公开(公告)号：JP2010034555A

公开(公告)日：2010-02-12

申请号：JP2009168336

申请日：2009-07-17

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DIREKS DANIEL JOSEPH MARIA ,  LAMBERTUS DONDERS SJOERD NICOLAAS ,  KEMPER NICOLAAS R ,  DANNY MARIA HUBERTUS PHILIPS ,  RIEPEN MICHEL ,  CLEMENS JOHANNES GERARDUS VAN DEN DUNGEN ,  BAETEN ADRIANES JOHANNES ,  FABRIZIO EVANGELISTA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70991

Abstract: PROBLEM TO BE SOLVED: To provide a fluid-handling structure for a lithographic apparatus. SOLUTION: The fluid-handling structure has a plurality of openings, arranged in the form of a straight line, in a plan view. The fluid-handling structure is configured so that the opening is oriented toward an opposed surface, when it is in use; and here, the opposed surface is a substrate and/or a substrate table. The substrate table is configured so as to support the substrate. There is a damper outside the line of the opening. The damper can have a width that changes along the line of the opening. The damper width is defined between the line of the opening and a damper edge part which in opposition thereto. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于光刻设备的流体处理结构。 解决方案：流体处理结构在平面图中具有以直线形式布置的多个开口。 流体处理结构构造成使得当其在使用中时开口朝向相对的表面; 这里，相对表面是基板和/或基板台。 衬底台被配置为支撑衬底。 在开口线外面有阻尼器。 阻尼器可以具有沿开口线改变的宽度。 阻尼器宽度限定在开口的线和与其相对的阻尼器边缘部分之间。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009105443A

公开(公告)日：2009-05-14

申请号：JP2009024156

申请日：2009-02-04

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： CADEE THEODORUS PETRUS MARIA ,  JACOBS JOHANNES HENRICUS WILHE ,  KATE NICOLAAS TEN ,  LOOPSTRA ERIK ROELOF ,  VAN MEER ASCHWIN LODEWIJK HEND ,  MERTENS JEROEN JOHANNES SOPHIA ,  DE MOL CHRISTIANUS GERARDUS MA ,  MUITJENS MARCEL JOHANNUS ELISA ,  VAN DER NET ANTONIUS J ,  OTTENS JOOST JEROEN ,  QUAEDACKERS JOHANNES ANNA ,  REUHMAN-HUISKEN MARIA ELISABET ,  STAVENGA MARCO KOERT ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VERHAGEN MARTINUS CORNELIS MAR ,  VERSPAIJ JACOBUS JOHANNUS LEON ,  DE JONG FREDERIK EDUARD ,  GOORMAN KOEN ,  MENCHTCHIKOV BORIS ,  BOOM HERMAN ,  NIHTIANOV STOYAN ,  MOERMAN RICHARD ,  SMEETS MARTIN FRANS PIERRE ,  SCHOONDERMARK BART LEONARD PET ,  JANSSEN FRANCISCUS JOHANNES JO ,  RIEPEN MICHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70808 ,  G03F7/70341 ,  G03F7/70841 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide a system reducing lithography errors arising from the immersion liquid. SOLUTION: A lithographic apparatus includes: an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern to its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; a liquid supply system configured to at least partly fill a space between a final element of the projection system and the substrate with liquid; a seal member arranged to substantially contain the liquid within the space between the final element of the projection system and the substrate; and elements to control and/or compensate for evaporation of immersion liquid from the substrate. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供减少由浸没液体引起的光刻误差的系统。 光刻设备包括：被配置为调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够将辐射束赋予其横截面图案以形成图案化的辐射束; 构造成保持基板的基板台; 投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 液体供应系统，被配置为至少部分地用液体填充所述投影系统的最终元件和所述基板之间的空间; 密封构件，其布置成基本上将所述液体容纳在所述投影系统的最终元件与所述基板之间的空间内; 以及用于控制和/或补偿来自基底的浸没液体的蒸发的元件。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2007150308A

