公开(公告)号：JP2008294439A

公开(公告)日：2008-12-04

申请号：JP2008120668

申请日：2008-05-02

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG ANTHONIUS MARTINUS COR ,  STAVENGA MARCO KOERT ,  JANSEN BAUKE ,  BEEREN RAYMOND GERARDUS MARIUS ,  KORNELIS TIJMEN HOEKERD ,  JANSEN HANS ,  PETER FRANCISCUS WANTEN ,  JOHANNES WILHELMUS JACOBUS LEO

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70925 ,  B08B3/12 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide lithographic equipment which is easily and effectively cleaned, and to provide a cleaning method to effectively clean the liquid immersion lithographic equipment. SOLUTION: A cleaning tool to clean a surface of a component of the lithographic equipment is disclosed. The cleaning tool includes a sonic transducer, a liquid supply mechanism to supply liquid to a reservoir between the surface to be cleaned and the sonic transducer, and a liquid outlet to discharge the liquid supplied by the liquid supply mechanism. The cleaning tool is constituted so that the liquid may flow into the liquid outlet under operation of gravity when used. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供易于有效清洁的平版印刷设备，并提供清洁方法以有效地清洁液浸光刻设备。 公开了一种用于清洁光刻设备的部件的表面的清洁工具。 清洁工具包括声音换能器，用于将液体供应到待清洁表面与声音换能器之间的储液器的液体供给机构以及用于排出由液体供应机构供应的液体的液体出口。 清洁工具被构造成使得当使用时液体可以在重力作用下流入液体出口。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2006165577A

公开(公告)日：2006-06-22

申请号：JP2005353343

申请日：2005-12-07

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： BASELMANS JOHANNES JACOBUS MAT ,  LAMBERTUS DONDERS SJOERD NICOL ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  MERTENS JEROEN JOHANNES SOPHIA ,  HUBERTUS MULKENS JOHANNES C ,  STREEFKERK BOB

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/7085 ,  G03F7/70341 ,  G03F7/70808

Abstract: PROBLEM TO BE SOLVED: To take countermeasures against the influence of a liquid in an immersion lithographic apparatus. SOLUTION: The lithographic apparatus includes a supporting structure MT for supporting a pattern providing device MA. The pattern providing device provides a pattern to a radiation beam PB in accordance with a desired pattern. The lithographic apparatus further includes a substrate table WT for supporting a substrate; a projection system PL for projecting a pattern-provided beam to a target portion of the substrate W; a measurement system for measuring a parameter of (a) the substrate table, (b) the substrate, (c) an image projected by the projection system and (d) a combination of any of (a)-(c); and a liquid supplying system for supplying a liquid to a space between the substrate and the projection system. The lithographic apparatus is also includes a shield arranged near one part of the measurement system, and shielding the part of the measurement system from the liquid. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：针对浸没式光刻设备中液体的影响采取对策。 解决方案：光刻设备包括用于支撑图案提供装置MA的支撑结构MT。 图案提供装置根据期望的图案向辐射束PB提供图案。 光刻设备还包括用于支撑衬底的衬底台WT; 用于将图案提供的光束投影到基板W的目标部分的投影系统PL; 用于测量（a）衬底台的参数的测量系统，（b）衬底，（c）由投影系统投影的图像和（d）（a） - （c）中任一个的组合; 以及用于将液体供应到基板和投影系统之间的空间的液体供应系统。 光刻设备还包括设置在测量系统的一部分附近的屏蔽，并且将测量系统的一部分与液体隔离。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2005079584A

公开(公告)日：2005-03-24

申请号：JP2004247635

申请日：2004-08-27

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： DIERICHS MARCEL MATHIJS THEODO ,  DONDERS SJOERD NICOLAAS LAMBER ,  JACOBS JOHANNES HENRICUS WILHE ,  JANSEN HANS ,  LOOPSTRA ERIK ROELOF ,  JEROEN JOHANNES SOPHIA MARIA M ,  STAVENGA MARCO KOERT ,  STREEFKERK BOB ,  VERHAGEN MARTINUS CORNELIS MAR ,  SEUNTIENS-GRUDA LEJLA

IPC: B01D61/02 ,  B01D61/24 ,  C02F1/04 ,  C02F1/28 ,  C02F1/32 ,  C02F1/42 ,  C02F1/44 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70866 ,  B01D19/0031 ,  B01D61/025 ,  B01D61/24 ,  C02F1/04 ,  C02F1/20 ,  C02F1/28 ,  C02F1/283 ,  C02F1/32 ,  C02F1/42 ,  C02F1/441 ,  C02F2103/40 ,  G03F7/2041 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus, in which a liquid supply system maintains a liquid in a space between a final element of a projection system and a substrate with a liquid confinement system. SOLUTION: The liquid supply system further comprises a de-mineralizing unit, a distillation unit and a UV radiating source for the purification of an immersion liquid. Chemicals may be added to the immersion liquid for the inhibition of organism growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of organisms is reduced. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种光刻投影装置，其中液体供应系统在具有液体限制系统的投影系统的最终元件和基板之间的空间中保持液体。 解决方案：液体供应系统还包括去矿化单元，蒸馏单元和用于净化浸液的UV辐射源。 可以将化学品加入到用于抑制生物体生长的浸液中，并且液体供应系统的组分可以由对可见光不透明的材料制成，使得生物体的生长减少。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2012147039A

