公开(公告)号：JP2008143998A

公开(公告)日：2008-06-26

申请号：JP2006331486

申请日：2006-12-08

Applicant: Kao Corp ,  花王株式会社

Inventor： MATSUMOTO SHIGE ,  AIDA TAKASHI ,  FUJIOKA TOKU

IPC: C11D1/14 ,  C07C303/44 ,  C07C305/06

Abstract: PROBLEM TO BE SOLVED: To provide a method for producing a high-purity anionic surfactant by stripping off impurities from a crude anionic surfactant efficiently within a short time.
SOLUTION: The method for producing the anionic surfactant comprises the step of stripping off impurities from a crude anionic surfactant of a water content of 0.01-5 wt.% in a granulator or dryer having an agitation blade by introducing a carrier gas thereto.
COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 待解决的问题：提供一种通过在短时间内有效地从粗阴离子表面活性剂中除去杂质来制备高纯度阴离子表面活性剂的方法。 解决方案：制备阴离子表面活性剂的方法包括以下步骤：通过将载气引入到具有搅拌叶片的造粒机或干燥器中，从0.01-5重量％含水量的粗阴离子表面活性剂中除去杂质 。 版权所有（C）2008，JPO＆INPIT