公开(公告)号：JP2009283970A

公开(公告)日：2009-12-03

申请号：JP2009176829

申请日：2009-07-29

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  BASELMANS JOHANNES JACOBUS MAT ,  BRULS RICHARD JOSEPH ,  DIERICHS MARCLE MATHIJS T M ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  LOOPSTRA ERIK ROELOF ,  JEROEN JOHANNES SOPHIA MARIA M ,  MULKENS JOHANNES CATHARINUS HU ,  SENGERS TIMOTHEUS FRANCISCUS ,  RONALD WALTER JIIN SEVERYNS ,  SERGEI SHULEPOV ,  BOOM HERMAN

IPC: H01L21/027 ,  B05D3/12 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  G03F7/70908 ,  G03F7/70958

Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithographic projection apparatus.
SOLUTION: The immersion lithographic projection apparatus is disclosed in which immersion liquid is provided between the last element of a projection system and a substrate. The use of both hydrophobic and hydrophilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the immersion liquid and to help reduce residue on the elements after being in contact with the immersion liquid.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供浸没式光刻投影装置。 公开了浸没式光刻投影装置，其中浸没液体设置在投影系统的最后一个元件和基板之间。 提供了在设备的各种元件上使用疏水层和亲水层两者以帮助防止在浸液中形成气泡并有助于在与浸液接触之后减少元件上的残留物。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009182359A

公开(公告)日：2009-08-13

申请号：JP2009122207

申请日：2009-05-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： CHRISTIAAN ALEXANDER HOOGENDAM ,  STREEFKERK BOB ,  MULKENS JOHANNES CATHARINUS HU ,  BIJLAART ERIK THEODORUS MARIA ,  KOLESNYCHENKO ALEKSEY YURIEVIC ,  LOOPSTRA ERIK ROELOF ,  MERTENS JEROEN JOHANNES SOPHIA ,  SLAGHEKKE BERNARDUS ANTONIUS ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VAN SANTEN HELMAR

IPC: G03F7/20 ,  H01L21/027 ,  B05C11/00 ,  G03B27/42 ,  G03B27/52 ,  H01L21/00

CPC classification number: G03F7/70866 ,  G03F7/70341 ,  G03F7/70808

Abstract: PROBLEM TO BE SOLVED: To provide a liquid supply system minimizing pressure variation and/or temperature variation of liquid, without causing unnecessary disturbances due to mechanical vibration, in a lithographic projection apparatus. SOLUTION: Liquid is supplied to a reservoir 10 between a final element of a projection system PS and a substrate from an inlet 21. Overflow removes the liquid that is beyond a given height. Overflow is formed above the inlet, and accordingly, the liquid is newly replenished and the pressure in the liquid is kept at a substantially constant level, at all times. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种在光刻投影装置中使液体的压力变化和/或温度变化最小化而不引起机械振动引起的不必要的扰动的液体供给系统。 解决方案：将液体从入口21供应到投影系统PS的最终元件和基底之间的储存器10.溢流除去超过给定高度的液体。 在入口上方形成溢流，因此，液体被新补充，液体中的压力始终保持在基本恒定的水平。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009116322A

公开(公告)日：2009-05-28

申请号：JP2008263556

申请日：2008-10-10

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03B27/52 ,  G03F7/70591

Abstract: PROBLEM TO BE SOLVED: To provide an apparatus and a method used to obtain information indicative of the uniformity of a projection system of a lithographic apparatus. SOLUTION: An electromagnetic radiation beam is directed toward a projection system such that the radiation beam passes from a first end of the projection system to a second end of the projection system. The electromagnetic radiation beam is subsequently directed back toward the projection system such that the electromagnetic radiation beam passes from the second end of the projection system to the first end of the projection system. At least a part of the electromagnetic radiation beam is detected after the electromagnetic radiation beam has passed back through the projection system to obtain information indicative of the uniformity of the projection system. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于获得指示光刻设备的投影系统的均匀性的信息的装置和方法。 解决方案：电磁辐射束被引向投影系统，使得辐射束从投影系统的第一端传播到投影系统的第二端。 电磁辐射束随后被引导回投影系统，使得电磁辐射束从投影系统的第二端延伸到投影系统的第一端。 在电磁辐射束已经通过投影系统返回之​​后，检测到电磁辐射束的至少一部分，以获得指示投影系统的均匀性的信息。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008277854A

公开(公告)日：2008-11-13

申请号：JP2008161707

申请日：2008-06-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JANSEN HANS ,  BASELMANS JOHANNES JACOBUS MAT ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  MERTENS JEROEN JOHANNES SOPHIA ,  MULKENS JOHANNES CATHARINUS HU ,  STAVENGA MARCO KOERT ,  STREEFKERK BOB ,  HOEVEN JAN CORNELIS V D ,  GROUWSTRA CEDRIC D