公开(公告)日：2012-08-02

申请号：JP2012109711

申请日：2012-05-11

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： GRAAF ROELOF FREDERICK DE ,  LAMBERTUS DONDERS SJOERD NICOLAAS ,  HOOGENDAM CHRISTIAAN A ,  JANSEN HANS ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  LIEBREGTS PAULUS MARTINUS MARIA ,  JEROEN JOHANNES SOPHIA MARIA MERTENS ,  STREEFKERK BOB ,  VAN DER TOORN JAN-GERARD C ,  RIEPEN MICHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus in which measures are taken to prevent or reduce presence of bubbles in liquid through which radiated projection beam passes.SOLUTION: This provision may be done, for example, by ensuring that a gap between a substrate and a substrate table is filled with immersion liquid or by causing a localized flow toward radial outside direction from an optical axis in the vicinity of an edge of the substrate.

Abstract translation: 要解决的问题：提供一种光刻投影装置，其中采取措施来防止或减少辐射投射光束通过的液体中气泡的存在。 解决方案：这种设置可以通过例如通过确保衬底和衬底台之间的间隙被浸没液体填充或者通过使得从位于其附近的光轴朝向径向外侧方向的局部流动来实现 衬底的边缘。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012069981A

公开(公告)日：2012-04-05

申请号：JP2011250615

申请日：2011-11-16

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JANSEN HANS ,  STAVENGA MARCO KOERT ,  FELSPINE JACOBUS JOHANNES LEONARDUS HENDRICKS ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  KUIPER ANTONY

IPC: H01L21/027

CPC classification number: G03F7/70858 ,  G03F7/2041 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide an immersion liquid containing one or more additives for solving the problem of stain appearance when drying areas wetted by the liquid in immersion exposure.SOLUTION: A device manufacturing method includes adding a component having a vapor pressure greater than 0.1 IcPa to a liquid and exposing a photosensitive substrate to radiation, in which the radiation passes through the aqueous liquid containing the component before reaching the photosensitive substrate. Since the addition of the component increases an ion concentration in the liquid, the immersion liquid is provided containing an ion-forming component, e.g. an acid or a base having a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.

Abstract translation: 要解决的问题：提供一种含有一种或多种添加剂的浸渍液体，用于解决在浸渍曝光中被液体润湿的干燥区域时污点外观的问题。 解决方案：一种器件制造方法包括将具有大于0.1IpaPa的蒸气压的组分添加到液体中，并将​​光敏衬底暴露于辐射，其中辐射在到达感光衬底之前通过含有组分的水性液体。 由于添加该组分会增加液体中的离子浓度，因此提供含有离子形成组分的浸渍液，例如， 具有较高蒸气压的酸或碱。 还提供了使用浸液的光刻工艺和光刻系统。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012044227A

公开(公告)日：2012-03-01

申请号：JP2011260597

申请日：2011-11-29

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JANSEN HANS ,  BASELMANS JOHANNES JACOBUS MATHEUS ,  SCHULT NICHOLAS LAMBERTUS DONDERS ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JEROEN JOHANNES SOPHIA MARIA MERTENS ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  MARCO COELHO STAUFEN ,  STREEFKERK BOB ,  JAN CORNELIS VAN DER HOEVEN ,  CEDRIC DEZILLE GLOVESTOLA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To provide a method and an apparatus for cleaning the inside of a immersion lithographic apparatus.SOLUTION: In particular, cleaning fluid may be introduced into a space between a projection system and a substrate table of a lithographic apparatus by using a liquid supply system of the lithographic apparatus. Additionally or alternatively, a cleaning device may be installed on the substrate table, and an ultrasonic emitter may be provided to produce ultrasonic liquid.

Abstract translation: 要解决的问题：提供一种用于清洁浸没式光刻设备内部的方法和设备。 特别地，清洁流体可以通过使用光刻设备的液体供应系统引入到光刻设备的投影系统和基板台之间的空间中。 附加地或替代地，清洁装置可以安装在基板台上，并且可以提供超声波发射器以产生超声波液体。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2011216904A

公开(公告)日：2011-10-27

申请号：JP2011152771

申请日：2011-07-11

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  BASELMANS JOHANNES JACOBUS MATHEUS ,  BRULS RICHARD JOSEPH ,  DIERICHS MARCLE MATHIJS T M ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  LOOPSTRA ERIK ROELOF ,  JEROEN JOHANNES SOPHIA MARIA MERTENS ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  SENGERS TIMOTHEUS FRANCISCUS ,  RONALD WALTER JIIN SEVERYNS ,  SERGEI SHULEPOV ,  BOOM HERMAN

IPC: H01L21/027 ,  B05D3/12 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  G03F7/70908 ,  G03F7/70958

Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithographic projection apparatus.SOLUTION: The immersion lithographic projection apparatus is disclosed in which an immersion liquid is enclosed between a final element of a projection system and a substrate. The use of both hydrophobic and hydrophilic layers on various elements of the apparatus is disclosed. The use can help to prevent the formation of bubbles in the immersion liquid and to reduce a residue on the elements after being immersed in the immersion liquid.

