公开(公告)号：US5866062A

公开(公告)日：1999-02-02

申请号：US814713

申请日：1997-03-11

Applicant: Stephan Moritz ,  Wolfgang Englisch

Inventor： Stephan Moritz ,  Wolfgang Englisch

IPC: B22C9/12 ,  C03B19/06 ,  C03C3/06 ,  C03C11/00 ,  C30B35/00 ,  C04B33/28

CPC classification number: C30B35/002 ,  B22C9/12 ,  C03B19/06 ,  C03B19/066 ,  C03B20/00 ,  C03C11/00 ,  C03C3/06 ,  C04B35/14 ,  C04B35/62204 ,  C04B35/6261 ,  C04B35/6263 ,  C03B2201/23 ,  C03C2201/02 ,  C03C2201/80 ,  C03C2203/10 ,  C03C2203/52 ,  C04B2235/3418 ,  C04B2235/36 ,  C04B2235/5427 ,  C04B2235/5436 ,  C04B2235/5463 ,  C04B2235/6027 ,  C04B2235/606 ,  C04B2235/656 ,  C04B2235/6562 ,  C04B2235/6565 ,  C04B2235/6567 ,  C04B2235/661 ,  C04B2235/72 ,  C04B2235/77 ,  C04B2235/95 ,  C04B2235/96 ,  C04B2235/9653

Abstract: A shaped body of amorphous silicon dioxide, which has a chemical purity of at least 99.9% and a cristobalite content of at most 1% and which is impermeable to gas, is known. To provide shaped bodies of amorphous silicon dioxide which have a high precision, which can be small or large in size and of simple to complicated shape, which have a chemical purity of at least 99.9%, are impermeable to gas above wall thicknesses of 1 mm, which have a high cold flexural strength, low thermal conductivity and low radiation of heat, which are thermal shock resistant and can be exposed repeatedly or also long-term to temperatures in the range from 1000.degree. to 1300.degree. C. and which can be welded in a sharply delineated manner without spreading joins and which have a low spectral transmission from the ultraviolet to the middle infrared spectral region, the shaped body is opaque, contains pores, at a wall thickness of 1 mm has a direct spectral transmission which is virtually constant in the wavelength range from .lambda.=190 nm to .lambda.=2650 nm and is below 10%, and it has a density which is at least 2.15 g/cm.sup.3. A process for producing such shaped bodies is also provided.

Abstract translation: 已知一种无定形二氧化硅的成形体，其化学纯度为99.9％以上，方石方含量为1％以下且不透气。 为了提供具有至少99.9％的化学纯度的具有高精度的成形体的非晶形二氧化硅，其尺寸可以是小的或大的，并且具有简单到复杂的形状，对于壁厚为1mm的气体是不可渗透的 ，具有高的抗弯强度，低导热性和低辐射热，耐热冲击，可以反复暴露或长时间暴露于1000℃至1300℃的温度，并且可以是 焊接成锐利的方式而不扩散接头，并且具有从紫外线到中红外光谱区域的低光谱透射率，成形体是不透明的，包含孔，在1mm厚的壁处具有直接光谱透射，其实际上 在λ= 190nm至λ= 2650nm的波长范围内恒定，并且低于10％，并且其密度为至少2.15g / cm 3。 还提供了一种用于生产这种成形体的方法。

公开(公告)号：US4119422A

公开(公告)日：1978-10-10

申请号：US877888

申请日：1978-02-15

Applicant: David Rostoker

Inventor： David Rostoker

IPC: C03C3/06 ,  C03C3/091 ,  C03C11/00 ,  C03C12/00 ,  C03B19/08

CPC classification number: C03C12/00 ,  C03C11/007 ,  C03C3/06 ,  C03C3/091 ,  C03C2201/10 ,  C03C2201/32 ,  C03C2201/50 ,  C03C2201/80 ,  C03C2203/00

Abstract: An aqueous slurry comprising an intimate mixture of colloidal silica, (preferably an amorphous, precipitated, hydrated silica), caustic potash, boric acid and alumina is first prepared and then dried. The dried aggregates are thereafter crushed, calcined and rapidly quenched. It is preferred to dry the slurry in a spray drier and thereafter omit crushing after drying and to calcine the dried admixture by means of a plasma arc so that the mixture is rapidly quenched after calcination. The calcined mixture is introduced into a crusher, such as a ball mill, with a carbonaceous cellulating agent and reduced to a fine pulverulent material. The pulverulent material is then cellulated in a cellulating furnace to form cellular borosilicate bodies. Where desired, the calcined material may be utilized as a ceramic frit.

