公开(公告)号：WO1991014928A1

公开(公告)日：1991-10-03

申请号：PCT/JP1991000385

申请日：1991-03-26

Applicant: ANRITSU CORPORATION ,  NIPPON TELEGRAPH AND TELEPHONE CORPORATION ,  TAMURA, Youichi ,  GOTO, Hiroshi ,  TSUKAMOTO, Takeshi ,  ICHIHASHI, Yasutaka ,  IMAI, Takamasa

Inventor： ANRITSU CORPORATION ,  NIPPON TELEGRAPH AND TELEPHONE CORPORATION

IPC: G01J09/02

CPC classification number: G01J3/453 ,  G01J9/0246

Abstract: The wavelength (μ) of light to be measured is determined in accordance with the formula μ = Ds/N from the number (N) of interference fringes having predetermined repeating waveforms that occur when the optical path length is changed by the quantity Ds by moving continuously a movable portion (7) of an interference spectrometer portion (1) of a wavelength measuring apparatus at a constant speed. A wave number counter (13) counts the number of specific points in each period of the interference fringes entirely from a predetermined measuring start point to a predetermined measuring finish point to obtain wave number data (Na). A reference pulse generation portion (21) generates reference pulses having a higher frequency than the repeating waveforms of the interference fringes. Detection portions (22a, 23a) detect the first number of the reference pulses existing in one period of the interference fringes, the second number of the reference pulses existing inside the period from the measuring start point till the first specific point of the interference fringes in succession to the measuring start point and the third number of the reference pulses existing inside the period from the final specific point of the interference fringes to the measuring finish point. A calculation portion (26) corrects the wave number data (Na) to wave number data (NA) inclusive of fraction values using the first, second and third numbers, and measures highly precisely the wavelength of light to be measured in accordance with the following equation: μ = Ds/NA.

公开(公告)号：WO1990002930A1

公开(公告)日：1990-03-22

申请号：PCT/GB1989001030

申请日：1989-09-04

Applicant: NATIONAL RESEARCH DEVELOPMENT CORPORATION ,  TYRER, John, Raymond ,  MENDOZA-SANTOYO, Fernando ,  KERR, David

Inventor： NATIONAL RESEARCH DEVELOPMENT CORPORATION

IPC: G01J09/02

CPC classification number: G01B9/0201 ,  G01B9/02094

Abstract: An interferometric procedure, such as electronic speckle pattern interferometry, involves generating two signals representing the point-by-point variations in intensity of respective patterns of electromagnetic radiation resulting from the interference of first and second beams of such radiation derived from a coherent source, with at least the first beam from each pattern being scattered, before interference with its respective second beam, from a common object surface, and with a corresponding pair of the beams, one for each pattern, having a predetermined relative phase difference of other than a multiple of pi ; and determining from the two signals values for a datum phase of the radiation at the object surface. Preferably, as a preliminary to this last determination, DC components are removed from the two signals. Conveniently, to simplify the determination, the phase difference is an odd multiple of pi /4 or pi /2.

Abstract translation: 诸如电子散斑图案干涉测量的干涉测量程序涉及产生两个信号，表示由衍射自相干光源的这种辐射的第一和第二光束的干涉导致的各个电磁辐射图案的逐点变化的强度变化， 至少来自每个图案的第一光束在与其相应的第二光束干涉之前从公共物体表面散射，并且对应于一对光束，每个图案之一具有除多个之外的预定相对相位差 的pi 并根据两个信号确定物体表面上的辐射的基准相位值。 优选地，作为该最后确定的初步，将DC分量从两个信号中去除。 方便地，为了简化确定，相位差是pi / 4或pi / 2的奇数倍。

公开(公告)号：WO1989003516A1

公开(公告)日：1989-04-20

申请号：PCT/GB1988000821

申请日：1988-10-05

Applicant: RENISHAW PLC ,  CROWNSHAW, John, Charles

Inventor： RENISHAW PLC

IPC: G01J09/02

CPC classification number: G01B11/306 ,  G01B9/02

Abstract: Laser interferometer system in use for taking measurements on a machine. Optical devices (14, 16) such as interferometers, reflectors and beam splitters are required to be mounted on the machine spindle (3) or the machine bed (2). It is an advantage for some of the optical devices to be interchangeably mountable on the spindle or the bed to avoid duplication. The invention proposes that for interchangeability, a bed-mounted retro-reflector (16) has the geometric center of its optical component (16b) positioned at a distance (b) from the side in contact with the machine bed, and (b-x) from the opposite side, while a spindle mounted interferometer (14) has the geometric centre of its optical component (14b) positioned at a distance (b-x) from the side confronting the bed (which is at a distance (x) from the bed) and at a distance (b) from the opposite side. Thus the geometric centers of the optical components are each at a distance (b) from the bed. The components can simply be interchanged between spindle-mounted and bed-mounted positions, by turning them through 180 DEG and the geometric centres would still be at a distance (b) from the machine bed.

Abstract translation: 用于在机器上进行测量的激光干涉仪系统。 需要将诸如干涉仪，反射器和分束器的光学装置（14,16）安装在机器主轴（3）或机床（2）上。 一些光学装置可以可互换地安装在主轴或床上以避免重复是有利的。 本发明提出，为了可互换性，床安装的后向反射器（16）具有其光学部件（16b）的几何中心位于与机床接触的一侧的距离（b）处，并且（bx） 相对侧，而主轴安装的干涉仪（14）具有其光学部件（14b）的几何中心位于与床（与床的距离（x））相对的一侧的距离（bx）处），并且 距离（b）的距离相反。 因此，光学部件的几何中心各自与床的距离（b）。 这些部件可以通过将主轴安装位置与床位安装位置之间的角度进行180°的交替，几何中心距机床距离（b）也可以相互交换。