Abstract translation: 要解决的问题：提供一种浸没式光刻投影装置。公开了浸没式光刻投影装置，其中浸没液被包围在投影系统的最终元件和基板之间。 公开了在设备的各种元件上使用疏水层和亲水层。 该用途可以有助于防止在浸没液中形成气泡并且在浸入浸液中之后减少元件上的残留物。

公开(公告)号：JP2010074159A

公开(公告)日：2010-04-02

申请号：JP2009208753

申请日：2009-09-10

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BRUIJSTENS JEROEN PETER JOHANNES ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  SIEBE LANDHEER ,  MEESTER ARNOUT JOHANNES ,  JANSEN BAUKE ,  THOMAS IVO ADAM JOHANNES ,  MIRANDA MARCIO ALEXANDRE CANO ,  TANASA GHEORGHE

IPC: H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a system that reduces an influence of a droplet on a final optical element, or substantially avoids the formation of such a droplet. SOLUTION: This lithography device includes: a projection system PS; and a liquid confinement structure for at least partially confining an immersion liquid in an immersion space demarcated by the projection system, a liquid confinement structure 12, and also a substrate and/or a substrate table. A wet gas space for confining a wet gas is demarcated among the projection system, the liquid confinement structure, and the immersion liquid in the immersion space. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种降低液滴对最终光学元件的影响的系统，或基本避免形成这样的液滴。 解决方案：该光刻设备包括：投影系统PS; 以及用于至少部分地将浸没液体限制在由投影系统划分的浸没空间中的液体限制结构，液体限制结构12以及基底和/或基底台。 在投影系统，液体限制结构和浸没空间中的浸没液体之间划定用于限制湿气体的湿气空间。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009152555A

公开(公告)日：2009-07-09

申请号：JP2008274272

申请日：2008-10-24

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG ANTHONIUS MARTINUS COR ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HEN ,  BLOM PAUL ,  KRAMER RONALD HARM GUNTHER ,  VAN PUTTEN MICHEL ,  DE GRAAF ARIEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70925 ,  G03F7/70341 ,  G03F7/70733

Abstract: PROBLEM TO BE SOLVED: To provide a cleaning apparatus for cleaning a substrate or component of an immersion lithographic apparatus, and an immersion lithographic apparatus including an apparatus for cleaning one or more surfaces. SOLUTION: The cleaning apparatus 42 may comprise a plasma radical source, a conduit, and a radical confinement system. The plasma radical source may provide a flow of radicals. The conduit may supply radicals from the plasma radical source to a surface to be cleaned. The radical confinement system may direct the radicals to clean a localized portion of the surface. The cleaning apparatus may comprise a rotator and may be configured to clean a substrate edge. The immersion lithographic apparatus may comprise a substrate table for supporting a substrate and a fluid confinement structure for confining immersion fluid between a projection system and the substrate table and/or the substrate. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于清洗浸没式光刻设备的基板或部件的清洁设备，以及包括用于清洁一个或多个表面的设备的浸没式光刻设备。 解决方案：清洁设备42可以包括等离子体激光源，导管和激光束限制系统。 等离子体自由基源可以提供自由基流。 导管可以将来自等离子体源的源自由基提供给待清洁的表面。 自由基限制系统可以引导自由基清洁表面的局部化部分。 清洁装置可以包括旋转器并且可以被配置为清洁基板边缘。 浸没式光刻设备可以包括用于支撑衬底的衬底台和用于将浸没流体限制在投影系统和衬底台和/或衬底之间的流体限制结构。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009117879A

公开(公告)日：2009-05-28

申请号：JP2009048424

申请日：2009-03-02

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VERSPAIJ JACOBUS JOHANNUS LEON ,  JANSEN HANS ,  STAVENGA MARCO KOERT

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70608 ,  G03F7/70808 ,  G03F7/70858

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus and a device manufacturing method. SOLUTION: In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan view substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain the liquid and a surrounding configured not to contain the liquid. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供光刻设备和设备制造方法。 解决方案：在将浸没液体供应到局部空间的浸没式光刻设备中，基本上平行于基板的平面图中的空间基本上为多边形。 在一个实施例中，空间的两个角部具有不大于构造成容纳液体的空间与构造成不含有液体的周边之间的过渡区域的宽度的曲率半径。 版权所有（C）2009，JPO＆INPIT