VERFAHREN ZUR PASSIVIERUNG DER SPIEGELFL CHEN VON OPTISCHEN HALBLEITERBAUELEMENTEN
    31.
    发明公开
    VERFAHREN ZUR PASSIVIERUNG DER SPIEGELFL CHEN VON OPTISCHEN HALBLEITERBAUELEMENTEN 有权
    光学半导体元件的方法钝化镜面

    公开(公告)号:EP1514335A2

    公开(公告)日:2005-03-16

    申请号:EP03727457.8

    申请日:2003-05-08

    CPC classification number: H01S5/028 H01S5/0281 H01S5/0282

    Abstract: The aim of the invention is to simplify known passivation methods. According to said method, the semi-conductor elements are heated and cleaned in a high vacuum with a gaseous, reactive low-energy medium. A closed, insulating or slightly conductive, transparent protective layer is applied in-situ, said layer being inert in relation to the material on the mirror-type surface and the remaining components of a natural oxide. In a preferred embodiment, the optical semi-conductor element is a GaAs-based semi-conductor laser, the reactive and low-energy medium is an atomic hydrogen and the protective layer is made of ZnSe.

Patent Agency Ranking