公开(公告)号：JP2008239646A

公开(公告)日：2008-10-09

申请号：JP2007077689

申请日：2007-03-23

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NATSUME NORIHIRO ,  SUGIE NORIHIKO ,  TAKAHASHI JUNICHI

IPC: C08F12/32 ,  G03F7/11 ,  H01L21/027

CPC classification number: G03F7/091 ,  C08F212/14 ,  C08F212/32 ,  C08F220/04 ,  C08F222/02 ,  C08F2220/382 ,  G03F7/0045

Abstract: PROBLEM TO BE SOLVED: To obtain a resin for forming an upper layer antireflection film and a composition for forming an upper layer antireflection film and to provide a method for forming a resist pattern. SOLUTION: The resin for forming an upper layer antireflection film comprises at least one of repeating units represented by formulas (1) and (2) and is soluble in an alkali development solution. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：获得用于形成上层抗反射膜的树脂和用于形成上层抗反射膜的组合物，并提供形成抗蚀剂图案的方法。 解决方案：用于形成上层抗反射膜的树脂包含由式（1）和（2）表示的重复单元中的至少一种，并且可溶于碱显影溶液。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2012155047A

公开(公告)日：2012-08-16

申请号：JP2011012571

申请日：2011-01-25

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NATSUME NORIHIRO ,  HARADA SAKI ,  KOBAYASHI SATORU ,  NAKANO TAKANORI

IPC: G03F7/039 ,  C08F12/24 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive composition capable of attaining a good pattern shape in lithography process for a high reflective substrate or a stepped substrate.SOLUTION: A radiation sensitive composition comprises: a polymer [A1] that includes a structural unit (HS1) derived from hydroxystyrene and a structural unit (a1) having a group represented by formula (a-1) and includes substantially no acid-dissociable group for producing an acidic functional group through dissociation caused by a function of an acid; and a polymer [A2] including a structural unit (HS2) derived from hydroxystyrene and the acid-dissociable group.

Abstract translation: 要解决的问题：提供一种能够在用于高反射性基板或阶梯式基板的光刻工艺中获得良好图案形状的辐射敏感组合物。 解决方案：辐射敏感组合物包括：包含由羟基苯乙烯衍生的结构单元（HS1）的聚合物[A1]和具有由式（a-1）表示的基团的结构单元（a1），并且基本上不含酸 用于通过由酸的功能引起的解离产生酸性官能团的相互关联基团; 和包含由羟基苯乙烯衍生的结构单元（HS2）和酸解离性基团的聚合物[A2]。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2010079231A

公开(公告)日：2010-04-08

申请号：JP2008257241

申请日：2008-10-02

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： TANAKA KIKA ,  NATSUME NORIHIRO ,  SUGIE NORIHIKO

IPC: G03F7/11 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an upper-layer film forming composition that forms an upper-layer film which has a small bubble defect while having large receding contact angle and small advancing contact angle, i.e. having a higher scanning speed. SOLUTION: The upper-layer film forming composition is used to form the upper-layer film on a surface of a photoresist film, and contains (A) a polymer having a repeating structure unit expressed by formula (1), (B) a polymer other than (A) and having a sulfonic acid group, and (C) a solvent. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种上层成膜组合物，其形成具有小气泡缺陷的上层膜，同时具有大的后退接触角和小的前进接触角，即具有较高的扫描速度。 解决方案：使用上层成膜组合物在光致抗蚀剂膜的表面上形成上层膜，并且含有（A）具有由式（1）表示的重复结构单元的聚合物，（B ）除（A）以外的具有磺酸基的聚合物，和（C）溶剂。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2008299349A

