公开(公告)号：JP2004343106A

公开(公告)日：2004-12-02

申请号：JP2004135865

申请日：2004-04-30

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： MARIA ZAAL KOEN JACOBUS JOHANN ,  VAN EMPEL TJARKO ADRIAAN RUDOL ,  OTTENS JOOST JEROEN

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/683 ,  H01L21/68

CPC classification number: G03F7/707 ,  G03F7/70783

Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus having a substrate holder whose support pin distribution of is improved. SOLUTION: A substrate holder 2 equipped with a plurality of projections is provided, the ends thereof define a substantially flat support plane in order to support a substantially flat substrate 3, the substrate holder is provided with a means for providing a pressure force that presses the ends of the projections of the substrate, the projections in the edge zone of the substrate holder are configured so as to provide a substantially flat overhang of the substrate against the pressing force of the pressing means, the projections in zones other than the edge zone of the substrate holder are distributed so as to provide a support region 13 substantially similar to each projection of the plurality of projections, and the support region is defined by the Voronoi distribution relating to the projections. The lithography apparatus provides a substrate holder that has reduced the overlay errors and focus errors. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种具有提高支撑销分布的基板保持器的光刻设备。 解决方案：设置有多个突起的基板支架2，其端部限定基本平坦的支撑平面，以支撑基本平坦的基板3，基板支架设有用于提供压力的装置 其压入基板的突出部的端部，基板保持件的边缘区域中的突起被构造成抵抗压制装置的压力提供基板的基本上平坦的突出部， 基板保持器的边缘区域被分布以提供与多个突起的每个突起大致相似的支撑区域13，并且支撑区域由与突起相关的Voronoi分布限定。 光刻设备提供了减少重叠误差和聚焦误差的衬底保持器。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2014060447A

公开(公告)日：2014-04-03

申请号：JP2013257890

申请日：2013-12-13

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： ZAAL KOEN JACOBUS JOHANNES MARIA ,  OTTENS JOOST JEROEN

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70716 ,  G03F7/70341 ,  G03F7/70725 ,  G03F7/70775 ,  G03F7/70783 ,  G03F7/7085 ,  G03F7/70858 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide a system etc. which improve accuracy in positioning a substrate relatively to a projection system etc.SOLUTION: A lithographic apparatus comprises a cover plate formed separately from a substrate table, and means for stabilizing the temperature of the substrate table by controlling the temperature of the cover plate. A lithographic apparatus comprises thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table. A lithographic apparatus comprises means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion.

Abstract translation: 要解决的问题：提供相对于投影系统等提高基板定位精度的系统等。解决方案：光刻设备包括与基板台分开形成的盖板，以及用于稳定基板温度的装置 控制盖板的温度。 光刻设备包括设置在盖板和基板台之间的热绝缘体，使得盖板用作基板台的热屏蔽。 光刻设备包括参考衬底台畸变来确定衬底台变形并改善衬底的位置控制的装置。

公开(公告)号：JP2012124540A

公开(公告)日：2012-06-28

申请号：JP2012071254

申请日：2012-03-27

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： ZAAL KOEN JACOBUS J M ,  OTTENS JOOST JEROEN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70341 ,  G03F7/70725 ,  G03F7/70775 ,  G03F7/70783 ,  G03F7/7085 ,  G03F7/70858 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide a system and the like for improving accuracy for positioning a substrate with respect to a projection system and the like.SOLUTION: A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing temperature of the substrate table by controlling temperature of the cover plate is disclosed. The lithographic apparatus with a thermal insulation material provided between the cover plate and the substrate table so that the cover plate acts as a thermal shielding material for the substrate table is disclosed. The lithographic apparatus comprising means to improve position control of a substrate by measuring a substrate table distortion, and referring to the substrate table distortion is disclosed.

