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    Method of damping object, active damping system, and lithographic apparatus
    34.
    发明专利
    Method of damping object, active damping system, and lithographic apparatus 有权
    阻尼对象，主动阻尼系统和平面设备的方法

    公开(公告)号：JP2010153854A

    公开(公告)日：2010-07-08

    申请号：JP2009279995

    申请日：2009-12-10

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BUTLER HANS ,  VAN DER WIJST MARC WILHELMUS MARIA

    IPC: H01L21/027 ,  H01L21/68

    CPC classification number: F16F15/002 ,  G03F7/709

    Abstract: PROBLEM TO BE SOLVED: To provide a method of damping an object in motion at two or greater of degrees of freedom. SOLUTION: In the method, positional quantities are measured at each of two or more of the positions of measurements, measurement signals are extracted at every dynamic mode from the measured positional quantities and controller units connected to each corresponding dynamic mode are supplied with the measurement signals in one dynamic mode. In the method, output signals are provided at every dynamic mode on the basis of each measurement signal, to which the controller units correspond, and control signals are provided to each of two or of actuators. In the method, the control signals at every actuator are based on output signals from one or two or more of the controller units. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种在两个或更多个自由度下运动的物体的阻尼方法。 解决方案：在该方法中，在测量位置的两个或多个位置中的每一个处测量位置量，在每个动态模式下从测量的位置量中提取测量信号，并且连接到每个对应的动态模式的控制器单元被提供 测量信号在一个动态模式。 在该方法中，根据控制器单元对应的每个测量信号，在每个动态模式下提供输出信号，并且向两个或每个致动器中的每一个提供控制信号。 在该方法中，每个致动器处的控制信号基于来自一个或两个或多个控制器单元的输出信号。 版权所有（C）2010，JPO＆INPIT

    Cable connection, control system for it, and method for reducing vibration transmitted via cable connection from first object to second object
    36.
    发明专利
    Cable connection, control system for it, and method for reducing vibration transmitted via cable connection from first object to second object 有权
    电缆连接，其控制系统以及通过从第一个对象到第二个对象的电缆连接传输的振动的方法

    公开(公告)号：JP2008042201A

    公开(公告)日：2008-02-21

    申请号：JP2007200649

    申请日：2007-08-01

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BUTLER HANS ,  VAN DUIJNHOVEN MARTINUS ,  GEERKE JOHAN HENDRIK ,  DE PEE JOOST ,  DE HOON CORNELIUS ADRIANUS LAM

    IPC: H01L21/027 ,  H01L21/68

    CPC classification number: G03F7/709 ,  G03F7/70691 ,  G03F7/70833

    Abstract: PROBLEM TO BE SOLVED: To provide cable connection between a first object and a second object, in which vibration propagated or transmitted from the first object to the second object is reduced. SOLUTION: The cable connection between the first object and the second object includes a cable bundle containing one or more cables, one end of which is fixed to the first object and the other end of which is fixed to the second object; a cable bundle holder configured so as to hold the cable bundle at a position along the length of the cable bundle;a control system configured so as to control a position of the cable bundle holder with respect to the second object. A control system for the cable connection, and a method for reducing vibration transmitted via the cable connection from the first object to the second object. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：提供第一物体和第二物体之间的电缆连接，其中从第一物体传播或传播的振动减少到第二物体。 解决方案：第一物体和第二物体之间的电缆连接包括一束包含一根或多根电缆的电缆束，其一端固定在第一物体上，另一端固定在第二物体上; 电缆束保持器，其构造成将电缆束保持在沿着电缆束的长度的位置;控制系统，被配置为控制电缆束保持器相对于第二物体的位置。 一种用于电缆连接的控制系统，以及一种减少通过电缆连接从第一物体传递到第二物体的振动的方法。 版权所有（C）2008，JPO＆INPIT

    Lithography equipment and device fabrication method
    37.
    发明专利
    Lithography equipment and device fabrication method 有权
    LITHOGRAPHY设备和设备制造方法

    公开(公告)号：JP2007318118A

    公开(公告)日：2007-12-06

    申请号：JP2007121335

    申请日：2007-05-02

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BUTLER HANS ,  AUER FRANK

    IPC: H01L21/027

    CPC classification number: G03F7/709 ,  G03F7/70833 ,  H01L21/0274

    Abstract: PROBLEM TO BE SOLVED: To provide lithography equipment capable of reducing alignment errors due to misalignment in a projection system and the other portion. SOLUTION: A projection system is supported by a frame and is provided with a piezo actuator configured in a way that a force applies to the projection system. A frame position or a time derivative for the frame position is measured by a piezoelectric sensor and the piezo actuator is controlled based on the measured frame position or the measured time derivative for the frame position. In addition, data from the piezoelectric sensor is used in a control loop for a frame air-mount which supports the other lithography equipment portion like a mask table, substrate table or projection system. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：提供能够减少由于投影系统和其他部分中的未对准引起的对准误差的光刻设备。 解决方案：投影系统由框架支撑并且设置有以将力施加到投影系统的方式构造的压电致动器。 通过压电传感器测量帧位置的帧位置或时间导数，并且基于测量的帧位置或帧位置的测量时间导数来控制压电致动器。 此外，来自压电传感器的数据用于支持另一光刻设备部分的框架空气支架的控制回路，如掩模台，基板台或投影系统。 版权所有（C）2008，JPO＆INPIT

    Pattern alignment method and lithography apparatus
    38.
    发明专利
    Pattern alignment method and lithography apparatus 有权
    图案对齐方法和平面设备

