公开(公告)号：JP2009224806A

公开(公告)日：2009-10-01

申请号：JP2009159623

申请日：2009-07-06

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  ANTONIUS THEODORUS ANNA MARIA ,  JOERI LOF ,  SIMON KLAUS ,  STRAAIJER ALEXANDER

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70258 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70891

Abstract: PROBLEM TO BE SOLVED: To reduce distortion of an image due to temperature gradient of a substrate and an immersion liquid in a liquid immersion projection exposure apparatus.
SOLUTION: In the liquid immersion lithographic apparatus including a temperature control unit for adjusting temperatures of a member in a final stage of the projection exposure apparatus PL, a substrate, and the immersion liquid to a common target temperature T4, the temperature gradient is reduced by adjusting total temperatures of these components. By doing so, matching properties of image formation and total performance are improved. Means to be used includes control of a flow rate and temperature of the immersion liquid by a feedback circuit.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：为了减少由于液浸投影曝光装置中的基板和浸没液体的温度梯度引起的图像的变形。 解决方案：在液浸光刻设备中，包括用于调节投影曝光设备PL的最后阶段中的部件的温度的温度控制单元，衬底和浸入液体到达共同的目标温度T4的温度梯度 通过调节这些组件的总温度来减少。 通过这样做，改善了图像形成和总性能的匹配性质。 待使用的手段包括通过反馈电路控制浸液的流量和温度。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2008311684A

公开(公告)日：2008-12-25

申请号：JP2008239157

申请日：2008-09-18

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LOF JOERI ,  DE SMIT JOANNES THEODOOR ,  RITSEMA ROELOF AEILKO SIEBRAND ,  SIMON KLAUS ,  MODDERMAN THEODORUS MARINUS ,  MULKENS JOHANNES CATHARINUS HU ,  MEIJER HENDRICUS JOHANNES MARI ,  LOOPSTRA ERIK ROELOF

IPC: H01L21/027 ,  G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7003 ,  G03F9/7034 ,  G03F9/7088

Abstract: PROBLEM TO BE SOLVED: To provide a method and apparatus for accurately aligning and/or leveling a substrate in an immersion lithography apparatus.
SOLUTION: A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to a place where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于在浸没式光刻设备中精确对准和/或调平基板的方法和装置。 解决方案：在测量站产生衬底表面的图。 然后将衬底移动到投影透镜和衬底之间的空间被液体填充的位置。 然后使用例如透射图像传感器对衬底进行对准，并且使用先前的映射可以准确地暴露衬底。 因此，映射不会发生在液体环境中。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008160155A

公开(公告)日：2008-07-10

申请号：JP2008073704

申请日：2008-03-21

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  JOHANNES JACOBUS MATHEUS BASEL ,  COX HENRIKUS HERMAN MARIE ,  ANTONIUS THEODORUS ANNA MARIA ,  SJOERD NICOLAAS LAMBERTUS DOND ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JOERI LOF ,  LOOPSTRA ERIK ROELOF ,  JEROEN JOHANNES SOPHIA MARIA M ,  VAN DER MEULEN FRITS ,  MULKENS JOHANNES CATHARINUS HU ,  GERARDUS PETRUS MATTHIJS VAN N ,  SIMON KLAUS ,  SLAGHEKKE BERNARDUS ANTONIUS ,  STRAAIJER ALEXANDER ,  VAN DER TOORN JAN-GERARD CORNE ,  HOUKES MARTIJN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70425 ,  G03F7/70525 ,  G03F7/709

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus for reducing residual liquid left on the surface of a substrate, after exposure by a projection system. SOLUTION: The lithographic apparatus whose localized area of the substrate surface under a projection system PL is immersed in a liquid. By having the height of a liquid supply system 310 above the surface of a substrate W, the height can be varied by using actuators 314. A control system uses feedforward control or feedback control with input of the surface height of the substrate W, to maintain the liquid supply system 310 at a predetermined height above the surface of the substrate W. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于减少残留在基板表面上的残留液体的光刻设备，在通过投影系统曝光之后。 解决方案：将投影系统PL下的基板表面的局部区域浸入液体中的光刻设备。 通过在基板W的表面上方具有液体供应系统310的高度，可以通过使用致动器314来改变高度。控制系统使用前馈控制或反馈控制与基板W的表面高度的输入来维持 液体供应系统310在衬底W的表面上方的预定高度处。版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2008022038A

公开(公告)日：2008-01-31

申请号：JP2007260925

申请日：2007-10-04

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LOF JOERI ,  DE SMIT JOANNES THEODOOR ,  RITSEMA ROELOF AEILKO SIEBRAND ,  SIMON KLAUS ,  MODDERMAN THEODORUS MARINUS ,  MULKENS JOHANNES CATHARINUS HU ,  MEIJER HENDRICUS JOHANNES MARI ,  LOOPSTRA ERIK ROELOF

IPC: H01L21/027 ,  G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7003 ,  G03F9/7034 ,  G03F9/7088

