公开(公告)号：JP2012220751A

公开(公告)日：2012-11-12

申请号：JP2011086944

申请日：2011-04-11

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YONEDA EIJI ,  KURIYAMA KEISUKE

IPC: G02B5/20 ,  G02B5/22 ,  G02F1/1335

Abstract: PROBLEM TO BE SOLVED: To provide a coloring composition for color filters, even when undergoing a high-temperature heating process, developing an excellent chromaticity characteristic of a dye without losing it.SOLUTION: The coloring composition includes (A) a colorant and (B) a crosslinking agent and, as (A) the colorant, includes a dye covered with an organic polymer. A microcapsule including the dye, particles formed by covering the surface of dye with resin that is carried by a porous particle, and the like are quoted as the colorant covered with the organic polymer.

Abstract translation: 要解决的问题：即使在进行高温加热处理的情况下，为了提供彩色滤光片的着色组合物，也不会损失色素的显色性。 ＆lt; P＆gt;解决方案：着色组合物包括（A）着色剂和（B）交联剂，并且作为（A）着色剂，包括用有机聚合物覆盖的染料。 引用了包含染料的微胶囊，通过用多孔颗粒承载的树脂覆盖染料表面形成的颗粒等作为被有机聚合物覆盖的着色剂。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2011253110A

公开(公告)日：2011-12-15

申请号：JP2010127939

申请日：2010-06-03

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YONEDA EIJI ,  NISHI NOBUHIRO ,  KODAMA SEIICHIRO ,  INOMATA KATSUMI

IPC: G03F7/004 ,  C08F2/44 ,  C08F2/50 ,  G03F7/031 ,  G03F7/033

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition with which storage stability and low-temperature firing can be achieved and which has adequate radiation sensitivity, and a hardening film excellent in terms of heat resistance, chemical resistance, permeability, flatness, voltage retention, linear thermal expansion resistance etc. which are required for the hardening film, a hardening film formation method and a display element.SOLUTION: A radiation-sensitive resin composition has [A] a polymer having epoxy groups, [B] a polymerizable compound having ethylenically unsaturated bonds, [C] a radiation-sensitive polymerization initiator and [D] at least one of a compound selected from compounds expressed by following formula (1) to (3).

Abstract translation: 要解决的问题：提供一种能够实现储存稳定性和低温烧制并且具有足够的辐射灵敏度的辐射敏感性树脂组合物，以及耐热性，耐化学性，渗透性优异的硬化膜 ，硬化膜所需的平坦度，电压保持率，线性热膨胀性等，硬化膜形成方法和显示元件。 解决方案：辐射敏感性树脂组合物具有[A]具有环氧基的聚合物，[B]具有烯键式不饱和键的可聚合化合物，[C]辐射敏感聚合引发剂和[D]至少一种 选自由下式（1）至（3）表示的化合物的化合物。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2008189668A

公开(公告)日：2008-08-21

申请号：JP2008013412

申请日：2008-01-24

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： EHATA SATOSHI ,  YONEDA EIJI ,  NAGAI TOMOKI ,  TONERI TATSUYA ,  O ISAMU

IPC: C07C309/24 ,  C07C20060101 ,  C07C309/81 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide sulfonic acid to be generated from a thermosensitive acid-generating agent and its raw material compound. SOLUTION: The raw material compound is represented by general formula (I-a), which is a radiation-sensitive resin composition of positive type and negative type containing the acid-generating agent. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 待解决的问题：提供由热敏酸产生剂及其原料化合物产生的磺酸。 解决方案：原料化合物由通式（I-a）表示，其为含有酸产生剂的正型和负型的辐射敏感性树脂组合物。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2008001906A

公开(公告)日：2008-01-10

申请号：JP2007185083

申请日：2007-07-13

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： EHATA SATOSHI ,  YONEDA EIJI ,  NAGAI TOMOKI ,  TONERI TATSUYA ,  O ISAMU

