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公开(公告)号：JP2014203835A
公开(公告)日：2014-10-27
申请号：JP2013075878
申请日：2013-04-01
Applicant: 株式会社トクヤマ , Tokuyama Corp
Inventor： YATABE OSAMU , INOUE YASUSHI , MURATA AKIKO
IPC: H01L21/308 , H01L31/04
CPC classification number: Y02E10/50
Abstract: 【課題】液組成を厳密に管理する必要がなく、むらが低減された表面凹凸形態を有し且つ光反射率が低減されたシリコン基板テクスチャー形成用組成物を提供する。【解決手段】水、塩基を含み、更に下記式(1)で表されるアミノアルコール化合物を2種類以上含むことを特徴とする、テクスチャー形成用組成物とする。(式中、R1、およびR2は、それぞれ独立に水素原子、炭素数1〜12のアルキル基、または炭素数6〜18のアリール基であり、R3は炭素数2〜6のアルキレン基である。mは1〜4の整数、また、aは0または1、bは0または1、cは1〜3の整数でa+b+c=3であり、cが2以上の場合、−(R3O)m−Hで表される基はそれぞれ独立な基でも良い。)【選択図】図1
Abstract translation: 要解决的问题：提供一种用于形成不需要严格管理液体组合物的硅衬底织构的组合物，并且具有减小的不均匀性减小的表面凹凸形状的光学反射率。解决方案：用于形成纹理的组合物包含 水和碱，并且还含有一种以下式（1）表示的氨基醇化合物。 （式中，R 1和R 3分别独立地为氢原子，1〜12个碳原子的烷基或6-18-C的芳基，R 2为2〜6C的亚烷基，m为1的整数 -4，a为0或1，b为0或1，c为1-3的整数，a + b + c = 3，如果c为2以上，则由 - （RO）mH表示的基团可以 成为彼此独立的团体）。
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公开(公告)号：JP2013168619A
公开(公告)日：2013-08-29
申请号：JP2012032632
申请日：2012-02-17
Applicant: Tokuyama Corp , 株式会社トクヤマ
Inventor： KISHI MAYUMI , INOUE YASUSHI , YATABE OSAMU , SATO MAKOTO , TONO SEIJI
IPC: H01L31/04 , H01L21/306
CPC classification number: Y02E10/50
Abstract: PROBLEM TO BE SOLVED: To provide a composition for texture formation for forming an uneven structure whose size is finely and uniformly controlled with a small amount of etching and obtaining a silicon substrate with low reflectance, and to provide a formation method of the texture.SOLUTION: The composition for a texture formation, for forming an uneven part on a silicon substrate surface by contacting the surface, comprising water, base, alkyl sulfonic acid anion, and aliphatic carboxylic acid anion, and the method of forming an uneven part on the substrate surface by contacting the composition for the texture formation and the silicon substrate surface are provided.
Abstract translation: 要解决的问题：提供一种组合物，用于形成用于形成不均匀结构的组合物，其尺寸通过少量蚀刻精细均匀地控制并获得低反射率的硅衬底，并提供了纹理的形成方法。 ：用于通过使包含水，碱，烷基磺酸阴离子和脂肪族羧酸阴离子的表面接触而在硅衬底表面上形成凹凸部分的组织，以及在衬底上形成不均匀部分的方法 提供了通过使组合物接触用于纹理形成和硅衬底表面的表面。
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23.发明专利Composition for texture formation, manufacturing method of silicon substrate, and preparation kit of composition for texture formation 审中-公开用于纹理形成的组合物，硅基材的制造方法和用于纹理形成的组合物的制备工具
公开(公告)号：JP2013168610A
公开(公告)日：2013-08-29
申请号：JP2012032500
申请日：2012-02-17
Applicant: Tokuyama Corp , 株式会社トクヤマ
Inventor： MURATA AKIKO , SATO MAKOTO , HITOMI TATSUYA , YATABE OSAMU , TONO SEIJI
IPC: H01L21/308 , H01L31/04
CPC classification number: Y02E10/50
Abstract: PROBLEM TO BE SOLVED: To provide a composition for texture formation which allows for production of a silicon substrate having a surface form (uneven structure) where unevenness is reduced while reducing the etching amount, and a low optical reflectance.SOLUTION: The composition for texture formation contains 0.3-15 pts.mass of base, 0.001-10 pts.mass of alkyl sulfonic acid anion represented by formula (1), and 0.000001-5 pts.mass of alcohol of 6-14C for 100 pts.mass of water. (In the formula (1), R is an alkyl radical of 6-12C).