Abstract: PROBLEM TO BE SOLVED: To provide a method and apparatus for accurately aligning and/or leveling a substrate in an immersion lithography apparatus.
SOLUTION: A map of the surface of a substrate is formed at a measurement station. Then the substrate is moved to the place of which space between a projection lens and the substrate is filled with liquid. Subsequently, the substrate is aligned with, for example, a transmission image sensor to expose exactly according to the map formed previously. In this way, the mapping is never carried out under an environment of liquid.
COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于在浸没式光刻设备中精确对准和/或调平基板的方法和装置。 解决方案：在测量站处形成衬底表面的图。 然后将基板移动到投影透镜和基板之间的空间被液体填充的位置。 随后，基板与例如透射图像传感器对准，以根据先前形成的图准确地曝光。 以这种方式，映射从不在液体环境下进行。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2007208279A

公开(公告)日：2007-08-16

申请号：JP2007065471

申请日：2007-03-14

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LOF JOERI ,  BIJLAART ERIK THEODORUS MARIA ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBER ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  KOLESNYCHENKO ALEKSEY ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARI ,  MERTENS JEROEN JOHANNES SOPHIA ,  MULKENS JOHANNES CATHARINUS HU ,  RITSEMA ROELOF AEILKO SIEBRAND ,  SCHAIK FRANK VAN ,  SENGERS TIMOTHEUS FRANCISCUS ,  SIMON KLAUS ,  DE SMIT JOHANNES THEODOOR ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  VAN SANTEN HELMAR

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F7/70866

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus which minimizes a liquid loss from a supply system during the exposure of ends of a substrate, in liquid immersion exposure. SOLUTION: Liquid is limited by a middle plate 210 located between the liquid supply system and the substrate W. Spaces 222, 215 among the middle plate 210, a transmitted image sensor (TIS) 220, and the substrate W are also filled with the liquid 111. This procedure can be performed by two separated space liquid-supply systems via holes 230, 240, or can be performed by the same space liquid-supply system via the holes 230, 240. Therefore, both the space 215 between the substrate W and the middle plate 210, and the space 225 between the transmitted image sensor 220 and the middle plate 210 are filled with the liquid, so that both the substrate W and the transmitted image sensor can be illuminated under the same condition. A part 200 provides one or a plurality of support surfaces with the middle plate 210 which can be held at a predetermined position by a vacuum source. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻投影装置，其在液浸曝光期间在基片的端部曝光期间使供应系统的液体损失最小化。 解决方案：液体受位于液体供应系统和基板W之间的中间板210的限制。中间板210中的空间222,215，透射图像传感器（TIS）220和基板W也被填充 该过程可以通过两个分离的空间供液系统通孔230,240进行，或者可以经由孔230,240由相同的空间液体供应系统执行。因此，两者之间的空间215 基板W和中间板210以及透射图像传感器220和中间板210之间的空间225被填充液体，从而能够在相同条件下照射基板W和透射图像传感器。 部件200提供一个或多个支撑表面，中间板210可由真空源保持在预定位置。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2007182063A

公开(公告)日：2007-07-19

申请号：JP2006296405

申请日：2006-10-31

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： SIMON KLAUS

IPC: B29C59/02 ,  H01L21/027

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus with which microprocessing is conducted without the need for an expensive equipment or material.
SOLUTION: The lithographic apparatus has a first base plate table 31 arranged to hold the base plate, a second base plate table 32 arranged to hold the base plate, an imprint template holder 41 arranged to hold the imprint template 40 and an imprintable medium dispenser 36. The first base plate table is movable between a first position located at the imprintable medium dispenser or its neighborhood and a second position located at the imprint template holder or its neighborhood. The second base plate table is movable between the position of the first base plate table and that of the second base plate table in a way that the first and the second base plate tables exchange their positions.
COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供在不需要昂贵的设备或材料的情况下进行微处理的光刻设备。 解决方案：光刻设备具有布置成保持基板的第一基板台31，布置成保持基板的第二基板台32，设置成保持压印模板40的压印模板保持器41和可压印 介质分配器36.第一基板台可在位于可压印介质分配器或其附近的第一位置和位于压印模板保持器或其附近的第二位置之间移动。 第二基板台可以在第一基板台的位置和第二基板台的位置之间以第一和第二基板台交换其位置的方式移动。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2007013165A

公开(公告)日：2007-01-18

申请号：JP2006178860

申请日：2006-06-29

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN DE MOOSDIJK MICHAEL J E ,  SIMON KLAUS ,  MARIA DE LAAT WILHELMUS J