IPC: C09K3/00 ,  C07C309/19 ,  C07C309/23 ,  C07C309/80 ,  C07C309/81 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a new radiation-sensitive acid generator which exhibits comparatively high combustibility and no bioaccumulation, and produces an acid exhibiting high acidity, high boiling point, moderately short diffusion length in the resist coating, and low dependency to mask pattern density, to provide a sulfonic acid (derivative) related to the acid generator, and to provide a radiation-sensitive resin composition containing the acid generator.
SOLUTION: This radiation-sensitive acid generator comprises a compound having a structure of the following formula (I), wherein R is a monovalent organic group having a fluorine content of 50 wt.% or less, wherein an optionally substituted linear or branched monovalent hydrocarbon group, or the optionally substituted monovalent hydrocarbon group represents a group bound to -CO-, -COO-, -S-, -SO-, -SO
2 -, or the like; Z
1 and Z
2 represent each a fluorine atom or a perfluoroalkyl group. The radiation-sensitive resin composition comprises the acid generator and further an acid-dissociable group-containing resin in a positive type or an alkali-soluble resin and a cross-linking agent in a negative type.
COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种新的辐射敏感性酸产生器，其具有较高的可燃性和无生物累积性，并且产生在抗蚀剂涂层中具有高酸度，高沸点，适度短扩散长度的酸和低依赖性 以掩模图案密度，以提供与酸产生剂相关的磺酸（衍生物），并提供含有酸产生剂的辐射敏感性树脂组合物。 解决方案：该辐射敏感性酸产生剂包括具有下式（I）结构的化合物，其中R是氟含量为50重量％以下的一价有机基团，其中任选取代的直链或 支链一价烃基或任选取代的一价烃基表示与-CO - ， - COO - ， - S - ， - SO - ， - SO 2 - 等结合的基团。 Z 1 和Z 2 各自表示氟原子或全氟烷基。 辐射敏感性树脂组合物包含酸产生剂，另外含有阳离子型或碱溶性树脂的酸解离性基团的树脂和负型的交联剂。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2007230913A

公开(公告)日：2007-09-13

申请号：JP2006055222

申请日：2006-03-01

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YONEDA EIJI ,  EHATA TAKUMA ,  NAGAI TOMOKI

IPC: C07C381/12 ,  G03F7/004

Abstract: PROBLEM TO BE SOLVED: To provide a resist material obtaining high resolving power corresponding to high definition of a resist pattern in recent years. SOLUTION: This compound is represented by general formula (1) (wherein A is a sulfur atom or an iodine atom; Ar is an aromatic hydrocarbon group or a heterocyclic hydrocarbon group; B is a divalent functional group; R 1 and R 2 are each a hydrogen atom, an alkyl group, an alicyclic group, an aromatic hydrocarbon group or a heterocyclic hydrocarbon group; R 3 is an alkyl group, an alicyclic group, an aromatic hydrocarbon group or a heterocyclic hydrocarbon group; Y - is a counterion of A + ; Z is an oxygen atom or a sulfur atom). COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：为了提供近年来获得与抗蚀剂图案的高清晰度相对应的高分辨能力的抗蚀剂材料。 解决方案：该化合物由通式（1）表示（其中A是硫原子或碘原子; Ar是芳族烃基或杂环烃基; B是二价官能团; R 1 和R 2 各自为氢原子，烷基，脂环族基，芳族烃基或杂环烃基; R 3为 烷基，脂环族基团，芳香族烃基或杂环烃基; Y是SP的平衡离子，Z是氧原子或硫原子） 。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2007101763A

公开(公告)日：2007-04-19

申请号：JP2005289472

申请日：2005-10-03

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YONEDA EIJI ,  HAMADA KENICHI ,  SHIHO KOUJI

