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公开(公告)号：GB2109816A
公开(公告)日：1983-06-08
申请号：GB8134778
申请日：1981-11-18
Applicant: IBM
Abstract: A chromium electroplating electrolyte containing trivalent chromium ions, a complexant, a buffer agent and thiocyanate ions for promoting chromium deposition, the thiocyanate having a molar concentration lower than that of the chromium ions. The chromium preferably has a concentration lower than 0.01M. Preferably the complexant is selected so that the stability constant K1 of chromium complex is in the range 10 M . Complexants in this range include aspartic acid, iminodiacetic acid, nitrilotriacetic acid and 5-sulphosalicylic acid.
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公开(公告)号：AU528649B2
公开(公告)日：1983-05-05
申请号：AU5268979
申请日：1979-11-09
Applicant: IBM
Inventor： BARCLAY DONALD JOHN , VIGAR JAMES MICHAEL LINFORD
Abstract: A very low concentration trivalent chromium plating bath in which the source of chromium is an aqueous solution of a chromium (III)- thiocyanate complex (Cr less than 0.03 M) gives a deposit of unexpectedly light colour. Such a bath is employed to produce thin overcoatings of light coloured chromium and may replace the rinse tank of a first chromium (III)- thiocyanate process which is optimized for efficiency and bath stability rather than colour.
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公开(公告)号：AU5268979A
公开(公告)日：1980-05-15
申请号：AU5268979
申请日：1979-11-09
Applicant: IBM
Inventor： BARCLAY DONALD JOHN , VIGAR JAMES MICHAEL LINFORD
Abstract: A very low concentration trivalent chromium plating bath in which the source of chromium is an aqueous solution of a chromium (III)- thiocyanate complex (Cr less than 0.03 M) gives a deposit of unexpectedly light colour. Such a bath is employed to produce thin overcoatings of light coloured chromium and may replace the rinse tank of a first chromium (III)- thiocyanate process which is optimized for efficiency and bath stability rather than colour.
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公开(公告)号：DK151975B
公开(公告)日：1988-01-18
申请号：DK475879
申请日：1979-11-09
Applicant: IBM
Inventor： BARCLAY DONALD JOHN , VIGAR JAMES MICHAEL LINFORD
Abstract: A very low concentration (below 0.03 M) trivalent chromium plating bath in which the source of chromium is an equilibrated aqueous solution of a chromium (III) - thiocyanate complex gives a deposit of unexpectedly light color. Such a bath is employed to produce thin overcoatings of light colored chromium for decorative applications. The bath and process is also used to plate the initial layer of a thick (greater than 5 micron) deposit for engineering applications, the major part of which is plated from a higher chromium concentration bath. Such thick deposits from a higher concentration bath are more cohesive and smoother when plated over an initial layer from the low concentration bath.
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公开(公告)号：DE3265889D1
公开(公告)日：1985-10-03
申请号：DE3265889
申请日：1982-11-11
Applicant: IBM
Abstract: A chromium electroplating electrolyte containing trivalent chromium ions, a complexant, a buffer agent and thiocyanate ions for promoting chromium deposition, the thiocyanate having a molar concentration lower than that of the chromium ions. The chromium preferably has a concentration lower than 0.01M. Preferably the complexant is selected so that the stability constant K1 of chromium complex is in the range 10 M . Complexants in this range include aspartic acid, iminodiacetic acid, nitrilotriacetic acid and 5-sulphosalicylic acid.
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Patent Agency Ranking
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公开(公告)号：NO151473C
公开(公告)日：1985-04-17
申请号：NO793615
申请日：1979-11-09
Applicant: IBM
Inventor： BARCLAY DONALD JOHN , VIGAR JAMES MICHAEL LINFORD
Abstract: A very low concentration (below 0.03 M) trivalent chromium plating bath in which the source of chromium is an equilibrated aqueous solution of a chromium (III) - thiocyanate complex gives a deposit of unexpectedly light color. Such a bath is employed to produce thin overcoatings of light colored chromium for decorative applications. The bath and process is also used to plate the initial layer of a thick (greater than 5 micron) deposit for engineering applications, the major part of which is plated from a higher chromium concentration bath. Such thick deposits from a higher concentration bath are more cohesive and smoother when plated over an initial layer from the low concentration bath.
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公开(公告)号：GB2109816B
公开(公告)日：1985-01-23
申请号：GB8134778
申请日：1981-11-18
Applicant: IBM
Abstract: A chromium electroplating electrolyte containing trivalent chromium ions, a complexant, a buffer agent and thiocyanate ions for promoting chromium deposition, the thiocyanate having a molar concentration lower than that of the chromium ions. The chromium preferably has a concentration lower than 0.01M. Preferably the complexant is selected so that the stability constant K1 of chromium complex is in the range 10 M . Complexants in this range include aspartic acid, iminodiacetic acid, nitrilotriacetic acid and 5-sulphosalicylic acid.
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公开(公告)号：FI65286B
公开(公告)日：1983-12-30
申请号：FI824259
申请日：1982-12-10
Applicant: IBM
Inventor： BARCLAY DONALD JOHN , VIGAR JAMES MICHAEL LINFORD
IPC: C25D20060101 , C25D3/06
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