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41.发明公开Method of synthetic diamond ablation with an oxygen plasma and synthetic diamonds etched accordingly 失效一种用于用氧等离子体合成金刚石的烧蚀法蚀刻并因此合成金刚石
公开(公告)号：EP0741118A2
公开(公告)日：1996-11-06
申请号：EP96201152.4
申请日：1996-04-26
CPC classification number: C04B41/009 , C04B41/0054 , C04B41/5346 , C04B41/80 , C04B41/91 , C04B2111/00844 , C30B29/04 , C30B33/00 , H01L21/3065 , C04B41/459 , C04B41/5001 , C04B35/52
Abstract: A method for ablating a synthetic diamond having a pitted surface includes applying a colloidal graphite to the surface of the diamond and subjecting it to an oxygen plasma so that preferably approximately 50 microns are removed from the surface of the synthetic diamond. The resulting surface of the diamond is virtually pit free. Preferably, the diamond is then mechanically lapped for finishing.
Abstract translation: 一种用于消融具有凹坑表面的合成金刚石方法包括施加胶体石墨到钻石的表面上并在氧等离子体所以也优选为约50微米，从合成金刚石的表面除去对其进行。 钻石的产生的表面实际上是无坑。 优选地，金刚石，然后机械打磨进行精加工。
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42.发明公开Method of making synthetic diamond film with reduced bowing 失效维尔法赫尔·赫斯特伦·艾伦·合成师Diamantschicht mit reduzierter Beugung
公开(公告)号：EP0695816A1
公开(公告)日：1996-02-07
申请号：EP95201797.8
申请日：1995-07-01
Inventor： Meroth, John
CPC classification number: C23C16/276 , C23C16/01
Abstract: The invention relates to a method of making synthetic diamond with reduced bowing. Bowing direction has been investigated. Depositing synthetic diamond with a plasma using a concave deposition surface results in a reduced or eliminated bowing, as compared to the use of a flat substrate. Various applications such as heat sink material.
Abstract translation: 本发明涉及一种减少弓形的合成金刚石的方法。 弯道方向已被调查。 与使用平坦基底相比，使用凹形沉积表面沉积具有等离子体的合成金刚石与弓形结构相比导致减少或消除的弯曲。 各种应用如散热材料。
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43.发明公开Integrated circuit package with diamond heat sink 失效Integrierte Schaltungspackung mit einerDiamantwärmesenke
公开(公告)号：EP0690501A2
公开(公告)日：1996-01-03
申请号：EP95201765.5
申请日：1995-06-28
Inventor： Nagy, Bela , Partha, Arjun
IPC: H01L23/433
CPC classification number: H01L23/4334 , H01L23/3732 , H01L24/45 , H01L24/48 , H01L24/49 , H01L2224/45015 , H01L2224/45144 , H01L2224/48091 , H01L2224/48247 , H01L2224/49171 , H01L2224/85455 , H01L2924/00014 , H01L2924/01019 , H01L2924/01039 , H01L2924/01079 , H01L2924/14 , H01L2924/181 , H01L2924/19107 , H01L2924/00 , H01L2924/00015 , H01L2924/20755 , H01L2224/05599 , H01L2924/00012
Abstract: A JEDEC IC package comprising:
a) an integrated circuit,
b) a lead frame having a plurality of legs in electrical connection with the integrated circuit, and
c) a diamond film,
wherein the diamond film in is intimate thermal contact with both the integrated circuit and the plurality of legs of the lead frame.Abstract translation: 一种JEDEC IC封装，包括：a）集成电路，b）具有与所述集成电路电连接的多个支腿的引线框架，以及c）金刚石膜，其中所述金刚石膜与所述集成电路 电路和引线框架的多个支脚。
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44.发明公开Ceramic material, process of making and use of same 失效Keramische Werkstoff，Verfahren zu seiner Herstellung und seine Verwendung。
公开(公告)号：EP0585761A1
公开(公告)日：1994-03-09
申请号：EP93113377.1
申请日：1993-08-20
Inventor： Coblenz, William S. , Kavanaugh, Michael D.
