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公开(公告)号：US20090097142A1
公开(公告)日：2009-04-16
申请号：US12338049
申请日：2008-12-18
Applicant: Andreas Seifert , Markus Weiss , Andreas Heisler , Stefan Dornheim
Inventor： Andreas Seifert , Markus Weiss , Andreas Heisler , Stefan Dornheim
CPC classification number: B82Y10/00 , G02B7/1824 , G03F7/70166 , G03F7/702 , G03F7/70825
Abstract: A faceted mirror apparatus includes a support plate having a plurality of stepped reception bores into which are fitted the base portions of respective ones of a plurality of mirror facets having mirrored surfaces. An outer surface of each of the facets bears on an inner wall to provide a stable alignment of the optical axes of the mirrored surfaces such that the apparatus generates a beam of rays from impinging rays.
Abstract translation: 分面镜装置包括具有多个阶梯式接收孔的支撑板，其中装配有具有镜面的多个镜面中相应的一个的基部。 每个小面的外表面承载在内壁上以提供镜面的光轴的稳定对准，使得该装置从入射光线产生射线。
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公开(公告)号：US20070146660A1
公开(公告)日：2007-06-28
申请号：US11319193
申请日：2005-12-28
Applicant: Marc Lorenz Van Der Velden , Vadim Banine , Bastiaan Mertens , Johannes Josephina Moors , Markus Weiss , Bastiaan Wolschrijn , Michiel Nijkerk
Inventor： Marc Lorenz Van Der Velden , Vadim Banine , Bastiaan Mertens , Johannes Josephina Moors , Markus Weiss , Bastiaan Wolschrijn , Michiel Nijkerk
IPC: G03B27/52
CPC classification number: G03F7/70933 , G03F7/70916 , G03F7/7095
Abstract: The invention relates to a lithographic apparatus that includes a system configured to condition a radiation beam or project a patterned radiation beam onto a target portion of a substrate. The system includes an optically active device configured to direct the radiation beam or the patterned radiation beam, respectively, and a support structure configured to support the optically active device. The apparatus further includes a gas supply for providing a background gas into the system. The radiation beam or patterned radiation beam react with the background gas to form a plasma that includes a plurality of ions. The support structure includes an element that includes a material that has a low sputtering yield, a high sputter threshold energy, or a high ion implantation yield, to reduce sputtering and the creation of sputtering products.
Abstract translation: 本发明涉及一种光刻设备，其包括被配置为调节辐射束或将图案化的辐射束投影到基板的目标部分上的系统。 该系统包括被配置为分别引导辐射束或图案化辐射束的光学有源器件，以及被配置为支持光学有源器件的支撑结构。 该装置还包括用于将背景气体提供到系统中的气体供应。 辐射束或图案化的辐射束与背景气体反应以形成包括多个离子的等离子体。 支撑结构包括包括具有低溅射产率，高溅射阈值能量或高离子注入产量的材料的元件，以减少溅射和溅射产物的产生。
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公开(公告)号：US20070113857A1
公开(公告)日：2007-05-24
申请号：US11287163
申请日：2005-11-23
Applicant: Markus Weiss , William Denman
Inventor： Markus Weiss , William Denman
CPC classification number: A61M16/044 , A61M16/0434 , A61M16/0443 , A61M16/0452 , A61M16/0841 , A61M16/0858 , A61M2016/0413
Abstract: A medical ventilation device comprising a cannula having proximal and distal ends; an inflatable cuff adapted to be inflated to an inspiratory pressure, the cuff attached to and surrounding a portion of the cannula toward the distal end thereof; an inspiratory pressure inflation tube having first and second ends, the first end in communication with an interior of the inflatable cuff, the second end adapted to communicate with an inspiratory pressure source; and a pressure valve in communication with the inspiratory pressure inflation tube.