公开(公告)日：2007-06-14

申请号：JP2006315814

申请日：2006-11-22

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JANSEN HANS ,  CORNELISSEN SEBASTIAAN MARIA J ,  LAMBERTUS DONDERS SJOERD NICOL ,  GRAAF ROELOF FREDERICK DE ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JACOBS HERNES ,  ANTONIUS LEENDERS MARTINUS H ,  MERTENS JEROEN JOHANNES SOPHIA ,  STREEFKERK BOB ,  VAN DER TOORN JAN-GERARD CORNE ,  SMITS PETER ,  JANSSEN FRANCISCUS JOHANNES J ,  RIEPEN MICHEL

IPC: H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/707

Abstract: PROBLEM TO BE SOLVED: To prevent the presence of air bubbles in an immersion liquid to cause an adverse effect on the quality of a pattern image in an immersion lithography.
SOLUTION: In the immersion lithography, the formation of air bubbles in the immersion liquid can be minimized or prevented by reducing the size of a gap or a gap region between an object and a substrate table and/or providing a cover plate covering the gap. The immersion lithography may further comprise an actuator which laterally moves the object in a hole of the support table to reduce a gap between an end of the object and a side of the hole when the object is in contact with a liquid.
COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：为了防止浸没液中的气泡的存在对浸没式光刻中的图案图像的质量产生不利影响。 解决方案：在浸没式光刻中，可以通过减小物体和基板台之间的间隙或间隙区域的尺寸和/或提供盖板覆盖物来减小或防止浸没液体中的气泡的形成 差距。 浸没式光刻可以进一步包括致动器，该致动器在物体与液体接触时使物体在支撑台的孔中横向移动，以减小物体的端部与孔的一侧之间的间隙。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006313910A

公开(公告)日：2006-11-16

申请号：JP2006128497

申请日：2006-05-02

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  DONDERS SJOERD NICOLAAS LAMBER ,  GRAAF ROELOF FREDERICK DE ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  LEENDERS MARTINUS HENDRIKUS AN ,  MERTENS JEROEN JOHANNES SOPHIA ,  RIEPEN MICHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide immersion lithography equipment suitable for preventing or reducing generation of bubbles by preventing bubbles from leaking to a radiation beam passage through one or more gaps in a substrate table, or by extracting bubbles possibly generated in the gap. SOLUTION: The lithography equipment is arranged to project an image of desired pattern onto a substrate W held on a substrate table WT through liquid. A gap 22 exists in the surface of the substrate table between the substrate table and the outer edge of the substrate, or between the substrate table and other component touching the liquid during normal use. The lithography equipment is provided, in the gap, with a bubble holding device arranged to hold a bubble 24 possibly generated in the gap. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：通过防止气泡通过衬底台中的一个或多个间隙而泄漏到辐射束通道中，或通过提取可能在间隙中产生的气泡来提供适于防止或减少气泡产生的浸没式光刻设备 。 解决方案：光刻设备被布置成通过液体将所需图案的图像投影到保持在基板台WT上的基板W上。 在衬底台与衬底的外边缘之间，或在正常使用过程中，在衬底台和其他部件接触液体之间，衬底台表面上存在间隙22。 光刻设备在间隙中设置有气泡保持装置，其被布置成保持可能在间隙中产生的气泡24。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2014027308A

公开(公告)日：2014-02-06

申请号：JP2013228111

申请日：2013-11-01

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： CADEE THEODORUS PETRUS MARIA ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  NICOLAAS TEN KATE ,  LOOPSTRA ERIK ROELOF ,  ASHWIN RODEVICK HENDRICKS JOHANNES VAN MEHL ,  JEROEN JOHANNES SOPHIA MARIA MERTENS ,  CHRISTIANUS GERARDUS MARIA DE MOL ,  MUITJENS MARCEL JOHANNUS ELISABETH HUBERTUS ,  VAN DER NET ANTONIUS J ,  OTTENS JOOST JEROEN ,  QUAEDACKERS JOHANNES ANNA ,  REUHMAN-HUISKEN MARIA ELISABETH ,  MARCO COELHO STAUFEN ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VERHAGEN MARTINUS CORNELIS MARIA ,  VERSPAIJ JACOBUS JOHANNUS LEONARDUS HENDRICUS ,  DE JONG FREDERIK EDUARD ,  GOORMAN KOEN ,  MENCHTCHIKOV BORIS ,  BOOM HERMAN ,  STOYAN NIHTIANOV ,  MOERMAN RICHARD ,  SMEETS MARTIN FRANS PIERRE ,  SCHOONDERMARK BART LEONARD PETER ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  RIEPEN MICHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70808 ,  G03F7/70341 ,  G03F7/70841 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide a system that reduces lithography errors caused by immersion liquid.SOLUTION: A lithographic apparatus comprises: an illumination system configured to adjust a radiation beam; a support body configured to support a pattern forming device capable of imparting a pattern to the radiation beam in a cross section of the radiation beam to form a pattern formed radiation beam; a substrate table configured to hold a substrate; a projection system configured to project the pattern formed radiation beam onto a target portion of the substrate; a liquid supply system configured to fill at least a part of space between a final element of the projection system and the substrate with liquid; a seal member arranged to substantially contain the liquid within the space between the final element of the projection system and the substrate; and elements to control and/or compensate for evaporation of the immersion liquid from the substrate.

