公开(公告)号：US10230322B2

公开(公告)日：2019-03-12

申请号：US15428847

申请日：2017-02-09

Applicant: STMicroelectronics, Inc.

Inventor： Cheng Peng ,  Robert Krysiak

IPC: H02P29/60 ,  H02P27/08

Abstract: A system in package encloses a sensor and motor driver circuit. In an implementation, the sensor is an integrated circuit micro-electro-mechanical-systems (MEMS) sensor and the driver circuit is a motor driver circuit. Non-motor winding data information is sensed by the MEMS sensor and processed for the purpose of characterizing known fault patterns for motors; characterizing normal operation of the motor; and evaluating continued operation of the motor to detect abnormal motor behavior and instances of motor fault. The motor is driven using PWM control and the information output by the MEMS sensor is sampled at sampling times having a fixed timing relationship relative to the PWM control signals.

公开(公告)号：US20190057178A1

公开(公告)日：2019-02-21

申请号：US16160780

申请日：2018-10-15

Applicant: STMicroelectronics, Inc.

Inventor： Chetan BISHT ,  Harry SCRIVENER, III

IPC: G06F17/50 ,  H03K19/0175 ,  H03F3/195 ,  H03F3/60

Abstract: An integrated circuit system-on-chip (SOC) includes a semiconductor substrate, a plurality of components made up of transistors formed in the substrate, and a plurality of interconnection lines providing electrical connectivity among the components. Use of a channel-less design eliminates interconnection channels on the top surface of the chip. Instead, interconnection lines are abutted to one another in a top layer of metallization, thus preserving 5-10% of chip real estate. Clock buffers that are typically positioned along interconnection channels between components are instead located within regions of the substrate that contain the components. Design rules for channel-less integrated circuits permit feed-through interconnections and exclude multi-fanout interconnections.

公开(公告)号：US20190051722A1

公开(公告)日：2019-02-14

申请号：US16164481

申请日：2018-10-18

Applicant: STMicroelectronics, Inc.

Inventor： John H. Zhang

IPC: H01L49/02 ,  H01L27/11507 ,  H01L21/02 ,  H01L27/108 ,  H01L21/28

Abstract: An interconnect structure for use in coupling transistors in an integrated circuit is disclosed, including various configurations in which ferroelectric capacitors exhibiting negative capacitance are coupled in series with dielectric capacitors. In one embodiment, the negative capacitor includes a dielectric/ferroelectric bi-layer. When a negative capacitor is electrically coupled in series with a conventional dielectric capacitor, the series combination behaves like a stable ferroelectric capacitor for which the overall capacitance can be measured experimentally, and tuned to a desired value. The composite capacitance of a dielectric capacitor and a ferroelectric capacitor having negative capacitance coupled in series is, in theory, infinite, and in practice, very large. A series combination of positive and negative capacitors within a microelectronic interconnect structure can be used to make high capacity DRAM memory cells.

公开(公告)号：US10204982B2

公开(公告)日：2019-02-12

申请号：US14048232

申请日：2013-10-08

Applicant: STMicroelectronics, Inc.

Inventor： Pierre Morin ,  Qing Liu ,  Nicolas Loubet

IPC: H01L29/06 ,  H01L21/84 ,  H01L27/12 ,  H01L29/78 ,  H01L21/8238

Abstract: A method for forming a semiconductor device includes forming a mask layer on a stressed semiconductor layer of a stressed, semiconductor-on-insulator wafer. An isolation trench bounding the stressed semiconductor layer is formed. The isolation trench extends through the mask layer and into the SOI wafer past an oxide layer thereof. A dielectric body is formed in the isolation trench. A relaxation reduction liner is formed on the dielectric body and on an adjacent sidewall of the stressed semiconductor layer. The mask layer on the stressed semiconductor layer is removed.

公开(公告)号：US10199505B2

公开(公告)日：2019-02-05

申请号：US15620444

申请日：2017-06-12

Applicant: STMicroelectronics, Inc.

Inventor： John H. Zhang

IPC: H01L29/786 ,  H01L29/775 ,  H01L29/66 ,  H01L29/40 ,  H01L29/417 ,  H01L29/778 ,  H01L29/41 ,  H01L21/8238 ,  H01L27/092 ,  H01L29/06 ,  H01L29/12 ,  H01L29/423 ,  H01L29/45 ,  H01L29/49 ,  H01L29/165

Abstract: Metal quantum dots are incorporated into doped source and drain regions of a MOSFET array to assist in controlling transistor performance by altering the energy gap of the semiconductor crystal. In a first example, the quantum dots are incorporated into ion-doped source and drain regions. In a second example, the quantum dots are incorporated into epitaxially doped source and drain regions.

公开(公告)号：US20190034150A1

公开(公告)日：2019-01-31

申请号：US16045269

申请日：2018-07-25

Applicant: STMicroelectronics, Inc. ,  STMicroelectronics International N.V.

