Abstract:
A resonator is described. The resonator includes multiple electrodes. The resonator also includes a composite piezoelectric material. The composite piezoelectric material includes at least one layer of a first piezoelectric material and at least one layer of a second piezoelectric material. At least one electrode is coupled to a bottom of the composite piezoelectric material. At least one electrode is coupled to a top of the composite piezoelectric material.
Abstract:
This disclosure provides implementations of electromechanical systems resonator structures, devices, apparatus, systems, and related processes. In one aspect, a resonator structure includes a first conductive layer of electrodes and a second conductive layer of electrodes. A piezoelectric layer including a piezoelectric material is disposed between the first conductive layer and the second conductive layer. One or more trenches can be formed in the piezoelectric layer on one or both sides in space regions between the electrodes. In some implementations, a process for forming the resonator structure includes removing an exposed portion of the piezoelectric layer to define a trench, for instance, by partial etching or performing an isotropic release etch using a XeF2 gas or SF6 plasma. In some other implementations, a portion of a sacrificial layer is removed to define a trench in the piezoelectric layer.
Abstract:
This disclosure provides implementations of electromechanical systems resonator structures, devices, apparatus, systems, and related processes. In one aspect, resonator apparatus includes a first conductive layer including a first electrode and a second electrode. The first electrode is coupled to receive a first input signal, and the second electrode is coupled to provide a first output signal. A piezoelectric layer includes a piezoelectric material. The piezoelectric layer has a first side and a second side opposite the first side. The first side is proximate the first conductive layer, and the second side is electrically isolated from ground. In some examples, the second side of the piezoelectric layer can be exposed and/or electrically de-coupled from one or more components.
Abstract:
This disclosure provides systems, methods and apparatus for combining devices deposited on a first substrate, with integrated circuits formed on a second substrate such as a semiconducting substrate or a glass substrate. The first substrate may be a glass substrate. The first substrate may include conductive vias. A power combiner circuit may be deposited on a first side of the first substrate. The power combiner circuit may include passive devices deposited on at least the first side of the first substrate. The integrated circuit may include a power amplifier circuit disposed on and configured for electrical connection with the power combiner circuit, to form a power amplification system. The conductive vias may include thermal vias configured for conducting heat from the power amplification system and/or interconnect vias configured for electrical connection between the power amplification system and a conductor on a second side of the first substrate.
Abstract:
A load balancing in a multiple DRAM system comprises interleaving memory data across two or more memory channels. Access to the memory channels is controlled by memory controllers. Bus masters are coupled to the memory controllers via an interconnect system and memory requests are transmitted from the bus masters to the memory controller. If congestion is detected in a memory channel, congestion signals are generated and transmitted to the bus masters. Memory requests are accordingly withdrawn or rerouted to less congested memory channels based on the congestion signals.
Abstract:
A non-uniform interleaving scheme in a multiple channel DRAM system comprises associating memory data with a memory address, associating address zones to predetermined ranges of memory addresses and associating predetermined interleaving granularities with the address zones. Memory data is interleaved across two or more memory channels such that a predetermined interleaving granularity is applied to each address zone.
Abstract:
A passive device having a portion in the package substrate (1372, 582) and a portion in the system board (374, 584) such that the portions of the device are electromagnetically coupled. A transformer including inductors in the package substrate (372) and system board (374) electromagnetically coupled across a space between the substrate and board (370) that is surrounded by solder balls (320, 322) coupling the substrate and board. A capacitor including plates in the substrate (582) and board (584) electromagnetically coupled across a space between the substrate and board (580) that is surrounded by solder balls (520, 522) coupling the substrate and board. A core material (586, 376) can at least partially fill the space between the substrate and board. The solder balls surrounding the space can be coupled to ground. Metal shielding can be put in the substrate and/or board surrounding the device. The metal shielding can be coupled to the solder balls. The metal shielding can be coupled to ground.
Abstract:
A three dimensional on-chip inductor, transformer and radio frequency amplifier are disclosed. The radio frequency amplifier includes a pair of transformers and a transistor. The transformers include at least two inductively coupled inductors. The inductors include a plurality of segments (704) of a first metal layer, a plurality of segments (706) of a second metal layer, a first inductor input (708) a second inductor input (710) and a plurality of through silicon vias (702) coupling the plurality of segments of the first metal layer and the plurality of segments of the second metal layer to form a continuous, non-intersecting path between the first inductor input and the second inductor input. The inductors can have a symmetric or asymmetric geometry. The first metal layer can be a metal layer in the back-end-of-line section of the chip. The second metal layer can be located in the redistributed design layer of the chip
Abstract:
Methods and apparatuses for matching impedances in a flip-chip circuit assembly are presented. An apparatus for matching impedances in a flip-chip circuit assembly may include a first circuit associated with a first die and a through silicon via (TSV) coupling the first circuit to a second circuit. The apparatus may further include a first impedance matching inductor interposed between the TSV and the second circuit. A method for matching impedances in a flip-chip circuit assembly may include providing a die having a first circuit, and forming a TSV over the die. The method may further include providing a second circuit and forming a first impedance matching inductor interposed between the TSV and second circuit.
Abstract:
A method includes identifying a first set of masters and a second set of masters from a plurality of masters. The plurality of masters have access to a multi-channel memory via a crossbar interconnect. The method includes partitioning the crossbar interconnect into a plurality of partitions comprising at least a first partition corresponding to the first set of masters and a second partition corresponding to the second set of masters. The method also includes allocating a first set of buffer areas within the multi-channel memory. The first set of buffer areas correspond to the first set of masters. The method further includes allocating a second set of buffer areas within the multi-channel memory. The second set of buffers correspond to the second set of masters.