Point-of-use water treatment system
    301.
    发明授权
    Point-of-use water treatment system 失效
    使用点水处理系统

    公开(公告)号:US07166216B2

    公开(公告)日:2007-01-23

    申请号:US11199721

    申请日:2005-08-09

    Abstract: The present invention relates to a point-of-use water treatment system unit (10). The unit (10) includes a filter housing assembly (60) having a filter tank assembly (66) and a closure (64) which utilizes a handle (152) and cammed reciprocating lock blades (146, 150) to secure the closure (64) to the filter tank assembly (66). A UV tank assembly (300) includes a planar baffle plate (322) and a vaned baffle plate (324) to induce plug flow about a UV lamp assembly (280). The UV lamp assembly (280) is used which simultaneously electrically and sealingly mounts to UV tank assembly (300) and electrical cap assembly (290) using a bayonet mount. A bi-planar manifold assembly (40) is used to interconnect components of the WTS unit and to provide an envelope for accommodating a water pipe assembly (34). The bi-planar manifold assembly (26) enhances the compactness of the design of the WTS unit (10). Also, a support plate (26) is disclosed which provides support to subcomponents of the WTS unit (10) while also dissipating heat from a UV tank assembly (300).

    Abstract translation: 本发明涉及一种使用水处理系统单元(10)。 单元(10)包括具有过滤器容器组件(66)的过滤器壳体组件(60)和利用手柄(152)和凸轮往复运动的锁定刀片(146,150)以将闭合件(64)固定的闭合件 )到过滤罐组件(66)。 UV罐组件(300)包括平面挡板(322)和用于引导围绕UV灯组件(280)的插头流动的挡板(324)。 UV灯组件(280)被使用,其同时使用卡口式安装件电气密封地安装到UV罐组件(300)和电帽组件(290)。 双平面歧管组件(40)用于互连WTS单元的部件并提供用于容纳水管组件(34)的封套。 双平面歧管组件(26)增强了WTS单元(10)的设计的紧凑性。 此外,公开了一种支撑板(26),其提供对WTS单元(10)的子部件的支撑,同时还从UV罐组件(300)散发热量。

    Apparatus for irradiating fluids with UV
    302.
    发明授权
    Apparatus for irradiating fluids with UV 有权
    紫外线照射液体的装置

    公开(公告)号:US07097764B2

    公开(公告)日:2006-08-29

    申请号:US10509717

    申请日:2003-04-01

    Abstract: An apparatus for irradiating fluids with UV including a reactor vessel (10) having a fluid inleT (12), a fluid outlet (14) and a reaction chamber (16); a plurality of UV lamps (18a–d) extending across the reaction chamber (16) and substantially perpendicularly to an axis (A) extending between the fluid inlet (12) and the fluid outlet (14); an upper fluid diverter (22) and a lower fluid diverter (24) extending across the reaction chamber (16) substantially parallel to the lamps (19a–d) and positioned downstream of at least one upstream UV lamp (18a, b), wherein the upper and lower fluid diverters (22, 24) are positioned to direct fluids toward at least one UV lamp (18c, d) downstream of the upstream UV lamp (18a, b).

    Abstract translation: 一种用于用UV照射流体的装置,包括具有流体入口(12),流体出口(14)和反应室(16)的反应器容器(10) 多个沿着反应室(16)延伸并基本上垂直于在流体入口(12)和流体出口(14)之间延伸的轴线(A))的UV灯(18a-d); 基本上平行于灯(19ad)延伸并且位于至少一个上游UV灯(18a,b)的下游的上部流体转向器(22)和下部流体转向器(24)延伸穿过反应室(16),其中 定位上部和下部流体分配器(22,24)以将流体引向上游UV灯(18a,b)下游的至少一个UV灯(18c,d)。

    Fluid treatment device
    304.
    发明授权
    Fluid treatment device 有权
    流体处理装置

    公开(公告)号:US07018544B2

    公开(公告)日:2006-03-28

    申请号:US10374766

    申请日:2003-02-27

    Abstract: A fluid treatment device, preferably for the treatment of water, is described. The device comprises a closed housing having a fluid inlet, a fluid outlet and a fluid treatment zone disposed between the fluid inlet and the fluid outlet. The fluid treatment zone comprises a first irradiation zone and a second irradiation zone. At least one fluid mixing element is interposed between the first irradiation zone and the second irradiation zone.

    Abstract translation: 描述了优选用于处理水的流体处理装置。 该装置包括具有流体入口,流体出口和设置在流体入口和流体出口之间的流体处理区的封闭壳体。 流体处理区包括第一照射区和第二照射区。 在第一照射区域和第二照射区域之间插入至少一个流体混合元件。

    Point-of-use water treatment system
    305.
    发明申请
    Point-of-use water treatment system 失效
    使用点水处理系统

    公开(公告)号:US20060021926A1

    公开(公告)日:2006-02-02

    申请号:US11199721

    申请日:2005-08-09

    Abstract: The present invention relates to a point-of-use water treatment system unit (10). The unit (10) includes a filter housing assembly (60) having a filter tank assembly (66) and a closure (64) which utilizes a handle (152) and cammed reciprocating lock blades (146, 150) to secure the closure (64) to the filter tank assembly (66). A UV tank assembly (300) includes a planar baffle plate (322) and a vaned baffle plate (324) to induce plug flow about a UV lamp assembly (280). The UV lamp assembly (280) is used which simultaneously electrically and sealingly mounts to UV tank assembly (300) and electrical cap assembly (290) using a bayonet mount. A bi-planar manifold assembly (40) is used to interconnect components of the WTS unit and to provide an envelope for accommodating a water pipe assembly (34). The bi-planar manifold assembly (26) enhances the compactness of the design of the WTS unit (10). Also, a support plate (26) is disclosed which provides support to subcomponents of the WTS unit (10) while also dissipating heat from a UV tank assembly (300).

