Abstract:
PROBLEM TO BE SOLVED: To lower the drive voltage of a plasma information display element and produce a protection film excellent in the anti-sputtering performance. SOLUTION: As the protection film 5 to be installed in a plasma discharge part, an amorphous MgO film is used in a PDP or PALC. At the time of forming the MgO film, a base board is installed at a certain angle to a deposition source, and thereby it is possible to form the amorphous MgO film using a film forming device intended to general purposes.
Abstract:
PROBLEM TO BE SOLVED: To reduce liquid crystal offset in an AC discharging type plasma address display device, to improve display quality and to prolong a service life. SOLUTION: The driving method is for a plasma address display in which display cells having column shaped signal electrodes and plasma cells having row shaped discharging channels that have exposed electrodes and electrodes covered by dielectric material are overlapped. During the driving, negative discharging pulses are applied to the exposed electrodes, then, to the covered electrodes, and AC plasma discharge occurs in the discharging channels. The row shaped discharging channels on which AC plasma discharging is conducted and switched in a line order and scanned, and image signals are applied to the column shaped signal electrodes of a display cell side to conduct display driving.
Abstract:
PROBLEM TO BE SOLVED: To realize the lowering of a driving voltage by improving the driving system of plasma cells in which an AC type and a DC type are blended. SOLUTION: This plasma address display device has a flat panel 10 in which display cells which are provided with columnar signal electrodes Ys and plasma cells which are provided with row-like discharge channels Xs are laminated and pixels 11 are provided at intersections of respective signal electrodes Ys and respective discharge channels Xs, a scanning circuit 22 which selects pixels for every row by successively discharging the row discharge channels Xs, a signal circuit 21 which writes a picture signal in pixels 11 of a selected row by successively supplying the picture signal to the columnar signal electrodes Ys in comformity with the discharge of the discharge channel X. Each discharge channel X has a coated electrode C whose conductor surface is coated with a dielectric substance and an exposed electrode B whose conductor surface is not coated with a dielectric substance. After the scanning circuit 22 generates a preliminary discharge in the discharge channel X by holding the exposed electrode B to the ground potential and, on the other hand, by impressing a pulse on the coated electrode C, the circuit generates a principal discharge in the channel by holding the coated electrode C to the ground potential and, on the other hand, by impressing the pulse on the exposed electrode B and thus, the circuit makes it possible to perform the lowering of the driving voltage. Moreover, the impression order of the pulse may be exchanged in both electrodes B, C.
Abstract:
PROBLEM TO BE SOLVED: To provide a forming method of a metal thin film, capable of achieving refinement and high yield more than the past, without raising a resistance value of the thin film more than the necessity.SOLUTION: Electroless plating processing is applied to a substrate 40 to which ink 2A containing a catalyst material is transcribed. A metal thin film 42 is selectively formed to a transfer area of the ink 2A on the substrate 40. Moreover, ink 2 is transcribed by using a plate blanket 1, and the contact is done by pressure compression in a transfer process. Alignment becomes easy, and the pressure at the contact is made uniform as a whole, and the yield when the metal thin film 42 is formed improves. Moreover, not the material of the metal thin film 42 but the catalyst material of the electroless plating processing is included. A resistance value of the metal thin film 42 lowers compared with the past, and the refinement of the pattern becomes easy.
Abstract:
PROBLEM TO BE SOLVED: To provide a manufacturing method of a film, capable of forming a film having a fine through-hole, and a manufacturing method of a display device, using the method.SOLUTION: The manufacturing method of a film forms a film having a through-hole on a base material by using an intaglio plate which has a recessed part for filling paste, has a projection part inside the recessed part and has a liquid-repellent region on an upper surface of the projection part and transferring the paste filled in the recessed part to the base material. The manufacturing method of a display device includes a step of forming a TFT, an insulating film and an organic EL element in order on a substrate, and forms a film having a through-hole on a base material by using an intaglio plate which has a recessed part for filling paste, has a projection part inside the recessed part and has a liquid-repellent region on an upper surface of the projection part and transferring the paste filled in the recessed part to the base material in a step of forming the insulating film.
