Method and apparatus for cutting diamond
    33.
    发明公开
    Method and apparatus for cutting diamond 失效
    Verfahren und Vorrichtung zum Schneiden von Diamanten

    公开(公告)号:EP0799680A2

    公开(公告)日:1997-10-08

    申请号:EP97200862.7

    申请日:1997-03-21

    CPC classification number: B28D5/045

    Abstract: This invention relates to the field of cutting hard materials. More particularly, the invention describes a method and apparatus for cutting diamond.
    The method for cutting diamond according to the present invention, comprises the steps of providing a wire; heating said wire; and urging said wire and diamond together and moving said wire longitudinally.
    Preferably, the wire and/or diamond is heated to approach the metal-carbon eutectic temperature and create sensible reaction rates of the carbon on the wire surface. The wire can also carry a molten oxidant to enhance the cutting rate.

    Abstract translation: 本发明涉及切割硬质材料的领域。 更具体地说,本发明描述了切割钻石的方法和装置。 根据本发明的切割金刚石的方法包括提供丝线的步骤; 加热所述电线; 并且将所述线和金刚石一起推动在一起并纵向移动所述线。 优选地,将线和/或金刚石加热以接近金属 - 碳共晶温度,并产生线表面上的碳的明显的反应速率。 电线还可以携带熔融氧化剂以提高切割速率。

    MODIFIED SOL-GEL ALUMINA
    34.
    发明公开
    MODIFIED SOL-GEL ALUMINA 无效
    改性的溶胶 - 凝胶法氧化铝

    公开(公告)号:EP0792331A1

    公开(公告)日:1997-09-03

    申请号:EP95930303.0

    申请日:1995-08-30

    Inventor: GARG, A., K.

    CPC classification number: C04B35/624 C04B35/1115 C09K3/1418

    Abstract: Alpha alumina abrasive grits with grain boundaries modified with at least one of yttria and a rare earth metal oxide, and one or more oxides selected from the oxides of magnesium and/or transition elements, perform at enhanced levels if at least the yttria and/or rare earth metal oxide modifiers are present within the body of the grit in concentrations at least as high as their concentrations at the surface of the grit.

    Apparatus and method for depositing diamond film
    35.
    发明公开
    Apparatus and method for depositing diamond film 失效
    Vorrichtung und Methode zum Erzeugen eines Diamantfilms

    公开(公告)号:EP0791668A2

    公开(公告)日:1997-08-27

    申请号:EP97200277.8

    申请日:1997-02-12

    CPC classification number: C23C16/272 C23C16/509 H01J37/32348

    Abstract: This invention relates to an improved method and apparatus for producing diamond film by chemical vapor deposition. Said method comprises the steps of providing an environment comprising hydrogen and a hydrocarbon gas; dissociating hydrogen gas of said environment by dielectric barrier discharge to obtain atomic hydrogen; and depositing diamond on a deposition surface from said hydrocarbon gas, assisted by said atomic hydrogen. This method allows to produce synthetic diamond film with increased efficiency and at a lower cost.

    Abstract translation: 本发明涉及通过化学气相沉积制造金刚石膜的改进方法和装置。 所述方法包括提供包括氢气和烃气体的环境的步骤; 通过电介质阻挡放电来解离所述环境的氢气以获得原子氢; 以及在所述原子氢辅助下,将沉积在所述烃气体的沉积表面上的金刚石沉积。 该方法允许以更高的效率和更低的成本生产人造金刚石薄膜。

    Method and apparatus for coating a substrate with diamond film
    37.
    发明公开
    Method and apparatus for coating a substrate with diamond film 失效
    用于与金刚石膜涂覆衬底的方法和装置

    公开(公告)号:EP0780489A1

    公开(公告)日:1997-06-25

    申请号:EP96203474.0

    申请日:1996-12-06

    CPC classification number: C23C16/44 C23C16/27 C23C16/4582

    Abstract: The present invention is directed to a method and apparatus for depositing synthetic diamond film (120) on a substrate (110). More particularly, the invention relates to depositing diamond film as a coating on substances that have coefficients of thermal expansion that are not well matched to the coefficient of thermal expansion of diamond film.
    The method of the invention includes the following steps : pre-stressing (125) the substrate to obtain a pre-deposition stress across a surface thereof; depositing the diamond film on the pre-stressed substrate surface; and cooling the film and substrate, and relieving the pre-deposition stress during the cooling. The pre-stress is either compressional or tensile, depending on the substrate coefficient of thermal expansion being higher or lower than that of diamond film.

    Apparatus and method for depositing a substance on a rotating surface
    40.
    发明公开
    Apparatus and method for depositing a substance on a rotating surface 失效
    装置和用于将材料施加到旋转表面的方法。

    公开(公告)号:EP0661387A3

    公开(公告)日:1996-12-18

    申请号:EP94203694.8

    申请日:1994-12-20

    CPC classification number: C23C16/4584

    Abstract: This invention relates to temperature control during material deposition and, more particularly, to controlling temperature of a substance experiencing high thermal energy fluxes while being deposited on a rotating surface. In accordance with an embodiment of the invention for depositing a substance, there is provided a deposition chamber for containing heated constituents of the substance and a mandrel assembly, which includes a mandrel mounted on a base. The mandrel assembly is rotatable on an axis, and the mandrel thereof has a surface in said chamber.

    Abstract translation: 本发明的材料沉积,并且更特别是在涉及温度控制,控制经历高的热能量通量而旋转表面上沉积的物质的温度。 在与本发明的用于沉积的物质的实施例雅舞蹈,提供了一种用于含有该物质和心轴组件,其包括安装在基座上的心轴的加热成分提供一个沉积室中。 所述心轴组件是关于轴旋转基体,和它们的所述心轴具有在所述室的表面。

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