Abstract translation: 一种医用通气装置，包括具有近端和远端的插管; 适于充气到吸气压力的可充气套筒，所述袖带附着到所述套管的一部分并围绕其远端延伸; 吸气压力充气管具有第一和第二端，所述第一端与所述可充气袖带的内部连通，所述第二端适于与吸气压力源连通; 以及与吸气压力充气管连通的压力阀。
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公开(公告)号：US20070054497A1
公开(公告)日：2007-03-08
申请号：US10555562
申请日：2004-05-06
Applicant: Markus Weiss , Marco Wedowski , Bas Mertens , Bas Wolschrijn , Bart Van Mierlo , Norbert Koster , Jan Van Elp , Anton Duiserwinkel , Annemieke Van De Runstraat
Inventor： Markus Weiss , Marco Wedowski , Bas Mertens , Bas Wolschrijn , Bart Van Mierlo , Norbert Koster , Jan Van Elp , Anton Duiserwinkel , Annemieke Van De Runstraat
CPC classification number: G03F7/70983 , G03F7/70916 , G21K1/06
Abstract: The invention relates to a method for preventing contamination of the surfaces of reflective optical elements for the soft X-ray and EUV wavelength range during their irradiation at operating wavelength in an evacuated closed system having a residual gas atmosphere, said elements comprising a cover layer consisting of at least one transition metal. According to said method a residual gas atmosphere is adjusted. The aim of the invention is to prevent a degradation of the surfaces by deposition of carbon and by surface oxidation. For this purpose, both a reducing gas or gas mixture and a gas or gas mixture containing oxygen atoms are introduced. In conjunction with the cover layer of the reflective optical element that consists of a transition metal a degradation of the surface is effectively prevented
Abstract translation: 本发明涉及一种防止在具有残留气体气氛的抽空封闭系统中在其工作波长下照射时用于软X射线和EUV波长范围的反射光学元件表面的污染的方法，所述元件包括覆盖层， 的至少一种过渡金属。 根据所述方法，调节残留气体气氛。 本发明的目的是通过沉积碳和表面氧化来防止表面的降解。 为此，引入还原气体或气体混合物以及含有氧原子的气体或气体混合物。 结合由过渡金属组成的反射光学元件的覆盖层，有效地防止了表面的劣化
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公开(公告)号：US07091505B2
公开(公告)日：2006-08-15
申请号：US10775037
申请日：2004-02-09
Applicant: Wolfgang Singer , Wilhelm Egle , Markus Weiss , Joachim Hainz , Joachim Wietzorrek , Johannes Wangler , Frank Melzer , Bernhard Gellrich , Bernhard Geuppert , Erich Schubert , Martin Antoni
Inventor： Wolfgang Singer , Wilhelm Egle , Markus Weiss , Joachim Hainz , Joachim Wietzorrek , Johannes Wangler , Frank Melzer , Bernhard Gellrich , Bernhard Geuppert , Erich Schubert , Martin Antoni
CPC classification number: B82Y10/00 , G02B5/09 , G02B7/182 , G02B17/006 , G02B19/0023 , G02B19/0047 , G02B19/0095 , G03F7/70158 , G03F7/70166 , G03F7/70175 , G03F7/702 , G03F7/70233 , G03F7/70358 , G03F7/70825 , G21K1/06 , G21K5/04
Abstract: There is provided a projection exposure system operable in a scanning mode along a scanning direction. The projection exposure system includes a collector that receives light having a wavelength ≦193 nm and illuminates a region in a plane. The plane is defined by a local coordinate system having a y-direction parallel to the scanning direction and an x-direction perpendicular to the scanning direction. The collector includes (a) a first mirror shell, (b) a second mirror shell within the first mirror shell, and (c) a fastening device for fastening the first and second mirror shells. The mirror shells are substantially rotational symmetric about a common rotational axis. The fastening device has a support spoke that extends in a radial direction of the mirror shells, and the support spoke, when projected into the plane, yields a projection that is non-parallel to the y-direction.
Abstract translation: 提供了沿着扫描方向以扫描模式操作的投影曝光系统。 投影曝光系统包括收集器，其收集波长<= 193nm的光并照亮平面中的区域。 平面由具有与扫描方向平行的y方向和垂直于扫描方向的x方向的局部坐标系限定。 收集器包括（a）第一镜壳，（b）第一镜壳内的第二镜壳，以及（c）用于紧固第一镜壳和第二镜壳的紧固装置。 镜壳基本上围绕公共旋转轴线旋转对称。 紧固装置具有在镜壳的径向方向上延伸的支撑辐条，并且当投影到平面中时支撑辐条产生不平行于y方向的突起。
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Patent Agency Ranking
36.发明申请Collector unit with a reflective element for illumination systems with a wavelength of smaller than 193 nm 有权具有反射元件的收集器单元，用于波长小于193nm的照明系统公开(公告)号：US20050094764A1
公开(公告)日：2005-05-05
申请号：US10952412
申请日：2004-09-28
Applicant: Markus Weiss
Inventor： Markus Weiss
CPC classification number: B82Y10/00 , G03F7/70166 , G21K1/06 , G21K2201/064
Abstract: There is provided a collector unit for illumination systems with a wavelength of ≦193 nm, preferably ≦126 nm, and especially preferably in the region of EUV wavelengths. Rays of a beam bundle impinge on the collector unit, and the beam bundle emerges from an object in an object plane. The collector unit includes at least one mirror shell that receives the rays of the beam bundle emerging from the object and shows an optical effect, and a periodic structure with at least one grating period applied to at least a part of the mirror shell. An illumination system and an EUV projection exposure system are also provided.
Abstract translation: 为波长<= 193nm，优选<= 126nm，特别优选在EUV波长区域的照明系统提供收集器单元。 束束的射线照射在收集器单元上，并且束束从物平面中的物体出射。 收集器单元包括至少一个镜壳，其接收从物体出射的束束的光线并且显示光学效应，以及具有施加到镜壳的至少一部分的至少一个光栅周期的周期性结构。 还提供照明系统和EUV投影曝光系统。
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公开(公告)号：US20050030656A1
公开(公告)日：2005-02-10
申请号：US10841846
申请日：2004-05-07
Applicant: Hubert Holderer , Andres Heisler , Wolfgang Singer , Markus Weiss , Andreas Seifert , Frank Melzer , Heinz Mann
Inventor： Hubert Holderer , Andres Heisler , Wolfgang Singer , Markus Weiss , Andreas Seifert , Frank Melzer , Heinz Mann
CPC classification number: G03F7/70258 , G02B5/09 , G02B7/1821 , G02B7/1824 , G02B26/0816 , G03F7/70075 , G03F7/70141 , G03F7/702 , G03F7/70275
Abstract: In a facet mirror with a number of mirror facets, wherein the mirror facets are provided with reflecting surfaces, the mirror facets are mounted jointly in a basic body via bearing devices. The mirror facets comprise mirror bodies contacting at the periphery with the bearing devices via a surface, line or point contact. The preferred field of use of the facet mirrors is a projection objective of a projection exposure machine in microlithography for fabricating semiconductor elements.
