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    ELECTROPLATING CHROMIUM FROM TRIVALENT CHROMIUM CONTAINING BATHS
    32.
    发明专利
    ELECTROPLATING CHROMIUM FROM TRIVALENT CHROMIUM CONTAINING BATHS 未知

    公开(公告)号：AU531640B2

    公开(公告)日：1983-09-01

    申请号：AU5926380

    申请日：1980-06-12

    Applicant: IBM

    Inventor： VIGAR JAMES MICHAEL LINFORD

    IPC: C25D3/06 ,  C25D3/10

    Abstract: A process for plating thick chromium coatings for engineering applications comprises depositing a thin initial layer from a low concentration chromium III/thiocyanate bath and depositing the bulk of the remaining thickness from a relatively higher concentration chromium III/thiocyanate bath. Deposits produced by this two-stage process are more cohesive and smoother than those obtainable by plating the entire thickness from the high concentration bath alone.

    ELECTRODEPOSITION OF CHROMIUM
    33.
    发明专利
    ELECTRODEPOSITION OF CHROMIUM 未知

    公开(公告)号：GB2109817A

    公开(公告)日：1983-06-08

    申请号：GB8134779

    申请日：1981-11-18

    Applicant: IBM

    Inventor： BARCLAY DONALD JOHN ,  VIGAR JAMES MICHAEL LINFORD ,  MORGAN WILLIAM MORRIS

    IPC: C25D3/06 ,  C25D3/10 ,  C25D3/56

    Abstract: A chromium electroplating electrolyte comprising a source of trivalent chromium ions, a complexant, a buffer agent and a sulphur species selected from sulphites and dithionites, the complexant being selected so that the stability constant K1 of the chromium complex as defined herein is in the range 10 M preferably the chromium ions have a molar concentration lower than 0.01M. Complexants within this range include aspartic acid, iminodiacetic acid, nitrilotriacetic acid, 5-sulphosalicylic acid and citric acid.

    34.
    发明专利
    未知

    公开(公告)号：FI63445B

    公开(公告)日：1983-02-28

    申请号：FI802060

    申请日：1980-06-27

    Applicant: IBM

    Inventor： VIGAR JAMES MICHAEL LINFORD

    IPC: C25D3/06

    Abstract: A process for plating thick chromium coatings for engineering applications comprises depositing a thin initial layer from a low concentration chromium III/thiocyanate bath and depositing the bulk of the remaining thickness from a relatively higher concentration chromium III/thiocyanate bath. Deposits produced by this two-stage process are more cohesive and smoother than those obtainable by plating the entire thickness from the high concentration bath alone.

    35.
    发明专利
    未知

    公开(公告)号：DE2930981A1

    公开(公告)日：1980-05-22

    申请号：DE2930981

    申请日：1979-07-31

    Applicant: IBM

    Inventor： BARCLAY DONALD JOHN ,  VIGAR JAMES MICHAEL LINFORD

    IPC: C25D3/06 ,  C25D3/10 ,  C25D5/14

    Abstract: A very low concentration trivalent chromium plating bath in which the source of chromium is an aqueous solution of a chromium (III)- thiocyanate complex (Cr less than 0.03 M) gives a deposit of unexpectedly light colour. Such a bath is employed to produce thin overcoatings of light coloured chromium and may replace the rinse tank of a first chromium (III)- thiocyanate process which is optimized for efficiency and bath stability rather than colour.

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