公开(公告)号：JP2006237608A

公开(公告)日：2006-09-07

申请号：JP2006043899

申请日：2006-02-21

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： STAVENGA MARCO KOERT ,  JACOBS JOHANNES HENRICUS WILHE ,  JANSEN HANS ,  VERHAGEN MARTINUS CORNELIS MAR

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/709

Abstract: PROBLEM TO BE SOLVED: To provide various pressure adjusting means for reducing pressure gradient in a liquid supply system of a lithographic apparatus. SOLUTION: The liquid supply system has a liquid confinement structure constituted to at least partially confine a liquid between a projection system of the lithography apparatus and a substrate table. High pressure gradient may cause particulate contamination within the liquid supply system and/or the liquid confinement structure. The pressure gradient, for example, can be reduced by the use of slow switching in one or more valves, a bleed flow around or through one or more valves, diversion of liquid to a drain rather than or in addition to switching a valve off, a pressure regulator or flow restrictor for preventing shock waves, and a buffer volume/damper for compensating pressure fluctuation. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供用于减小光刻设备的液体供应系统中的压力梯度的各种压力调节装置。 解决方案：液体供应系统具有液体限制结构，其构造成至少部分地限制光刻设备的投影系统和基板台之间的液体。 高压梯度可能导致液体供应系统和/或液体限制结构内的颗粒污染。 例如，压力梯度可以通过在一个或多个阀中使用缓慢的切换，或者通过一个或多个阀周围的排出流或通过一个或多个阀的流出而被减少，而不是或者除了切断阀之外， 用于防止冲击波的压力调节器或限流器以及用于补偿压力波动的缓冲容积/阻尼器。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2011029657A

公开(公告)日：2011-02-10

申请号：JP2010220937

申请日：2010-09-30

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JACOBS HERNES ,  GILISSEN NOUD JAN ,  JANSEN HANS ,  KATE NICOLAAS TEN ,  KEMPER NICOLAAS R ,  ANTONIUS LEENDERS MARTINUS HENDRIKUS ,  LOOPSTRA ERIK R ,  HUBERTUS MULKENS JOHANNES C ,  HARMEN KLAAS VAN DER SCHOOT ,  STAVENGA MARCO KOERT ,  STREEFKERK BOB ,  VERHAGEN MARTINUS CORNELIS MARIA ,  STEIJAART PETER PAUL ,  VERMAELEN MARKUS MARTINUS PETRUS ADRIANUS ,  VAN DER HOEVEN JAN CORNELIS

IPC: H01L21/027

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To moderate a defect induced by an immersion liquid in an immersion lithography projection apparatus where a liquid removal system surrounds a liquid supply system for providing liquid to a space between a projection system and a substrate.
SOLUTION: The liquid removal system 100 is moveable relative to the liquid supply system (partially shown as a barrier member 12) and is controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system (partially shown as the barrier member 12) and the liquid removal system 100 may be covered and the atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained so that the vapor pressure of liquid is relatively high.
COPYRIGHT: (C)2011,JPO&INPIT

公开(公告)号：JP2011029656A

公开(公告)日：2011-02-10

申请号：JP2010220936

申请日：2010-09-30

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JACOBS HERNES ,  GILISSEN NOUD JAN ,  JANSEN HANS ,  KATE NICOLAAS TEN ,  KEMPER NICOLAAS R ,  ANTONIUS LEENDERS MARTINUS HENDRIKUS ,  LOOPSTRA ERIK R ,  HUBERTUS MULKENS JOHANNES C ,  HARMEN KLAAS VAN DER SCHOOT ,  STAVENGA MARCO KOERT ,  STREEFKERK BOB ,  VERHAGEN MARTINUS CORNELIS MARIA ,  STEIJAART PETER PAUL ,  VERMAELEN MARKUS MARTINUS PETRUS ADRIANUS ,  VAN DER HOEVEN JAN CORNELIS

IPC: H01L21/027

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To moderate a defect induced by an immersion liquid in an immersion lithography projection apparatus where a liquid removal system surrounds a liquid supply system for providing liquid to a space between a projection system and a substrate. SOLUTION: The liquid removal system 100 is moveable relative to the liquid supply system (partially shown as a barrier member 12) and controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system (partially shown as the barrier member 12) and the liquid removal system 100 may be covered and an atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained so that the vapor pressure of liquid is relatively high. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：为了缓和浸没光刻投影装置中的浸没液体引起的缺陷，其中液体移除系统围绕用于向投影系统和基板之间的空间提供液体的液体供应系统。 解决方案：液体移除系统100可相对于液体供应系统（部分地示为阻挡构件12）移动并被控制为相对于移动的衬底台具有基本上零的速度。 可以覆盖液体供应系统（部分示为阻挡构件12）和液体移除系统100之间的间隙，并且可以保持液体供应系统和衬底台上方的液体移除系统之间的气氛，使得蒸气压 的液体比较高。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2009094510A