IPC: G03F7/023 ,  C08F220/26 ,  G03F7/004 ,  G03F7/40 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having no safety problem, superior in sensitivity, resolution and storage stability as a solution, and having such a proper development margin that a proper pattern profile can be formed, even after the lapse of the optimum developing time in a developing step, and to provide an interlayer insulation film and microlenses formed from the composition. SOLUTION: The radiation-sensitive resin composition contains [A] a copolymer of (a1) at least one selected from among unsaturated carboxylic acid and unsaturated carboxylic acid anhydride and (a2) a specific oxetane group-containing unsaturated compound, [B] a 1,2-quinonediazido compound and [C] a thermosensitive acid generating compound. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：为了提供不具有安全性问题的辐射敏感性树脂组合物，作为溶液的灵敏度，分辨率和储存稳定性优异，并且具有能够形成适当图案轮廓的适当的显影余量，甚至 在显影步骤中经过最佳显影时间之后，并提供由该组合物形成的层间绝缘膜和微透镜。 解决方案：辐射敏感性树脂组合物含有[a]（a1）至少一种选自不饱和羧酸和不饱和羧酸酐的共聚物和（a2）特定的含氧杂环丁烷基的不饱和化合物[B ] 1,2-醌二叠氮化合物和[C]热敏酸产生化合物。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2007101759A

公开(公告)日：2007-04-19

申请号：JP2005289468

申请日：2005-10-03

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YONEDA EIJI ,  HAMADA KENICHI ,  SHIHO KOUJI

IPC: G03F7/023 ,  C08F220/02 ,  G02B1/04 ,  G02B3/00 ,  G03F7/40 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having no safety problem, superior in sensitivity, resolution and storage stability as a solution, and having such a proper development margin that a good pattern profile can be formed even after the lapse of the optimum developing time in a developing step, and a method for forming an interlayer insulation film having superior solvent resistance, heat resistance, light transmittance and adhesion, and microlenses having superior solvent resistance, heat resistance, light transmittance and adhesion, and also having a proper melt shape, using the composition. SOLUTION: The radiation-sensitive resin composition contains [A] a copolymer of (a1) at least one selected from among unsaturated carboxylic acid and unsaturated carboxylic acid anhydride, (a2) a specific oxetane group-containing unsaturated compound and (a3) a specific aromatic ring-containing unsaturated compound, and [B] a 1,2-quinonediazido compound. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 解决问题的方案：为了提供不具有安全性问题的辐射敏感性树脂组合物，作为溶液的灵敏度，分辨率和储存稳定性优异，并且具有适当的显影余量，即使在即使在 在显影步骤中经过最佳显影时间，以及形成具有优异的耐溶剂性，耐热性，透光性和粘附性的层间绝缘膜和具有优异的耐溶剂性，耐热性，透光性和粘附性的微透镜的方法，以及 也使用组合物具有适当的熔体形状。 解决方案：辐射敏感性树脂组合物含有[a]（a1）至少一种选自不饱和羧酸和不饱和羧酸酐中的至少一种的共聚物，（a2）特定的含氧杂环丁烷基的不饱和化合物和（a3 ）特定的含芳环的不饱和化合物，[B] 1,2-醌二叠氮化合物。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006290798A

公开(公告)日：2006-10-26

申请号：JP2005113734

申请日：2005-04-11

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YONEDA EIJI

IPC: C07C381/12 ,  G03F7/004

Abstract: PROBLEM TO BE SOLVED: To provide a resist material giving high resolution responding to the recent tendency of demanding increased fineness of resist pattern. SOLUTION: The onium salt is expressed by general formula (1) (A is sulfur atom or iodine atom; Ar 1 is an aromatic hydrocarbon group or a heterocyclic hydrocarbon group; Ar 2 is an aromatic hydrocarbon group or a heterocyclic hydrocarbon group; R 1 and R 2 are each a hydrogen atom, an alkyl group, an alicyclic group, an aromatic hydrocarbon group or a heterocyclic hydrocarbon group; Y - is a non-nucleophilic counter ion; and Z 1 and Z 2 are each oxygen atom or sulfur atom; when A is sulfur atom, then m is an integer of 1-3, n is an integer of 0-2 (m+n=3) and x is an integer of ≥1, and when A is iodine atom, then m is 1 or 2, n is 0 or 1 (m+n=2) and x is an integer of ≥1; R 1 and R 2 may be bonded through a single bond, a bivalent functional group or a bivalent atom to form a ring structure composed of ≥5 atoms). COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供响应于最近要求提高抗蚀剂图案的细度的趋势而提供高分辨率的抗蚀剂材料。 解决方案：鎓盐由通式（1）表示（A是硫原子或碘原子; Ar 1是芳族烃基或杂环烃基; Ar - 是非亲核反离子; Z 1 和Z 2 分别是氧原子或 硫原子;当A为硫原子时，m为1-3的整数，n为0-2（m + n = 3）的整数，x为≥1的整数，当A为碘原子时， 那么m是1或2，n是0或1（m + n = 2），x是≥1的整数; R 1 和R 2 通过单键，二价官能团或二价原子形成由≥5个原子构成的环结构）。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006126350A