Abstract translation: 要解决的问题：提供减少由浸没液体引起的光刻误差的系统。解决方案：光刻设备包括：照明系统，被配置为调节辐射束; 支撑体，被配置为支撑图案形成装置，其能够在所述辐射束的横截面中赋予所述辐射束的图案以形成图案形成的辐射束; 被配置为保持基板的基板台; 投影系统，被配置为将所述图案形成的辐射束投影到所述基板的目标部分上; 液体供应系统，其配置成用液体填充所述投影系统的最终元件和所述基板之间的至少一部分空间; 密封构件，其布置成基本上将所述液体容纳在所述投影系统的最终元件与所述基板之间的空间内; 以及用于控制和/或补偿来自衬底的浸没液体的蒸发的元件。

公开(公告)号：JP2013021332A

公开(公告)日：2013-01-31

申请号：JP2012154531

申请日：2012-07-10

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： ROGIER HENDRIX MAGDALENA CORTIE ,  RIEPEN MICHEL ,  ROPS CORNELIUS MARIA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70483 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus in which the likelihood of bubble inclusion is at least reduced.SOLUTION: A fluid handling structure for a lithographic apparatus comprises at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: meniscus pinning features to resist passage of immersion fluid in a radially outward direction from the space; a plurality of gas supply openings in a linear array; and at least one gas recovery opening placed radially outside of the plurality of gas supply openings in a linear array. The plurality of gas supply openings at least partly surround the meniscus pinning features, and are placed radially outside of the meniscus pinning features.

Abstract translation: 要解决的问题：提供其中气泡夹杂的可能性至少降低的光刻设备。 解决方案：用于光刻设备的流体处理结构包括在从被配置为将浸没流体包含在流体处理结构外部的区域的边界处的边界处：弯月面钉扎特征以阻止浸没流体沿径向向外的方向从 空间; 线性阵列中的多个气体供给开口; 以及至少一个气体回收开口，其以多个气体供给开口径向外侧设置成线性阵列。 多个气体供应开口至少部分地围绕弯液面钉扎特征，并且被放置在半月板钉扎特征的径向外侧。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2011187954A

公开(公告)日：2011-09-22

申请号：JP2011039323

申请日：2011-02-25

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LAFARRE RAYMOND WILHELMUS LOUIS ,  RIEPEN MICHEL ,  CORTIE ROGIER HENDRIKUS MAGDALENA ,  MEIJERS RALPH JOSEPH ,  EVANGELISTA FABRIZIO

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03B27/52

Abstract: PROBLEM TO BE SOLVED: To reduce or remove the risk of focusing defects, and to maintain or increase throughput. SOLUTION: A liquid handling structure for a lithographic apparatus comprises a droplet controller configured to allow a droplet of immersion liquid to be lost from the handling structure and to prevent the droplet from colliding with the meniscus of the confined immersion liquid. The droplet controller may comprise gas knives arranged to overlap to block an incoming droplet. There may be extraction holes lined up with gaps between gas knives to extract liquid that passes through the gap. A droplet is allowed to escape through the gaps. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：减少或消除聚焦缺陷的风险，并维持或提高吞吐量。 解决方案：用于光刻设备的液体处理结构包括液滴控制器，其被配置为允许浸没液滴从处理结构中丢失并防止液滴与限制浸没液体的弯月面碰撞。 液滴控制器可以包括布置成重叠以阻挡进入的液滴的气刀。 在气刀之间可能存在排列有间隙的抽出孔，以提取通过间隙的液体。 允许液滴通过间隙逃逸。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011166151A

