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公开(公告)号：JP2010129822A
公开(公告)日：2010-06-10
申请号：JP2008303846
申请日：2008-11-28
Applicant: Dainippon Screen Mfg Co Ltd , Hamamatsu Photonics Kk , 大日本スクリーン製造株式会社 , 浜松ホトニクス株式会社
Inventor： MURAOKA YUSUKE , ISHIKAWA MASAYOSHI
IPC: H01L21/31 , H01L21/312 , H01L21/768 , H01L23/522
Abstract: PROBLEM TO BE SOLVED: To provide substrate processing device and substrate processing method executing clean substrate processing at a low cost by preventing a substrate from being contaminated with a substance generated in radiating electron beams toward a substrate surface to perform predetermined substrate processing.
SOLUTION: Argon gas is supplied to an electron beam radiation area IR and the gas is exhausted from a surrounding area of the electron beam radiation area IR while the electron beams are being radiated. Thus, a contaminant generated by electron beam radiation to the substrate W is exhausted into an outer space of a processing space 41a together with the argon gas as exhaust gas to prevent the contaminant from being re-adhered to the substrate surface and from being dispersed into the whole of the processing space 41a. The contaminant is removed from the exhaust gas to generate a processing gas (once-used argon gas) and the processing gas is supplied to the processing space 41a. Thus, the processing space 41a is purged with the processing gas.
COPYRIGHT: (C)2010,JPO&INPITAbstract translation: 要解决的问题：通过防止基板被辐射电子束产生的物质朝向基板表面而被污染，从而提供以低成本执行清洁的基板处理的基板处理装置和基板处理方法，以进行预定的基板处理。 解决方案：氩气被供应到电子束辐射区域IR，并且在电子束被辐射的同时气体从电子束辐射区域IR的周围区域排出。 因此，通过对基板W的电子束辐射产生的污染物与氩气一起作为废气排放到处理空间41a的外部空间中，以防止污染物再附着到基板表面并分散在 整个处理空间41a。 从排气中除去污染物，生成处理气体（一次性使用的氩气），将处理气体供给到处理空间41a。 因此，处理空间41a被处理气体吹扫。 版权所有（C）2010，JPO＆INPIT
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公开(公告)号：JP2008128969A
公开(公告)日：2008-06-05
申请号：JP2006317495
申请日：2006-11-24
Applicant: Hamamatsu Photonics Kk , 浜松ホトニクス株式会社
Inventor： ISHIKAWA MASAYOSHI , UCHIYAMA KEIGO
CPC classification number: B41F23/0406 , G21K5/04 , G21K5/10
Abstract: PROBLEM TO BE SOLVED: To provide an electron beam irradiation system capable of sufficiently lowering the oxygen content of an atmosphere gas in an electron beam irradiation position.
SOLUTION: The electron beam irradiation system 100 has a casing 20 of an electron beam irradiation unit 1, and the casing 20 is placed in a chamber 30 in which printed matter P is transferred. The chamber 30 comprises a first flow passage 37 circulating nitrogen gas to an irradiation position Q along an outer wall 20b on a loading opening 31 side of the casing 20 and a second flow passage 38 circulating the nitrogen gas to the irradiation position Q along the outer wall 20c on a discharge opening 32 side of the casing 20. The flow of the nitrogen gas flowing to the irradiation position Q is rectified by the Coanda effect in the first flow passage 37 and the second flow passage 38. Accordingly, the electron beam irradiation system 100 can feed the nitrogen gas with small fluctuation of flow to the irradiation position Q, and the oxygen content of the atmosphere gas at the irradiation position Q can be sufficiently lowered.