Abstract translation: 要解决的问题：提供一种用于提高相对于投影系统等定位基板的精度的系统等。 公开了一种具有与基板台分隔开的盖板的光刻设备和通过控制盖板的温度来稳定基片台温度的装置。 公开了具有设置在盖板和基板台之间的绝热材料的光刻设备，使得盖板用作用于基板台的热屏蔽材料。 光刻设备包括通过测量衬底台畸变来改善衬底的位置控制以及参照衬底台变形的装置。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012124539A

公开(公告)日：2012-06-28

申请号：JP2012071249

申请日：2012-03-27

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JACOBS JOHANNES HENRICUS WILHELMUS ,  TEN KATE NICOLAAS ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  LOOPSTRA ERIK ROELOF ,  VERHAGEN MARTINUS CORNELIS MARIA ,  BOOM HERMAN ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  BOUCHOMS IGOR PETRUS MARIA ,  KEMPER NICOLAAS R ,  OTTENS JOOST JEROEN ,  KOEK YUECEL ,  VAN ES JOHANNES

IPC: H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/70716 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide a system that efficiently and effectively eliminates such energy loss in a lithographic apparatus as occurs by evaporation of a provided liquid which locally cools associated components leading to deformations and deterioration that may cause defocus and lens aberration in immersion lithography where a space between a projection system and a substrate is filled with an immersion liquid to increase the numerical aperture.SOLUTION: A timetable 34 is prepared which comprises information regarding the time and the position, the speed, the acceleration etc. of the substrate W at which evaporation of a provided liquid 11 is most likely to occur. A liquid evaporation controller 30 heats at least a part of the substrate W by a heater or sends humidified air to prevent local evaporation, according to the timetable 34.

Abstract translation: 要解决的问题：提供一种系统，其有效地和有效地消除光刻设备中的这种能量损失，如通过蒸发局部冷却相关部件的所提供的液体而发生的，导致变形和劣化，这可能导致散焦和透镜像差 浸没光刻，其中投影系统和衬底之间的空间被浸没液体填充以增加数值孔径。 解决方案：制备时间表34，其包括关于最可能发生所提供的液体11的蒸发的基板W的时间和位置，速度，加速度等的信息。 液体蒸发控制器30根据时间表34通过加热器加热至少一部分基板W或者发送加湿空气以防止局部蒸发。版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012114484A

公开(公告)日：2012-06-14

申请号：JP2012066780

申请日：2012-03-23

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JOERI LOF ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  ALEXEI KOLESNE TCHENKO ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARIA ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  RITSEMA ROELOF AEILKO SIEBRAND ,  VAN SCHAIK FRANK ,  SENGERS TIMOTHEUS FRANCISCUS ,  KLAUS SIMON ,  DE SMIT JOANNES THEODOOR ,  ALEXANDER STOLE YALE ,  STREEFKERK BOB ,  ERIK THEODORUS MARIA BIJLAART ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  HELMAR VAN SANTEN ,  VAN DE KERKHOF MARCUS ADRIANUS ,  KROON MARK ,  DEN BOEF ARIE JEFFREY ,  OTTENS JOOST JEROEN ,  JEROEN JOHANNES SOPHIA MARIA MERTENS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

Abstract: PROBLEM TO BE SOLVED: To provide an immersion-type lithography projection device with improved functionality.SOLUTION: An immersion-type lithography projection device comprises: a radiation systems Ex, IL which are provided with a radiation source LA and supply projection beams PB of radiation; a first object table (mask table) MT connected to first positioning means for correctly positioning a mask with respect to a member PL; a second object table (substrate table) WT connected to second positioning means for correctly positioning a substrate with respect to the member PL; and a projection system PL for forming an image of a radiated part of the mask MA on a target part C of a substrate W.

