公开(公告)号：EP1524681A2

公开(公告)日：2005-04-20

申请号：EP04077809.4

申请日：2004-10-13

Applicant: FEI Company

Inventor： Gerlach, Robert L. ,  Utlaut, Mark

IPC: H01J37/317

CPC classification number: H01J37/3056 ,  B82Y10/00 ,  H01J37/3007 ,  H01J37/3178 ,  H01J2237/045 ,  H01J2237/31744 ,  H01J2237/31755

Abstract: The present invention provides improved angular aperture schemes for generating shaped beam spots having a desired geometric shape from rectangular, elliptical, and semi-elliptical apertures having one sharp edge. A sharper beam edge can be generated by offsetting the rectangular or elliptical aperture in combination with under or over focus. In the spherical aberration limit, under-focused semi-circle apertures provide a sharp, flat edge. The sharp edge can be made resolute enough for precision milling applications, and at the same time, the spot can be made large enough with enough overall current and current density to efficiently mill away material in either a production or laboratory environment. Depending on the particular beam spot that is desired, combinations of techniques including defocusing, aperture offsetting, and stigmation adjustment, can be used in both spherical aberration dominant and chromatic aberration dominant environments to achieve a desired beam for a desired application.

Abstract translation: 本发明提供了改进的角孔方案，用于从具有一个锋利边缘的矩形，椭圆形和半椭圆形孔产生具有期望几何形状的成形束斑。 可以通过将矩形或椭圆形孔径与焦点下方或焦点相结合来产生更尖锐的光束边缘。 在球面像差极限中，未聚焦的半圆孔提供了尖锐的平坦边缘。 尖锐的边缘可以做出足够坚固的精密铣削应用，同时，现场可以制造得足够大，具有足够的总电流和电流密度，以便在生产或实验室环境中有效地磨碎材料。 根据期望的特定光束点，可以在球面像差优势和色差优势环境中使用包括散焦，孔径偏移和标注调整的技术的组合，以实现期望的应用所需的光束。