21.
    发明专利
    未知

    公开(公告)号:BR9406347A

    公开(公告)日:1996-02-13

    申请号:BR9406347

    申请日:1994-03-04

    Abstract: The invention relates to a cleaning apparatus for a radiation source assembly in a fluid treatment system. The invention is characterized in that the cleaning apparatus comprises: a cleaning sleeve engaging a portion of the exterior of a radiation source in the radiation source assembly and movable between: (i) a retracted position wherein a portion of the radiation source is exposed to a flow of fluid to be treated, and (ii) an extended position wherein the portion of the radiation source is completely or partially covered by the cleaning sleeve, the cleaning sleeve further comprising a chamber in contact with the portion of the radiation source, the chamber adapted for receiving a cleaning fluid suitable to remove undesired materials from the portion of the radiation source upon movement of the cleaning sleeve.

    Fluid Treatment System and Process
    22.
    发明专利

    公开(公告)号:CA2117040A1

    公开(公告)日:1994-09-06

    申请号:CA2117040

    申请日:1994-03-04

    Abstract: The invention relates to a cleaning apparatus for a radiation source assembly in a fluid treatment system. The invention is characterized in that the cleaning apparatus comprises: a cleaning sleeve engaging a portion of the exterior of a radiation source in the radiation source assembly and movable between: (i) a retracted position wherein a portion of the radiation source is exposed to a flow of fluid to be treated, and (ii) an extended position wherein the portion of the radiation source is completely or partially covered by the cleaning sleeve, the cleaning sleeve further comprising a chamber in contact with the portion of the radiation source, the chamber adapted for receiving a cleaning fluid suitable to remove undesired materials from the portion of the radiation source upon movement of the cleaning sleeve.

    23.
    发明专利
    未知

    公开(公告)号:NO310139B1

    公开(公告)日:2001-05-28

    申请号:NO953451

    申请日:1995-09-01

    Abstract: The invention relates to a cleaning apparatus for a radiation source assembly in a fluid treatment system. The invention is characterized in that the cleaning apparatus comprises: a cleaning sleeve engaging a portion of the exterior of a radiation source in the radiation source assembly and movable between: (i) a retracted position wherein a portion of the radiation source is exposed to a flow of fluid to be treated, and (ii) an extended position wherein the portion of the radiation source is completely or partially covered by the cleaning sleeve, the cleaning sleeve further comprising a chamber in contact with the portion of the radiation source, the chamber adapted for receiving a cleaning fluid suitable to remove undesired materials from the portion of the radiation source upon movement of the cleaning sleeve.

    UV FLUID TREATMENT DEVICE AND METHOD

    公开(公告)号:HU219100B

    公开(公告)日:2001-02-28

    申请号:HU9702313

    申请日:1995-10-17

    Abstract: A fluid treatment device comprising a housing for receiving a flow of fluid, the housing comprising a fluid inlet, a fluid outlet, a fluid treatment zone disposed between the fluid inlet and the fluid outlet, and at least one radiation source module disposed in the fluid treatment zone, the at least one radiation source module comprising a radiation source sealably connected to a leg, the leg sealably mounted to the housing, the radiation source being disposed substantially parallel to the flow of fluid. A method of treating a fluid in a housing comprising a fluid inlet, a fluid outlet, a fluid treatment zone disposed between the fluid inlet and the fluid outlet, the fluid treatment zone having at least one radiation source disposed therein is also described. The method comprises the steps of: (i) providing a flow of the fluid to the fluid inlet; (ii) feeding the flow of fluid from the fluid inlet to the fluid treatment zone in a manner substantially parallel to the at least one radiation source; (iii) irradiating the flow of fluid in the fluid treatment zone; and (iv) feeding the flow of fluid to the fluid outlet. During the method, the flow of fluid through the fluid inlet, the fluid outlet and the fluid treatment zone is substantially collinear. The fluid treatment device and method are ideally suited (but not limited) to inactivate microorganisms present in water.

    25.
    发明专利
    未知

    公开(公告)号:AT188679T

    公开(公告)日:2000-01-15

    申请号:AT95934013

    申请日:1995-10-17

    Abstract: A method of cleaning fouling materials from a radiation module, the method comprising the steps of: (i) immersing at least a portion of the radiation module in a fluid; and (ii) subjecting the radiation module to vibration at a frequency sufficient to substantially inhibit fouling materials adhering to the at least one radiation source. A radiation module for use in a fluid treatment system comprising: a support member for mounting the module in the fluid treatment system; at least one radiation assembly extending from the support member; and a vibration generator associated with the at least one radiation assembly. The radiation module is self-cleaning and can take the form of a radiation source module or a radiation sensor module. Incorporation of the radiation source module in a fluid treatment system is also described.