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

CPC classification number: G03F7/70341 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To provide a method and apparatus for cleaning the inside of a liquid immersion lithographic apparatus. SOLUTION: A cleaning fluid is introduced into a space between the projection system and the substrate table of the lithographic apparatus using the liquid supply system of the lithographic apparatus. Additionally or replacing above, a cleaning device is installed on the substrate table, or an ultrasonic emitter is provided for generating an ultrasonic liquid. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种清洗液浸式光刻设备内部的方法和设备。 解决方案：使用光刻设备的液体供应系统将清洁流体引入到光刻设备的投影系统和基板台之间的空间中。 另外或者更换以上，清洁装置安装在基板台上，或者提供超声发射器用于产生超声波液体。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008199069A

公开(公告)日：2008-08-28

申请号：JP2008132385

申请日：2008-05-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： CHRISTIAAN ALEXANDER HOOGENDAM ,  STREEFKERK BOB ,  MULKENS JOHANNES CATHARINUS HU ,  BIJLAART ERIK THEODORUS MARIA ,  KOLESNYCHENKO ALEKSEY YURIEVIC ,  LOOPSTRA ERIK ROELOF ,  MERTENS JEROEN JOHANNES SOPHIA ,  SLAGHEKKE BERNARDUS ANTONIUS ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VAN SANTEN HELMAR

IPC: G03F7/20 ,  H01L21/027 ,  B05C11/00 ,  G03B27/42 ,  G03B27/52 ,  H01L21/00

CPC classification number: G03F7/70866 ,  G03F7/70341 ,  G03F7/70808

Abstract: PROBLEM TO BE SOLVED: To provide a liquid supply system which minimizes pressure variation and/or temperature change of liquid without causing unnecessary disturbance due to mechanical vibration, in a lithographic projection apparatus. SOLUTION: Liquid is supplied from an inlet 21 to a reservoir 10 between a final element of a projection system PS and a substrate. An overflow removes the liquid above a given level. The overflow is constructed above the inlet, whereby the liquid is constantly replenished and the pressure in the liquid remains substantially constant. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种在光刻投影设备中使液体的压力变化和/或温度变化最小化而不引起机械振动引起的不必要的扰动的液体供应系统。 解决方案：液体从入口21供应到投影系统PS的最终元件和基底之间的储存器10。 溢出物将液体移至高于给定水平的位置。 溢流构造在入口的上方，由此不断地补充液体，液体中的压力基本保持不变。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2008199062A

公开(公告)日：2008-08-28

申请号：JP2008120509

申请日：2008-05-02

Applicant: Asml Netherlands Bv ,  Carl Zeiss Smt Ag ,  エーエスエムエル ネザーランズ ビー.ブイ. ,  カール・ツァイス・エスエムティー・アーゲー

Inventor： STREEFKERK BOB ,  MULKENS JOHANNES CATHARINUS HU ,  BASELMANS JOHANNES JACOBUS MAT ,  GRAEUPNER PAUL ,  ENGELEN ADRIANUS FRANCISCUS PE ,  FINDERS JOSEF MARIA ,  VAN SCHOOT JAN BERNARD PLECHEL

IPC: H01L21/027 ,  G03F7/20 ,  G03F7/207

CPC classification number: G03F7/70341 ,  G03F7/70333

Abstract: PROBLEM TO BE SOLVED: To improve focus latitude and/or to stabilize contrast control in an immersion lithographic apparatus, where the position of a focus changes when accelerating a substrate table during exposure.
SOLUTION: A final element 50 in a projection system that is a parallel plate used for sealing a projection system PL against an immersion liquid 10 in immersion lithography changes an incidence angle of projection beams when the final element inclines to the optical axis of the device. Force generated by the immersion liquid is utilized passively, and the final element is moved, thus changing the focus continuously at all points on the substrate to improve the focus latitude. Some methods, such as a method for inclining the projection beams to the substrate, are disclosed.
COPYRIGHT: (C)2008,JPO&INPIT

公开(公告)号：JP2008098681A

公开(公告)日：2008-04-24

申请号：JP2008001122

申请日：2008-01-08

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DIERICHS MARCEL MATHIJS THEODO ,  MULKENS JOHANNES CATHARINUS HU ,  STREEFKERK BOB

