Abstract:
In a wavelength calibration method, an observed spectrum of a light that has a wavelength band is obtained, wherein the light has at least an attenuated wavelength component that corresponds to at least a predetermined absorption wavelength that is included in the wavelength band. A corrected spectrum is then obtained from the observed spectrum, wherein the corrected spectrum has reduced dependencies upon the full width at half maximum of an emission band of the light and upon an intensity ripple period of the light.
Abstract:
Methods of selecting spectral elements and system components for a multivariate optical analysis system include providing spectral calibration data for a sample of interest; identifying a plurality of combinations of system components; modeling performance of a pilot system with one of the combinations of system components; determining optimal characteristics of the pilot system; and selecting optimal system components from among the combinations of system components.
Abstract:
A method of arranging and utilizing a multivariate optical computing and analysis system includes transmitting a o first light from a light source; generating a second light by reflecting the first light from the sample; directing a portion of the second light with a beamsplitter; and arranging an optical filter mechanism in a normal incidence orientation to receive the portion of the second light, the optical filter mechanism being configured to optically filter data carried by the portion of the second light.
Abstract:
A spectroscopy system is provided which is optimized for operation in the VUV region and capable of performing well in the DUV-NIR region. Additionally, the system incorporates an optical module which presents selectable sources and detectors optimized for use in the VUV and DUV-NIR. As well, the optical module provides common delivery and collection optics to enable measurements in both spectral regions to be collected using similar spot properties. The module also provides a means of quickly referencing measured data so as to ensure that highly repeatable results are achieved. The module further provides a controlled environment between the VUV source, sample chamber and VUV detector which acts to limit in a repeatable manner the absorption of VUV photons. The use of broad band data sets which encompass VUV wavelengths, in addition to the DUV-NIR wavelengths enables a greater variety of materials to be meaningfully characterized. Array based detection instrumentation may be exploited to permit the simultaneous collection of larger wavelength regions.
Abstract:
A method and apparatus is disclosed for using below deep ultra-violet (DUV) wavelength reflectometry for measuring properties of diffracting and/or scattering structures on semiconductor work-pieces is disclosed. The system can use polarized light in any incidence configuration, but one technique disclosed herein advantageously uses un-polarized light in a normal incidence configuration. The system thus provides enhanced optical measurement capabilities using below deep ultra-violet (DUV) radiation, while maintaining a small optical module that is easily integrated into other process tools. A further refinement utilizes an r−θ stage to further reduce the footprint.
Abstract:
Method and apparatus for detecting, by absorption spectroscopy, an isotopic ratio of a sample, by passing first and second laser beams of different frequencies through the sample. Two IR absorption cells are used, a first containing a reference gas of known isotopic ratio and the second containing a sample of unknown isotopic ratio. An interlacer or reflective chopper may be used so that as the laser frequencies are scanned the absorption of the sample cell and the reference cell are detected alternately. This ensures that the apparatus is continuously calibrated and rejects the baseline noise when phase sensitive detection is used.
Abstract:
A technique is provided for generating and subsequently monitoring the controlled environment(s) within an optical metrology instrument in such a manner as to minimize absorbing species within the light path of the metrology instrument and to minimize the build-up of contaminants on the surfaces of optical elements that may result in performance degradation. Both evacuation and backfill techniques may be utilized together along with a monitoring technique to determine if the environmental is suitable for measurements or if the environment should be regenerated. The optical metrology instrument may be an instrument which operates at wavelengths that include vacuum ultra-violet (VUV) wavelengths.
Abstract:
A spectroscope designed to utilize an adaptive optical element such as a micro mirror array (MMA) and two distinct light channels and detectors. The devices can provide for real-time and near real-time scaling and normalization of signals.
Abstract:
A detecting device for a spectrophotometer is provided which is capable of exhibiting a sufficient sensitivity and with an adequate linearity over the ultraviolet light, visible light and near-infrared light ranges. The spectrophotometer detecting device includes detectors of a photomultiplier-tube detector, an InGaAs detector and a PbS detector, and a switching device for switching among these detectors. Alternatively, the spectrophotometer may include a single integrating sphere including these three types of detectors placed thereon. The spectrophotometer may further include output conversion means for correcting the output linearity difference among these detectors.
Abstract:
A spectroscopy system is provided which is optimized for operation in the VUV region and capable of performing well in the DUV-NIR region. Additionally, the system incorporates an optical module which presents selectable sources and detectors optimized for use in the VUV and DUV-NIR. As well, the optical module provides common delivery and collection optics to enable measurements in both spectral regions to be collected using similar spot properties. The module also provides a means of quickly referencing measured data so as to ensure that highly repeatable results are achieved. The module further provides a controlled environment between the VUV source, sample chamber and VUV detector which acts to limit in a repeatable manner the absorption of VUV photons. The use of broad band data sets which encompass VUV wavelengths, in addition to the DUV-NIR wavelengths enables a greater variety of materials to be meaningfully characterized. Array based detection instrumentation may be exploited to permit the simultaneous collection of larger wavelength regions.