Abstract:
PROBLEM TO BE SOLVED: To provide a tantalum oxide film having large capacitance and a less leak current and manufacturing method thereof. SOLUTION: The tantalum oxide film having the capacitance of a range 0.004 F/m 2 or more, electric field strength in a range -1.25 - +1.25 MV/cm, and only the leak current of 1×10 -8 A/cm 2 or less, and the manufacturing method thereof are provided. This film is used as a capacitor for a CMOS and an insulating film for a semiconductor device. COPYRIGHT: (C)2004,JPO
Abstract:
PROBLEM TO BE SOLVED: To provide a composition for forming an ink-jet method tantalum oxide film for forming a desired pattern of a tantalum oxide film stably by saving energy and at a low cost, and also to provide a method of forming the tantalum oxide film. SOLUTION: The composition contains a specific tantalum-contained reactant and solvent. The method of forming the tantalum oxide film at least includes processes: of applying the composition on a substrate by an ink-jet method (1); and of conducting at least one treatment selected from either heat treatment or optical treatment (2). COPYRIGHT: (C)2004,JPO
Abstract:
PROBLEM TO BE SOLVED: To provide a storage stability composition for easily and effectively forming a high-grade tantalum oxide film with less leak current even under high-humidity conditions by a simple coating application method, and a method for forming the tantalum oxide film. SOLUTION: The composition contains [A] a reaction product of (a1) tantalum alkoxide with (a2) at least one compound selected from an amino alcohol, a compound having ≥2 hydroxy groups in the molecule (exclusive of amino alcohol), β-diketone, β-ketoester, β-dicarboxylate, lactic acid, ethyl lactate and 1,5-cyclooctadiene, [B] orthocarboxylate, and [C] an acid. The tantalum oxide film is formed by applying such composition onto a substrate and treating the composition by heat and/or light. COPYRIGHT: (C)2004,JPO
Abstract:
PROBLEM TO BE SOLVED: To obtain a PSA mode liquid crystal display element hardly causing afterimage while developing high voltage retention even after a light irradiation to a liquid crystal cell.SOLUTION: A liquid crystal orienting agent for a PSA mode liquid crystal display element contains a polymer (A1) which has polymerizable unsaturated bond. A group including the polymerizable unsaturated bond contained in the polymer (A1) is preferably selected at least from one of a group represented by the following formula (f1), a group represented by the following formula (f2), and a group represented by the following formula (f3).
Abstract:
PROBLEM TO BE SOLVED: To provide a liquid crystal aligning agent which prevents a coating film from degrading due to water absorption of the film even if the film is exposed to the air after formation of the liquid crystal aligned film and is excellent in removability of the coating film and also in printability.SOLUTION: The liquid crystal aligning agent contains at least one kind of polymer selected from the group consisting of polyamic acid obtained from reaction of tetracarboxylic acid dianhydride with diamine and polyimide obtained from dehydration ring-closure of the polyamic acid, where the diamine includes a certain diamine having a phenyl-dihydroindene structure and a diamine having a carboxyl group.
Abstract:
PROBLEM TO BE SOLVED: To provide a liquid crystal aligning agent which has uniform film quality, provides a liquid crystal alignment layer excellent in electric characteristics and heat resistance, and is also excellent in coating property.SOLUTION: The liquid crystal aligning agent contains at least one kind of polymer selected from a group which comprises polyamic acid and polyimide, wherein the polymer has a group represented by the following formula (A'): R-(X)-R-O-X-COO-(RO)-. In the formula (A'), Rrepresents 1-30 alkyl group or 1-30C fluoroalkyl group, Rrepresents single bond, methylene group or 2-30C alkylene group, Rrepresents 2-5C alkylene group, and Xand Xare respectively bivalent alicyclic group, bivalent heterocyclic group, arylene group or bivalent heteroaromatic group, wherein a plurality of groups Xmay be equal to one another or different from one another, n1 is an integer of 2 to 5, n2 is an integer of 0 to 10, and (*) represents bonding hand.
