公开(公告)号：US20210293618A1

公开(公告)日：2021-09-23

申请号：US17263147

申请日：2019-07-25

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Gilad Barak ,  Yonatan OREN

IPC: G01J3/02 ,  G01J3/06 ,  G01J3/44 ,  G01J3/28 ,  G01J3/10

Abstract: A polarized Raman Spectrometric system for defining parameters of a polycrystaline material, the system comprises a polarized Raman Spectrometric apparatus, a computer-controlled sample stage for positioning a sample at different locations, and a computer comprising a processor and an associated memory. The polarized Raman Spectrometric apparatus generates signal(s) from either small sized spots at multiple locations on a sample or from an elongated line-shaped points on the sample, and the processor analyzes the signal(s) to define the parameters of said polycrystalline material.

公开(公告)号：US11029258B2

公开(公告)日：2021-06-08

申请号：US16231718

申请日：2018-12-24

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Gilad Barak ,  Danny Grossman ,  Dror Shafir ,  Yoav Berlatzky ,  Yanir Hainick

IPC: G01N21/956 ,  G01B9/02 ,  G01B11/06 ,  G01N21/88

Abstract: A measurement system for use in measuring parameters of a patterned sample, the system including a broadband light source, an optical system configured as an interferometric system, a detection unit, and a control unit, where the interferometric system defines illumination and detection channels having a sample arm and a reference arm having a reference reflector, and is configured for inducing an optical path difference between the sample and reference arms, the detection unit for detecting a combined light beam formed by a light beam reflected from the reflector and a light beam propagating from a sample's support, and generating measured data indicative of spectral interference pattern formed by spectral interference signatures, and the control unit for receiving the measured data and applying a model-based processing to the spectral interference pattern for determining one or more parameters of the pattern in the sample.

公开(公告)号：US10732116B2

公开(公告)日：2020-08-04

申请号：US16062127

申请日：2016-12-15

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Gilad Barak ,  Yanir Hainick ,  Yonatan Oren

IPC: G01N21/65 ,  G01B11/06 ,  G01N21/95 ,  G03F7/20 ,  H01L21/66 ,  G01L1/24

Abstract: A method and system are presented for use in measuring characteristic(s) of patterned structures. The method utilizes processing of first and second measured data, wherein the first measured data is indicative of at least one Raman spectrum obtained from a patterned structure under measurements using at least one selected optical measurement scheme each with a predetermined configuration of illuminating and/or collected light conditions corresponding to the characteristic(s) to be measured, and the second measured data comprises at least one spectrum obtained from the patterned structure in Optical Critical Dimension (OCD) measurement session. The processing comprises applying model-based analysis to the at least one Raman spectrum and the at least one OCD spectrum, and determining the characteristic(s) of the patterned structure under measurements.

公开(公告)号：US20190317024A1

公开(公告)日：2019-10-17

申请号：US16398297

申请日：2019-04-30

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Boris Levant ,  Yanir Hainick ,  Vladimir Machavariani ,  Roy Koret ,  Gilad Barak

IPC: G01N21/956 ,  G03F7/20 ,  G01B11/02 ,  G01N21/95

Abstract: Determining parameters of a patterned structure located on top of an underneath layered structure, where input data is provided which includes first measured data PMD being a function ƒ of spectral intensity Iλ and phase ϕ, PMD=ƒ(Iλ; ϕ), corresponding to a complex spectral response of the underneath layered structure, and second measured data Smeas indicative of specular reflection spectral response of a sample formed by the patterned structure and the underneath layered structure, and where a general function F is also provided describing a relation between a theoretical optical response Stheor of the sample and a modeled optical response Smodel of the patterned structure and the complex spectral response PMD of the underneath layered structure, such that Stheor=F(Smodel; PMD), where the general function is then utilized for comparing the second measured data Smeas and the theoretical optical response Stheor, and determining parameter(s) of interest of the top structure.

公开(公告)号：US10359369B2

公开(公告)日：2019-07-23

申请号：US15502329

申请日：2015-08-06

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Gilad Barak ,  Oded Cohen

IPC: G01N21/956 ,  G01B11/14 ,  G01R31/309 ,  H01L23/544 ,  H01L21/66

Abstract: A test structure is presented for use in metrology measurements of a sample pattern. The test structure comprises a main pattern, and one or more auxiliary patterns. The main pattern is formed by a plurality of main features extending along a first longitudinal axis and being spaced from one another along a second lateral axis. The one or more auxiliary patterns are formed by a plurality of auxiliary features associated with at least some of the main features such that a dimension of the auxiliary feature is in a predetermined relation with a dimension of the respective main feature. This provides that a change in a dimension of the auxiliary feature from a nominal value affects a change in non-zero order diffraction response from the test structure in a predetermined optical measurement scheme, and this change is indicative of a deviation in one or more parameters of the main pattern from nominal value thereof.

公开(公告)号：US10209206B2

公开(公告)日：2019-02-19

申请号：US14903629

申请日：2014-07-08

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Gilad Barak ,  Shay Wolfling ,  Cornel Bozdog ,  Matthew Sendelbach

IPC: G01N23/00 ,  G01N23/20 ,  G01L1/24

Abstract: A control system is presented for use in measuring one or more parameters of a sample. The control system comprises an input utility and a processor utility. The input utility is configured for receiving input data including first data comprising X-ray Diffraction or High-Resolution X-ray Diffraction (XRD) response data of the sample indicative of a material distribution in the sample, and second data comprising optical response data of the sample to incident light indicative of at least a geometry of the sample. The processor utility is configured and operable for processing and analyzing one of the first and second data for optimizing the other one of the first and second data, and utilizing the optimized data for determining said one or more parameters of the sample including a strain distribution in the sample.

公开(公告)号：US20150168132A1

公开(公告)日：2015-06-18

申请号：US14378486

申请日：2013-02-12

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Gilad Barak ,  Boaz Brill

IPC: G01B11/22 ,  G01N21/95 ,  G01N21/21 ,  G01B11/30

CPC classification number: G01B11/22 ,  G01B11/02 ,  G01B11/24 ,  G01B11/30 ,  G01B2210/56 ,  G01N21/21 ,  G01N21/9501 ,  G01N21/95692 ,  G01N2021/8848 ,  G01N2201/061 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A measurement system and method are presented for use in measuring in patterned structures having annularly-shaped vias. The system comprises illumination and detection channels, a polarization orientation system, a navigation system, and a control unit. The polarization orientation system provides at least one of a first polarization orientation condition corresponding to a first measurement mode enabling determination a depth of the via, and a second polarization orientation condition corresponding to a second measurement mode enabling determination of one or more parameters of a profile of the via, the first and second polarization orientation conditions defining first and second predetermined orientations respectively for polarization of the incident light relative a sidewall of the via.

Abstract translation: 提出了一种用于在具有环形通孔的图案化结构中测量的测量系统和方法。 该系统包括照明和检测通道，偏振定向系统，导航系统和控制单元。 偏振取向系统提供与能够确定通孔的深度的第一测量模式相对应的第一偏振取向条件和对应于第二测量模式的第二极化取向条件中的至少一个，使得能够确定轮廓的一个或多个参数 所述第一和第二偏振取向条件分别限定入射光相对于所述通孔的侧壁的偏振的第一和第二预定取向。