公开(公告)日：2009-04-30

申请号：JP2008258797

申请日：2008-10-03

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STAVENGA MARCO KOERT ,  JANSEN HANS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/7085 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To detect damage to a board or a component of an immersion system or to prevent its occurrence, in immersion lithography. SOLUTION: This immersion lithography device including a detector measuring a distance between a board support structure and/or a board and a fluid handling system, and/or detecting an item when the item is present between the fluid handling system and the board and/or the upper surface of the board support structure, is disclosed. The detector uses information of an electric characteristic of a fluid provided by the fluid handling system in order to measure the distance. The detector measures the change of resistance and/or capacitance between an electrode of the fluid handling system and the board and/or an electrode of the board support structure. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：在浸没式光刻中检测对浸没系统的板或部件的损坏或防止其发生。 解决方案：该浸渍光刻设备包括测量板支撑结构和/或板与流体处理系统之间的距离的检测器和/或当物品存在于流体处理系统和板之间时检测物品 和/或板支撑结构的上表面。 检测器使用由流体处理系统提供的流体的电特性的信息，以便测量距离。 检测器测量流体处理系统的电极与板和/或板支撑结构的电极之间的电阻和/或电容的变化。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009055062A

公开(公告)日：2009-03-12

申请号：JP2008279191

申请日：2008-10-30

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DIERICHS MARCEL MATHIJS THEODO ,  DONDERS SJOERD NICOLAAS LAMBER ,  JACOBS JOHANNES HENRICUS WILHE ,  JANSEN HANS ,  LOOPSTRA ERIK ROELOF ,  JEROEN JOHANNES SOPHIA MARIA M ,  STAVENGA MARCO KOERT ,  STREEFKERK BOB ,  VERHAGEN MARTINUS CORNELIS MAR ,  SEUNTIENS-GRUDA LEJLA

IPC: H01L21/027 ,  B01D61/02 ,  B01D61/24 ,  C02F1/04 ,  C02F1/28 ,  C02F1/32 ,  C02F1/42 ,  C02F1/44 ,  G03F7/20

CPC classification number: G03F7/70866 ,  B01D19/0031 ,  B01D61/025 ,  B01D61/24 ,  C02F1/04 ,  C02F1/20 ,  C02F1/28 ,  C02F1/283 ,  C02F1/32 ,  C02F1/42 ,  C02F1/441 ,  C02F2103/40 ,  G03F7/2041 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide lithographic equipment in which a liquid supply system keeps liquid in a space between the final component of the projection system and a substrate by a liquid sealing system. SOLUTION: The liquid supply system 100 is further equipped with a de-mineralizing unit 130, a distillation unit 120, and a UV radiation source 145 to purify an immersion liquid. Chemicals can be added to the immersion liquid to inhibit the growth of living organisms. The components of the liquid supply system 100 can be made of materials non-transparent to visible light to prevent the growth of living organism. COPYRIGHT: (C)2009,JPO&INPIT

公开(公告)号：JP2009055061A

公开(公告)日：2009-03-12

申请号：JP2008279190

申请日：2008-10-30

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DIERICHS MARCEL MATHIJS THEODO ,  DONDERS SJOERD NICOLAAS LAMBER ,  JACOBS JOHANNES HENRICUS WILHE ,  JANSEN HANS ,  LOOPSTRA ERIK ROELOF ,  JEROEN JOHANNES SOPHIA MARIA M ,  STAVENGA MARCO KOERT ,  STREEFKERK BOB ,  VERHAGEN MARTINUS CORNELIS MAR ,  SEUNTIENS-GRUDA LEJLA

IPC: H01L21/027 ,  B01D61/02 ,  B01D61/24 ,  C02F1/04 ,  C02F1/28 ,  C02F1/32 ,  C02F1/42 ,  C02F1/44 ,  G03F7/20

CPC classification number: G03F7/70866 ,  B01D19/0031 ,  B01D61/025 ,  B01D61/24 ,  C02F1/04 ,  C02F1/20 ,  C02F1/28 ,  C02F1/283 ,  C02F1/32 ,  C02F1/42 ,  C02F1/441 ,  C02F2103/40 ,  G03F7/2041 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide lithographic equipment in which a liquid supply system keeps liquid in a space between the final component of the projection system and a substrate by a liquid sealing system. SOLUTION: The liquid supply system 100 is further equipped with a de-mineralizing unit 130, a distillation unit 120, and a UV radiation source 145 to purify an immersion liquid. Chemicals can be added to the immersion liquid to inhibit the growth of living organisms. The components of the liquid supply system 100 can be made of materials non-transparent to visible light to prevent the growth of living organism. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供平版印刷设备，其中液体供应系统通过液体密封系统将液体保持在投影系统的最终部件和基板之间的空间中。 解决方案：液体供应系统100还配备有去矿化单元130，蒸馏单元120和UV辐射源145以净化浸没液体。 可以将化学品加入到浸液中以抑制生物体的生长。 液体供应系统100的部件可以由对可见光不透明的材料制成，以防止生物体的生长。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008300824A

