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公开(公告)号:CA2787161A1
公开(公告)日:2011-12-29
申请号:CA2787161
申请日:2011-06-15
Applicant: IBM
Inventor: STAMPER ANTHONY , JAHNES CHRISTOPHER VINCENT
IPC: B81C1/00
Abstract: A method of forming at least one Micro-Electro-Mechanical System(MEMS) cavity includes forming a first sacrificial cavity layer over a lower wiring layer. The method further includes forming a layer. The method further includes forming a second sacrificial cavity layer over the first sacrificial layer and in contact with the layer. The method further includes forming a lid on the second sacrificial cavity layer. The method further includes forming at least one vent hole in the lid, exposing a portion of the second sacrificial cavity layer. The method further includes venting or stripping the second sacrificial cavity layer such that a top surface of the second sacrificial cavity layer is no longer touching a bottom surface of the lid, before venting or stripping the first sacrificial cavity layer thereby forming a first cavity and second cavity, respectively.
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公开(公告)号:CA2787130A1
公开(公告)日:2011-12-29
申请号:CA2787130
申请日:2011-06-15
Applicant: IBM
Inventor: STAMPER ANTHONY , JAHNES CHRISTOPHER VINCENT
IPC: B81B3/00
Abstract: A method of forming a Micro-Electro-Mechanical System (MEMS) includes forming a lower electrode on a first insulator layer within a cavity of the MEMS. The method further includes forming an upper electrode over another insulator material on top of the lower electrode which is at least partially in contact with the lower electrode. The forming of the lower electrode and the upper electrode includes adjusting a metal volume of the lower electrode and the upper electrode to modify beam bending.
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