公开(公告)号：EP3796089A1

公开(公告)日：2021-03-24

申请号：EP19203613.5

申请日：2019-10-16

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V. ,  Stichting Nederlandse Wetenschappelijk ,  Stichting VU ,  Universiteit van Amsterdam

Inventor： MEHTA, Nikhil ,  KOOLEN, Armand Eugene Albert ,  KREUZER, Justin ,  WARNAAR, Patrick ,  TENNER, Vasco Tomas

IPC: G03F7/20 ,  G01N21/956

Abstract: Disclosed is a method for a metrology measurement on an area of a substrate comprising at least a portion of a target structure. The method comprises receiving a radiation information representing a portion of radiation scattered by the are, and using a filter in a Fourier domain for removing or suppressing at least a portion of the received radiation information that does not relate to radiation that has been scattered by the target structure for obtaining a filtered radiation information for the metrology measurement, wherein characteristics of the filter are based on target information about the target structure.

公开(公告)号：EP3647871A1

公开(公告)日：2020-05-06

申请号：EP18203837.2

申请日：2018-10-31

Applicant: ASML Netherlands B.V.

Inventor： WARNAAR, Patrick ,  BOS, Hilko, Dirk ,  SMILDE, Hendrik, Jan, Hidde ,  HAJIAHMADI, Mohammadreza

IPC: G03F7/20 ,  G01N21/47

Abstract: The disclosure relates to determining a value of a parameter of interest of a patterning process. A plurality of calibration data units is obtained from targets in a metrology process. Each of at least two of the calibration data units represents detected radiation obtained using different respective polarization settings in the metrology process, each polarization setting defining a polarization property of incident radiation of the metrology process and a polarization property of detected radiation of the metrology process. The calibration data units are used to obtain calibration information about the metrology process. A measurement data unit representing detected radiation scattered from a further target is obtained, the further target comprising a structure formed using the patterning process on the substrate or on a further substrate. The value of the parameter of interest is determined using the measurement data unit and the obtained calibration information.

公开(公告)号：EP3605230A1

公开(公告)日：2020-02-05

申请号：EP18186825.8

申请日：2018-08-01

Applicant: Stichting VU ,  Stichting Nederlandse Wetenschappelijk Onderzoek Instituten ,  Universiteit van Amsterdam ,  ASML Netherlands B.V.

Inventor： TINNEMANS, Patricius Aloysius Jacobus ,  WARNAAR, Patrick ,  TENNER, Vasco Tomas

IPC: G03F7/20

Abstract: Disclosed is a method for obtaining a computationally determined interference electric field describing scattering of radiation by a pair of structures comprising a first structure and a second structure on a substrate. The method comprises determining a first electric field relating to first radiation scattered by the first structure; determining a second electric field relating to second radiation scattered by the second structure; and computationally determining the interference of the first electric field and second electric field, to obtain a computationally determined interference electric field.

公开(公告)号：EP3441819A1

公开(公告)日：2019-02-13

申请号：EP17185116.5

申请日：2017-08-07

Applicant: ASML Netherlands B.V.

Inventor： WARNAAR, Patrick ,  TINNEMANS, Patricius, Aloysius Jacobus ,  GRZELA, Grzegorz ,  MOS, Everhardus, Cornelis

IPC: G03F7/20

Abstract: A method, includes obtaining, for each particular feature of a plurality of features of a device pattern of a substrate being created using a patterning process, a modelled or simulated relation of a parameter of the patterning process between a measurement target for the substrate and the particular feature; and based on the relation and measured values of the parameter from the metrology target, generating a distribution of the parameter across at least part of the substrate for each of the features, the distributions for use in design, control or modification of the patterning process.