Abstract translation: 在具有多个镜面的小平面镜中，其中镜面设置有反射面，镜面通过轴承装置联合地安装在基体内。 镜面包括通过表面，线或点接触在外周与轴承装置接触的镜体。 小平面镜的优选使用领域是用于制造半导体元件的微光刻中的投影曝光机的投影物镜。
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公开(公告)号：US20050018269A1
公开(公告)日：2005-01-27
申请号：US10708183
申请日：2004-02-13
Applicant: Markus Weiss , Ulrich Haag
Inventor： Markus Weiss , Ulrich Haag
CPC classification number: G03F7/70308 , G03F7/70258 , G03F7/70891
Abstract: An optical system, for example a projection exposure apparatus for microlithography, has at least one optical element with an optical surface. A correction radiation device is provided that includes at least one correction radiation source for emitting correction radiation. A scanning device has at least one scanning mirror that is irradiated by the correction radiation and driven in such a way that a defined portion of the optical surface of the optical element is scanned with the correction radiation. This results in a correction of imaging characteristics of the optical element by means of heat which is supplied to the optical element by the correction radiation.
Abstract translation: 光学系统，例如用于微光刻的投影曝光装置，具有至少一个具有光学表面的光学元件。 提供了一种校正辐射装置，其包括用于发射校正辐射的至少一个校正辐射源。 扫描装置具有至少一个由校正辐射照射的扫描镜，并以这样一种方式驱动，使得光学元件的光学表面的限定部分用校正辐射扫描。 这导致通过校正辐射提供给光学元件的热量校正光学元件的成像特性。
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公开(公告)号：US20050002806A1
公开(公告)日：2005-01-06
申请号：US10495462
申请日：2002-11-15
Applicant: Rudolf Fuechslin , Markus Weiss , Rudolf Duenki , Peter Mejer , Thomas Neff , Erich Stoll , Andreas Suter
Inventor： Rudolf Fuechslin , Markus Weiss , Rudolf Duenki , Peter Mejer , Thomas Neff , Erich Stoll , Andreas Suter
CPC classification number: A61M39/223 , A61M5/14 , A61M5/142 , A61M5/14216 , A61M5/1456 , A61M2005/1402 , A61M2005/14264 , Y10T137/86871
Abstract: The invention relates to a medical pump device comprising a rotary valve (13) having preferably only one rectilinear channel (20) which respectively connects the inlet (4) and the outlet (7) of the pump device, or connects the inlet to a pump chamber (15), or said pump chamber to the outlet, upon rotation of the rotary element (19) of the valve. The invention enables a medical pump device to be especially easily produced, said pump device being preferably inserted between an infusion syringe driver or an infusion container and a catheter, and being used to supply small quantities of liquid in an accurately dosed manner.
Abstract translation: 本发明涉及一种医疗泵装置，其包括旋转阀（13），其优选地仅具有一个直接通道（20），其分别连接泵装置的入口（4）和出口（7），或将入口连接到泵 （15）或所述泵室在所述旋转元件（19）旋转时到所述出口。 本发明能够特别容易地制造医疗泵装置，所述泵装置优选地插入在注射器驱动器或输注容器和导管之间，并且用于以精确计量的方式供应少量的液体。
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公开(公告)号：US06836530B2
公开(公告)日：2004-12-28
申请号：US10163262
申请日：2002-06-05
Applicant: Wolfgang Singer , Markus Weiss , Bernd Kleemann , Karlfried Osterried , Johannes Wangler , Frank Melzer , Andreas Heisler , Vadim Yevgenyevich Banine
Inventor： Wolfgang Singer , Markus Weiss , Bernd Kleemann , Karlfried Osterried , Johannes Wangler , Frank Melzer , Andreas Heisler , Vadim Yevgenyevich Banine
IPC: G21K500
CPC classification number: G03F7/70158 , G03F7/702 , G21K1/06
Abstract: There is provided an illumination system for wavelengths of ≦100 nm, having an object plane and a field plane. The illumination system includes a grating element having a plurality of gratings, and a diaphragm. The diaphragm is arranged after the grating element in a beam path from the object plane to the field plane.
Abstract translation: 提供了具有物体平面和场平面的<= 100nm波长的照明系统。 照明系统包括具有多个光栅的光栅元件和隔膜。 隔膜设置在从物体平面到场平面的光束路径中的光栅元件之后。
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