Abstract translation: 要解决的问题：提供具有改进的功能的浸没式光刻投影装置。 解决方案：浸没型光刻投影装置包括：辐射系统Ex，IL，其设置有辐射源LA并且提供放射线的投影束PB; 连接到用于相对于构件PL正确定位掩模的第一定位装置的第一对象表（掩模台）MT; 连接到用于相对于构件PL正确定位衬底的第二定位装置的第二对象台（衬底台）WT; 以及用于在基板W的目标部分C上形成掩模MA的辐射部分的图像的投影系统PL。版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012064984A

公开(公告)日：2012-03-29

申请号：JP2011287797

申请日：2011-12-28

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： COMPEN RENE THEODORUS P ,  OTTENS JOOST JEROEN

IPC: H01L21/027

CPC classification number: G03F7/70925 ,  G03F7/707

Abstract: PROBLEM TO BE SOLVED: To provide a cleaning method of removing a pollutant on site from a lithographic apparatus, a cleaning system, and a lithographic apparatus component.SOLUTION: A lithographic apparatus is disclosed. The lithographic apparatus includes a cleaning system for cleaning a component inside the lithographic apparatus on site. The cleaning system is structured so as to provide a cleaning environment in the vicinity of a predetermined position on the component to be cleaned. The system is also structured so as to provide the cleaning environment, substantially independent of a pollutant type which is present in the predetermined position.

Abstract translation: 要解决的问题：提供从光刻设备，清洁系统和光刻设备部件去除现场污染物的清洁方法。 解决方案：公开了一种光刻设备。 光刻设备包括用于在现场清洁光刻设备内部的部件的清洁系统。 清洁系统构造成在待清洁部件上的预定位置附近提供清洁环境。 该系统还构造成提供清洁环境，基本上与存在于预定位置的污染物类型无关。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012054602A

公开(公告)日：2012-03-15

申请号：JP2011243516

申请日：2011-11-07

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JOERI LOF ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  ALEXEI KOLESNE TCHENKO ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARIA ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  RITSEMA ROELOF AEILKO SIEBRAND ,  VAN SCHAIK FRANK ,  SENGERS TIMOTHEUS FRANCISCUS ,  KLAUS SIMON ,  DE SMIT JOANNES THEODOOR ,  ALEXANDER STOLE YALE ,  STREEFKERK BOB ,  ERIK THEODORUS MARIA BIJLAART ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  HELMAR VAN SANTEN ,  VAN DE KERKHOF MARCUS ADRIANUS ,  KROON MARK ,  DEN BOEF ARIE JEFFREY ,  OTTENS JOOST JEROEN ,  JEROEN JOHANNES SOPHIA MARIA MERTENS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

Abstract: PROBLEM TO BE SOLVED: To provide an immersion-type lithographic projection apparatus with improved functionality.SOLUTION: The immersion-type lithographic projection apparatus comprises: a radiation system Ex which is provided with a radiation source LA and supplies a radiation projection beam PB; an illumination system IL; a first object table (mask table) MT connected to first positioning means for accurately positioning a mask to a member PL; a second object table (substrate table) WT connected to second positioning means for accurately positioning the substrate to the member PL; and a projection system PL for imaging an irradiated part of a mask MA on a target part C of a substrate W. This apparatus also includes at least one sensor that is disposed so as to be illuminated with a radiation projection beam that has passed through an immersion liquid.

Abstract translation: 要解决的问题：提供具有改进的功能的浸没式光刻投影设备。 浸渍式光刻投影装置包括：放射线系统Ex，其设置有辐射源LA并提供辐射投射光束PB; 照明系统IL; 连接到第一定位装置的第一目标表（掩模台）MT，用于将掩模精确地定位到构件PL; 连接到第二定位装置的第二对象台（衬底台）WT，用于将衬底精确地定位到构件PL; 以及投影系统PL，用于对基板W的目标部分C上的掩模MA的照射部分进行成像。该装置还包括至少一个传感器，其布置成被辐射投影光束照射， 浸液 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2010147506A

公开(公告)日：2010-07-01

申请号：JP2010059515

申请日：2010-03-16

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： WIJCKMANS MAURICE ,  CUIJPERS MARTINUS AGNES WILLEM ,  DE JONG FREDERIK EDUARD ,  VAN GOMPEL EDWIN AUGUSTINUS MATHEUS ,  JANSEN ROB ,  KUSTERS GERARDUS ADRIANUS ANTONIUS MARIA ,  CADEE THEODORUS PETRUS MARIA ,  SMEETS MARTIN FRANS PIERRE ,  VAN DER MEULEN FRITS ,  SIMONS WILHELMUS FRANCISCUS JOHANNES ,  ANTONIUS LEENDERS MARTINUS HENDRIKUS ,  OTTENS JOOST JEROEN ,  VAN BAREN MARTIJN

