公开(公告)号：JP2006060223A

公开(公告)日：2006-03-02

申请号：JP2005237216

申请日：2005-08-18

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： KEMPER NICOLAAS R ,  COX HENRIKUS HERMAN MARIE ,  DONDERS SJOERD NICOLAAS L ,  GRAAF ROELOF FREDERICK DE ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  KATE NICOLAAS T ,  MERTENS JEROEN JOHANNES SOPHIA ,  VAN DER MEULEN FRITS ,  HERMAN MARIA TEUNISSEN FRANCIS ,  VAN DER TOORN JAN-GERARD C ,  VERHAGEN MARTINUS CORNELIS MAR ,  BELFROID STEFAN PHILIP CHRISTI ,  SMEULERS JOHANNES PETRUS MARIA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70883 ,  G03F7/70341 ,  G03F7/70858 ,  G03F7/70866 ,  G03F7/7095

Abstract: PROBLEM TO BE SOLVED: To provide a device which causes no vibration nor other disturbances by effectively removing a liquid from neighborhood of a substrate. SOLUTION: A porous member is used for a liquid removing system of an immersion lithography projector to make an inhomogeneous flow uniformly. A pressure difference between both ends of the porous member can be kept to a bubble point or below of the porous member, so that one-phase flow of the liquid is obtained. In place of this, the porous member can be used to reduce nonuniformity in two-phase flows. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：通过从衬底附近有效地除去液体来提供不产生振动或其它干扰的装置。 解决方案：一种多孔构件用于浸没式光刻投影仪的液体去除系统，以使均匀的流动均匀。 多孔构件的两端之间的压差可以保持在多孔构件的起泡点以下，从而获得液体的一相流动。 代替这一点，多孔构件可用于减少两相流中的不均匀性。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2006024939A

公开(公告)日：2006-01-26

申请号：JP2005197421

申请日：2005-07-06

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： STREEFKERK BOB ,  BASELMANS JOHANNES JACOBUS MAT ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  MERTENS JEROEN JOHANNES SOPHIA ,  MULKENS JOHANNES CATHARINUS HU

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70866 ,  G03F9/7026 ,  G03F9/7034

Abstract: PROBLEM TO BE SOLVED: To prevent or reduce occurrence of residual liquid on a substrate and/or a substrate table, after exposure of the substrate in immersion lithography. SOLUTION: A lithography apparatus has a substrate table WT which is configured so as to hold a substrate, a projection system PL which is disposed so as to project radiation beam in which a pattern is imparted on the substrate, liquid-supplying systems IN and OUT which are configured so as to supply liquid to a space between the projection system and the substrate, and a residual liquid detector which is configured so as to detect liquid which remained in the substrate and/or the substrate table, after exposure has been completed. When liquid is detected by the residual liquid detector, residual liquid is ejected from an exit OUT. The lithography apparatus further has a drying station which is configured so as to dry the substrate and/or the substrate table. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：在浸没式光刻中曝光基板之后，为了防止或减少基板和/或基板台上残留液体的产生。 解决方案：光刻设备具有被配置为保持基板的基板台WT，投影系统PL设置成投射在基板上施加图案的辐射束，液体供应系统 IN和OUT，其构造成将液体供应到投影系统和基板之间的空间;以及残留液体检测器，被配置为检测在曝光之后残留在基板和/或基板台中的液体 已经完成 当残留液体检测器检测到液体时，剩余液体从出口OUT排出。 光刻设备还具有干燥台，其干燥基板和/或基板台。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2006013502A

公开(公告)日：2006-01-12

申请号：JP2005181472

申请日：2005-06-22

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： JOERI LOF ,  MULKENS JOHANNES CATHARINUS HU ,  MERTENS JEROEN JOHANNES SOPHIA ,  VAN DER NET ANTONIUS J ,  DER HAM RONALD V ,  LALLEMANT NICOLAS ,  BECKERS MARCEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70933 ,  G03F7/70341 ,  G03F7/70808