Abstract translation: 要解决的问题：提供一种用于纹理形成的组合物，其允许制造具有不均匀性降低的表面形式（不均匀结构）的硅衬底，同时减少蚀刻量和低光学反射率。溶液：用于质地的组合物 形成含有0.3-15质量份碱，0.001-10质量份由式（1）表示的烷基磺酸阴离子，和0.000001-5重量份的6-14℃的醇，100质量份水。 （式（1）中，R为6-12C的烷基）。
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公开(公告)号：JP2013159580A
公开(公告)日：2013-08-19
申请号：JP2012023296
申请日：2012-02-06
Applicant: Tokuyama Corp , 株式会社トクヤマ
Inventor： INOUE YASUSHI , YATABE OSAMU , HITOMI TATSUYA , TONO SEIJI
IPC: C07C303/44 , C07C309/04 , H01L21/306
Abstract: PROBLEM TO BE SOLVED: To provide a method for producing an alkylsulfonic acid salt having very high purity, and especially suitably usable as an additive for a texture-forming agent for a silicon substrate by efficiently reducing organic impurities, especially an aldehyde derivative.SOLUTION: There is provided a method for producing an alkylsulfonic acid salt including obtaining slurry in which the alkylsulfonic acid salt is dispersed by mixing a crude 3-12C alkylsulfonic acid salt having an average particle diameter of ≤100 μm with an ether solvent, and separating the alkylsulfonic acid salt from the slurry.
Abstract translation: 要解决的问题：提供一种生产具有非常高纯度的烷基磺酸盐的方法，特别适合用作有机还原有机杂质，特别是醛衍生物的用于硅基质的织构形成剂的添加剂。 提供了一种制备烷基磺酸盐的方法，包括通过将平均粒径≤100μm的粗制3-12C烷基磺酸盐与醚溶剂混合而获得烷基磺酸盐分散的浆料，并分离烷基磺酸盐 来自浆料的酸性盐。
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Patent Agency Ranking
公开(公告)号：JP2012038830A
公开(公告)日：2012-02-23
申请号：JP2010175876
申请日：2010-08-05
Applicant: Tokuyama Corp , 株式会社トクヤマ
Inventor： YATABE OSAMU , MURATA AKIKO
IPC: H01L21/312 , H01L31/04
CPC classification number: Y02E10/50
Abstract: PROBLEM TO BE SOLVED: To provide a texture formation composition for forming a silicon substrate low in reflectance, the silicon substrate having fine recesses and protrusions which are free from variations and formed on a surface of the silicon substrate, and a method for forming the texture.SOLUTION: There are provided: a texture formation composition that is brought into contact with a silicon substrate surface to form recesses and protrusions on the silicon substrate surface; and a method in which the texture formation composition is brought into contact with the silicon substrate surface to form the recesses and protrusions on the silicon substrate surface. The texture formation composition includes water, a base and an amino alcohol.
