公开(公告)号：US20150204796A1

公开(公告)日：2015-07-23

申请号：US14566002

申请日：2014-12-10

Applicant: NuFlare Technology, Inc.

Inventor： Hiroyuki NAGAHAMA ,  Riki OGAWA

IPC: G01N21/88

CPC classification number: G01N21/8806 ,  G01N21/93 ,  G01N21/956 ,  G01N2201/06113

Abstract: In a focal position adjusting method for an inspection apparatus, the inspection apparatus includes an illumination optical system and an imaging optical system configured to perform a defect inspection of a pattern formed in a sample using an image imaged on a first sensor. The focal position adjusting method includes illuminating the light from the first light source on the sample after transmitting the light through a first slit disposed in the illumination optical system. The light from the first light source is condensed into a second sensor disposed in the imaging optical system. A light intensity distribution of a pupil of the illumination optical system is observed. The focal position of the illumination optical system is adjusted by obtaining each light quantity of the front focus and the rear focus of the image of the first slit projected on the sample based on the light intensity distribution.

Abstract translation: 在用于检查装置的焦点位置调整方法中，检查装置包括照明光学系统和成像光学系统，其被配置为使用在第一传感器上成像的图像来对形成在样本中的图案进行缺陷检查。 焦点位置调整方法包括：在通过设置在照明光学系统中的第一狭缝透射光之后照射来自第一光源的光。 来自第一光源的光被冷凝成设置在成像光学系统中的第二传感器。 观察照明光学系统的光瞳的光强分布。 基于光强度分布，通过获得投射在样品上的第一狭缝的图像的前焦点和后焦点的每个光量来调整照明光学系统的焦点位置。

公开(公告)号：US20150022812A1

公开(公告)日：2015-01-22

申请号：US14332592

申请日：2014-07-16

Applicant: NuFlare Technology, Inc.

Inventor： Riki OGAWA

IPC: G01N21/956 ,  G01N21/21

CPC classification number: G01N21/956 ,  G01N21/21 ,  G01N2021/217 ,  G01N2021/4792 ,  G01N2021/8848 ,  G01N2021/95676

Abstract: An inspection apparatus comprising, a light source configured to illuminate a sample, a half-wavelength plate configured to transmit light transmitted through or reflected from the sample, a polarization beamsplitter, a first and second sensor configured to receive the light as a first and second optical image respectively transmitted through the beamsplitter, an image processor configured to obtain a gradation value of each pixel of the first sensor, a defect detector configured to detect a defect of the first optical image, using the gradation value, and a comparator configured to compare the second optical image to a reference image based on design data, and to determine that the second optical image is defective when at least one difference of position and shape between the optical image and the reference image exceeds a predetermined threshold, and an angle adjusting unit configured to adjust an angle of the half-wavelength plate.

Abstract translation: 一种检查装置，包括：被配置为照射样本的光源，被配置为透射透射通过或从所述样品反射的光的半波长板;偏振分束器;第一和第二传感器，被配置为接收所述光作为第一和第二 分别通过分束器发送的光学图像，被配置为获得第一传感器的每个像素的灰度值的图像处理器，使用灰度值检测第一光学图像的缺陷的缺陷检测器，以及被配置为比较 基于设计数据将第二光学图像提供给参考图像，并且当光学图像和参考图像之间的位置和形状的至少一个差异超过预定阈值时，确定第二光学图像有缺陷，并且角度调节单元 被配置为调节半波长板的角度。

公开(公告)号：US20200234919A1

公开(公告)日：2020-07-23

申请号：US16697248

申请日：2019-11-27

Applicant: NuFlare Technology, Inc.

Inventor： Shinji SUGIHARA ,  Riki OGAWA

IPC: H01J37/317 ,  H01J37/304 ,  H01J37/302

Abstract: A multiple electron beam irradiation apparatus includes a first region setting circuit which sets a first frame region of a plurality of first frame regions which can be irradiated with remaining beams after excluding beams in one row and one column at end; a second region setting circuit which sets a second frame region of a plurality of second frame regions each having four corners equivalent to an irradiation position of the defective beam by using normal beams; and an electron beam irradiation mechanism which performs the first multiple electron beam irradiation processing for the each of the plurality of first frame regions of the target object by using the normal beams, and perform second multiple electron beam irradiation processing for each of the plurality of second frame regions by using at least beams at the four corners.

公开(公告)号：US20190259572A1

公开(公告)日：2019-08-22

申请号：US16253510

申请日：2019-01-22

Applicant: NuFlare Technology, Inc.

