公开(公告)号：EP1767070A2

公开(公告)日：2007-03-28

申请号：EP05759377.4

申请日：2005-06-09

Applicant: Imra America, Inc.

Inventor： CHE, Yong ,  HU, Zhendong

IPC: H05H1/24

CPC classification number: C23C14/28 ,  C23C14/086 ,  H01M4/0426 ,  H01M6/40 ,  H01M10/0472 ,  H01M10/058

Abstract: A method of fabricating a multi-layered thin film electrochemical device is provided. The method comprises: providing a first target material in a chamber; providing a substrate in the chamber; emitting a first intermittent laser beam directed at the first target material to generate a first plasma, wherein each pulse of the first intermittent laser beam has a pulse duration of about 20 fs to about 500 ps; depositing the first plasma on the substrate to form a first thin film; providing a second target material in the chamber; emitting a second intermittent laser beam directed at the second target material to generate a second plasma, wherein each pulse of the second intermittent laser beam has a pulse duration of about 20 fs to about 500 ps; and depositing the second plasma on or above the first thin film to form a second thin film.

公开(公告)号：EP2391455A1

公开(公告)日：2011-12-07

申请号：EP09839437.2

申请日：2009-03-19

Applicant: Imra America, Inc.

Inventor： LIU, Bing ,  HU, Zhendong ,  MURAKAMI, Makoto ,  CHE, Yong

IPC: B02C19/00

CPC classification number: B02C19/18 ,  B01J13/0043 ,  B01J19/121 ,  B22F1/0022 ,  B22F9/04 ,  B22F2999/00 ,  B82Y30/00 ,  B22F2202/11

Abstract: Various embodiments include a method of producing chemically pure and stably dispersed metal and metal-alloy nanoparticle colloids with ultrafast pulsed laser ablation. A method comprises irradiating a metal or metal alloy target submerged in a liquid with ultrashort laser pulses at a high repetition rate, cooling a portion of the liquid that includes an irradiated region, and collecting nanoparticles produced with the laser irradiation and liquid cooling. The method may be implemented with a high repetition rate ultrafast pulsed laser source, an optical system for focusing and moving the pulsed laser beams, a metal or metal alloy target submerged in a liquid, and a liquid circulating system to cool the laser focal volume and collect the nanoparticle products. By controlling various laser parameters, and with optional liquid flow movement, the method provides stable colloids of dispersed metal and metal-alloy nanoparticles. In various embodiments additional stabilizing chemical agents are not required.

公开(公告)号：EP2109694A2

公开(公告)日：2009-10-21

申请号：EP08799669.0

申请日：2008-01-31

Applicant: Imra America, Inc.

Inventor： HU, Zhendong ,  CHE, Yong ,  LIU, Bing

IPC: C23C20/04

CPC classification number: C30B23/08 ,  C23C14/083 ,  C23C14/28 ,  C30B29/16

Abstract: A one-step and room-temperature process for depositing nanoparticles or nanocomposite (nanoparticle-assembled) films of metal oxides such as crystalline titanium dioxide (TiO2) onto a substrate surface using ultrafast pulsed laser ablation of Titania or metal titanium target. The system includes a pulsed laser with a pulse duration ranging from a few femtoseconds to a few tens of picoseconds, an optical setup for processing the laser beam such that the beam is focused onto the target surface with an appropriate average energy density and an appropriate energy density distribution, and a vacuum chamber in which the target and the substrate are installed and background gases and their pressures are appropriately adjusted.

公开(公告)号：EP2391455B1

公开(公告)日：2018-05-09

申请号：EP09839437.2

申请日：2009-03-19

Applicant: Imra America, Inc.

Inventor： LIU, Bing ,  HU, Zhendong ,  MURAKAMI, Makoto ,  CHE, Yong

IPC: B02C19/00

CPC classification number: B02C19/18 ,  B01J13/0043 ,  B01J19/121 ,  B22F1/0022 ,  B22F9/04 ,  B22F2999/00 ,  B82Y30/00 ,  B22F2202/11

Abstract: Various embodiments include a method of producing chemically pure and stably dispersed metal and metal-alloy nanoparticle colloids with ultrafast pulsed laser ablation. A method comprises irradiating a metal or metal alloy target submerged in a liquid with ultrashort laser pulses at a high repetition rate, cooling a portion of the liquid that includes an irradiated region, and collecting nanoparticles produced with the laser irradiation and liquid cooling. The method may be implemented with a high repetition rate ultrafast pulsed laser source, an optical system for focusing and moving the pulsed laser beams, a metal or metal alloy target submerged in a liquid, and a liquid circulating system to cool the laser focal volume and collect the nanoparticle products. By controlling various laser parameters, and with optional liquid flow movement, the method provides stable colloids of dispersed metal and metal-alloy nanoparticles. In various embodiments additional stabilizing chemical agents are not required.

公开(公告)号：EP2274771B1

公开(公告)日：2015-07-15

申请号：EP09758837.0

申请日：2009-03-11

Applicant: Imra America, Inc.

Inventor： MURAKAMI, Makoto ,  HU, Zhendong ,  LIU, Bing ,  CHE, Yong ,  LIU, Zhenlin ,  UEHARA, Yuzuru

IPC: H01L21/44 ,  C23C14/28 ,  C23C14/08 ,  H01S3/00 ,  H01S3/23 ,  C23C14/56

CPC classification number: C23C14/28 ,  C23C14/08 ,  C23C14/564 ,  H01S3/0057 ,  H01S3/0085 ,  H01S3/2308

公开(公告)号：EP2109694B1

公开(公告)日：2013-06-26

申请号：EP08799669.0

申请日：2008-01-31

Applicant: Imra America, Inc.

Inventor： HU, Zhendong ,  CHE, Yong ,  LIU, Bing

IPC: C23C20/04 ,  C23C20/02

CPC classification number: C30B23/08 ,  C23C14/083 ,  C23C14/28 ,  C30B29/16

公开(公告)号：EP2274771A1

公开(公告)日：2011-01-19

申请号：EP09758837.0

申请日：2009-03-11

Applicant: Imra America, Inc.

Inventor： MURAKAMI, Makoto ,  HU, Zhendong ,  LIU, Bing ,  CHE, Yong ,  LIU, Zhenlin ,  UEHARA, Yuzuru

IPC: H01L21/44

CPC classification number: C23C14/28 ,  C23C14/08 ,  C23C14/564 ,  H01S3/0057 ,  H01S3/0085 ,  H01S3/2308

Abstract: A method of pulsed laser deposition (PLD) capable of continuously tuning formed-film morphology from that of a nanoparticle aggregate to a smooth thin film free of particles and droplets. The materials that can be synthesized using various embodiments of the invention include, but are not limited to, metals, alloys, metal oxides, and semiconductors. In various embodiments a 'burst' mode of ultrashort pulsed laser ablation and deposition is provided. Tuning of the film morphology is achieved by controlling the burst-mode parameters such as the number of pulses and the time-spacing between the pulses within each burst, the burst repetition rate, and the laser fluence. The system includes an ultrashort pulsed laser, an optical system for delivering a focused onto the target surface with an appropriate energy density, and a vacuum chamber in which the target and the substrate are installed and background gases and their pressures are appropriately adjusted.