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公开(公告)号:SE7711232A
公开(公告)日:1977-10-06
申请号:SE7711232
申请日:1977-10-06
Applicant: HOECHST AG
Inventor: DANY F-J , MAIER K , RIEDEL T , WORTMANN J
IPC: C08K3/00 , C01B25/00 , C08J3/12 , C08J3/20 , C08K3/02 , C08K9/08 , C08L7/00 , C08L21/00 , C08L23/00 , C08L33/00 , C08L33/02 , C08L67/00 , C08L77/00 , C08L101/00 , C09K21/14
CPC classification number: C08K9/08
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公开(公告)号:SE7507661L
公开(公告)日:1976-01-07
申请号:SE7507661
申请日:1975-07-03
Applicant: HOECHST AG
Inventor: VOLLMER H , DANY F-J , WORTMANN J
IPC: C07F9/40 , C08J9/00 , C08K5/5353 , C08L75/04
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公开(公告)号:SE7501924A
公开(公告)日:1975-08-25
申请号:SE7501924
申请日:1975-02-20
Applicant: HOECHST AG
Inventor: DANY F-J , MAIER K , RIEDEL T , WORTMANN J
IPC: C08K3/00 , C01B25/00 , C08J3/12 , C08J3/20 , C08K3/02 , C08K9/08 , C08L7/00 , C08L21/00 , C08L23/00 , C08L33/00 , C08L33/02 , C08L67/00 , C08L77/00 , C08L101/00 , C09K21/14 , C09K3/28
CPC classification number: C08K9/08
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公开(公告)号:DK620274A
公开(公告)日:1975-07-28
申请号:DK620274
申请日:1974-11-29
Applicant: HOECHST AG
Inventor: DANY F-J , WORTMANN J , KANDLER J
Abstract: Production of intumescent flame-retardant coating compositions which substantially contain a film-forming binder, an ammonium polyphosphate, one or more substances carbonizing under the action of heat, dispersing agents and fillers, if desired. The compositions contain more particularly an ammonium polyphosphate of the general formula:
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公开(公告)号:SE7414962L
公开(公告)日:1975-06-02
申请号:SE7414962
申请日:1974-11-28
Applicant: HOECHST AG
Inventor: WORTMANN J , DANY F-J , KANDLER J
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公开(公告)号:SE7414013L
公开(公告)日:1975-05-12
申请号:SE7414013
申请日:1974-11-07
Applicant: HOECHST AG
Inventor: VOLLMER H , DANY F-J , WORTMANN J
Abstract: Production of agents reducing the flammability of polyurethane moulding compositions. The agents are more particularly comprised of compounds of the following general formula (I) (I) IN WHICH R stands for an alkylene radical having from 2 to 6 carbon atoms, which may be halogen-substituted, if desired, a -CH2-CH2-O-CH2-CH2- radical, a phenylene radical or an alkyl- or halogenoalkyl-substituted diphenylene methane radical, R1 and R2, respectively, stand for a hydrogen atom, an alkyl radical or a halogen-substituted alkyl radical having from 1 to 4 carbon atoms, x + y stand for a number between 0.1 and 3, and n stands for 1 or 2.
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公开(公告)号:SE7414012A
公开(公告)日:1975-05-12
申请号:SE7414012
申请日:1974-11-07
Applicant: HOECHST AG
Inventor: VOLLMER H , DANY F-J , WORTMANN J
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