公开(公告)号：EP3396458A1

公开(公告)日：2018-10-31

申请号：EP17168801.3

申请日：2017-04-28

Applicant: ASML Netherlands B.V.

Inventor： HAUPTMANN, Marc ,  MOS, Everhardus, Cornelis ,  KOU, Weitian ,  YPMA, Alexander ,  KUPERS, Michiel ,  YU, Hyun-Woo ,  HAN, Min-Sub

IPC: G03F7/20 ,  G05B19/418

CPC classification number: G03F7/70633 ,  G03F7/70525 ,  G05B19/41875

Abstract: A lithographic process is performed on a set of semiconductor substrates consisting of a plurality of substrates. As part of the process, the set of substrates is partitioned into a number of subsets. The partitioning may be based on a set of characteristics associated with a first layer on the substrates. A fingerprint of a performance parameter is then determined for at least one substrate of the set of substrates. Under some circumstances, the fingerprint is determined for one substrate of each subset of substrates. The fingerprint is associated with at least the first layer. A correction for the performance parameter associated with an application of a subsequent layer is then derived, the derivation being based on the determined fingerprint and the partitioning of the set of substrates.

公开(公告)号：EP4449203A1

公开(公告)日：2024-10-23

申请号：EP22818084.0

申请日：2022-11-21

Applicant: ASML Netherlands B.V.

Inventor： DOUNAEV, Dimitriy ,  GKOROU, Dimitra ,  VAN HERTUM, Pieter ,  LIJFFIJT, Jefrey ,  VAN SCHOUBROECK, Joachim Kinley ,  KAREVAN, Zahra ,  YPMA, Alexander

IPC: G03F7/20 ,  G06N20/00

公开(公告)号：EP4127834A1

公开(公告)日：2023-02-08

申请号：EP21707304.8

申请日：2021-03-01

Applicant: ASML Netherlands B.V.

Inventor： KOULIERAKIS, Eleftherios ,  LANCIA, Carlo ,  GONZALEZ HUESCA, Juan Manuel ,  YPMA, Alexander ,  GKOROU, Dimitra ,  SAHRAEIAN, Reza

IPC: G03F7/20

公开(公告)号：EP4111262A1

公开(公告)日：2023-01-04

申请号：EP21701325.9

申请日：2021-01-26

Applicant: ASML Netherlands B.V.

Inventor： LARRANAGA, Maialen ,  GKOROU, Dimitra ,  YPMA, Alexander

IPC: G03F7/20 ,  G05B19/418

公开(公告)号：EP3872567A1

公开(公告)日：2021-09-01

申请号：EP20159192.2

申请日：2020-02-25

Applicant: ASML Netherlands B.V.

Inventor： LARRANAGA, Maialen ,  GKOROU, Dimitra ,  YPMA, Alexander

IPC: G03F7/20 ,  G05B19/418

Abstract: Described herein is a model free reinforcement learning system and method for determining a relationship between sequences of states of a wafer across multiple process steps and process yield for the wafer. The system and method are configured such that an optimal policy (e.g. sequence of through stack actions) is defined which produces optimum wafer yield and/or a lowest cost (in view of metrology time for example) processing process.

公开(公告)号：EP3594749A1

公开(公告)日：2020-01-15

申请号：EP18182594.4

申请日：2018-07-10

Applicant: ASML Netherlands B.V.

Inventor： BASTANI, Vahid ,  YPMA, Alexander

IPC: G03F7/20 ,  G05B19/418

Abstract: A method of grouping data associated with substrates undergoing a process step of a manufacturing process is disclosed. The method comprises obtaining first data associated with substrates before being subject to the process step and obtaining a plurality of sets of second data associated with substrates after being subject to the process step, each set of second data being associated with a different value of a characteristic of the first data in common. A distance metric is determined which describes a measure of distance between the sets of second data; and the second data is grouped based on a property of the distance metric.

公开(公告)号：EP3279737A1

公开(公告)日：2018-02-07

申请号：EP16183008.8

申请日：2016-08-05

Applicant: ASML Netherlands B.V.

Inventor： YPMA, Alexander ,  KOOPMAN, Adrianus, Cornelis, Matheus ,  MIDDLEBROOKS, Scott, Anderson

IPC: G03F7/20 ,  H01L21/66 ,  G06K9/62

CPC classification number: G03F7/70616 ,  G03F7/70508 ,  G03F7/70525 ,  G06K9/6296 ,  H01L22/20 ,  Y02P90/86

Abstract: A diagnostic system (242, 244, 236, 248) implements a network comprising two or more sub-domains (DOM-A, B , C). Each sub-domains comprises diagnostic information extracted by analysis of object data, the first object data representing one or more first parameters measured in relation to a first set of product units that have been subjected nominally to the same industrial process as one another. The network further comprises at least one probabilistic connection (622, 624, 626) from a first variable in a first diagnostic sub-domain to a second variable in a second diagnostic sub-domain. Part of the second diagnostic information is thereby being influenced probabilistically by knowledge within the first diagnostic information. Diagnostic information may comprise for example a spatial fingerprint observed in the object data, or inferred. The network may include connections within sub-domains. The network may form a directed acyclic graph, and used for Bayesian inference operations.

Abstract translation: 诊断系统（242,244,236,248）实现包括两个或更多个子域（DOM-A，B，C）的网络。 每个子域包括通过对象数据的分析而提取的诊断信息，第一对象数据表示关于第一组产品单位测量的一个或多个第一参数，第一组产品单位在名义上经历了彼此相同的工业过程。 网络还包括从第一诊断子域中的第一变量到第二诊断子域中的第二变量的至少一个概率连接（622,624,626）。 因此第二诊断信息的一部分由第一诊断信息内的知识概率性地受到影响。 诊断信息可以包括例如在对象数据中观察到的或推断的空间指纹。 网络可以包括子域内的连接。 网络可以形成有向无环图，并用于贝叶斯推理操作。