    Abstract translation: 本发明涉及一种使用水处理系统单元(10)。 单元(10)包括具有过滤器容器组件(66)的过滤器壳体组件(60)和利用手柄(152)和凸轮往复运动的锁定刀片(146,150)以将闭合件(64)固定的闭合件 )到过滤罐组件(66)。 UV罐组件(300)包括平面挡板(322)和用于引导围绕UV灯组件(280)的插头流动的挡板(324)。 UV灯组件(280)被使用,其同时使用卡口式安装件电气密封地安装到UV罐组件(300)和电帽组件(290)。 双平面歧管组件(40)用于互连WTS单元的部件并提供用于容纳水管组件(34)的封套。 双平面歧管组件(26)增强了WTS单元(10)的设计的紧凑性。 此外,公开了一种支撑板(26),其提供对WTS单元(10)的子部件的支撑,同时还从UV罐组件(300)散发热量。

    Fluid treatment system and method of treating fluid
    308.
    发明授权
    Fluid treatment system and method of treating fluid 失效
    流体处理系统和处理流体的方法

    公开(公告)号:US06803586B1

    公开(公告)日:2004-10-12

    申请号:US09567051

    申请日:2000-05-08

    Abstract: It is often desirable to operate ultraviolet (UV) water treatment systems at high fluid velocities; such as, when low UV doses are required, the UV transmittance of the water being treated is high, or when a high intensity radiation source is used. The operation of an open channel UV fluid treatment system at high fluid velocity causes a disproportionate amount of water to pass through the relatively low intensity region above the top lamp. This results in non-uniform UV dose delivery and poor reactor performance. In one embodiment of the invention, by elevating the inlet to the irradiation zone of the fluid treatment system with respect to the outlet, the amount of water that passes above the top lamp can be minimized, improving overall system performance. The means of elevation can consist of a step or slope in the channel, or a combination of both. Depending on the magnitude of elevation, an increase in maximum velocity of approximately two times can be obtained. In practice, a means must be provided to prevent damage to the radiation sources of the elevated banks that become exposed during periods of low flow. This can consist of either a mechanism for switching off the affected lamp when low water level or high temperature is detected, or a means of lamp cooling.

    Abstract translation: 经常需要以高流体速度操作紫外线(UV)水处理系统; 例如当需要低UV剂量时,待处理的水的UV透射率高,或者当使用高强度辐射源时。 开放通道UV流体处理系统在高流体速度下的操作导致不相称量的水通过顶灯上方的相对低强度的区域。 这导致UV剂量递送不均匀和反应器性能差。 在本发明的一个实施例中,通过相对于出口将入口提升到流体处理系统的照射区域,可以最小化通过顶灯上方的水量,从而提高整体系统性能。 升降装置可以由通道中的台阶或斜坡组成,或两者的组合。 取决于高程的大小,可以获得大约两倍的最大速度的增加。 在实践中,必须提供一种手段,以防止在低流量期间暴露的升高的银行的辐射源受到损害。 这可以包括当检测到低水位或高温时关闭受影响的灯的机构或灯冷却装置。

    Ultraviolet treatment for liquid dispensing unit
    310.
    发明授权
    Ultraviolet treatment for liquid dispensing unit 失效
    液体分配单元的紫外线处理

    公开(公告)号:US06483119B1

    公开(公告)日:2002-11-19

    申请号:US09404225

    申请日:1999-09-23

    Applicant: Wayne A. Baus

    Inventor: Wayne A. Baus

    Abstract: A system and method are provided for treating liquids in a dispensing reservoir. An ultraviolet source is located in a liquid dispensing reservoir or well. The ultraviolet source discharges ultraviolet light rays in the dispensing reservoir to treat the liquid by killing bacteria in the liquid. One or more existing or added baffle means prevent the ultraviolet light rays from being emitted outside of the dispensing reservoir. The ultraviolet source comprises a waterproof submersible element, with a transformer and a ground fault interrupter breaker typically located outside the reservoir.

    Abstract translation: 提供了一种用于处理分配储存器中的液体的系统和方法。 紫外线源位于液体分配储存器或井中。 紫外线源在分配储存器中排出紫外光,以通过杀死液体中的细菌来处理液体。 一个或多个现有或附加的挡板装置防止紫外光射出到分配储存器外部。 紫外线源包括防水潜水元件,其具有变压器和通常位于储存器外部的接地故障断路器断路器。

Patent Agency Ranking