33.
    发明专利
    未知

    公开(公告)号:IT1108767B

    公开(公告)日:1985-12-09

    申请号:IT6874378

    申请日:1978-07-21

    Applicant: REED KENNETH J

    Abstract: There is provided a method for producing a stencil for use in screen printing which method comprises coating a screen mesh with liquid photopolymerizable composition, imagewise exposing the coated mesh to radiation to polymerize liquid composition on the mesh in the exposed areas, and removing unexposed liquid composition from the mesh to develop the stencil. Suitably the liquid composition is applied with the screen mesh in contact with a protective film and, after imagewise exposure, the stencil is developed by stripping of the film such that unexposed liquid remains on the film. This provides a simple method of producing a stencil which does not require highly skilled personnel.

    37.
    发明专利
    未知

    公开(公告)号:NL7807772A

    公开(公告)日:1979-01-23

    申请号:NL7807772

    申请日:1978-07-20

    Applicant: REED KENNETH J

    Abstract: There is provided a method for producing a stencil for use in screen printing which method comprises coating a screen mesh with liquid photopolymerizable composition, imagewise exposing the coated mesh to radiation to polymerize liquid composition on the mesh in the exposed areas, and removing unexposed liquid composition from the mesh to develop the stencil. Suitably the liquid composition is applied with the screen mesh in contact with a protective film and, after imagewise exposure, the stencil is developed by stripping of the film such that unexposed liquid remains on the film. This provides a simple method of producing a stencil which does not require highly skilled personnel.

    38.
    发明专利
    未知

    公开(公告)号:IT7868743D0

    公开(公告)日:1978-07-21

    申请号:IT6874378

    申请日:1978-07-21

    Applicant: REED KENNETH J

    Abstract: There is provided a method for producing a stencil for use in screen printing which method comprises coating a screen mesh with liquid photopolymerizable composition, imagewise exposing the coated mesh to radiation to polymerize liquid composition on the mesh in the exposed areas, and removing unexposed liquid composition from the mesh to develop the stencil. Suitably the liquid composition is applied with the screen mesh in contact with a protective film and, after imagewise exposure, the stencil is developed by stripping of the film such that unexposed liquid remains on the film. This provides a simple method of producing a stencil which does not require highly skilled personnel.

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