公开(公告)日：2008-12-11

申请号：JP2008211287

申请日：2008-08-20

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NUMATA ATSUSHI ,  SUZUKI AKI ,  HARA HIROMICHI ,  NATSUME NORIHIRO

IPC: G03F7/004 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a positive radiation-sensitive resin composition that is superior in sensitivity and resolution, small in an optical proximity effect, and ensures a sufficient focus margin for an isolated line pattern.
SOLUTION: The radiation-sensitive resin composition contains (A) a low molecular weight compound obtained by substituting one hydrogen atom or more of a compound comprising an amino group where the hydrogen atom is combined with a nitrogen atom by a t-butoxy carbonyl group, (B) a radiation-sensitive acid generator, and (C) an acid dissociation group-containing resin. The compound having the amino group where the hydrogen atom is combined with the nitrogen atom is selected from among groups of a compound of formula (1), 1-adamanthylamine, nitrogen-containing heterocyclic compound, or the like. The (B) constituent is selected from among a bis(cyclohexane sulfonyl)diazomethane, N-(triflouromethanesulfonyloxy)bicyclo[2.2.1]hepto-5-ene-2, 3-dicarboximide, or the like. In the formula, R
1 and R
2 represent the hydrogen atom, alkyl group, or the like.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供灵敏度和分辨率优异的光敏感树脂组合物，光学邻近效应小，并且确保隔离线图案的足够的聚焦余量。 解决方案：辐射敏感性树脂组合物含有（A）通过将氢原子与氮原子结合的氨基的一个氢原子或更多个取代为叔丁氧基而获得的低分子量化合物 羰基，（B）辐射敏感性酸产生剂，和（C）含酸解离基团的树脂。 具有氢原子与氮原子结合的氨基的化合物选自式（1）化合物，1-金刚烷胺，含氮杂环化合物等的组。 （B）成分选自双（环己烷磺酰基）重氮甲烷，N-（三氟甲磺酰氧基）双环[2.2.1]庚-5-烯-2,3-二甲酰亚胺等。 在该式中，R“SP”1 和R 2 表示氢原子，烷基等。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2007154047A

公开(公告)日：2007-06-21

申请号：JP2005351370

申请日：2005-12-05

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NISHIMURA ISAO ,  SUGIE NORIHIKO ,  NATSUME NORIHIRO ,  TAKAHASHI JUNICHI

IPC: C08G77/12 ,  G03F7/039 ,  G03F7/075 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition capable of remarkably decreasing development defects while keeping good properties of polysiloxane and sufficient principal resist performance as a chemical amplification resist and provide a polysiloxane useful as a constituent component of the radiation-sensitive resin composition. SOLUTION: The invention provides a polysiloxane obtained by polycondensation of a silane compound expressed by general formula (I) and SiR 4 3 H (R 1 groups are each independently 1-20C alkoxy, 2-7C acyloxy or a halogen atom; R 2 is 1-20C bivalent hydrocarbon group which may have substituents; and R 3 is univalent acid-dissociable group) in the presence of water, and a radiation-sensitive resin composition containing the polysiloxane and a radiation-sensitive acid generator. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供能够显着降低显影缺陷同时保持聚硅氧烷的良好性能和足够的主抗蚀剂性能作为化学增幅抗蚀剂的辐射敏感性树脂组合物，并提供可用作辐射的组成成分的聚硅氧烷 敏感树脂组合物。 解决方案：本发明提供通过由通式（I）表示的硅烷化合物与SiR 4（S H） / SP>基团各自独立地为1-20C烷氧基，2-7C酰氧基或卤素原子; R 2为可以具有取代基的1-20C二价烃基;且R 3 = SP>是一价酸解离基团）和含有聚硅氧烷和辐射敏感性酸产生剂的辐射敏感性树脂组合物。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2009134177A

公开(公告)日：2009-06-18

申请号：JP2007311461

申请日：2007-11-30

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NISHIMURA YUKIO ,  NATSUME NORIHIRO ,  SUGIE NORIHIKO

IPC: G03F7/38 ,  C08F20/10 ,  G03F7/40 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a pattern forming method, capable of suppressing development defects by using a defect removing agent in formation of a fine resist pattern by liquid immersion exposure or the like. SOLUTION: The pattern forming method comprises steps of (1) applying a radiation-sensitive resin composition containing a resin (a) which becomes alkali-soluble by the effect of acid and (b) a radiation-sensitive acid generator (b) onto a substrate to form a coating film followed by exposing; (2) applying a defect removing agent onto the coating film to form a coating layer; and (3) performing development. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 解决的问题：提供一种图案形成方法，其能够通过使用缺陷去除剂在通过液浸曝光等形成精细抗蚀剂图案的同时抑制显影缺陷。 解决方案：图案形成方法包括以下步骤：（1）施加含有通过酸的作用变成碱溶性的树脂（a）的辐射敏感性树脂组合物和（b）辐射敏感性酸产生剂（b ）到基底上以形成涂膜，随后暴露; （2）将缺陷去除剂涂覆在涂膜上以形成涂层; （3）发展。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2007298633A

