Abstract:
The invention provides a negative image-recording material for heat-mode exposure systems, which comprises (A) an IR absorbent including cyanine dye having an electron-withdrawing group or a heavy atom-containing substituent in at least one terminal aromatic ring, (B) a radical generator and (C) a radically-polymerizable compound, and which is imagewise exposed to IR rays for image formation thereon.
Abstract:
A heat mode type negative image recording material is provided which comprises (A') a polymer compound that is insoluble in water but is soluble in an alkali aqueous solution and has at least one of structural units represented by general formulae (4) and (5) in an amount of 30 mol% or more; (B) a photothermal conversion agent; and (C') a compound forming radicals by heat mode exposure with light that is capable of being absorbed by the photothermal conversion agent (B), said heat mode type negative image recording material being capable of recording an image by heat mode exposure. The general formulae are defined in the specification.
Abstract:
PROBLEM TO BE SOLVED: To provide an ink composition curing by high sensitivity to the irradiation of a radiation, forming a high quality image and further giving a cured image which has sufficient flexibility and excellent close adhesion with a medium to be recorded, an inkjet-recording method by using the ink composition, a printed matter obtained by using the ink composition and inkjet-recording method, a lithographic printing plate obtained by using the ink composition and a method for producing the lithographic printing plate. SOLUTION: This ink composition contains (A) a compound containing ≥1 lactone ring and ≥1 radical polymerizable unsaturated double bond in its molecule, (B) a polymerization initiator and (C) a coloring matter. COPYRIGHT: (C)2007,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a positive resist composition for electron beam or X-ray having high sensitivity and good profile configuration in addition to high resolution particularly in the manufacture of a semiconductor device or the like, and a pattern forming method using the same. SOLUTION: The chemically amplified positive resist composition for electron beam or X-ray comprises an alkali-soluble resin having a weight average molecular weight of >3,000 to 300,000 and a specific structure or a resin which is decomposed by the action of an acid and has increased solubility to an alkali developer. The pattern forming method using the same is also provided. COPYRIGHT: (C)2009,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a negative image recording material for dealing with a heat mode in which ablation by laser scanning in recording is suppressed and from which a lithographic printing plate having high strength of a formed image part and excellent plate wear can be formed. SOLUTION: The recording material contains (A) polyurethane resin insoluble with water and soluble with an alkali aqueous solution, (B) a radical polymerizable compound, (C) a photo-thermal converting agent and (D) a compound generating a radical by heat-mode exposure to light at a wavelength where the photo-thermal converting agent(C) can absorb, in which an image can be recorded by heat-mode exposure. The polyurethane resin (A) preferably has a structural unit as a basic skeleton expressed by a reaction product of a diisocyanate compound expressed by general formula (2):OCN-X 0 -NCO and a diol compound expressed by general formula (3):HO-Y 0 -OH. COPYRIGHT: (C)2009,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a negative image recording material which suppresses ablation in laser scanning in recording and is capable of forming a lithographic printing plate having high strength of a formed image area and excellent in printing durability. SOLUTION: The negative lithographic printing plate precursor responding to a heat mode comprises (A) a high molecular compound having at least one of groups represented by formulae (1)-(3) in a side chain, insoluble in water and soluble in an alkaline aqueous solution, (B) a photothermal conversion agent, (C) an onium salt compound which generates a radical upon heat mode exposure to light of a wavelength which the photothermal conversion agent can absorb, and (D) a radically polymerizable compound, and it is capable of image recording by heat mode exposure. COPYRIGHT: (C)2008,JPO&INPIT