Abstract translation: 首先制备包含胶体二氧化硅（优选无定形的，沉淀的，水合二氧化硅），苛性钾，硼酸和氧化铝的紧密混合物的含水浆料，然后干燥。 然后将干燥的聚集体压碎，煅烧并快速骤冷。 优选在喷雾干燥器中干燥浆料，然后在干燥后省略破碎并通过等离子体电弧煅烧干燥的混合物，使得混合物在煅烧后快速淬火。 将煅烧的混合物用含碳细胞剂引入破碎机如球磨机中并还原成细粉状材料。 然后将粉状材料在细胞培养炉中细胞化以形成细胞硼硅酸盐体。 如果需要，煅烧材料可以用作陶瓷玻璃料。

公开(公告)号：US3972721A

公开(公告)日：1976-08-03

申请号：US562065

申请日：1975-03-26

Applicant: Joseph J. Hammel ,  Ties Allersma

Inventor： Joseph J. Hammel ,  Ties Allersma

IPC: C03C3/06 ,  C03C3/064 ,  C03C3/089 ,  C03C3/091 ,  C03C11/00 ,  C03C15/00 ,  C03C3/08 ,  C03C3/04 ,  C03C3/30

CPC classification number: B01D71/04 ,  B01D67/0058 ,  C03C11/005 ,  C03C15/00 ,  C03C3/06 ,  C03C3/064 ,  C03C3/089 ,  C03C3/091 ,  C03C2201/10 ,  C03C2201/32 ,  C03C2201/50 ,  C03C2201/80 ,  C03C2203/00

Abstract: Thermally stable, mechanically strong microporous glass articles with large pore volumes, surface areas, and varying pore sizes, and methods for making such articles are disclosed. In particle form, such as beads, the microporous glass articles are useful as catalyst supports in applications such as petroleum catalytic refiners, chemical processes and motor vehicle catalytic mufflers. The mechanical strength and the dimensional stability of the microporous glass articles at elevated temperatures can be improved if the articles are preshrunk, such as by brief exposure to high temperatures, before their intended use, and can be improved even further if treated with certain metal oxides.

Abstract translation: 公开了具有大孔体积，表面积和不同孔径的热稳定的机械强度微孔玻璃制品及其制造方法。 在颗粒形式如珠粒中，微孔玻璃制品可用作催化剂载体，例如石油催化精炼机，化学工艺和汽车催化消声器。 如果在预期的使用之前，如在短时间暴露于高温下预制物品，则可以提高微孔玻璃制品在高温下的机械强度和尺寸稳定性，并且如果用某些金属氧化物 。

公开(公告)号：US09061317B2

公开(公告)日：2015-06-23

申请号：US13439911

申请日：2012-04-05

Applicant: Raymond Nicholas Vrtis ,  Mark Leonard O'Neill ,  Jean Louis Vincent ,  Aaron Scott Lukas ,  Mary Kathryn Haas

Inventor： Raymond Nicholas Vrtis ,  Mark Leonard O'Neill ,  Jean Louis Vincent ,  Aaron Scott Lukas ,  Mary Kathryn Haas

IPC: C23C16/30 ,  B05D1/00 ,  C23C16/40 ,  C23C16/56 ,  H01L21/02 ,  C03C3/04 ,  C03C11/00

CPC classification number: B05D1/62 ,  C03C3/045 ,  C03C11/00 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/80 ,  C23C16/30 ,  C23C16/401 ,  C23C16/56 ,  H01L21/02126 ,  H01L21/02203 ,  H01L21/02208 ,  H01L21/02216 ,  H01L21/02274 ,  H01L21/02348

Abstract: A chemical vapor deposition method for producing a porous organosilica glass film comprising: introducing into a vacuum chamber gaseous reagents including at least one precursor selected from the group consisting of an organosilane and an organosiloxane, and a porogen that is distinct from the precursor, wherein the porogen is a C4 to C14 cyclic hydrocarbon compound having a non-branching structure and a degree of unsaturation equal to or less than 2; applying energy to the gaseous reagents in the vacuum chamber to induce reaction of the gaseous reagents to deposit a preliminary film on the substrate, wherein the preliminary film contains the porogen; and removing from the preliminary film substantially all of the labile organic material to provide the porous film with pores and a dielectric constant less than 2.6.