    PROCESS AND SYSTEM FOR FLUID TREATMENT, RADIATION UNIT AND RADIATION SENSOR FOR EXECUTING THE SYSTEM, AND CLEANING UNIT AND PROCESS FOR CLEANING OF THE RADIATION UNIT

    公开(公告)号:HU215737B

    公开(公告)日:1999-02-01

    申请号:HU9502580

    申请日:1994-03-04

    Abstract: The invention relates to a cleaning apparatus for a radiation source assembly in a fluid treatment system. The invention is characterized in that the cleaning apparatus comprises: a cleaning sleeve engaging a portion of the exterior of a radiation source in the radiation source assembly and movable between: (i) a retracted position wherein a portion of the radiation source is exposed to a flow of fluid to be treated, and (ii) an extended position wherein the portion of the radiation source is completely or partially covered by the cleaning sleeve, the cleaning sleeve further comprising a chamber in contact with the portion of the radiation source, the chamber adapted for receiving a cleaning fluid suitable to remove undesired materials from the portion of the radiation source upon movement of the cleaning sleeve.

    DISPOSITIVO Y METODO PARA TRATAMIENTO DE FLUIDOS DE UV.

    公开(公告)号:MX9702775A

    公开(公告)日:1998-04-30

    申请号:MX9702775

    申请日:1995-10-17

    Abstract: Un dispositivo de tratamiento de fluido comprendiendo un alojamiento para recibir un flujo de fluido, el alojamiento comprendiendo una entrada de fluido, una salida de fluido, una zona de tratamiento de fluido dispuesta entre la entrada de fluido y la salida de fluido. y por lo menos un modulo de fuente de radiacion dispuesto en la zona de tratamiento de fluido, por lo menos un modulo de fuente de radiacion comprendiendo una fuente de radiacion conectada herméticamente a una extremidad, la extremidad montada herméticamente al alojamiento, la fuente de radiacion estando dispuesta substancialmente paralela al flujo de fluidos. Un método para tratar un fluido en un alojamiento que comprende una entrada de fluido, una salida de fluido, una zona de tratamiento de fluido dispuesta entra la entrada de fluido y la salida de fluido, también se describe la zona de tratamiento de fluidos teniendo por lo menos una fuente de radiacion dispuesta en la misma. El método comprende los pasos de: (i) proveer un flujo de fluido a la entrada de fluidos; (ii) alimentar el flujo de fluido desde la entrada de fluido a la zona de tratamiento de fluido en una manera substancialmente paralela a por lo menos una fuente de radiacion; (iii) irradiar el flujo de fluido en la zona de tratamiento de fluidos; y (iv) alimentar el flujo de fluido a la salida de fluidos; en donde el flujo de fluidos a través de la entrada de fluidos, la salida de fluidos y la zona de tratamiento de fluidos es substancialmente colinear. El dispositivo y método para tratamiento de fluidos son idealmente adecuados (pero no limitados) para inactivar microorganismos presentes en el agua.

    PROCESS AND APPARATUS FOR TREATING LIQUIDS BY UV RADIATION

    公开(公告)号:CZ116397A3

    公开(公告)日:1997-10-15

    申请号:CZ116397

    申请日:1995-10-16

    Abstract: A fluid treatment device comprising a housing for receiving a flow of fluid, the housing comprising a fluid inlet, a fluid outlet, a fluid treatment zone disposed between the fluid inlet and the fluid outlet, and at least one radiation source module disposed in the fluid treatment zone, the at least one radiation source module comprising a radiation source sealably connected to a leg, the leg sealably mounted to the housing, the radiation source being disposed substantially parallel to the flow of fluid. A method of treating a fluid in a housing comprising a fluid inlet, a fluid outlet, a fluid treatment zone disposed between the fluid inlet and the fluid outlet, the fluid treatment zone having at least one radiation source disposed therein is also described. The method comprises the steps of: (i) providing a flow of the fluid to the fluid inlet; (ii) feeding the flow of fluid from the fluid inlet to the fluid treatment zone in a manner substantially parallel to the at least one radiation source; (iii) irradiating the flow of fluid in the fluid treatment zone; and (iv) feeding the flow of fluid to the fluid outlet. During the method, the flow of fluid through the fluid inlet, the fluid outlet and the fluid treatment zone is substantially collinear. The fluid treatment device and method are ideally suited (but not limited) to inactivate microorganisms present in water.

    FUID TREATMENT SYSTEM AND PROCESS
    30.
    发明专利

    公开(公告)号:SK109195A3

    公开(公告)日:1996-04-03

    申请号:SK109195

    申请日:1994-03-04

    Abstract: The invention relates to a cleaning apparatus for a radiation source assembly in a fluid treatment system. The invention is characterized in that the cleaning apparatus comprises: a cleaning sleeve engaging a portion of the exterior of a radiation source in the radiation source assembly and movable between: (i) a retracted position wherein a portion of the radiation source is exposed to a flow of fluid to be treated, and (ii) an extended position wherein the portion of the radiation source is completely or partially covered by the cleaning sleeve, the cleaning sleeve further comprising a chamber in contact with the portion of the radiation source, the chamber adapted for receiving a cleaning fluid suitable to remove undesired materials from the portion of the radiation source upon movement of the cleaning sleeve.

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