公开(公告)日：2011-08-25

申请号：JP2011026775

申请日：2011-02-10

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： RIEPEN MICHEL ,  KEMPER NICOLAAS R

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03B27/52 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To preferably provide a lithographic apparatus that prevents bubble from entering a projection beam when imaging.
SOLUTION: A meniscus fixation device formed of a lower plate 12a of a fluid handling structure of an immersion lithographic projection apparatus has a plurality of openings 50 forming concentric circles, through which liquid and air from the environment are extracted, the plurality of openings 50 have a middle size whose diameter is about 75 to about 150 μm.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：优选地提供一种当成像时防止气泡进入投影束的光刻设备。 解决方案：由浸没式光刻投影装置的流体处理结构的下板12a形成的弯液面固定装置具有形成同心圆的多个开口50，来自环境的液体和空气通过该开口50被提取， 开口50具有直径为约75至约150μm的中等尺寸。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011124573A

公开(公告)日：2011-06-23

申请号：JP2010271352

申请日：2010-12-06

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： ROPS CORNELIUS MARIA ,  KEMPER NICOLAAS R ,  RIEPEN MICHEL

IPC: H01L21/027

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus capable of at least reducing the possibility of mixing of bubbles. SOLUTION: An immersion lithographic apparatus is disclosed. The immersion lithographic apparatus includes a fluid handling system which confines immersion liquid to be within a local space between a final element of a projection system and a substrate and/or a table, and a gas supply device which supplies gas of which solubility in the immersion liquid is higher than 5x10 -3 mol/kg, at a total pressure of 1 atm and 20°C into a region that adjoins the space. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供能够至少降低气泡混合的可能性的光刻设备。 解决方案：公开了一种浸没式光刻设备。 浸没式光刻设备包括将浸没液体限制在投影系统的最终元件与基板和/或台之间的局部空间内的流体处理系统，以及供应在浸没中的溶解度的气体的气体供应装置 液体高于5×10 -3 SPM / kg，在1atm和20℃的总压力下进入与该空间相邻的区域。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010245569A

公开(公告)日：2010-10-28

申请号：JP2010164859

申请日：2010-07-22

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JANSEN HANS ,  CORNELISSEN SEBASTIAAN MARIA J ,  LAMBERTUS DONDERS SJOERD NICOLAAS ,  GRAAF ROELOF FREDERICK DE ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JACOBS HERNES ,  ANTONIUS LEENDERS MARTINUS H ,  MERTENS JEROEN JOHANNES SOPHIA MARIA ,  STREEFKERK BOB ,  VAN DER TOORN JAN-GERARD CORNELIS ,  SMITS PETER ,  JANSSEN FRANCISCUS JOHANNES J ,  RIEPEN MICHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/707

Abstract: PROBLEM TO BE SOLVED: To provide a liquid immersion lithographic apparatus which reduces bubbles in an immersion liquid to prevent an adverse effect on pattern image quality. SOLUTION: The liquid immersion lithographic apparatus is provided to minimize bubbles generated or to prevent bubbles from being generated in the immersion liquid by reducing sizes or volumes of gaps between a target object and a substrate support table, and their upper structures, in the liquid immersion lithographic apparatus, and/or preparing a cover plate covering the gaps. The liquid immersion lithographic apparatus may further include an actuator which laterally moves the target object in a hole of the substrate support table to reduce a gap between a peripheral end of the target object and an inner side of the hole when the target object is in contact with the immersion liquid. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种减少浸没液体中的气泡以防止对图案图像质量的不利影响的液浸光刻设备。 解决方案：提供液浸式光刻设备，以最小化产生的气泡或通过减少目标物体和基底支撑台及其上部结构之间的间隙的尺寸或体积来防止在浸没液体中产生气泡， 液浸光刻设备，和/或制备覆盖间隙的盖板。 液浸式光刻设备还可以包括致动器，该致动器在目标物体接触时使目标物体在基板支撑台的孔中横向移动，以减小目标物体的外周端与孔的内侧之间的间隙 与浸没液体。 版权所有（C）2011，JPO＆INPIT