Abstract translation: 一种用于生产多孔有机硅玻璃膜的化学气相沉积方法，包括：向真空室中引入包含至少一种选自有机硅烷和有机硅氧烷的前体的气态试剂和与前体不同的致孔剂，其中 致孔剂是具有非支化结构和不饱和度等于或小于2的C 4至C 14环烃化合物; 向真空室中的气态试剂施加能量以诱导气态试剂在衬底上沉积初步膜的反应，其中预备膜含有致孔剂; 并从初步膜上去除基本上所有不稳定的有机材料，以提供具有小于2.6的孔隙和介电常数的多孔膜。

公开(公告)号：US20070051135A1

公开(公告)日：2007-03-08

申请号：US11513103

申请日：2006-08-31

Applicant: Hiroshi Machida ,  Mitsuji Sato

Inventor： Hiroshi Machida ,  Mitsuji Sato

IPC: C03C3/06 ,  C03B37/07 ,  C03B37/018 ,  G01N21/00

CPC classification number: C03C3/06 ,  C03B37/01406 ,  C03B2207/20 ,  C03C13/045 ,  C03C2201/80 ,  C03C2203/44 ,  Y02P40/57

Abstract: A method for manufacturing a porous-glass material for optical fiber performed in a reaction apparatus having a plurality of burners for producing glass particles toward a initial base material and a ventilation mechanism at a position opposed to the plurality of burners, the method comprises the steps of (a) moving the plurality of burners back and forth along a initial base material, (b) depositing the glass particles produced by the flame hydrolysis reaction of the glass raw material around the initial base material, (c) starting the deposition of a next porous-glass material without removing soot stuck to the inside of the chamber after the deposition of the glass particles is completed. Under the above condition, the inside pressure of the chamber is preferably adjusted within the range of −80 Pa≦Pmin≦−40 Pa, which is a pressure differential between the inside and outside of the chamber. (Hereinafter referred to a pressure differential between the inside and outside of the apparatus)

Abstract translation: 一种制造光纤用多孔玻璃材料的方法，其特征在于，在具有多个朝向初始基材制造玻璃粒子的燃烧器的反应装置和与上述多个燃烧器相对的位置设置有通气机构的反应装置中， （a）沿着初始基材来回移动多个燃烧器，（b）将通过玻璃原料的火焰水解反应产生的玻璃颗粒沉积在初始基材周围，（c）开始沉积 完成在玻璃颗粒沉积之后没有去除粘附到室内部的烟灰的下一个多孔玻璃材料。 在上述条件下，室的内部压力优选在-80Pa·分钟内的压力差的范围内调节 房间。 （以下称为装置内外的压力差）

公开(公告)号：US20060194453A1

公开(公告)日：2006-08-31

申请号：US10550859

申请日：2004-03-25

Applicant: Yasushi Murakami ,  Masayuki Harano ,  Yoshio Takasu ,  Yoshio Taniguchi

Inventor： Yasushi Murakami ,  Masayuki Harano ,  Yoshio Takasu ,  Yoshio Taniguchi

IPC: H01L23/58 ,  H01L21/31

CPC classification number: C03C11/00 ,  C03C3/06 ,  C03C2201/80

Abstract: A transparent amorphous silicon dioxide film containing many fine voids, characterized in that the refractive index (for light at λ=500 nm) is in the range of 1.01 to 1.40 and that 80 vol. % or more of the fine voids have a diameter of 5 nm or less, has a low refractive index and excellent physical strength such as high scratch resistance, so that it is advantageously employable as an optical film of an optical device for various uses.

Abstract translation: 含有许多细小空隙的透明无定形二氧化硅膜，其特征在于折射率（对于λ= 500nm的光）在1.01〜1.40的范围内，80体积％ 小于等于或小于5nm的直径为5nm以下，具有折射率低，耐刮擦性优异的物理强度，有利地可用作各种用途的光学装置的光学膜。

公开(公告)号：US06672107B2

公开(公告)日：2004-01-06

申请号：US09913632

申请日：2001-08-16

Applicant: Waltraud Werdecker ,  Johann Leist

Inventor： Waltraud Werdecker ,  Johann Leist

IPC: C03B1906

CPC classification number: C03C3/06 ,  C03B19/09 ,  C03B19/095 ,  C03B2201/04 ,  C03C2201/02 ,  C03C2201/23 ,  C03C2201/80 ,  C30B15/10 ,  C30B35/002 ,  Y10S65/04 ,  Y10T428/131

