Abstract:
The invention relates to a laser diode (100) comprising: an active layer (10); a wave guiding region (12) which surrounds the active layer (10) at least in part; a rear facet (14); a front facet (16) designed for decoupling laser radiation, wherein the active layer (10) extends, at least in part, along a first axis (X) between the rear facet (14) and the front facet (16); and a grid (18) which is operatively connected to the wave-guiding region (12), wherein the grid (18) comprises a plurality of webs (22) and trenches (24), characterized in that the plurality of trenches (24) is designed such that an average rise of a coupling parameter P is not equal to zero for the plurality of trenches (24) along the grid (18), wherein the coupling parameter P of a trench (24) is defined by the formula (I), wherein d res is a distance of the trench (24) to the active layer (10), w is a width of the trench (24) and Δ n is the refractive index difference between a refractive index of the trench (24) and a refractive index of a material surrounding the trench (24). The invention in particular relates to a laser diode in which a distributed feedback occurs over a surface grid of high order while radiation is decoupled on one side and in which the coupling strength of the grid is matched to the power density of the wave guided in the laser diode.
Abstract:
A method for growing beta phase of gallium oxide (²-Ga 2 O 3 ) single crystals from the melt contained within a metal crucible surrounded by a thermal insulation and heated by a heater. A growth atmosphere provided into a growth furnace has a variable oxygen concentration or partial pressure in such a way that the oxygen concentration reaches a growth oxygen concentration value (C2, C2', C2") in the concentration range (SC) of 5 - 100 vol. % below the melting temperature (MT) of Ga 2 O 3 or at the melting temperature (MT) or after complete melting of the Ga 2 O 3 starting material adapted to minimize creation of metallic gallium amount and thus eutectic formation with the metal crucible. During the crystal growth step of the ²-Ga 2 O 3 single crystal from the melt at the growth temperature (GT) the growth oxygen concentration value (C2, C2', C2") is maintained within the oxygen concentration range (SC).
Abstract:
Die vorliegende Erfindung betrifft einen Breitstreifenlaser mit hoher Effizienz und einer geringen Fernfelddivergenz. Es ist Aufgabe der vorliegenden Erfindung, einen Breitstreifenlaser mit einer geringen Fernfelddivergenz bei gleichzeitig hoher Ausgangsleistung anzugeben. Weiterhin soll der erfindungsgemäße Breitstreifenlaser preisgünstig herstellbar sein. Erfindungsgemäß weisen die aktive Schicht (10), der erste Kontakt (22) und der zweite Kontakt (24) jeweils eine Breite (W) größer als 10 µm auf, und es ist weiterhin eine Antiwellenleiterschicht (20) seitlich des zwischen den Kontakten (22, 24) eingeschlossenen, aktiven Gebiets angeordnet, wobei die Brechzahl der Antiwellenleiterschicht (20) größer als die minimale Brechzahl der Mantelschichten (14, 22) ist, und wobei der minimale Abstand (d x ) zwischen der Antiwellenleiterschicht (20) und einer Projektion einer der Kontakte (24) in die Ebene der Antiwellenleiterschicht (20) zwischen 0 und 50 µm beträgt.
Abstract:
A method for growing beta phase of gallium oxide (β-Ga 2 O 3 ) single crystals from the melt contained within a metal crucible surrounded by a thermal insulation and heated by a heater. A growth atmosphere provided into a growth furnace has a variable oxygen concentration or partial pressure in such a way that the oxygen concentration reaches a growth oxygen concentration value (C2, C2', C2") in the concentration range (SC) of 5 - 100 vol. % below the melting temperature (MT) of Ga 2 O 3 or at the melting temperature (MT) or after complete melting of the Ga 2 O 3 starting material adapted to minimize creation of metallic gallium amount and thus eutectic formation with the metal crucible. During the crystal growth step of the β-Ga 2 O 3 single crystal from the melt at the growth temperature (GT) the growth oxygen concentration value (C2, C2', C2") is maintained within the oxygen concentration range (SC).
Abstract translation:一种用于氧化镓的生长β相(²-的Ga 2 O 3)从含有金属坩埚由一热绝缘包围和加热用加热器内的熔体单晶的方法。 提供到生长炉A生长气氛具有在寻求一种方法所做的氧浓度达到在5-100的浓度范围内(SC)生长氧浓度值(C2,C2”,C2“)的可变的氧浓度或分压 下面的Ga 2 O 3的熔融温度(MT)或在熔化温度(MT)或Ga的2 O 3原料angepasst完全熔化后%(体积),以尽量减少金属镓量的创建,并与金属THUS共晶形成 坩埚中。在晶体生长步骤²-的Ga 2 O 3从在生长温度(GT)的生长氧浓度值(C2,C2”,C2“)熔体单晶被保持在氧浓度范围内(SC )。
Abstract:
The invention relates to compounds that can be used in particular as structural mimetics of proline-rich peptides and accordingly are able to bind PRM (proline-rich motif) binding domains of proteins. The invention further relates to the use of said compounds as pharmaceutical active ingredients and to the use of the pharmaceutical active ingredients to treat bacterial diseases, neurodegenerative diseases, and tumors.