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus which reduces disturbances in at least one of a projection system and an illumination system arising from flow induced noise, and a method for manufacturing a device. SOLUTION: A purge hood of a purging system supplies gas to a purge volume including at least a portion of a projection system and/or at least a portion of an illumination system, and is floated over a substrate and/or a substrate table by gas bearings. The gas bearings 12 and 14 also function as coupling devices which stably maintain a small gap 22 from the substrate W through gas flow regulation by a regulator 26. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供减少由流动引起的噪声引起的投影系统和照明系统中的至少一个的干扰的光刻设备以及用于制造设备的方法。 解决方案：清洗系统的净化罩向包括投影系统的至少一部分和/或照明系统的至少一部分的净化容积提供气体，并且浮在基板和/或基板上 气体轴承表。 气体轴承12和14还用作通过调节器26通过气流调节从衬底W稳定地保持小间隙22的耦合装置。（C）2006年，JPO和NCIPI

公开(公告)号：JP2004289128A

公开(公告)日：2004-10-14

申请号：JP2003417261

申请日：2003-11-11

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： ANTONIUS THEODORUS ANNA MARIA ,  DONDERS SJOERD NICOLAAS LAMBER ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  LOF JOERI ,  LOOPSTRA ERIK ROELOF ,  MERTENS JEROEN JOHANNES SOPHIA ,  MULKENS JOHANNES CATHARINUS HU ,  SENGERS TIMOTHEUS FRANCISCUS ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC classification number: G03F7/707 ,  G03F7/70341 ,  G03F7/70833 ,  G03F7/7085 ,  G03F7/70916 ,  G03F9/7088

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus and a device manufacturing method. SOLUTION: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the final element of the projection system and the substrate of the lithographic projection apparatus. A shutter member is provided to take the place of the substrate in containing the liquid in the liquid supply system during substrate exchange. COPYRIGHT: (C)2005,JPO&NCIPI

公开(公告)号：JP2009283987A

公开(公告)日：2009-12-03

申请号：JP2009204590

申请日：2009-09-04

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BASELMANS JOHANNES JACOBUS MAT ,  LAMBERTUS DONDERS SJOERD NICOL ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  MERTENS JEROEN JOHANNES SOPHIA ,  HUBERTUS MULKENS JOHANNES C ,  STREEFKERK BOB

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/7085 ,  G03F7/70341 ,  G03F7/70808

Abstract: PROBLEM TO BE SOLVED: To take countermeasures against a bad influence of a liquid in an immersion lithographic apparatus. SOLUTION: The lithographic apparatus includes a supporting structure MT for supporting a pattern providing device MA. The pattern providing device provides a pattern to a radiation beam PB in accordance with a desired pattern. The lithographic apparatus further includes a substrate table WT for supporting a substrate; a projection system PL for projecting a pattern-provided beam to a target portion of the substrate W; a measurement system for measuring a parameter of (a) the substrate table, or (b) the substrate, or (c) an image projected by the projection system or (d) a combination of any of (a)-(c); and a liquid supplying system for supplying a liquid to a space between the substrate and the projection system. The lithographic apparatus also includes a shield arranged near one part of the measurement system, and shielding the part of the measurement system from the liquid. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：采取对抗浸没式光刻设备中液体的不良影响的对策。 解决方案：光刻设备包括用于支撑图案提供装置MA的支撑结构MT。 图案提供装置根据期望的图案向辐射束PB提供图案。 光刻设备还包括用于支撑衬底的衬底台WT; 用于将图案提供的光束投影到基板W的目标部分的投影系统PL; 用于测量（a）衬底台的参数的测量系统，或（b）衬底，或（c）由投影系统投影的图像，或（d）（a） - （c）中任何一个的组合; 以及用于将液体供应到基板和投影系统之间的空间的液体供应系统。 光刻设备还包括靠近测量系统的一部分附近的屏蔽，并且将测量系统的一部分与液体隔离。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009182359A