IPC: G03F7/20 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus, a device manufacturing method and a substrate. SOLUTION: A substrate W is provided with a coating 4 of a material which is substantially transparent to a wavelength of a projection beam. The coating may be thicker than the wavelength of the projection beam and have a refractive index of the coating 4 such that the wavelength of the projection beam is shortened as the projection beam passes through the coating. This allows the imaging of smaller features on the substrate. Alternatively, the coating may be used with a liquid supply system and act to keep bubbles away from a radiation sensitive layer of the substrate. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供光刻设备，器件制造方法和衬底。 解决方案：衬底W设置有对投影光束的波长基本透明的材料的涂层4。 涂层可以比投影光束的波长厚，并且具有涂层4的折射率，使得当投影光束通过涂层时，投影光束的波长被缩短。 这允许在衬底上成像较小的特征。 或者，涂层可以与液体供应系统一起使用，并且用于保持气泡远离基底的辐射敏感层。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2007013150A

公开(公告)日：2007-01-18

申请号：JP2006176023

申请日：2006-06-27

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： GRAAF ROELOF FREDERICK DE ,  LAMBERTUS DONDERS SJOERD NICOL ,  HOOGENDAM CHRISTIAAN A ,  JANSEN HANS ,  LEENDERS MARTINUS HENDRIKUS AN ,  LIEBREGTS PAULUS MARTINUS MARI ,  MERTENS JEROEN JOHANNES SOPHIA ,  STREEFKERK BOB ,  VAN DER TOORN JAN-GERARD C ,  RIEPEN MICHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus preventing the existence of bubbles in a liquid through which an emitted projection beam is passed, or taking countermeasures to reduce them.
SOLUTION: This is performed, for example, by ensuring that a gap between a substrate and a substrate table is filled with an immersion liquid, or by inducing a local flow from an optical axis toward a radially outward side in the vicinity of the edge of the substrate.
COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻投影装置，其防止在发射的投射光束通过的液体中存在气泡，或采取对策来减少它们。 解决方案：例如，这通过确保衬底和衬底台之间的间隙被浸没液体填充，或者通过引起局部从光轴朝向径向向外的侧面 衬底的边缘。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006140449A

公开(公告)日：2006-06-01

申请号：JP2005290623

申请日：2005-10-04

Applicant: Asml Holdings Nv ,  Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ ,  エイエスエムエル ホールディング ナムローゼ フエンノートシャップ

Inventor： LIPSON MATTHEW ,  DIERICHS MARCEL MATHIJS T M ,  DONDERS SJOERD NICOLAAS LAMBER ,  MULKENS JOHANNES CATHARINUS H ,  STREEFKERK BOB ,  WILKLOW RONALD ,  DE JONGE ROEL

IPC: H01L21/027 ,  G03F7/038

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus which includes an immersion liquid having a refractive index higher than that of water and has no possibility of agglomeration of contained particles during operation.
SOLUTION: In a projection exposure type lithographic apparatus used as a stepper or a scanner, an aqueous solution of one or more alkali metal halides such as alkali metal fluoride, alkali metal chloride, and alkali metal bromide, is used as an immersion liquid having a refractive index higher than that of water. The refractive index is 1.5 or more.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种光刻设备，其包括折射率高于水的浸液，并且在操作期间不具有所包含的颗粒的聚集的可能性。 解决方案：在用作步进器或扫描仪的投影曝光型光刻设备中，使用一种或多种碱金属卤化物如碱金属氟化物，碱金属氯化物和碱金属溴化物的水溶液作为浸渍 液体的折射率高于水的折射率。 折射率为1.5以上。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2005340815A

公开(公告)日：2005-12-08

申请号：JP2005147548

申请日：2005-05-20

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： STREEFKERK BOB ,  COX HENRIKUS HERMAN MARIE ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  MERTENS JEROEN JOHANNES SOPHIA ,  ZAAL KOEN JACOBUS JOHANNES MAR ,  CUPERUS MINNE

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/70641 ,  G03F7/70783

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus and a method of manufacturing a device configured to introduce an immersion liquid and a liquid supply system associated therewith into the lithographic apparatus so as to solve the problem of causing degradation in the accuracy of focus at the substrate and in the precision with which other parameters critical to imaging are controlled.
SOLUTION: The immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种光刻设备和一种制造器件的方法，该器件被配置为将与其相关联的浸没液体和液体供应系统引入到光刻设备中，以解决导致其精度降低的问题 在基板上的焦点和控制成像关键的其他参数的精度。 浸没式光刻设备包括液体供应系统构件，其配置为在光刻设备的投影系统和基板之间的空间中容纳液体，液体供应系统构件补偿器被布置成补偿液体供应 系统构件和衬底台。 版权所有（C）2006，JPO＆NCIPI