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68 ,  H01L21/683

CPC classification number: G03F7/707 ,  G03F7/70691

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic device with which various sizes of substrates including nonstandard substrates can be processed without making a major change for the lithographic device which is so designed as to hold and process specific sizes and forms of substrates. SOLUTION: The lithographic device comprises: a substrate table which is so constituted as to hold a first type of first substrate, wherein the first substrate has a polishing surface; and a projection system which is so constituted as to project a radiation beam, provided with a pattern, to a target part of the substrate. The polishing surface supports a second type of second substrate, and the projection system is so constituted as to project the radiation beam, provided with the pattern, to the second substrate. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻设备，其中可以处理包括非标准基板的各种尺寸的基板，而不会对被设计为保持和处理特定尺寸和形式的基板的光刻设备进行主要变化。 光刻设备包括：衬底台，其被构造成保持第一类型的第一衬底，其中第一衬底具有抛光表面; 以及投影系统，其被构造成将具有图案的辐射束投射到基板的目标部分。 抛光表面支撑第二类型的第二基板，并且投影系统被构造成将具有图案的辐射束投射到第二基板。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2004343114A

公开(公告)日：2004-12-02

申请号：JP2004142059

申请日：2004-05-12

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： STREEFKERK BOB ,  BAKKER LEVINUS PIETER ,  JOHANNES JACOBUS MATHEUS BASEL ,  COX HENRIKUS HERMAN MARIE ,  ANTONIUS THEODORUS ANNA MARIA ,  SJOERD NICOLAAS LAMBERTUS DOND ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JOERI LOF ,  LOOPSTRA ERIK ROELOF ,  JEROEN JOHANNES SOPHIA MARIA M ,  VAN DER MEULEN FRITS ,  MULKENS JOHANNES CATHARINUS HU ,  GERARDUS PETRUS MATTHIJS VAN N ,  SIMON KLAUS ,  SLAGHEKKE BERNARDUS ANTONIUS ,  STRAAIJER ALEXANDER ,  VAN DER TOORN JAN-GERARD CORNE ,  HOUKES MARTIJN

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/70425 ,  G03F7/70525 ,  G03F7/709

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus intended to reduce liquid which remains on the surface of a substrate after exposure by a projection system.
SOLUTION: In the lithographic apparatus, a local region on the surface of the substrate under a projection system PL is immersed in a liquid. The height of a liquid feed system 310 above the surface of a substrate W can be varied using an actuator 314. In a control system, the liquid feed system 310 is maintained at a predetermined height above the surface of the substrate W, using feedforward control or feedback control by inputting the height of the surface of the substrate W.
COPYRIGHT: (C)2005,JPO&NCIPI

公开(公告)号：JP2004289126A

公开(公告)日：2004-10-14

申请号：JP2003417259

申请日：2003-11-11

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： LOF JOERI ,  ANTONIUS THEODORUS ANNA MARIA ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  KOLESNYCHENKO ALEKSEY ,  LOOPSTRA ERIK ROELOF ,  MODDERMAN THEODORUS MARINUS ,  MULKENS JOHANNES CATHARINUS HU ,  RITSEMA ROELOF AEILKO SIEBRAND ,  SIMON KLAUS ,  DE SMIT JOHANNES THEODOOR ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  VAN SANTEN HELMAR

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7088

Abstract: PROBLEM TO BE SOLVED: To provide a lithography projector in which a space between a substrate and a projection system is filled with liquid while minimizing the quantity of the liquid required to be accelerated during a stage operation. SOLUTION: In the lithography projector, the space between the final element of the projection system and the substrate table of the lithography projector is surrounded by a sealing member. A gas seal is formed between the sealing member and the plane of the substrate and the liquid is confined in that space. COPYRIGHT: (C)2005,JPO&NCIPI

公开(公告)号：WO2005001461A3

公开(公告)日：2005-04-21

申请号：PCT/EP2004006823

申请日：2004-06-24

Applicant: ASML NETHERLANDS BV ,  UNIV WAGENINGEN ,  ZUILHOF JOHANNES TEUNIS ,  SIMON KLAUS ,  SUDHOLTER ERNST JAN ROBERT ,  SUN QIAO-YU

Inventor： ZUILHOF JOHANNES TEUNIS ,  SIMON KLAUS ,  SUDHOLTER ERNST JAN ROBERT ,  SUN QIAO-YU

IPC: G01N27/414 ,  G01N33/543

CPC classification number: G01N33/5438 ,  G01N27/4145 ,  Y10S977/809

Abstract: A method for patterning a polished silicon surface is disclosed, the method comprising steps leading to an organic monolayer on at least a part of the silicon surface, the monolayer being functionalised in specific desired locations. The method can be used to produce a device comprising one or more FET structures, the gate of the FET being formed by the functionalised organic monolayer. The functionalised monolayer preferably contains oligosaccharides or oligopeptides which are capable of interacting with biological substance, such that the device acts as a bio-sensor.

Abstract translation: 公开了一种用于图案化抛光的硅表面的方法，所述方法包括导致硅表面的至少一部分上的有机单层的步骤，所述单层在特定的所需位置被官能化。 该方法可用于制造包括一个或多个FET结构的器件，FET的栅极由官能化的有机单层形成。 功能化单层优选含有能够与生物物质相互作用的寡糖或寡肽，使得该装置用作生物传感器。