公开(公告)日：2007-11-15

申请号：JP2006125228

申请日：2006-04-28

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NOMURA NAKAATSU ,  NATSUME NORIHIRO ,  KONNO KEIJI

IPC: G03F7/11 ,  C08F220/22 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a composition for antireflection film formation having excellent coating property, forming an antireflection film capable of sufficiently reducing standing-wave effect, and capable of suppressing generation of microbubbles. SOLUTION: The composition for antireflection film formation contains (A) a copolymer (salt) of a sulfonic acid group-containing acrylamide derivative typified by 2-(meth)acrylamide-2-methylpropanesulfonic acid and a fluoroalkyl group-containing acrylic ester derivative typified by 2,2,3,3,3-pentafluoropropyl (meth)acrylate and (B) an acetylene compound typified by 2,5,8,11-tetramethyl-6-dodecyne-5,8-diol, 5,8-dimethyl-6-dodecyne-5,8-diol or ethylene oxide addition derivatives of these. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：为了提供具有优异涂布性能的抗反射膜形成用组合物，形成能够充分降低驻波效应并能够抑制微泡产生的抗反射膜。 解决方案：用于防反射膜形成的组合物包含（A）以2-（甲基）丙烯酰胺-2-甲基丙磺酸为代表的含磺酸基的丙烯酰胺衍生物和含氟烷基的丙烯酸酯的共聚物（盐） 以（甲基）丙烯酸2,2,3,3,3-五氟丙酯为代表的衍生物，（B）以2,5,8,11-四甲基-6-十二炔-5,8-二醇为代表的乙炔化合物，5,8 二甲基-6-十二炔-5,8-二醇或环氧乙烷加成衍生物。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2006259382A

公开(公告)日：2006-09-28

申请号：JP2005078127

申请日：2005-03-17

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NOMURA NAKAATSU ,  KONNO KEIJI ,  NATSUME NORIHIRO

IPC: G03F7/11 ,  G03F7/033 ,  H01L21/027

CPC classification number: G03F7/091 ,  G03F7/0046

Abstract: PROBLEM TO BE SOLVED: To provide a composition for forming an antireflection film, the composition having excellent coating property, significantly suppressing generation of fine microbubbles, sufficiently decreasing a standing wave effect in a formed antireflection film, and having excellent dissolving property with water and an alkali developing solution. SOLUTION: The composition for forming an antireflection film contains a polymer having at least one kind of repeating unit expressed by formula (1). In formula (1), each of R 1 and R 2 independently represents a hydrogen atom, a fluorine atom, or a monovalent organic group; Y represents a divalent bond; Z represents a trivalent organic group; and n represents an integer of 1 to 20. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题为了提供一种防反射膜形成用组合物，具有优异的涂布性，显着抑制微细微泡的产生，充分降低了形成的防反射膜中的驻波效应，并且具有优异的溶解性的组合物 水和碱性显影液。 解决方案：用于形成抗反射膜的组合物含有具有至少一种由式（1）表示的重复单元的聚合物。 在式（1）中，R 1和R 2各自独立地表示氢原子，氟原子或一价有机基团; Y表示二价键; Z表示三价有机基团; 并且n表示1〜20的整数。（C）2006，JPO＆NCIPI

公开(公告)号：JPH10177247A

公开(公告)日：1998-06-30

申请号：JP35328696

申请日：1996-12-17

Applicant: JSR CORP ,  OSAKA ORGANIC CHEM IND

Inventor： IWANAGA SHINICHIRO ,  TANABE TAKAYOSHI ,  NATSUME NORIHIRO ,  TANAKA YUKIO ,  NAKAGOME NAOKI

IPC: G03F7/004 ,  G03F7/033 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To obtain a radiation sensitive resin compsn. excellent in sensitivity, resolution and pattern shape and capable of stably forming a high precision fine resist pattern by incorporating a specified copolymer and a radiation sensitive acid generating agent. SOLUTION: This radiation sensitive resin compsn. contains a copolymer having repeating units represented by formula I and repeating units represented by formula II and a radiation sensitive acid generating agent. In the formula I, R is H or methyl. In the formula II, each of R -R is H or methyl, R is 1-6C alkylene or 2-6C alkylidene, R is 1-10C straight chain or branched alkyl, 1-10C straight chain or branched haloalkyl, 3-11C cycloalkyl, 6-10C aryl or 7-11C aralkyl and (n) is an integer of 0-5. A mixture of two or more kinds of copolymers may be used.