Abstract:
PROBLEM TO BE SOLVED: To provide a radiosensitive resin composition which can acquire a sufficient spacer configuration with high sensitivity and high resolution even in ≤1,200 J/m 2 amount of exposure and excellent in solubility in a developing liquid and can form a spacer for a liquid crystal display element excellent in elastic recovery, rubbing resistance, adhesiveness with a transparent substrate, heat resistance and the like. SOLUTION: The radiosensitive resin composition comprises a polymer and a polymerizable unsaturated compound. The polymer is prepared by reacting a (meth)acryloyloxyalkyl isocyanate compound with a copolymer prepared by copolymerizing an unsaturated carboxylic acid and/or an unsaturated carboxylic acid anhydride, an unsaturated compound having ≥1 hydroxyl groups in one molecule, an unsaturated compound having a lactone structure and another unsaturated compound except the unsaturated compounds. COPYRIGHT: (C)2007,JPO&INPIT
Abstract translation:要解决的问题:提供一种即使在≤1,200J/ m 2 SP>曝光量中也能以高灵敏度和高分辨率获得足够的间隔物构型的放射线敏感性树脂组合物,并且溶解度优异 可以形成用于液晶显示元件的间隔物,该间隔物具有优异的弹性恢复性,耐摩擦性,与透明基材的粘合性,耐热性等。 解决方案:放射敏感性树脂组合物包含聚合物和可聚合不饱和化合物。 聚合物通过使(甲基)丙烯酰氧基烷基异氰酸酯化合物与通过使不饱和羧酸和/或不饱和羧酸酐共聚制备的共聚物,在一个分子中具有≥1个羟基的不饱和化合物,具有内酯的不饱和化合物 结构和不饱和化合物之外的另一种不饱和化合物。 版权所有(C)2007,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a radiation-sensitive composition for colored layer formation which leaves no undissolved matter in development, has no scumming, chipping and undercut of a pattern edge, and excels also in solvent re-solubility of a dry film and electrical properties of the film typified by voltage retention. SOLUTION: The radiation-sensitive composition for colored layer formation contains [A] a colorant, [B] an alkali-soluble resin containing a polymer obtained by reacting a copolymer obtained from (b1) an unsaturated carboxylic acid (anhydride) typified by (meth)acrylic acid, (b2) a hydroxyl group-containing unsaturated compound typified by (meth)acrylic acid 2-(6-hydroxyhexanoyloxy)ethyl ester and (b3) another polymerizable unsaturated compound with an unsaturated isocyanate compound typified by 2-(meth)acryloyloxyethyl isocyanate, [C] a polyfunctional monomer and [D] a photopolymerization initiator. COPYRIGHT: (C)2007,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having high sensitivity, forming a sufficient spacer form even by the exposure rate of ≤1,200 J/m 2 and giving a spacer for a liquid crystal display element having excellent softness, high recovery rate, rubbing resistance, adhesiveness to a transparent substrate, heat resistance, etc. SOLUTION: The radiation-sensitive resin composition contains a polymer produced by reacting an isocyanate compound to a copolymer of (a1) an unsaturated carboxylic acid and/or an unsaturated carboxylic acid anhydride, (a2) a hydroxy-containing unsaturated compound containing one hydroxy group in the molecule and (a3) an unsaturated compound other than the compounds (a1) and (a2). COPYRIGHT: (C)2007,JPO&INPIT
Abstract translation:要解决的问题:为了提供具有高灵敏度的辐射敏感性树脂组合物,即使通过暴露速率≤1,200J/ m 2 SP< SP>形成足够的间隔物形式,并给出 具有优异的柔软度,高回收率,耐摩擦性,对透明基材的粘合性,耐热性等的液晶显示元件。解决方案:该辐射敏感性树脂组合物含有通过使异氰酸酯化合物与 (a1)不饱和羧酸和/或不饱和羧酸酐,(a2)分子中含有一个羟基的含羟基的不饱和化合物和(a3)不同于化合物(a1)和(a2)的不饱和化合物, 。 版权所有(C)2007,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To obtain a radiation sensitive resin composition which can acquire a sufficient spacer configuration even in low the exposure with high sensitivity and high resolution and also can form a spacer for a liquid crystal display element excellent in elastic recovery, rubbing resistance, adhesiveness with a transparent substrate, heat resistance, resistance to release liquid, etc. SOLUTION: The radiation sensitive resin composition comprises a polymer which is obtained by reacting a copolymer of (a1) an unsaturated carboxylic acid and/or an unsaturated carboxylic acid anhydride with (a2) a two or more hydroxyl groups-containing unsaturated compound expressed by formula (1) (wherein R 1 represents hydrogen atom or methyl group; p is an integer of 0-3 and q is an integer of 1-12) and (a3) another unsaturated compound with a methacryloyloxyalkyl isocyanate. COPYRIGHT: (C)2007,JPO&INPIT