Abstract:
PROBLEM TO BE SOLVED: To provide a printing method by which a pattern can accurately be formed by a simple process. SOLUTION: An elimination plate 10 having a coarse surface 10A and a mirror surface 10B on the surface is brought into pressurization-contact with an ink 2 on a flat blanket 1. A section corresponding to the mirror surface 10B of the ink 2 is transferred to the elimination plate 10 and removed from the top of the flat blanket 1 by a difference in surface property, i.e., adhesion to the ink 2 between the coarse surface 10A and the mirror surface 10B of the elimination plate 10. On the flat blanket 1, a section corresponding to the coarse surface 10A remains, and the remaining section becomes a printing pattern layer 2B. By bringing a printed to be printed board 4 into pressurization-contact with the printing pattern layer 2B, the printing pattern layer 2B is transferred to the board to be printed 4. COPYRIGHT: (C)2010,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a method of manufacturing an electronic device, which can secure high performance of the electronic device, can reduce cost and can improve productivity. SOLUTION: A sacrificial layer 12 of MgO etc., is formed on a first substrate 11 and patterned, and a support layer 13 of SiO 2 etc., is formed. On the sacrificial layer 12, the electronic device 14 such as a TFT and a capacitor is formed with a support layer 13 interposed, and covered with a protective layer 15 of SiN x etc. The protective layer 15 and support layer 13 are partially removed to expose part of the sacrificial layer 12, which in turn is etched away. The electronic device 14 on the first substrate 11 is brought into contact with an adhesive layer 22 on a surface of a second substrate 21 and the first substrate 11 is separated to transfer the electronic device 14 to the second substrate 21. The electronic device 14 can be selectively transferred by a method of removing only the sacrificial layer 12 of the electronic device 14 to be transferred. COPYRIGHT: (C)2009,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a method for manufacturing a metal thin film capable of easily forming an inclined plane in a simple process, and to provide the metal thin film and a method of manufacturing a thin-film transistor. SOLUTION: A first base layer 13A containing a catalyst material is formed on a substrate 11, and then an electroless plating treatment is performed on it to form a first plating layer 14A so as to coat the first base layer 13A. Then, a second base layer 13B containing a catalyst material is formed in a neighborhood region of the first plating layer 14A on the substrate 11, and further a second electroless plating treatment is performed with the second base layer 13B and the first plating layer 14A as catalysts. A second plating layer 14B is so film-formed as to coat the first plating layer 14A, accumulated on the first base layer 13A, and the second base layer 13B. By the difference of film thickness caused between a region facing the first base layer 13A and a region facing the second base layer 13B, a taper 14A-1 is formed at the end portion of the metal thin film 10. COPYRIGHT: (C)2009,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a plasma information display element with a protection film which has superior spattering-resistant, and with low discharge voltages. SOLUTION: This plasma information display element comprises a first substrate 110 and a second substrate 120 which are disposed in facing with each other, and a plurality of barrier ribs 140 formed between the first substrate 110 and the second substrate 120. Here, the first substrate 110, the second substrate 120 and plural barrier ribs 140 specify plural discharge channels 150. And also the plasma information display element has a protection layer 118 formed so as to cover an anode 114A and a cathode 114C, and the protection layer 118 is a layer including (220)-aligned MgO and (200)-aligned MgO.
Abstract:
PROBLEM TO BE SOLVED: To lessen the flicker and image persistence to be induced by the charges by the impurity ions accumulating at the boundary of a liquid crystal layer by forming spacers which are disposed in a liquid crystal layer and maintain the thickness of the liquid crystal layer so as to have electrical conductivity. SOLUTION: The liquid crystal display device is provided with a liquid crystal display element having the liquid crystal layer 1, transparent first electrode groups (column electrodes) 2 which are arranged on the first surface side, i.e., front surface side of the liquid crystal layer 1 and second electrode groups for scanning which are arranged to face the second surface side, i.e., rear surface side of the liquid crystal layer 1 and form a plurality of plasma discharge channels formed in a direction orthogonal the first electrode groups 2. The liquid crystal display element is provided with the spacers 13 for maintaining the thickness of the liquid crystal layer 1 within the liquid crystal layer 1. The spacers have the electrical conductivity. An alignment layer 14 and a dielectric sheet 15 are disposed on the rear surface side of the liquid crystal layer 1. A conductive thin film 16 having the adequate electrical conductivity is disposed between the alignment layer 14 and the dielectric sheet 15. COPYRIGHT: (C)2000,JPO