公开(公告)日：2009-08-13

申请号：JP2009122207

申请日：2009-05-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： CHRISTIAAN ALEXANDER HOOGENDAM ,  STREEFKERK BOB ,  MULKENS JOHANNES CATHARINUS HU ,  BIJLAART ERIK THEODORUS MARIA ,  KOLESNYCHENKO ALEKSEY YURIEVIC ,  LOOPSTRA ERIK ROELOF ,  MERTENS JEROEN JOHANNES SOPHIA ,  SLAGHEKKE BERNARDUS ANTONIUS ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VAN SANTEN HELMAR

IPC: G03F7/20 ,  H01L21/027 ,  B05C11/00 ,  G03B27/42 ,  G03B27/52 ,  H01L21/00

CPC classification number: G03F7/70866 ,  G03F7/70341 ,  G03F7/70808

Abstract: PROBLEM TO BE SOLVED: To provide a liquid supply system minimizing pressure variation and/or temperature variation of liquid, without causing unnecessary disturbances due to mechanical vibration, in a lithographic projection apparatus. SOLUTION: Liquid is supplied to a reservoir 10 between a final element of a projection system PS and a substrate from an inlet 21. Overflow removes the liquid that is beyond a given height. Overflow is formed above the inlet, and accordingly, the liquid is newly replenished and the pressure in the liquid is kept at a substantially constant level, at all times. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种在光刻投影装置中使液体的压力变化和/或温度变化最小化而不引起机械振动引起的不必要的扰动的液体供给系统。 解决方案：将液体从入口21供应到投影系统PS的最终元件和基底之间的储存器10.溢流除去超过给定高度的液体。 在入口上方形成溢流，因此，液体被新补充，液体中的压力始终保持在基本恒定的水平。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009152625A

公开(公告)日：2009-07-09

申请号：JP2009033893

申请日：2009-02-17

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： MARIA HENNUS PIETER R ,  MERTENS JEROEN JOHANNES SOPHIA ,  CORNELUS HENDRIK SMULDERS PATR ,  SMITS PETER

IPC: H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/70808 ,  G03F7/7085 ,  G03F7/709

Abstract: PROBLEM TO BE SOLVED: To provide a lithography equipment for efficiently sealing liquid between different substrate tables.
SOLUTION: The substrate table includes a cover plate 100 on the upper plane of a substrate table body MB. The cover plate 100 includes a flat continuous upper plane, therefor applicable to a local region type liquid delivery system. The upper plane of the cover plate 100 includes almost the same plane with the upper plane of a substrate W, therefor a sealing protrusion member 200 is disposable to reduce or to prevent a liquid entering into a recess between a support SS and the substrate body MB. The sealing protrusion member 200 connects a bottom inner edge of the cover plate 100 and the upper plane of the substrate support SS.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供用于有效地密封不同基板台之间的液体的光刻设备。 解决方案：衬底台包括在衬底台体MB的上平面上的盖板100。 盖板100包括平坦的连续上平面，因此适用于局部区域型液体输送系统。 盖板100的上平面包括与基板W的上平面几乎相同的平面，因此密封突出构件200是一次性的，以减少或防止液体进入支撑体SS和基板主体MB之间的凹部 。 密封突起构件200连接盖板100的底部内边缘和基板支撑件SS的上平面。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009076951A

公开(公告)日：2009-04-09

申请号：JP2009007038

申请日：2009-01-15

Applicant: Asml Holding Nv ,  Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ. ,  エーエスエムエル ホールディング エヌ.ブイ.

