公开(公告)号：EP3454129A1

公开(公告)日：2019-03-13

申请号：EP17189740.8

申请日：2017-09-07

Applicant: ASML Netherlands B.V.

Inventor： FAGGINGER AUER, Bastiaan Onne ,  HINNEN, Paul Christiaan ,  CRAMER, Hugo Augustinus Joseph ,  TSIATMAS, Anagnostis ,  MEDVEDYEVA, Mariya Vyacheslavivna

IPC: G03F9/00 ,  G03F7/20

Abstract: Disclosed herein is a target formed on a substrate, the target comprising: an alignment structure; and a metrology structure; wherein the alignment structure comprises structures that are arranged to generate a beat pattern when the alignment structure is illuminated with source radiation. Advantageously, when the target is illuminated, the beat patterns that appear in an image of the target allow the target to be easily identified using pattern recognition techniques.

公开(公告)号：EP3444674A1

公开(公告)日：2019-02-20

申请号：EP17186137.0

申请日：2017-08-14

Applicant: ASML Netherlands B.V.

Inventor： TSIATMAS, Anagnostis ,  MC NAMARA, Elliott, Gerard

IPC: G03F7/20

Abstract: A method, including: measuring a first plurality of instances of a metrology target on a substrate processed using a patterning process to determine values of at least one parameter of the patterning process using a first metrology recipe for applying radiation to, and detecting radiation from, instances of the metrology target; and measuring a second different plurality of instances of the metrology target on the same substrate to determine values of the at least one parameter of the patterning process using a second metrology recipe for applying radiation to, and detecting radiation from, instances of the metrology target, wherein the second metrology recipe differs from the first metrology recipe in at least one characteristic of the applying radiation to, and detecting radiation from, instances of the metrology target.