Abstract translation: 解决问题的方案为了提供一种用于形成反射率低的硅基板的纹理形成组合物，具有微细凹凸的硅基板，其形成在硅基板的表面上，并且形成在其上。 形成纹理。 解决方案：提供：与硅衬底表面接触以在硅衬底表面上形成凹陷和突起的纹理形成组合物; 以及其中使纹理形成组合物与硅衬底表面接触以在硅衬底表面上形成凹陷和突起的方法。 纹理形成组合物包括水，碱和氨基醇。 版权所有（C）2012，JPO＆INPIT
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公开(公告)号：JP2008311316A
公开(公告)日：2008-12-25
申请号：JP2007155706
申请日：2007-06-12
Applicant: Tokuyama Corp , 株式会社トクヤマ
Inventor： IMAI TETSUO , YATABE OSAMU , MAEDA MASAKATSU
IPC: H01L23/14
CPC classification number: H01L23/498 , B22F7/04 , B22F2998/00 , C22C5/02 , C22C5/04 , C22C19/03 , C22C27/04 , C22C32/0047 , C23C18/32 , C23C18/54 , C25D5/48 , C25D5/50 , H01L21/4853 , H01L23/15 , H01L23/49811 , H01L24/45 , H01L24/48 , H01L24/85 , H01L2224/45015 , H01L2224/45124 , H01L2224/45144 , H01L2224/48227 , H01L2224/48599 , H01L2224/48644 , H01L2224/48699 , H01L2224/48744 , H01L2224/85444 , H01L2924/01005 , H01L2924/01006 , H01L2924/01007 , H01L2924/01011 , H01L2924/01013 , H01L2924/01014 , H01L2924/01015 , H01L2924/01027 , H01L2924/01028 , H01L2924/01033 , H01L2924/01042 , H01L2924/01046 , H01L2924/01074 , H01L2924/01078 , H01L2924/01079 , H01L2924/09701 , H01L2924/15787 , H01L2924/20752 , Y10T428/12889 , H01L2924/00014 , B22F9/04 , H01L2924/00
Abstract: PROBLEM TO BE SOLVED: To provide a metalized substrate having a new structure, and capable of improving connection strength of wire bonding even after heating in mounting a semiconductor chip. SOLUTION: This metalized substrate has, on a high-melting-point metal layer formed on a ceramic substrate, a base nickel plated layer, a layered nickel-phosphorus plated metal layer, a diffusion prevention plated layer and a gold plated layer in this order; any of a nickel plated layer, a nickel-boron plated layer and a nickel-cobalt plated layer is used for the base nickel plated layer; and any of a columnar nickel-boron plated layer, a palladium-phosphorus plated layer and a palladium plated layer is used for the diffusion prevention plated layer. COPYRIGHT: (C)2009,JPO&INPIT
Abstract translation: 要解决的问题：提供具有新结构的金属化基板，并且即使在安装半导体芯片的加热之后也能够提高引线接合的连接强度。 解决方案：该金属化基板在形成在陶瓷基板上的高熔点金属层上具有基底镀镍层，层状镍 - 磷电镀金属层，扩散防止镀层和镀金层 按此顺序 镀镍层中使用镍镀层，镍 - 硼镀层和镍钴镀层中的任一种， 并且使用任何柱状镍 - 硼电镀层，钯 - 磷镀层和镀钯层作为防扩散镀层。 版权所有（C）2009，JPO＆INPIT
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公开(公告)号：JP2005112918A
公开(公告)日：2005-04-28
申请号：JP2003345947
申请日：2003-10-03
Applicant: Nippon Zeon Co Ltd , Tokuyama Corp , 日本ゼオン株式会社 , 株式会社トクヤマ
Inventor： TOTO TAKESHI , CHINO YOSHIHIRO , WATANABE KAZUTAKA , YATABE OSAMU
Abstract: PROBLEM TO BE SOLVED: To provide a rubber composition which has good silica dispersibility, can impart excellent tensile strength and abrasion resistance, has improved scorch stability, and has excellent vulcanization productivity, and to provide a vulcanized rubber.