Abstract: In order to provide a quartz glass crucible distinguished by high purity, high opacity and/or low transmissibility in the IR spectrum, it is proposed on the basis of a known quartz glass crucible of opaque quartz glass with a crucible body symmetrical in relation to a rotational axis, an outer zone (3) of opaque quartz glass transitioning radially toward the inside into an inner zone (2) of transparent quartz glass and with a density of at least 2.15 g/cm3, that according to the invention, the crucible body (1) be made of a synthetic SiO2 granulate with a specific BET surface ranging from 0.5 m2/g to 40 m2/g, a tamped volume of at least 0.8 g/cm3 and produced from at least partially porous agglomerates of SiO2 primary particles. A process for producing a quartz glass crucible of this kind is distinguished according to the invention in that for the production of the crucible a SiO2 granulate is used which was formed from at least partially porous agglomerates of synthetically manufactured SiO2 primary particles and that it has a specific BET surface ranging from 0.5 m2/g to 40 m2/g and a tamped volume of at least 0.8 g/cm3, the heating effected in such a way that a vitrification front advances from the inside outward while an inner zone (4) of transparent quartz glass is being formed.

Abstract translation: 为了提供在IR光谱中具有高纯度，高不透明性和/或低透射率的石英玻璃坩埚，提出了在已知的不透明石英玻璃的石英玻璃坩埚的基础上，坩埚体相对于 旋转轴线，不透明石英玻璃的外部区域（3），径向朝向内部转变成透明石英玻璃的内部区域（2），密度为至少2.15g / cm 3，根据本发明， 坩埚体（1）由合成SiO 2颗粒制成，比表面积为0.5m 2 / g至40m 2 / g，捣实体积至少为0.8g / cm 3， 由SiO 2一次颗粒的至少部分多孔的附聚物制成。 根据本发明，制造这种石英玻璃坩埚的方法的不同之处在于，对于坩埚的制造，使用由至少部分多孔的合成SiO 2原生颗粒的聚集体形成的SiO 2颗粒，并且其具有 比表面积为0.5m 2 / g至40m 2 / g，捣实体积为至少0.8g / cm 3，加热使玻璃化前沿从内部进入 外部形成透明石英玻璃的内部区域（4）。

公开(公告)号：US5674792A

公开(公告)日：1997-10-07

申请号：US636889

申请日：1996-04-24

Applicant: Stephan Moritz ,  Wolfgang Englisch

Inventor： Stephan Moritz ,  Wolfgang Englisch

IPC: B22C9/12 ,  C03B19/06 ,  C03C3/06 ,  C03C11/00 ,  C30B35/00 ,  C04B35/14

CPC classification number: C30B35/002 ,  B22C9/12 ,  C03B19/06 ,  C03B19/066 ,  C03B20/00 ,  C03C11/00 ,  C03C3/06 ,  C04B35/14 ,  C04B35/62204 ,  C04B35/6261 ,  C04B35/6263 ,  C03B2201/23 ,  C03C2201/02 ,  C03C2201/80 ,  C03C2203/10 ,  C03C2203/52 ,  C04B2235/3418 ,  C04B2235/36 ,  C04B2235/5427 ,  C04B2235/5436 ,  C04B2235/5463 ,  C04B2235/6027 ,  C04B2235/606 ,  C04B2235/656 ,  C04B2235/6562 ,  C04B2235/6565 ,  C04B2235/6567 ,  C04B2235/661 ,  C04B2235/72 ,  C04B2235/77 ,  C04B2235/95 ,  C04B2235/96 ,  C04B2235/9653

Abstract: A shaped body of amorphous silicon dioxide, which has a chemical purity of at least 99.9% and a cristobalite content of at most 1% and which is impermeable to gas, is known. To provide shaped bodies of amorphous silicon dioxide which have a high precision, which can be small or large in size and of simple to complicated shape, which have a chemical purity of at least 99.9%, are impermeable to gas above wall thicknesses of 1 mm, which have a high cold flexural strength, low thermal conductivity and low radiation of heat, which are thermal shock resistant and can be exposed repeatedly or also long-term to temperatures in the range from 1000.degree. to 1300.degree. C. and which can be welded in a sharply delineated manner without spreading joins and which have a low spectral transmission from the ultraviolet to the middle infrared spectral region, the shaped body is opaque, contains pores, at a wall thickness of 1 mm has a direct spectral transmission which is virtually constant in the wavelength range from .lambda.=190 nm to .lambda.=2650 nm and is below 10%, and it has a density which is at least 2.15 g/cm.sup.3. A process for producing such shaped bodies is also provided.

