FLÄCHENLICHTLEITER UND FLÄCHENSTRAHLER
    22.
    发明公开
    FLÄCHENLICHTLEITER UND FLÄCHENSTRAHLER 审中-公开
    AREA光纤和区域聚光灯

    公开(公告)号:EP2561387A1

    公开(公告)日:2013-02-27

    申请号:EP11710188.1

    申请日:2011-03-23

    Abstract: The invention relates to a surface light guide (1) which has a radiation exit area (10) extending along a main extension plane of the surface light guide (1) and is provided for laterally coupling radiation, wherein - the surface light guide (1) comprises scattering locations (4) for scattering the coupled radiation; - the surface light guide (1) comprises a first boundary surface (15) and a second boundary surface (16) which delimit the light conductance of the coupled-in radiation in the vertical direction; - and a first layer (11) and a second layer (12) are formed on each other in the vertical direction between the first boundary surface (31) and the second boundary surface (32). Further disclosed are a planar emitter (100) comprising at least one surface light guide (1).

    OPTOELEKTRONISCHES BAUELEMENT UND VERFAHREN ZU DESSEN HERSTELLUNG

    公开(公告)号:EP2289113A1

    公开(公告)日:2011-03-02

    申请号:EP09757123.6

    申请日:2009-06-03

    Abstract: An embodiment of the invention relates to a method for producing an optoelectronic component, comprising the following steps: A) providing an epitaxial growth substrate (1), B) growing at least one semiconductor layer (2) thereon by epitaxy in order to produce an active zone during operation, C) applying a metal mirror layer (3) onto the semiconductor layer (2), D) applying at least one contact layer (8) for the electronic contacting of the component, E) separating the epitaxial growth substrate (1) from the semiconductor layer (2), wherein a surface of the semiconductor layer (2) is exposed, F) structuring the semiconductor layer (2) by means of an etching method from the side of the surface that was exposed in step E).

    Abstract translation: 本发明的一个实施例涉及一种用于制造光电子器件的方法,包括以下步骤:A)提供外延生长衬底(1),B)通过外延在其上生长至少一个半导体层(2),以便产生 C)在半导体层(2)上施加金属镜层(3),D)施加至少一个接触层(8)以用于电子接触部件,E)将外延生长衬底 1)从半导体层(2)露出,其中暴露出半导体层(2)的表面,F)通过蚀刻方法从步骤E中暴露的表面侧构造半导体层(2) )。

    VERFAHREN ZUM HERSTELLEN EINES STRAHLUNGSEMITTIERENDEN HALBLEITERCHIPS
    25.
    发明公开
    VERFAHREN ZUM HERSTELLEN EINES STRAHLUNGSEMITTIERENDEN HALBLEITERCHIPS 审中-公开
    方法用于产生辐射半导体芯片

    公开(公告)号:EP1741144A1

    公开(公告)日:2007-01-10

    申请号:EP04730193.2

    申请日:2004-04-29

    CPC classification number: H01L33/22 H01L33/0079

    Abstract: A method for micropatterning a radiation-emitting surface of a semiconductor layer sequence for a thin-film light-emitting diode chip. The semiconductor layer sequence is grown on a substrate. A mirror layer is formed or applied on the semiconductor layer sequence, which reflects back into the semiconductor layer sequence at least part of a radiation that is generated in the semiconductor layer sequence during the operation thereof and is directed toward the mirror layer. The semiconductor layer sequence is separated from the substrate by means of a lift-off method, in which a separation zone in the semiconductor layer sequence is at least partly decomposed in such a way that anisotropic residues of a constituent of the separation zone, in particular a metallic constituent of the separation layer, remain at the separation surface of the semiconductor layer sequence, from which the substrate is separated. The separation surface—provided with the residues—of the semiconductor layer sequence with a dry etching method, a gaseous etchant or a wet-chemical etchant, wherein the anisotropic residues are at least temporarily used as an etching mask. A semiconductor chip is produced according to such a method.

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