SOLUTION: This rubber composition comprises (a) a coaggregation product comprising a conjugated dienic rubber, silica and a cationic substance, (b) sulfur, and (c) at least one compound selected from the group consisting of N-t-butyl-2-benzothiazylamide, N-oxydiethylene-2-benzothiazylsulfenamide, N,N-dicyclohexyl-2-benzothiazylsulfenamide, and N,N-diisopropyl-2-benzothiazylsulfenamide as a specific vulcanization accelerator. The vulcanized rubber is prepared by vulcanizing the rubber composition.
COPYRIGHT: (C)2005,JPO&NCIPIAbstract translation: 要解决的问题为了提供一种具有良好的二氧化硅分散性的橡胶组合物，可赋予优异的拉伸强度和耐磨性，具有改善的焦烧稳定性，并且具有优异的硫化生产率，并提供硫化橡胶。 解决方案：该橡胶组合物包含（a）共轭二烯橡胶，二氧化硅和阳离子物质的共聚产物，（b）硫，和（c）至少一种选自N-叔丁基 - 2-苯并噻唑基酰胺，N-氧代二亚乙基-2-苯并噻唑基亚磺酰胺，N，N-二环己基-2-苯并噻唑基亚磺酰胺和N，N-二异丙基-2-苯并噻唑基亚磺酰胺作为特定的硫化促进剂。 通过硫化橡胶组合物制备硫化橡胶。 版权所有（C）2005，JPO＆NCIPI
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公开(公告)号：JP2005097576A
公开(公告)日：2005-04-14
申请号：JP2004242482
申请日：2004-08-23
Applicant: Nippon Zeon Co Ltd , Tokuyama Corp , 日本ゼオン株式会社 , 株式会社トクヤマ
Inventor： FUKAHORI TAKAHIKO , CHINO YOSHIHIRO , HIKITA KAZUHIRO , TOTO TAKESHI , WATANABE KAZUTAKA , YATABE OSAMU , TOKUNAGA SHINJI
CPC classification number: B29C47/761 , Y02P70/263
Abstract: PROBLEM TO BE SOLVED: To provide a process for producing a silica-containing rubber composition that is significantly reinforced by silica industrially-advantageously and with low energy. SOLUTION: The process for producing a silica-containing rubber composition comprises, upon supply of slurry or a hydrated substance of a crumb of a silica-containing rubber composition that is obtained by coagulation of a mixture of rubber latex and silica to an extruder for dehydration of the crumb within the extruder, transiently blocking a part or the whole of a crumb outlet of the extruder. COPYRIGHT: (C)2005,JPO&NCIPI
Abstract translation: 要解决的问题：提供一种二氧化硅橡胶组合物的制造方法，该组合物通过工业上有利地和以低能量的二氧化硅显着增强。 解决方案：制备含二氧化硅的橡胶组合物的方法包括在通过将橡胶胶乳和二氧化硅的混合物凝结获得的含二氧化硅橡胶组合物的浆料或水合物质的水合物质 挤出机，用于在挤出机内使碎屑脱水，瞬时堵塞挤出机的碎屑出口的一部分或全部。 版权所有（C）2005，JPO＆NCIPI
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公开(公告)号：JP2004155859A
公开(公告)日：2004-06-03
申请号：JP2002321362
申请日：2002-11-05
Applicant: Tokuyama Corp , 株式会社トクヤマ
Inventor： WATANABE KAZUTAKA , YATABE OSAMU
Abstract: PROBLEM TO BE SOLVED: To provide a filler for a rubber which is less expensive than before, excels in the dispersibility in the rubber in the silica filled rubber, and can impart good abrasion resistance, tensile strength, and modulus to a rubber composition to be obtained.
SOLUTION: The filler for the rubber is composed of a silica powder in which the surface silanol groups of the silica particles are surface treated with a cationic polymer, and the above filler for the rubber can be obtained by mixing the cationic polymer in an aqueous suspension of silica and filtering the cationic polymer-attached silica, and drying the obtained silica. Further, the above filler for the rubber can effectively impart high reinforcing properties and high abrasion resistance to the rubber composition to be obtained by using the same.
COPYRIGHT: (C)2004,JPO
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