    公开(公告)号：JP2007180548A

    公开(公告)日：2007-07-12

    申请号：JP2006342178

    申请日：2006-12-20

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BUTLER HANS

    IPC: H01L21/027

    CPC classification number: G03F7/70633 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

    Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus being improved in alignment. SOLUTION: In an alignment method, a beam with a first pattern is irradiated to a first target portion of a substrate to form the first pattern on the substrate. Then, a beam with a second pattern is irradiated to a second target portion of the substrate to form the second pattern on the substrate. The second target portion is at least partially overlapped with the first target portion. During irradiating the second pattern, a diffraction beam is detected due to diffraction of the beam with the second pattern on the first pattern. The diffraction beam is compared to a desired diffraction beam, so that alignment of the substrate is performed, based on a result of comparison between the detected diffraction beam and the desired diffraction beam. COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种改进对准的光刻设备。 解决方案：在对准方法中，将具有第一图案的光束照射到基板的第一目标部分，以在基板上形成第一图案。 然后，将具有第二图案的光束照射到基板的第二目标部分，以在基板上形成第二图案。 第二目标部分至少部分地与第一目标部分重叠。 在照射第二图案期间，由于在第一图案上具有第二图案的光束的衍射来检测衍射光束。 将衍射光束与期望的衍射光束进行比较，基于检测到的衍射光束和期望的衍射光束之间的比较结果，执行基板的对准。 版权所有（C）2007，JPO＆INPIT

    Lithography device and method of manufacturing device
    39.
    发明专利
    Lithography device and method of manufacturing device 有权
    LITHOGRAPHY DEVICE AND METHOD OF MANUFACTURING DEVICE

    公开(公告)号：JP2007173808A

    公开(公告)日：2007-07-05

    申请号：JP2006337676

    申请日：2006-12-15

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BUTLER HANS

    IPC: H01L21/027

    CPC classification number: G03F7/70725

    Abstract: PROBLEM TO BE SOLVED: To provide a lithography device for controlling in high precision the position of a substrate table by referring to the position of a projection lens. SOLUTION: The lithography device includes a first constituting component WT, an actuator 13 which moves the first constituting component WT to a second constituting component 1, a measurement system 14 which measures at least one of higher order time derivative of a position, a speed, an acceleration, and the position, and a control system 2 for controlling the actuator 13 according to an output from the measurement system 14. The control system 2 includes various filter branchings 10, and determines the characteristic parameter of a variable from which the first analysis formula of the output of the measurement system 14 differs, and further, includes a predication unit 11 which offers the version of the output to which time was shifted in order to compensate partially at least a delay between the measured value of the characteristic of the second constituting components and effects which this measured value gives to the performance of the actuator 13, by using the characteristic parameter and the first analysis formula. COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种通过参考投影透镜的位置来高精度地控制衬底台的位置的光刻装置。 解决方案：光刻设备包括第一构成部件WT，将第一构成部件WT移动到第二构成部件1的致动器13，测量位置的高阶时间导数中的至少一个的测量系统14， 速度，加速度和位置，以及用于根据测量系统14的输出来控制致动器13的控制系统2.控制系统2包括各种滤波器分支10，并且确定变量的特性参数， 测量系统14的输出的第一分析公式不同，并且还包括预测单元11，该预测单元11提供时间被移位的输出的版本，以部分地至少补偿特性的测量值之间的延迟 通过使用特性p，该测量值给出致动器13的性能的第二构成部件和效果 参数和第一分析公式。 版权所有（C）2007，JPO＆INPIT

    Lithographic device and method for manufacturing device
    40.
    发明专利
    Lithographic device and method for manufacturing device 有权
    光刻设备和制造设备的方法

    公开(公告)号：JP2006191055A

    公开(公告)日：2006-07-20

    申请号：JP2005374334

    申请日：2005-12-27

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： HOUKES MARTIJN ,  BUTLER HANS ,  COX HENRIKUS HERMAN MARIE

    IPC: H01L21/027

    CPC classification number: G03F7/70341 ,  G03F7/70725

    Abstract: PROBLEM TO BE SOLVED: To improve quality of pixels in a lithographic device and a method for manufacturing the device.
    SOLUTION: The lithographic device has a first movable element (like an immersion liquid supply system), and operates while contacting the surface of a second movable element (like a substrate table). The lithographic device is also provided with a second element controller (like a substrate table controller) C2 that controls the amount of positions in the second movable element. Disturbance force by capillary force, for example, caused by relative movements of the first and the second movable elements, disturbs the positions y1, y2 of the first and the second movable elements. The lithographic device includes a feed forward control path that feeds a disturbance feed forward signal to the second element controller C2 to correct at least a part of positions of the second movable element caused by such a disturbance force, and the feed forward control path includes a disturbance force estimator Fd that estimates the disturbance force from the amount y1 of the position in the first movable element.
    COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提高光刻设备中的像素的质量以及用于制造该设备的方法。 解决方案：光刻设备具有第一可移动元件（如浸没液体供应系统），并且在接触第二可移动元件（如基板台）的表面时操作。 光刻设备还设置有控制第二可移动元件中的位置量的第二元件控制器（如基板台控制器）C2。 由第一和第二可移动元件的相对运动引起的例如毛细管力的扰动力扰乱第一和第二可移动元件的位置y1，y2。 光刻设备包括前馈控制路径，其将干扰前馈信号馈送到第二元件控制器C2以校正由这种干扰力引起的第二可移动元件的位置的至少一部分，并且前馈控制路径包括 扰动力估计器Fd，其估计来自第一可移动元件中的位置的量y1的扰动力。 版权所有（C）2006，JPO＆NCIPI

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