COPYRIGHT: (C)2008,JPO&INPITAbstract translation: 解决的问题：提供能够充分降低电子束照射位置中的气氛气体的氧含量的电子束照射系统。 解决方案：电子束照射系统100具有电子束照射单元1的壳体20，并且壳体20被放置在传送印刷物P的室30中。 腔室30包括沿着壳体20的装载口31侧的外壁20b将氮气循环到照射位置Q的第一流路37和沿着外侧的氮气将氮气循环到照射位置Q的第二流路38 壁20c位于壳体20的排出口32侧。流过照射位置Q的氮气流在第一流路37和第二流路38中通过附壁效应进行整流。因此，电子束照射 系统100可以将具有小的流动波动的氮气供给到照射位置Q，并且可以充分降低照射位置Q处的气氛气体的氧含量。 版权所有（C）2008，JPO＆INPIT
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公开(公告)号：JP2001203134A
公开(公告)日：2001-07-27
申请号：JP2000008455
申请日：2000-01-18
Applicant: TABAI ESPEC CORP , HOSHIDEN PHILIPS DISPLAY KK , HARADA SANGYO KK , HAMAMATSU PHOTONICS KK
Inventor： KAJIYAMA TOSHIJI , YAMAMOTO MINORU , MINE HARUYUKI , ISHIKAWA MASAYOSHI
Abstract: PROBLEM TO BE SOLVED: To provide a heat treatment apparatus provided with a destaticizer, capable of performing static charge elimination of products at the same time as heat treatment. SOLUTION: A machine room 3 is arranged under a heat treatment room 1, a window is made on a partition 4 between the machine room 3 and the heat treatment room 1, the machine room 3 is shielded with a shield 38 formed of a member that passes through soft x-rays, and soft x-rays are radiated upward through the window to the heating air or cooling air in the heat treatment room 1 by a soft x-ray irradiation device 30 provided in the machine room 3.
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公开(公告)号：JPH10283978A
公开(公告)日：1998-10-23
申请号：JP9238897
申请日：1997-04-10
Applicant: HAMAMATSU PHOTONICS KK
Inventor： SUZUKI MAKOTO , ISHIKAWA MASAYOSHI , WATANABE HIROYUKI
IPC: H01J37/244 , H01J43/04
Abstract: PROBLEM TO BE SOLVED: To provide an electron detector on which a sample for observation can be placed directly. SOLUTION: An electron-to-light conversion member 12 comprising a phosphor plate 12a coated with a metallic thin film 12b is mounted in an opening 2a in a bottomed cylinder 2, and a microchannel plate MCP and an anode 10 are placed in the bottomed cylinder 2 via insulative annular spacers 4, 6, 8. When the metallic thin film 12b, the microchannel plate MCP, and the anode 10 are biased to predetermined potential and a sample OBJ is directly placed on the metallic thin film 12b and scanned by an electron beam EB from above, ultraviolet rays excited by secondary electrons and transmitted charged particles emitted from the metallic thin film 12b are released from the phosphor plate 12a, the microchannel plate MCP detects the ultraviolet rays and performs secondary electron multiplication, and a detection signal is produced in the anode 10.
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公开(公告)号：JPH10186042A
公开(公告)日：1998-07-14
申请号：JP34839296
申请日：1996-12-26
Applicant: HAMAMATSU PHOTONICS KK
Inventor： ISHIKAWA MASAYOSHI
Abstract: PROBLEM TO BE SOLVED: To provide an X-ray detector easy and safe to handle. SOLUTION: This detector has a light detecting tube 10 formed of a metallic positive electrode 10b and negative electrode 10c arranged adjacently to each other within a glass bulb 10a having discharge gas sealed therein, and sensitive to the ultraviolet ray and X-ray incident on the glass bulb 10a, and a thermally contracting tube 12 closely fitted to the outer surface of the light detecting tube 10, so that the ultraviolet ray incident on the light detecting tube 10 is shielded by the thermally contracting tube 12.