Abstract translation: 已知一种无定形二氧化硅的成形体，其化学纯度为99.9％以上，方石方含量为1％以下且不透气。 为了提供具有至少99.9％的化学纯度的具有高精度的成形体的非晶形二氧化硅，其尺寸可以是小的或大的，并且具有简单到复杂的形状，对于壁厚为1mm的气体是不可渗透的 ，具有高的抗弯强度，低导热性和低辐射热，耐热冲击，可以反复暴露或长时间暴露于1000℃至1300℃的温度，并且可以是 焊接成锐利的方式而不扩散接头，并且具有从紫外线到中红外光谱区域的低光谱透射率，成形体是不透明的，包含孔，在1mm厚的壁处具有直接光谱透射，其实际上 在λ= 190nm至λ= 2650nm的波长范围内恒定，并且低于10％，并且其密度为至少2.15g / cm 3。 还提供了一种用于生产这种成形体的方法。

公开(公告)号：US5585173A

公开(公告)日：1996-12-17

申请号：US319570

申请日：1994-10-07

Applicant: Kenji Kamo ,  Kouichi Ono ,  Koji Tsukuma ,  Hiroya Nagata ,  Emiko Abe ,  Yoshikazu Kikuchi ,  Yushiharu Funakoshi

Inventor： Kenji Kamo ,  Kouichi Ono ,  Koji Tsukuma ,  Hiroya Nagata ,  Emiko Abe ,  Yoshikazu Kikuchi ,  Yushiharu Funakoshi

IPC: C03B19/06 ,  C03C3/06 ,  C03B19/08

CPC classification number: C03C3/06 ,  C03B19/06 ,  C03B19/066 ,  C03B20/00 ,  C03B2201/03 ,  C03C2201/02 ,  C03C2201/80 ,  C03C2203/50 ,  Y10S65/08 ,  Y10S65/09 ,  Y10T428/24661 ,  Y10T428/249953 ,  Y10T428/249969 ,  Y10T428/2975

Abstract: The high-purity, opaque quartz glass containing 3.times.10.sup.6 -9.times.10.sup.6 of closed cells having an average size of 20-40 .mu.m per 1 cm.sup.3, a ratio of closed cells having sizes of 100 .mu.m or more to the whole of cells being 1% or less, thereby showing 5% or less of linear transmittance for near infrared rays (.lambda.=900 nm) at a thickness of 1 mm is produced by compacting amorphous silica powder having an average particle size of 0.5-10 .mu.m, in which each of impurities selected from Li, Na, K, Fe, Ti and Al is 1 ppm or less, if any, and sintering the resultant green body at 1730.degree.-1850.degree. C.

Abstract translation: 含有3×10 6-9×10 6个细胞的高纯度不透明石英玻璃，平均粒径为每1cm 320-40μm，具有100μm以上的细胞与整个细胞的比例为1％ 通过压制平均粒径为0.5〜10μm的无定形二氧化硅粉末，制造厚度为1mm的近红外线（λ= 900nm）的线性透射率的5％以下， 从Li，Na，K，Fe，Ti和Al中选出的杂质为1ppm以下，在1730〜-1850℃下烧成生坯。

公开(公告)号：US5497004A

公开(公告)日：1996-03-05

申请号：US337447

申请日：1994-11-08

Applicant: Bernd Rudolph ,  Frank Kellner ,  Uwe Kroenert

Inventor： Bernd Rudolph ,  Frank Kellner ,  Uwe Kroenert

IPC: G01J1/02 ,  B22C9/12 ,  C03B19/06 ,  C03C3/06 ,  C03C11/00 ,  C30B35/00 ,  G01J1/42 ,  G01J1/04 ,  G01J5/08 ,  G02B1/00 ,  G02B5/02

CPC classification number: G01J1/429 ,  B22C9/12 ,  C03B19/06 ,  C03B19/066 ,  C03B20/00 ,  C03C11/00 ,  C03C3/06 ,  C30B35/002 ,  C03B2201/23 ,  C03C2201/02 ,  C03C2201/80 ,  C03C2203/52

Abstract: A UV sensor having a photodetector for measurement of UV radiation, an SiO.sub.2 -containing dispersive element disposed ahead of the photodetector in the direction of incident UV radiation and an optional housing having an entry opening for UV radiation. The dispersive element contains quartz glass with interiorly disposed boundary surfaces, the orientations of which are statistically homogeneously distributed.

Abstract translation: 一种UV传感器，其具有用于测量UV辐射的光电检测器，在入射UV辐射方向上设置在光电检测器前面的含SiO 2的分散元件，以及具有用于UV辐射的入口的可选的壳体。 分散元件含有内部设置的边界面的石英玻璃，其取向在统计上均匀分布。