CPC classification number: C04B35/111 , B01J21/04 , B01J37/0236 , C01F7/44 , C01P2004/10 , C04B35/622 , C04B35/624
Abstract: A process for producing ceramic materials, especially flake, fiber and grain materials comprising solidifying a hydrated alumina sol, freeze drying the solidified sol and thereafter sintering the freeze dried material is disclosed. Ribbed flake material obtainable by the process is also disclosed.
Abstract translation: 公开了一种用于生产陶瓷材料，特别是薄片，纤维和颗粒材料的方法，包括固化水合氧化铝溶胶，冷冻干燥固化的溶胶，然后烧结冷冻干燥的材料。 还公开了可通过该方法获得的带肋薄片材料。
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45.发明公开Supported filtration membrane and method of manufacturing same 失效过滤膜自动切割机和Verfahren zu ihrer Herstellung。
公开(公告)号：EP0428083A2
公开(公告)日：1991-05-22
申请号：EP90121494.0
申请日：1990-11-09
Inventor： Hay, Robert A. , Willkens, Craig A. , Arsenault, Normand P.
CPC classification number: B01D69/125 , B01D63/062 , B01D67/0046 , B01D71/02 , B01D2325/02 , B01D2325/04 , C04B41/009 , C04B41/5066 , C04B41/87 , C04B2111/00801 , C04B41/0072 , C04B41/455 , C04B41/4582 , C04B35/10 , C04B38/0051 , C04B38/007
Abstract: Strong and durable silicon nitride filtration membranes with effective separating layers having effective pore diameters less than about 1 µm are produced by depositing a source of silicon onto a porous microfilter support, removing any liquid used in the depositing, and subjecting the silicon source to nitridation conditions. Suitable sources of silicon include silicon per se and silica. When silica is used, a suitable reducing agent is deposited therewith to reduce the silica to silicon in situ .
Abstract translation: 通过将硅源沉积到多孔微型过滤器支架上，去除沉积中使用的任何液体，并对硅源进行氮化，生产具有有效孔径小于约1μm的有效分离层的坚固耐用的氮化硅过滤膜 条件。 合适的硅源包括硅本身和二氧化硅。 当使用二氧化硅时，沉积合适的还原剂以将二氧化硅原位还原成硅。
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Patent Agency Ranking
公开(公告)号：EP0799680A3
公开(公告)日：1998-04-01
申请号：EP97200862.7
申请日：1997-03-21
Inventor： Bigelow, Louis Kimball
IPC: B28D5/04
CPC classification number: B28D5/045
Abstract: This invention relates to the field of cutting hard materials. More particularly, the invention describes a method and apparatus for cutting diamond. The method for cutting diamond according to the present invention, comprises the steps of providing a wire; heating said wire; and urging said wire and diamond together and moving said wire longitudinally. Preferably, the wire and/or diamond is heated to approach the metal-carbon eutectic temperature and create sensible reaction rates of the carbon on the wire surface. The wire can also carry a molten oxidant to enhance the cutting rate.
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公开(公告)号：EP0727507A3
公开(公告)日：1997-02-26
申请号：EP96200262.2
申请日：1996-02-06
Inventor： Fellbaum, Randy D. , Ulbrich, Volker R.
IPC: C23C16/26
CPC classification number: C23C16/01 , C23C16/26 , Y10S117/915
Abstract: A mandrel for use in a diamond deposition process has surfaces with different diamond adhesion properties. According to one embodiment, a mandrel is provided and has first and second surfaces on which a diamond film is deposited, with the second surface forming a perimeter around the first surface. The first surface of the mandrel has a first diamond bonding strength which is less than a second diamond bonding strength of the second surface. In an embodiment for forming a cup-shaped diamond film, the mandrel is a titanium nitride (TiN) coated molybdenum (Mo) substrate having a stepped solid cylindrical shape with a central mesa having a side wall or flank. The side wall is etched near the top surface of the mesa to expose a molybdenum band and to form a second surface which bounds the TiN first surface. When the molybdenum band loses efficiency as a result of diamond particles remaining in the molybdenum band after a diamond deposition procedure, a second strip of the TiN coating adjacent to the first strip may be etched or machined to expose a second band of molybdenum. Other embodiments of the invention include machining the molybdenum band on the mesa top surface, machining a stepped molybdenum band, using a separate and detachable molybdenum foil or wire applied to grooves in the mandrel, and forming radial lines or patches on the surface of the mandrel.