IPC: H01L21/027 ,  G02B21/00 ,  G02B21/26 ,  G02B21/30

CPC classification number: G03F7/70875 ,  F16L55/053 ,  G03F7/70341 ,  G03F7/70783

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus to which countermeasures are applied for suppressing influence of pressure variation of a conditioning fluid on a substrate table. SOLUTION: This lithographic apparatus is disclosed that projects a pattern from a patterning device onto a substrate. The lithographic apparatus includes a substrate table configured to hold a substrate. The substrate table includes a conditioning system configured to hold a conditioning fluid and to condition the substrate table. The conditioning system includes a pressure damper that is in fluid communication with the conditioning system and suppresses a pressure variation in the conditioning system. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻设备，其中应用了对策来抑制调理流体对基片台的压力变化的影响。 解决方案：公开了将图案形成装置的图案投影到基板上的该光刻设备。 光刻设备包括被配置为保持基板的基板台。 衬底台包括配置成保持调理流体并调节衬底台的调节系统。 调节系统包括与调节系统流体连通并抑制调节系统中的压力变化的压力调节器。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2010050454A

公开(公告)日：2010-03-04

申请号：JP2009186941

申请日：2009-08-12

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KEMPER NICOLAAS R ,  KATE NICOLAAS TEN ,  OTTENS JOOST JEROEN ,  BECKERS MARCEL ,  POLIZZI MARCO ,  RIEPEN MICHEL ,  KUIJPER ANTHONIE ,  STEFFENS KOEN ,  BAETEN ADRIANES JOHANNES ,  ANTONEVICI ANCA MIHAELA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70866 ,  B01D19/0021 ,  G03B27/52 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide an apparatus by which two-phase flow can be stabilized and/or at least substantially separated into liquid and gas flows, and desirably substantially minimized. SOLUTION: An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种可以将两相流稳定化和/或至少基本上分离成液态和气体流并且期望地基本上最小化的装置。 解决方案：描述了一种浸没式光刻设备，其中通过使富含液体的液流优先沿着表面流动，将两相流分离成富含液体的富气流。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009283935A

公开(公告)日：2009-12-03

申请号：JP2009118181

申请日：2009-05-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VERMAELEN MARKUS MARTINUS PETR ,  JACOBS JOHANNES HENRICUS WILHE ,  OTTENS JOOST JEROEN

IPC: H01L21/68 ,  B65G49/07 ,  H01L21/027

CPC classification number: G03F7/70691 ,  G03B27/53 ,  G03F1/66 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70733 ,  G03F7/708

Abstract: PROBLEM TO BE SOLVED: To provide a method for preventing or relieving misalignment etc. of a substrate and a patterning device. SOLUTION: A support structure for supporting an exchangeable object in a lithographic exposure apparatus includes a first support structure part and a second support structure part, the first support structure part being arranged to support the object, and the second support structure part being arranged to, at least in part, support the first support structure part. At least one of the first support structure part and the second support structure part has an open-box structure. The first support structure part and the second support structure part are configured to be attached to one another in such a way that the first support structure part and the second support structure together form a closed-box structure. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于防止或减轻基板和图案形成装置的未对准等的方法。 解决方案：用于在光刻曝光设备中支撑可交换物体的支撑结构包括第一支撑结构部分和第二支撑结构部分，第一支撑结构部分被布置成支撑物体，第二支撑结构部分是 布置成至少部分地支撑第一支撑结构部分。 第一支撑结构部分和第二支撑结构部分中的至少一个具有开放式框架结构。 第一支撑结构部分和第二支撑结构部分被构造成彼此附接，使得第一支撑结构部分和第二支撑结构一起形成闭合箱结构。 版权所有（C）2010，JPO＆INPIT