Inventor： KEMPER NICOLAAS R ,  COX HENRIKUS HERMAN MARIE ,  DONDERS SJOERD NICOLAAS L ,  GRAAF ROELOF FREDERICK DE ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  KATE NICOLAAS T ,  MERTENS JEROEN JOHANNES SOPHIA ,  VAN DER MEULEN FRITS ,  HERMAN MARIA TEUNISSEN FRANCIS ,  VAN DER TOORN JAN-GERARD C ,  VERHAGEN MARTINUS CORNELIS MAR ,  BELFROID STEFAN PHILIP CHRISTI ,  SMEULERS JOHANNES PETRUS MARIA ,  VOGEL HERMAN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70883 ,  G03F7/70341 ,  G03F7/70858 ,  G03F7/70866 ,  G03F7/7095

Abstract: PROBLEM TO BE SOLVED: To provide an apparatus which does not cause vibration and other disturbances by effectively removing a liquid from neighborhood of a substrate. SOLUTION: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at the bubble point or below of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种通过从衬底附近有效地除去液体而不引起振动和其它干扰的装置。 解决方案：在浸没式光刻投影设备的液体去除系统中使用多孔构件以平滑不均匀流动。 跨越多孔构件的压差可以保持在多孔构件的起泡点或下方，从而获得单相液体流。 或者，多孔构件可以用于减少两相流中的不均匀性。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008277854A

公开(公告)日：2008-11-13

申请号：JP2008161707

申请日：2008-06-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JANSEN HANS ,  BASELMANS JOHANNES JACOBUS MAT ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  MERTENS JEROEN JOHANNES SOPHIA ,  MULKENS JOHANNES CATHARINUS HU ,  STAVENGA MARCO KOERT ,  STREEFKERK BOB ,  HOEVEN JAN CORNELIS V D ,  GROUWSTRA CEDRIC D

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

CPC classification number: G03F7/70341 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To provide a method and apparatus for cleaning the inside of a liquid immersion lithographic apparatus. SOLUTION: A cleaning fluid is introduced into a space between the projection system and the substrate table of the lithographic apparatus using the liquid supply system of the lithographic apparatus. Additionally or replacing above, a cleaning device is installed on the substrate table, or an ultrasonic emitter is provided for generating an ultrasonic liquid. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种清洗液浸式光刻设备内部的方法和设备。 解决方案：使用光刻设备的液体供应系统将清洁流体引入到光刻设备的投影系统和基板台之间的空间中。 另外或者更换以上，清洁装置安装在基板台上，或者提供超声发射器用于产生超声波液体。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008199069A

公开(公告)日：2008-08-28

申请号：JP2008132385

申请日：2008-05-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： CHRISTIAAN ALEXANDER HOOGENDAM ,  STREEFKERK BOB ,  MULKENS JOHANNES CATHARINUS HU ,  BIJLAART ERIK THEODORUS MARIA ,  KOLESNYCHENKO ALEKSEY YURIEVIC ,  LOOPSTRA ERIK ROELOF ,  MERTENS JEROEN JOHANNES SOPHIA ,  SLAGHEKKE BERNARDUS ANTONIUS ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VAN SANTEN HELMAR

IPC: G03F7/20 ,  H01L21/027 ,  B05C11/00 ,  G03B27/42 ,  G03B27/52 ,  H01L21/00

CPC classification number: G03F7/70866 ,  G03F7/70341 ,  G03F7/70808

Abstract: PROBLEM TO BE SOLVED: To provide a liquid supply system which minimizes pressure variation and/or temperature change of liquid without causing unnecessary disturbance due to mechanical vibration, in a lithographic projection apparatus. SOLUTION: Liquid is supplied from an inlet 21 to a reservoir 10 between a final element of a projection system PS and a substrate. An overflow removes the liquid above a given level. The overflow is constructed above the inlet, whereby the liquid is constantly replenished and the pressure in the liquid remains substantially constant. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种在光刻投影设备中使液体的压力变化和/或温度变化最小化而不引起机械振动引起的不必要的扰动的液体供应系统。 解决方案：液体从入口21供应到投影系统PS的最终元件和基底之间的储存器10。 溢出物将液体移至高于给定水平的位置。 溢流构造在入口的上方，由此不断地补充液体，液体中的压力基本保持不变。 版权所有（C）2008，JPO＆INPIT