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Patent Agency Ranking
公开(公告)号：JPH10134763A
公开(公告)日：1998-05-22
申请号：JP29213896
申请日：1996-11-01
Applicant: HAMAMATSU PHOTONICS KK
Inventor： ISHIKAWA MASAYOSHI , OKUMURA KAZUAKI , WATANABE HIROYUKI
IPC: H01J37/244 , H01J37/29 , H01J43/24
Abstract: PROBLEM TO BE SOLVED: To provide an electron multiplier capable of simultaneously loading a plurality of samples and easily recording and checking a specified sample. SOLUTION: An electron multiplier is provided with a sample boundary material 20 that is divided by a boundary part 20a at a channel forming part on a face on which an output electrode of a micro-channel plate 3 is formed and that forms a plurality of sample loading parts. This multiplier is provided with an electronic reflector 7 reflecting an electronic beam B passing between samples 2 or inside of the samples 2 loaded on the sample boundary material 20 and a micro-channel plate 3 taking an electron beam reflected by the electron reflector 7 into that channel 31, multiplying and emitting it. Thereby, by the sample boundary material 20, a plurality of samples can be loaded at one time, and mixing of these samples can be prevented.
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公开(公告)号：JPH01186734A
公开(公告)日：1989-07-26
申请号：JP919588
申请日：1988-01-19
Applicant: HAMAMATSU PHOTONICS KK
Inventor： KAWAI TOSHIAKI , OTAKA TSUGUO , OKUMURA KAZUAKI , MURABAYASHI MINEO , SUGA KEIJI , ISHIKAWA MASAYOSHI
Abstract: PURPOSE:To improve residual image characteristics by laminating a good landing layer on a target. CONSTITUTION:A PbO layer 103 with the surface side thereof covered by a PbS crystal layer substituted and reacted with sulphur is laminated on the transparent conductive film 102 of a face plate 101. Furthermore, an overcoat layer 100 composed of As2S3 and the like as a good landing material ensuring good scanning electron compared with the complex film 103 is laminated thereupon. According to the aforesaid construction, a landing is generated on the overcoat layer 109 and residual image characteristics can be improved depending upon the characteristics of the overcoat layer 109.
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公开(公告)号：JP2010129824A
公开(公告)日：2010-06-10
申请号：JP2008303848
申请日：2008-11-28
Applicant: Dainippon Screen Mfg Co Ltd , Hamamatsu Photonics Kk , 大日本スクリーン製造株式会社 , 浜松ホトニクス株式会社
Inventor： MURAOKA YUSUKE , ISHIKAWA MASAYOSHI
IPC: H01L21/768 , H01L21/31 , H01L21/312 , H01L23/522
Abstract: PROBLEM TO BE SOLVED: To provide substrate processing device and substrate processing method capable of performing favorable substrate processing in a short time period by radiating electron beams uniformly and in an appropriate dose to various substrates. SOLUTION: The electron beams EB are radiated from an outgoing window 40g of an electron beam generation unit 40A, 40B to a substrate surface while being scanned in a scanning direction (a first direction) Y, and a substrate W concerned is moved in a horizontally moving direction (a second direction) X and the electron beams EB are radiated to the substrate surface Wf two-dimensionally. Here, a distance D between the outgoing window 40g and the substrate W is adjusted to a value corresponding to each substrate W. A moving speed of the substrate W, and a current supplied to an electron gun 40b and an acceleration voltage applied to the electron gun 40b are also adjusted to values corresponding to each substrate W. The electron beams are radiated to an interlayer insulating film F on the substrate W in such a state that the values of the distance D, the moving speed and the current are adjusted to the values corresponding to each substrate W. COPYRIGHT: (C)2010,JPO&INPIT
Abstract translation: 解决的问题：提供能够通过以各种基板均匀且适当的剂量辐射电子束，在短时间内进行良好的基板处理的基板处理装置和基板处理方法。 解决方案：电子束EB从扫描方向（第一方向）Y扫描的电子束产生单元40A，40B的出射窗口40g照射到基板表面，并且相关的基板W移动 沿水平移动方向（第二方向）X和电子束EB二维地辐射到基板表面Wf。 这里，将输出窗口40g和基板W之间的距离D调整为与各基板W对应的值。基板W的移动速度，供给电子枪40b的电流和施加到电子线的加速电压 枪40b也被调整到与每个衬底W相对应的值。电子束在距离D，移动速度和电流的值被调整到基板W的状态下被辐射到衬底W上的层间绝缘膜F. 对应于每个基底W的值。版权所有（C）2010，JPO＆INPIT
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公开(公告)号：JP2010129823A
公开(公告)日：2010-06-10
申请号：JP2008303847
申请日：2008-11-28
Applicant: Dainippon Screen Mfg Co Ltd , Hamamatsu Photonics Kk , 大日本スクリーン製造株式会社 , 浜松ホトニクス株式会社
Inventor： MURAOKA YUSUKE , ISHIKAWA MASAYOSHI
IPC: H01L21/304 , C23C16/44 , H01L21/31
Abstract: PROBLEM TO BE SOLVED: To clean a contaminant generated in radiating electron beams toward a substrate surface in a processing chamber to perform predetermined substrate processing in a substrate processing device, out of the processing chamber favorably and at a low cost.