Inventor： Chosaku NODA ,  Riki OGAWA

IPC: H01J37/28 ,  H01J37/063 ,  H01J37/147

Abstract: A charged particle beam inspection method conducted by disposing a sample on a stage and by performing a first scanning in a first beam scanning area on the sample by using one first charged particle beam out of a plurality of charged particle beams while the stage is moved so that a first inspection of a first inspection unit in the first beam scanning area is performed, and by performing a second scanning in a second beam scanning area on the sample by using one second charged particle beam out of the charged particle beams while the stage is moved so that a second inspection of a second inspection unit in the second beam scanning area is performed.

公开(公告)号：US20180335394A1

公开(公告)日：2018-11-22

申请号：US16034872

申请日：2018-07-13

Applicant: NuFlare Technology, Inc.

Inventor： Riki OGAWA

IPC: G01N21/95 ,  G01N21/88 ,  G01N21/21

CPC classification number: G01N21/9501 ,  G01N21/21 ,  G01N21/8806 ,  G01N2021/8848 ,  G01N2201/06113

Abstract: An image capturing device comprising, a light source configured to emit light having a predetermined wavelength, a polarization beamsplitter configured to receive the light from the light source, a Faraday rotator configured to rotate a polarization plane of the light via the polarization beamsplitter by changing the intensity of the magnetic field, an objective lens configured to illuminate an inspection target with the light transmitted through the Faraday rotator and a sensor configured to capture an optical image of the inspection target by causing the light reflected by the inspection target to be incident through the objective lens, the Faraday rotator, and the polarization beamsplitter.

公开(公告)号：US20180031498A1

公开(公告)日：2018-02-01

申请号：US15652994

申请日：2017-07-18

Applicant: NuFlare Technology, Inc.

Inventor： Masataka SHIRATSUCHI ,  Chosaku NODA ,  Riki OGAWA

IPC: G01N23/225 ,  H01J37/147 ,  H01J37/22 ,  H01J37/20

CPC classification number: G01N23/2251 ,  G01N2223/3301 ,  G01N2223/3307 ,  G01N2223/426 ,  G01N2223/6116 ,  H01J37/1474 ,  H01J37/20 ,  H01J37/22

Abstract: A charged particle beam inspection apparatus includes a first deflector to deflect N×N′ multiple beams collectively to N×N′ small regions having a size p/M in the first direction and arrayed at the pitch p in the first direction, perform tracking deflection, and re-deflect the multiple beams collectively to next N×N′ small regions away from the N×N′ small regions by N small regions in the first direction, by the stage completes a movement of a distance of N/M×p so as to reset the tracking deflection; and a second deflector to deflect the multiple beams collectively to scan the N×N′ small regions concerned while the tracking deflection is performed.

公开(公告)号：US20170069111A1

公开(公告)日：2017-03-09

申请号：US15255658

申请日：2016-09-02

Applicant: NuFlare Technology, Inc.

Inventor： Kazuhiko INOUE ,  Riki OGAWA

IPC: G06T7/60 ,  G06T7/00

CPC classification number: G06T7/001 ,  G06T2207/30148

Abstract: A pattern width deviation measurement method includes measuring width dimensions of a plurality of figure patterns in an optical image from data of gray-scale value profiles of the optical image, using a threshold of a gray-scale value level variably set depending on design dimension information including design width dimension of a corresponding figure pattern of a plurality of figure patterns, and at which influence of a focus position on width dimension becomes smaller, measuring width dimensions of a plurality of corresponding figure patterns in a reference image from data of gray-scale value profiles of the reference image, respectively using the threshold for the corresponding figure pattern of a plurality of figure patterns, and calculating, for each of measured width dimensions of a plurality of figure patterns in the optical image, an amount deviated from a measured width dimension of a corresponding figure pattern in the reference image.

Abstract translation: 图案宽度偏差测量方法包括使用根据设计尺寸信息可变地设置的灰度级值的阈值来测量光学图像中的多个图形的宽度尺寸，该尺寸可以根据光学图像的灰度值分布图的数据 包括多个图形对应图形图案的设计宽度尺寸，以及聚焦位置对宽度尺寸的影响变小，从参考图像中的灰度数据中测量多个对应图形图案的宽度尺寸 分别使用多个图形对应图形图案的阈值，并且针对光学图像中的多个图形图案的每个测量的宽度尺寸计算偏离测量宽度的量的参考图像的值分布 参考图像中相应图形图形的尺寸。

公开(公告)号：US20160209333A1

公开(公告)日：2016-07-21

申请号：US15000715

申请日：2016-01-19

Applicant: NuFlare Technology, Inc.