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48.发明公开Apparatus and method for depositing a substance with temperature control 失效Vorrichtung und Methode mit Temperaturreglung zum Abscheiden eines Werkstoffes
公开(公告)号：EP0747505A2
公开(公告)日：1996-12-11
申请号：EP96201480.9
申请日：1996-05-29
Inventor： Patten, Donald O., Jr. , Simpson, Matthew A. , Windischmann, Henry , Heuser, Michael S. , Quirk, William A. , Jaffe, Stephen M.
CPC classification number: C23C16/463 , C23C16/4586 , C23C16/46 , C23C16/52
Abstract: A method and corresponding apparatus for depositing a substance with temperature control on a surface of a substrate are disclosed.
The method comprises the steps of :
providing a cooling block having a surface that is cooled by heat exchange ;
supporting said substrate from said cooling block so that the bottom surface of said substrate is spaced from said cooling block surface by a gap ;
providing a gas in said gap ; and
depositing said substance on the top surface of said substrate.
With such a method, the temperature conditions are uniform and repeatable when depositing a substance on a substrate.
The invention is especially applicable to deposition of diamond by plasma jet.Abstract translation: 公开了一种用于在衬底的表面上沉积具有温度控制的物质的方法和相应的装置。 该方法包括以下步骤：提供具有通过热交换冷却的表面的冷却块; 从所述冷却块支撑所述衬底，使得所述衬底的底表面与所述冷却块表面间隔开间隙; 在所述间隙中提供气体; 并将所述物质沉积在所述基底的顶表面上。 通过这种方法，当将物质沉积在基底上时，温度条件是均匀的和可重复的。 本发明特别适用于通过等离子体射流沉积金刚石。
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49.发明公开Diamond-coated composite cutting tool and method of making 失效Diamantbeschichtetes zusammengesetztes Schneidwerkzeug und Verfahren zu dessen Herstellung
公开(公告)号：EP0701006A1
公开(公告)日：1996-03-13
申请号：EP95202161.6
申请日：1995-08-08
Inventor： Puiia, James M. , Chang, Chow Ling
CPC classification number: C23C16/274 , C23C16/02 , C23C16/0209 , C23C16/0227 , C23C16/0236 , C23C16/0245 , C23C16/0272 , C23C16/27 , Y10S427/106 , Y10T428/26 , Y10T428/30
Abstract: At least the surface region of a cutting tool substrate made of tungsten carbide in a cobalt matrix is carburized to chemically passivate the cobalt prior to deposition of diamond film on it. The passivation improves adhesion by preventing reaction of the cobalt with the diamond in the course of the deposition process.
Abstract translation: 在钴基体中由碳化钨制成的切削工具衬底的至少表面区域被渗碳以在沉积金刚石膜之前化学钝化钴。 钝化通过在沉积过程中防止钴与金刚石的反应来提高粘合性。
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50.发明公开
公开(公告)号：EP0661387A2
公开(公告)日：1995-07-05
申请号：EP94203694.8
申请日：1994-12-20
Inventor： Enniss, Dan O. , Simpson, Matthew
CPC classification number: C23C16/4584
Abstract: This invention relates to temperature control during material deposition and, more particularly, to controlling temperature of a substance experiencing high thermal energy fluxes while being deposited on a rotating surface.
In accordance with an embodiment of the invention for depositing a substance, there is provided a deposition chamber for containing heated constituents of the substance and a mandrel assembly, which includes a mandrel mounted on a base. The mandrel assembly is rotatable on an axis, and the mandrel thereof has a surface in said chamber.
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