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公开(公告)号:FR2504264B1
公开(公告)日:1985-12-06
申请号:FR8108144
申请日:1981-04-16
Applicant: APPLIED RES LAB
Inventor: VOGEL WILFRIED , CHENUZ JEAN-MARC
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公开(公告)号:FR2196072A5
公开(公告)日:1974-03-08
申请号:FR7329115
申请日:1973-08-09
Applicant: APPLIED RES LAB
Abstract: An analyte material is prepared for spectrochemical analysis by depositing it in solution or electrostatically precipitating it upon a previously purged yarn of finely divided carbon fibers, dessicating it in situ, and electrically heating the yarn sufficiently to vaporize the analyte material while passing a gas stream over it in which the analyte material is condensed in particles of sufficiently small size to form an aerosol which is then conducted to any of a variety of excitation sources for spectrochemical analysis.
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公开(公告)号:CA904726A
公开(公告)日:1972-07-11
申请号:CA904726D
Applicant: APPLIED RES LAB
Inventor: LIEBL HELMUT J , ANDERSEN CHRISTIAN A
IPC: H01J37/252 , H01J37/26 , H01J49/10 , H01J49/14
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公开(公告)号:CA896737A
公开(公告)日:1972-03-28
申请号:CA896737D
Applicant: APPLIED RES LAB
Inventor: DAHLQUIST RALPH L , JONES JAMES L , PASCHEN KENNETH W
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公开(公告)号:DE1773598A1
公开(公告)日:1972-02-24
申请号:DE1773598
申请日:1968-06-10
Applicant: APPLIED RES LAB INC
Inventor: LEON DAHLQUIST RALPH , LATIMER JONES JAMES , BARBARA SANTA , WILLIAM PASCHEN KENNETH
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公开(公告)号:GB1261596A
公开(公告)日:1972-01-26
申请号:GB3039969
申请日:1969-06-16
Applicant: APPLIED RES LAB INC
Abstract: 1,261,596. Discharge lamps. APPLIED RESEARCH LABORATORIES Inc. 16 June, 1969 [17 June, 1968], No. 30399/69. Heading H1D. Material to be analysed spectrochemically is injected through an inlet 24 into a gas flowing through a tube 26 along which an arc is maintained in a wall-stabilized state by dynamically cooling the tube. A working gas, e.g. argon is admitted through a port 16 to a chamber 10 having a window 14, e.g. of lithium fluoride and an outlet 12 cooled by liquid circulating in a passage 18 and serving as an anode between which and a cathode 30, e.g. a wire of 99% tungsten-1% thorium alloy, a wall-stabilized arc is maintained along the tube 26 which is cooled by liquid in a passage 27. The inlet 24 opens into a passage 22 in an insulating disc 20, e.g. of boron nitride. The material to be analysed may be a gas or submicron particles entrained in a carrier gas such as argon. An exhaust port 36 is provided. The arc may be struck by a high-voltage pulse or by a movable auxiliary electrode (not shown). In a modified arrangement (Fig. 2, not shown) for absorption analysis the passage 26 is extended to a second chamber similar to the chamber 10. A light source is mounted internally or externally of this second chamber.
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公开(公告)号:CA864653A
公开(公告)日:1971-02-23
申请号:CA864653D
Applicant: APPLIED RES LAB
Inventor: NEUHAUS HERMANN
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公开(公告)号:CA857404A
公开(公告)日:1970-12-01
申请号:CA857404D
Applicant: APPLIED RES LAB
Inventor: LIEBL HELMUT J
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公开(公告)号:GB1213534A
公开(公告)日:1970-11-25
申请号:GB5106668
申请日:1968-10-28
Applicant: APPLIED RES LAB INC
IPC: G01N23/225 , G01N27/62 , H01J37/252 , H01J49/14
Abstract: 1,213,534. Ion beam apparatus. APPLIED RESEARCH LABORATORIES Inc. 28 Oct., 1968 [30 Oct., 1967; 12 July, 1968], No. 51066/68. Heading H1D. In a method of chemical analysis by bombarding a material to be analysed with a beam of primary ions to sputter atoms of the material from its surface as secondary ions and mass spectrometrically analysing the secondary ions, the primary ions are ions which are chemically reactive with the material to be analysed under the conditions of bombardment, e.g. ions of C, N, O, F, Cl or I in order to increase the availability and stability of yield of ions for analysis particularly in comparison with the use of primary ions of one of the inert gases, e.g. A or Xe. Graphs are given showing ion output against time in respect of the bombardment of aluminium, zinc and stainless steel targets with positive atomic or molecular oxygen ions to produce aluminium ions, zinc ions and chromium, iron, nickel or silicon ions respectively. Also mentioned are targets of Ti, Si, Mg, Fe, Ag, Mo, C, W, Zr, Mn, Cr, Sn, Pb, Bi, Ni and Cu. The analysing instrument may comprise an ion microscope or ion probe system coupled to a mass spectrometer. The ion source for the primary ions comprises a duoplasmatron in which the aperture 90 in intermediate electrode 86 is offset slightly from coaxial alignment with the cathode 80-a favourable arrangement for the production of negative ions. The tubular cathode 80 has electron emissive material on its inner wall. The source also includes an anode plate 94 having its aperture aligned with the axis of the cathode 80 and fixed upon an iron plate 94, a tubular acceleration tube 108 and a shielding tube 110 which supported on a bellows assembly 112 for axial adjustment. Dynamic air cooling is provided by a fan 104. A constricting magnetic field between intermediate electrode 86 and anode 92 is produced by annular ceramic permanent magnets 114 mounted between iron plate 94 and an iron plate 116. The reactive element used in the source is preferably diluted with an inert carrier gas e.g. A or N.
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公开(公告)号:DE1919880A1
公开(公告)日:1970-11-05
申请号:DE1919880
申请日:1969-04-18
Applicant: APPLIED RES LAB INC
Inventor: J LIEBL HELMUT
IPC: H01J37/22 , H01J37/252 , H01J37/256 , H01J49/14
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