公开(公告)号：EP4163715A1

公开(公告)日：2023-04-12

申请号：EP21201043.3

申请日：2021-10-05

Applicant: ASML Netherlands B.V.

Inventor： AJGAONKAR, Mahesh, Upendra ,  ABDOLVAND, Amir ,  PONGERS, Willem, Richard ,  BASELMANS, Johannes, Jacobus, Matheus ,  NI, Yongfeng

IPC: G02F1/35 ,  G02B6/02 ,  G02F1/365

Abstract: Radiation source assembly and method for generating broadband radiation by spectral broadening. The radiation source assembly comprises a pump assembly configured to provide broadband input radiation. The pump assembly comprises a pump source configured to provide first radiation at a pump wavelength, and a broadband assembly configured to provide second radiation comprising a continuous wavelength range, wherein the first radiation and the second radiation form the broadband input radiation. The radiation source assembly further comprises an optical fibre configured to receive the broadband input radiation. The optical fibre comprises a core configured along at least a part of the length of the fibre to guide the received broadband input radiation during propagation through the fibre, so as to generate broadband radiation by spectral broadening to be output by the fibre.

公开(公告)号：EP3172624B1

公开(公告)日：2020-01-01

申请号：EP15734325.2

申请日：2015-06-26

Applicant: ASML Netherlands B.V.

Inventor： POLET, Theodorus, Wilhelmus ,  BASELMANS, Johannes, Jacobus, Matheus ,  BOUMAN, Willem, Jan ,  LEMPENS, Han, Henricus, Aldegonda ,  MODDERMAN, Theodorus, Marinus ,  ROPS, Cornelius, Maria ,  SMEETS, Bart ,  STEFFENS, Koen ,  VAN DER HAM, Ronald

IPC: G03F7/20

公开(公告)号：EP3172624A1

公开(公告)日：2017-05-31

申请号：EP15734325.2

申请日：2015-06-26

Applicant: ASML Netherlands B.V.

Inventor： POLET, Theodorus, Wilhelmus ,  BASELMANS, Johannes, Jacobus, Matheus ,  BOUMAN, Willem, Jan ,  LEMPENS, Han, Henricus, Aldegonda ,  MODDERMAN, Theodorus, Marinus ,  ROPS, Cornelius, Maria ,  SMEETS, Bart ,  STEFFENS, Koen ,  VAN DER HAM, Ronald

IPC: G03F7/20

Abstract: An immersion lithographic apparatus includes a projection system. The projection system is configured to project a patterned radiation beam through an immersion liquid onto a target portion of a substrate. An external surface of the projection system includes a first surface. The first surface has a non-planar shape. An element is attached to the first surface and positioned so that at least a portion of the element contacts the immersion liquid in use. The element includes a closed loop of continuously integral material in a preformed state and conforms to the non-planar shape of the first surface.

Abstract translation: 公开了光刻设备和器件制造方法。 在一种布置中，提供了一种包括投影系统（PS）的浸没式光刻设备。 投影系统被配置成将图案化的辐射束通过浸没液体投影到衬底的目标部分上。 投影系统的外表面包括第一表面（102）。 第一个表面具有非平面形状。 元件（106）附接到第一表面并且被定位成使得元件的至少一部分在使用中接触浸没液体。 该元件包括处于预成型状态并且与第一表面的非平面形状一致的闭合的连续整体材料环。

公开(公告)号：EP1966651A2

公开(公告)日：2008-09-10

申请号：EP06838970.9

申请日：2006-12-05

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： SEWELL, Harry ,  BASELMANS, Johannes, Jacobus, Matheus

IPC: G03C5/00

CPC classification number: G03B27/54 ,  G03F7/70408

Abstract: A system and method are provided for writing patterns onto substrates. First and second beams are directed to converge and substantially overlap in a common region on a substrate. This can be done so that the first and second beams are mutually temporally coherent and spatially coherent in the region of overlap to form interference fringes to define a writing image. A beam width of the first and second beams is adjusted. This can be done so that respective path lengths of the beams are matched when they reach the common region to ensure the first and second beams are mutually spatially coherent and temporally coherent across an entire width of the common region. In one example, the substrate is moved with respect to the writing image, while writing patterns onto the substrate. In another example, the substrate remains stationary.

公开(公告)号：EP1626310A1

公开(公告)日：2006-02-15

申请号：EP05105767.7

申请日：2005-06-28

Applicant: ASML Netherlands B.V.

Inventor： JEUNINK, Andre, Bernardus ,  AKHSSAY, M'hamed ,  BASELMANS, Johannes, Jacobus, Matheus ,  COMMISSARIS,Franciscus,Antonius,Chrysogonus, Marie ,  VAN DIJK, Remco, Marcel ,  DE GROOT, Simon ,  TEL, Wim, Tjibbo ,  VAN DER HOFF, Alexander, Hendrikus, Martinus ,  VAN DE STADT, Arnout

IPC: G03F7/20

CPC classification number: G03F7/70891 ,  G03F7/70258 ,  G03F7/70491 ,  G03F7/705 ,  G03F7/706 ,  G03F9/7046

Abstract: A manufacturing method is utilized in lithographic projection apparatus in order to enable all aberrations to be compensated for but with those aberrations that arc of most significance to the particular application (the particular pattern, illumination mode, etc.) being given precedence over aberrations that are of lesser significance in relation to that particular application. The method uses a substrate having a target portion for receiving an image, a mask for applying a pattern in accordance with a required patterning application, and a projection system to project a selected beam of radiation onto the mask to produce a specific required patterned beam providing an image of the pattern on the target portion. In order to compensate for the aberrations in a manner that gives precedence to those aberrations of particular significance to the required application, the method incorporates the steps of predicting projection system aberration changes with time, determining the application-specific effect on certain parameters of the image of such predicted projection system aberration changes with respect to certain measured aberration values , generating a control signal specific to the required patterned beam according to such predicted projection system aberration changes in the projection system aberrations with time and their application-specific effect on certain parameters of the image; and carrying out imaging adjustments in dependence on the control signal to compensate for the application-specific effect of the predicted changes in the aberrations on the image. The adjustments arc therefore determined optimally for the given application.

Abstract translation: 在光刻投影设备中使用制造方法，以便能够补偿所有像差，但是对于特定应用（特定图案，照明模式等）具有最重要意义的那些像差优先于像差， 对该特定应用而言意义不大。 该方法使用具有用于接收图像的目标部分的基板，用于根据所需图案化应用来施加图案的掩模，以及将所选择的辐射束投影到掩模上以产生特定的所需图案束提供的投影系统 目标部分上的图案的图像。 为了以对所需应用具有特殊意义的像差优先的方式补偿像差，该方法包括随时间预测投影系统像差变化的步骤，确定对图像的某些参数的应用特定影响 这种预测的投影系统像差相对于某些测量的像差值发生变化，根据投影系统像差随时间的这种预测的投影系统像差变化产生对所需图案光束特有的控制信号，以及其对某些参数的应用特定影响 图片; 并且根据控制信号进行成像调整，以补偿预测图像上像差变化的应用特定效果。 因此，对于给定的应用，调整被最佳地确定。