公开(公告)日：2006-05-18

申请号：JP2004312637

申请日：2004-10-27

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YONEDA EIJI ,  KAWAKAMI MINEKI ,  HARA HIROMICHI

IPC: G03F7/039 ,  C08F20/18 ,  C08F20/28 ,  G03F7/033 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having excellent basic physical properties as a resist and low line edge roughness. SOLUTION: The radiation-sensitive resin composition contains (A) a resin which has a group expressed by formula (1) at an end of the molecular chain and which is hardly soluble or insoluble with alkali and changed into alkali-soluble by an effect of an acid, and (B) a radiation-sensitive acid generator. In the formula (1), X represents a divalent group expressed by S-R 1 , wherein R 1 is a 1-20C divalent hydrocarbon group which may have a substituent. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供具有优异的基础物理性能的抗辐射敏感性树脂组合物和低边缘粗糙度。 解决方案：辐射敏感性树脂组合物含有（A）在分子链末端具有由式（1）表示的基团并且几乎不溶于碱或不溶于碱的树脂，并由碱变为碱溶性的树脂 酸的作用，和（B）辐射敏感的酸产生剂。 在式（1）中，X表示由S-R 1表示的二价基团，其中R 1是可以具有取代基的1-20C二价烃基。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2006045136A

公开(公告)日：2006-02-16

申请号：JP2004229758

申请日：2004-08-05

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YONEDA EIJI ,  O ISAMU

IPC: C07D231/14 ,  C08F2/38 ,  C08F220/16 ,  C08F220/28 ,  G03F7/033 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition capable of being suitably used as a chemical amplification-type resist useful for fine processing, to provide an acid-dissociating group-containing polymer, and to provide a pyrazole derivative capable of being suitably used as a chain transfer agent for producing the copolymer. SOLUTION: This pyrazole derivative is expressed by formula (1) (R, R 2 and R 3 are each an alkyl, an alicyclic, an alkenyl, an aryl or an heteroaryl, wherein R 2 and R 3 may combine with each other to form one or more rings; R 1 is H, a substituted or unsubstituted alkyl or a substituted or unsubstituted alicyclic; and n is an integer of 0 to 3). The acid-dissociating group-containing polymer is obtained by polymerization for which the derivative is used as the chain transfer agent. The radiation-sensitive resin composition contains the derivative. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 待解决的问题：提供能够适合用作用于精细加工的化学放大型抗蚀剂的辐射敏感性树脂组合物，以提供含酸解离基的聚合物，并提供吡唑衍生物 能够适合用作生产共聚物的链转移剂。 解决方案：该吡唑衍生物由式（1）表示（R，R SP 2，R 3和R 3各自为烷基，脂环族，烯基，芳基 或杂芳基，其中R 2和R 3彼此可以相互结合形成一个或多个环; R 1是H，被取代的 或未取代的烷基或取代或未取代的脂环族; n为0〜3的整数。 含有酸解离基团的聚合物是通过使用该衍生物作为链转移剂的聚合获得的。 辐射敏感性树脂组合物含有衍生物。 版权所有（C）2006，JPO＆NCIPI