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公开(公告)号:ES2104941T3
公开(公告)日:1997-10-16
申请号:ES92918844
申请日:1992-08-14
Applicant: SUMMIT TECHNOLOGY INC
Inventor: KLOPOTEK PETER J
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公开(公告)号:DE69122349D1
公开(公告)日:1996-10-31
申请号:DE69122349
申请日:1991-10-16
Applicant: SUMMIT TECHNOLOGY INC
Inventor: SEILER THEO
Abstract: Methods and apparatus for correction of optical defects in vision, employing an infrared radiation source and a focusing element, for changing the curvature of the eye (10) by application of focused infrared radiation (41) into the collagenous tissue (44) of the cornea (12) in a controlled manner.
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公开(公告)号:AU2206695A
公开(公告)日:1995-10-30
申请号:AU2206695
申请日:1995-04-05
Applicant: SUMMIT TECHNOLOGY INC
Inventor: MULLER DAVID F , AGATI MIKE D , FRIEDMAN MARC , HARMON TROY , KLOPOTEK PETER , SACHAROFF ALEX , SHERR EVAN
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公开(公告)号:AU7099694A
公开(公告)日:1995-01-03
申请号:AU7099694
申请日:1994-06-03
Applicant: SUMMIT TECHNOLOGY INC
Inventor: KLOPOTEK PETER J
Abstract: Apparatus and methods to modify the intensity distribution of a beam of radiation, such as a laser, and for eroding surfaces with predetermined shapes. A rotatable mask is formed with one or more apertures that have a geometric spiral shape originating substantially the center of rotation on the mask. The mask is insert to the beam for modification of the intensity of that beam, and additionally to form the desired etch pattern on a target surface. In a preferred embodiment, the invention is useful for performing kerotoplasty or keratomileusis.
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公开(公告)号:AU4369793A
公开(公告)日:1994-11-21
申请号:AU4369793
申请日:1993-05-03
Applicant: SUMMIT TECHNOLOGY INC
Inventor: KLOPOTEK PETER J
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公开(公告)号:AU2511992A
公开(公告)日:1994-03-15
申请号:AU2511992
申请日:1992-08-14
Applicant: SUMMIT TECHNOLOGY INC
Inventor: KLOPOTEK PETER J
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公开(公告)号:AU4385093A
公开(公告)日:1993-12-13
申请号:AU4385093
申请日:1993-05-20
Applicant: SUMMIT TECHNOLOGY INC
Inventor: KLOPOTEK PETER J
Abstract: A method and device for lifting the epithelium from a selected area of the eye using an incision instrument for cutting the epithelium to define an area of the epithelium to be removed, and a fluid jet assembly for separating the selected area of the epithelium from the underlying layer. The incision instrument shown has a series of incision elements distributed about a peripheral pattern, arranged to cut the epithelium in the direction of its thickness without disturbing the underlying layer, to create a tear line. The jet assembly directs through the tear line a fluid jet in the manner that the fluid progresses inwardly from the tear line and effectively wedges the epithelium from the underlying layer. The device shown also has an epithelium support structure for engaging the exterior surface of the delineated area of the epithelium in order to support and maintain the structural integrity of the lifted epithelium. The lifted epithelium can be biologically preserved and repositioned after a medical procedure is conducted on the exposed surface of the eye. Isotonic fluids for maintaining the biological balance of the eye tissue and use of softening agents for aiding in the release of scarred or tenaciously held epithelium are also disclosed.
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公开(公告)号:CA2066842A1
公开(公告)日:1992-10-24
申请号:CA2066842
申请日:1992-04-22
Applicant: SUMMIT TECHNOLOGY INC
Inventor: MULLER DAVID F
IPC: A61K9/08 , A61K31/045 , A61P27/02
Abstract: Aliphatic alcohols are disclosed for the treatment of discomfort and visual artifacts following laser surgical procedures on the cornea of the eye. Such compositions reduce the inflammation associated with photorefractive keratectomy and promote the regrowth of epithelial tissue over the reprofiled corneal surface.
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公开(公告)号:AU7160687A
公开(公告)日:1987-10-09
申请号:AU7160687
申请日:1987-03-19
Applicant: SUMMIT TECHNOLOGY INC
Inventor: RAVEN ANTONY LOVELL , MARSHALL JOHN , MULLER DAVID F
Abstract: A laser system and masking apparatus for reprofiling surfaces, such as corneal surfaces. The system includes a laser and a mask disposed between the laser and the surface to be reprofiled, the mask providing a pre-defined profile of resistance to laser radiation, such that upon irradiation, part of the radiation is selectively absorbed and part is transmitted to the surface in accordance with the masked profile, to selectively erode the surface. The masking apparatus may consist of a mask to be affixed to the surface or may further include a support structure to support and position the mask above the surface. The resistance profile can be created by varying the thickness or the composition of the mask.
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