Inventor： Benedetto VIGNA ,  Mahesh CHOWDHARY ,  Matteo DAMENO

IPC: G06F3/14 ,  G01P1/07

Abstract: A method includes receiving, at a master agent, announcements from candidate consumer agents indicating the presence of the candidate consumer agents. Each announcement includes display parameters for a display of the corresponding candidate consumer agent. The method further includes receiving at the master agent content parameters from a producer agent, the content parameters defining characteristics of content to be provided by the consumer agent. A mosaic screen is configured based on the received announcements and the content parameters. This configuring of the mosaic screen includes selecting ones of the consumer agents for which an announcement was received and generating content distribution parameters based on the content parameters and the display parameters of the selected ones of the consumer agents. The generated content distribution parameters are provided to the consumer agent.

公开(公告)号：US10177255B2

公开(公告)日：2019-01-08

申请号：US15723152

申请日：2017-10-02

Applicant: STMICROELECTRONICS, INC.

Inventor： Pierre Morin ,  Nicolas Loubet

IPC: H01L29/00 ,  H01L29/78 ,  H01L29/66 ,  H01L29/165 ,  H01L27/088

Abstract: A semiconductor device may include a substrate, a fin above the substrate and having a channel region therein, and source and drain regions adjacent the channel region to generate shear and normal strain on the channel region. A semiconductor device may include a substrate, a fin above the substrate and having a channel region therein, source and drain regions adjacent the channel region, and a gate over the channel region. The fin may be canted with respect to the source and drain regions to generate shear and normal strain on the channel region.

公开(公告)号：US10170475B2

公开(公告)日：2019-01-01

申请号：US15448626

申请日：2017-03-03

Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION ,  STMICROELECTRONICS, INC.

Inventor： Stephane Allegret-Maret ,  Kangguo Cheng ,  Bruce Doris ,  Prasanna Khare ,  Qing Liu ,  Nicolas Loubet

IPC: H01L29/66 ,  H01L27/092 ,  H01L27/11 ,  H01L21/8238 ,  H01L21/84 ,  H01L29/786 ,  H01L21/02 ,  H01L21/265 ,  H01L21/3065 ,  H01L21/311 ,  H01L21/762 ,  H01L27/12 ,  H01L29/06 ,  H01L29/08 ,  H01L29/165 ,  H01L29/417

Abstract: An improved transistor with channel epitaxial silicon. In one aspect, a method of fabrication includes: forming a gate stack structure on an epitaxial silicon region disposed on a substrate, a width dimension of the epitaxial silicon region approximating a width dimension of the gate stack structure; and growing a raised epitaxial source and drain from the substrate, the raised epitaxial source and drain in contact with the epitaxial silicon region and the gate stack structure. For a SRAM device, further: removing an epitaxial layer in contact with the silicon substrate and the raised source and drain and to which the epitaxial silicon region is coupled leaving a space above the silicon substrate and under the raised epitaxial source and drain; and filling the space with an insulating layer and isolating the raised epitaxial source and drain and a channel of the transistor from the silicon substrate.

公开(公告)号：US10153371B2

公开(公告)日：2018-12-11

申请号：US14175215

申请日：2014-02-07

Applicant: STMICROELECTRONICS, INC. ,  GLOBALFOUNDRIES Inc.

Inventor： Xiuyu Cai ,  Qing Liu ,  Ruilong Xie

IPC: H01L29/78 ,  H01L29/66

Abstract: A method is for making a semiconductor device. The method may include forming fins above a substrate, each fin having an upper fin portion including a first semiconductor material and a lower fin portion including a dielectric material. The method may include forming recesses into sidewalls of each lower fin portion to expose a lower surface of a respective upper fin portion, and forming a second semiconductor layer surrounding the fins including the exposed lower surfaces of the upper fin portions. The second semiconductor layer may include a second semiconductor material to generate stress in the first semiconductor material.

公开(公告)号：US20180344186A1

公开(公告)日：2018-12-06

申请号：US16041140

申请日：2018-07-20

Applicant: STMicroelectronics, Inc.

Inventor： John H. ZHANG

IPC: A61B5/04 ,  A61B5/00 ,  B82Y30/00 ,  G01N27/414

CPC classification number: A61B5/04001 ,  A61B5/6877 ,  A61B5/688 ,  B82Y30/00 ,  G01N27/4145 ,  Y10T29/4913

Abstract: It is recognized that, because of its unique properties, graphene can serve as an interface with biological cells that communicate by an electrical impulse, or action potential. Responding to a sensed signal can be accomplished by coupling a graphene sensor to a low power digital electronic switch that is activatable by the sensed low power electrical signals. It is further recognized that low power devices such as tunneling diodes and TFETs are suitable for use in such biological applications in conjunction with graphene sensors. While tunneling diodes can be used in diagnostic applications, TFETs, which are three-terminal devices, further permit controlling the voltage on one cell according to signals received by other cells. Thus, by the use of a biological sensor system that includes graphene nanowire sensors coupled to a TFET, charge can be redistributed among different biological cells, potentially with therapeutic effects.