Inventor： Masatoshi HIRONO ,  Riki OGAWA ,  Takeshi FUJIWARA

IPC: G01N21/88 ,  G01N21/95

CPC classification number: G01N21/9501 ,  G01N21/956 ,  G01N2021/95676 ,  G01N2201/063 ,  G03F1/84

Abstract: According to one embodiment, a defect inspection device includes a first beam splitter configured to branch light into a first optical path and a second optical path, a first optical system on the first optical path, a second optical system on the second optical path, a first aperture configured to form an illumination field of an inspection sample by light from the first optical system, a second aperture configured to form an illumination field of the inspection sample by light from the second optical system, and a third optical system configured to illuminate, with a first illumination, an image of the first aperture on a first area of the inspection sample, and to illuminate, with a second illumination, an image of the second aperture on a second area of the inspection sample.

Abstract translation: 根据一个实施例，缺陷检查装置包括第一分束器，其被配置为将光分支到第一光路和第二光路中，第一光学系统上的第一光学系统，第二光学路径上的第二光学系统， 第一孔，被配置为通过来自第一光学系统的光形成检查样本的照明场;第二孔，被配置为通过来自第二光学系统的光形成检查样本的照明场;以及第三光学系统， 利用第一照明，在检查样品的第一区域上的第一孔的图像，并且用第二照明照亮检查样品的第二区域上的第二孔的图像。

公开(公告)号：US20150054941A1

公开(公告)日：2015-02-26

申请号：US14468605

申请日：2014-08-26

Applicant: NuFlare Technology, Inc.

Inventor： Riki OGAWA

IPC: G01N21/95 ,  G01N21/88

CPC classification number: G01N21/9501 ,  G01N21/21 ,  G01N21/8806 ,  G01N2021/8848 ,  G01N2201/06113

Abstract: An image capturing device comprising, a light source configured to emit light having a predetermined wavelength, a polarization beamsplitter configured to receive the light from the light source, a Faraday rotator configured to rotate a polarization plane of the light via the polarization beamsplitter by changing the intensity of the magnetic field, an objective lens configured to illuminate an inspection target with the light transmitted through the Faraday rotator and a sensor configured to capture an optical image of the inspection target by causing the light reflected by the inspection target to be incident through the objective lens, the Faraday rotator, and the polarization beamsplitter.

Abstract translation: 一种图像捕获装置，包括：被配置为发射具有预定波长的光的光源;被配置为接收来自光源的光的偏振分束器;被配置为通过偏振分束器旋转光的偏振面的法拉第旋转器， 磁场的强度，被配置为利用透射通过法拉第旋转器的光来照射检查对象物镜;以及传感器，被配置为通过使检查对象反射的光通过检测对象入射而被捕获检查对象的光学图像 物镜，法拉第转子和偏振分束器。

公开(公告)号：US20140300893A1

公开(公告)日：2014-10-09

申请号：US14228747

申请日：2014-03-28

Applicant: Kabushiki Kaisha Toshiba ,  NuFlare Technology, Inc.

Inventor： Riki OGAWA ,  Hiroyuki NAGAHAMA ,  Takeshi FUJIWARA

IPC: F21V14/06 ,  G01N21/88

CPC classification number: G01N21/8806 ,  G01N21/9501 ,  G01N21/95607 ,  G01N2021/95676 ,  G02B26/10 ,  G02B27/0961

Abstract: An illumination apparatus comprising, a light source that emits a laser beam, a lens array on which the laser beam is illuminated, a plurality of element lenses having a diameter greater than or equal to the laser beam are arranged in the lens array, the lens array being rotatable around an optical axis of the laser beam, wherein the two lens arrays are arrayed in an optical axis direction of the laser beam, andthe element lenses in each lens array are arranged such that a boundary between the element lenses adjacent to each other radiates from a rotation center of the lens array and a direction in which the element lens of one of the lens arrays traverses the optical axis of the laser beam is orthogonal to a direction in which the element lens of the other lens array traverses the optical axis of the laser beam.

Abstract translation: 一种照明装置，包括发射激光的光源，激光束被照射的透镜阵列，具有大于或等于激光束直径的多个元件透镜布置在透镜阵列中，透镜 阵列可以围绕激光束的光轴旋转，其中两个透镜阵列沿激光束的光轴方向排列，并且每个透镜阵列中的元件透镜被布置成使得与每个透镜阵列相邻的元件透镜之间的边界 其他从透镜阵列的旋转中心辐射的方向和透镜阵列之一的元件透镜穿过激光束的光轴的方向与另一透镜阵列的元件透镜横穿光学的方向正交 激光束的轴线。