公开(公告)日：2008-12-11

申请号：JP2008120654

申请日：2008-05-02

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG ANTHONIUS MARTINUS COR ,  STAVENGA MARCO KOERT ,  JANSEN BAUKE ,  BEEREN RAYMOND GERARDUS MARIUS ,  KORNELIS TIJMEN HOEKERD ,  JANSEN HANS ,  PETER FRANCISCUS WANTEN ,  JOHANNES WILHELMUS JACOBUS LEO

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/304 ,  H01L21/68

CPC classification number: G03F7/70925 ,  B08B3/12 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus which can be cleaned easily and effectively, and to provide a method of effectively cleaning an immersion lithographic apparatus. SOLUTION: An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of cleaning the immersion lithographic projection apparatus using megasonic waves through a liquid are disclosed. A flow, desirably a radial flow, is induced in the liquid. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供可以容易且有效地清洁的光刻设备，并提供一种有效地清洗浸没式光刻设备的方法。 公开了一种浸没式光刻投影装置，其具有构造成清洁表面的兆声传感器和使用超声波清洗液体的浸没式光刻投影装置的方法。 在液体中诱导流动，期望地是径向流动。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008263221A

公开(公告)日：2008-10-30

申请号：JP2008161719

申请日：2008-06-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JANSEN HANS ,  BASELMANS JOHANNES JACOBUS MAT ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  MERTENS JEROEN JOHANNES SOPHIA ,  MULKENS JOHANNES CATHARINUS HU ,  STAVENGA MARCO KOERT ,  STREEFKERK BOB ,  HOEVEN JAN CORNELIS V D ,  GROUWSTRA CEDRIC D

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To provide a method and an apparatus for cleaning the inside of a liquid immersion lithographic apparatus. SOLUTION: Particularly, cleaning fluid can be supplied to a space between the projection system of a lithographic apparatus and a substrate table by the liquid supply system of the lithographic apparatus. Additionally or as an alternative plan, a cleaning device can be arranged on the substrate table, or an ultrasonic emitter can be arranged in order to produce ultrasonic liquid. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种清洗液浸光刻设备内部的方法和设备。 特别地，清洁液可通过光刻设备的液体供应系统供应到光刻设备的投影系统和基片台之间的空间。 另外或作为替代方案，可以在衬底台上布置清洁装置，或者可以布置超声发射器以产生超声波液体。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2007013140A

公开(公告)日：2007-01-18

申请号：JP2006166261

申请日：2006-06-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LUTTIKHUIS BERNARDUS ANTONIUS ,  BARTRAY PETRUS R ,  BOX WILHELMUS JOSEPHUS ,  STAVENGA MARCO KOERT ,  HARINK THIJS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70916 ,  G03F7/7075 ,  G03F7/70791

Abstract: PROBLEM TO BE SOLVED: To provide a system and a method for reducing risk of contamination caused by the problems that a clean air supplied for keeping an in-device environment clean is not efficiently running through the entire substrate, and that movement of tables, etc. in a tight space acts as a pump to attract the contaminated air, when a lithographic device has a substrate of large size. SOLUTION: A loading table LT and an unloading table UT of a substrate handler for loading/unloading the substrate W from a substrate table WT is provided with a clean gas feed unit FU, which supplies a clean gas G to both of an exposed substrate EW and an unexposed substrate UW. Since the clean gas feed unit FU is movably attached, the clean gas G can be supplied in every steps in processes. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种降低由于为了保持设备内环境清洁而供应的清洁空气不能有效地穿过整个基板的问题而降低污染风险的系统和方法， 当平版印刷装置具有大尺寸的基片时，紧密空间中的桌子等用作吸引污染空气的泵。 解决方案：用于从衬底台WT装载/卸载衬底W的衬底处理器的装载台LT和卸载台UT设置有清洁气体供给单元FU，其将清洁气体G供应到 暴露的基底EW和未曝光的底物UW。 由于清洁气体供给单元FU可移动地附接，因此可以在每个步骤中提供清洁气体G。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006179909A

公开(公告)日：2006-07-06

申请号：JP2005364310

申请日：2005-12-19

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： JANSEN HANS ,  BASELMANS JOHANNES JACOBUS MAT ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  MERTENS JEROEN JOHANNES SOPHIA ,  MULKENS JOHANNES CATHARINUS HU ,  STAVENGA MARCO KOERT ,  STREEFKERK BOB ,  HOEVEN JAN CORNELIS V D ,  GROUWSTRA CEDRIC D

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To provide a method and an apparatus for cleaning the inside of an immersion lithographic apparatus. SOLUTION: In particular, the liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table, and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种用于清洁浸没式光刻设备内部的方法和设备。 特别地，光刻设备的液体供应系统可用于将清洁流体引入到投影系统和光刻设备的基板台之间的空间中。 附加地或替代地，可以在衬底台上设置清洁装置，并且可以设置超声发射器以产生超声波清洗液体。 版权所有（C）2006，JPO＆NCIPI