SOLUTION: After ozone gas has been initially charged into a processing space 41a by an ozone gas supply unit 48B while electron beam radiation is being stopped, a circulation fan 49a is operated and the ozone gas is circulated along a circulation route defined by communicating the both ends of a cleaning passage (an air supply and exhaust passage) with the processing space 41a. The contaminant adhered to the inside of the processing chamber 41 is decomposed with the circulating and flowing ozone gas to clean the entire inner wall surface of the processing chamber 41.
COPYRIGHT: (C)2010,JPO&INPITAbstract translation: 要解决的问题：为了将在辐射电子束中产生的污染物清洁到处理室中的基板表面，以在基板处理装置中进行预定的基板处理，优选地以低成本从处理室中排出。 解决方案：当电子束辐射停止时，臭氧气体最初被臭氧气体供给单元48B装入处理空间41a之后，循环风扇49a被操作，臭氧气体沿着由 将清洁通道（供气和排气通道）的两端与处理空间41a连通。 附着在处理室41内部的污染物被循环流动的臭氧气体分解，以清洁处理室41的整个内壁表面。（C）2010，JPO＆INPIT
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公开(公告)号：JP2010027614A
公开(公告)日：2010-02-04
申请号：JP2009211905
申请日：2009-09-14
Applicant: Hamamatsu Photonics Kk , Harada Sangyo Kk , Techno Ryowa Ltd , 原田産業株式会社 , 株式会社テクノ菱和 , 浜松ホトニクス株式会社
Inventor： MIZUNO AKIRA , SUGITA AKIO , SUZUKI MASANORI , IZUMI TAKAHARU , ISHIKAWA MASAYOSHI , MINE HARUYUKI
Abstract: PROBLEM TO BE SOLVED: To provide a chamber type ion-conveyance system ionization device doing away with generation of ozone, and electromagnetic noise, dust or the like to achieve elimination of static charge even in a narrow space.
SOLUTION: Generation sites of soft X rays, low-energy electron beams, ultraviolet rays, or surface creepage discharge, or ionizing sources 4 such as sealed radioisotope are arranged inside a chamber 1. A control device 5 consisting of a power source part of the ionizing sources 4 and a control part is arranged outside the chamber 1. A shielding part made of a plurality of barrier ribs 7, 7 is provided at a downstream side of the chamber 1 to shield the soft X rays and the low-energy electron beams generated from the ionizing sources 4 or radioactive rays or the like from the radioisotope.
COPYRIGHT: (C)2010,JPO&INPITAbstract translation: 要解决的问题：提供一种室内离子输送系统的电离装置消除臭氧的产生，以及电磁噪声，灰尘等，以便即使在狭窄的空间也能消除静电。 解决方案：在室1内部布置有软X射线，低能电子束，紫外线或表面爬电放电的产生位置或诸如密封的放射性同位素的电离源4，由电源 电离源4的一部分和控制部分设置在室1的外部。由多个隔壁7,7形成的屏蔽部分设置在室1的下游侧，以屏蔽软X射线和低频电极， 从电离源4产生的能量电子束或来自放射性同位素的放射线等。 版权所有（C）2010，JPO＆INPIT
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