公开(公告)号：JP2006114899A

公开(公告)日：2006-04-27

申请号：JP2005295920

申请日：2005-10-11

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： COX HENRIKUS HERMAN MARIE ,  BUTLER HANS ,  KUNST RONALD CASPER ,  VEN DER SCHOOT HARMEN KLAAS ,  DE VOS YOUSSEF KAREL MARIA

IPC: H01L21/027 ,  G03F9/00 ,  H01L21/68

CPC classification number: G03F7/70725

Abstract: PROBLEM TO BE SOLVED: To dispense with an actuator for accurately positioning, without deteriorating accuracy in positioning of an actuator driven assembly. SOLUTION: In order to obtain a high acceleration and high traveling speed of a pattern support or a substrate table of a lithography apparatus, one of the pattern support and the substrate table is supported by an actuator for relatively larger displacement, and the actuator for accurately positioning is dispensed with. The other of the pattern support and the substrate table is supported by the actuator assembly including the actuator for accurately positioning and the actuator for relatively larger displacement. By providing a control system adapted to align the other of the pattern support and the substrate table, so that the positioning error of one of the pattern support and the substrate table is compensated by the positioning of the other, a positioning accuracy of the pattern forming apparatus and the substrate is achieved. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：省略用于精确定位的致动器，而不会降低致动器驱动组件的定位精度。 解决方案：为了获得光刻设备的图案支撑件或基板台的高加速度和高行进速度，图案支撑件和基板台之一由用于相对较大位移的致动器支撑，并且 省去了用于精确定位的执行器。 图案支撑和基板台中的另一个由包括用于精确定位的致动器和用于相对较大位移的致动器的致动器组件支撑。 通过提供一种适于对准图案支架和基片台中的另一个的控制系统，使得图案支架和基板台之一的定位误差由另一方的定位补偿，图形形成的定位精度 设备和基板。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2005101606A

公开(公告)日：2005-04-14

申请号：JP2004273015

申请日：2004-09-21

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： BUTLER HANS

IPC: G03F7/20 ,  G05D3/12 ,  H01L21/027

CPC classification number: G03F7/70725

Abstract: PROBLEM TO BE SOLVED: To provide a lithography device using a method for lowering sensitivity of a position control unit for movable objects in the lithography device in order to suppress disturbance influence on the position control unit. SOLUTION: The position control unit has a position controller (6), an object expressed as an object filter (Ho), a position feedback circuit (22) and acceleration control equipment (34). The acceleration control equipment (34) has a subtractor (8), the first filter (Hf) in the first circuit branch, and the second filter (Hs) in the second circuit branch. While signal (Fp) outputted from the position controller is inputted to the subtractor (8), the disturbance force (Fd) is inputted directly to the object (Ho). The first transfer function (G1) relating to the first position controller force (Fp) is different from the second transfer function (G2) relating to the disturbance force (Fd). The first transfer function (G1) is the same as transfer function relating to the position controller force (Fp) in case that there is no acceleration control equipment (34). COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：为了提供一种光刻装置，其使用用于降低光刻装置中的可移动物体的位置控制单元的灵敏度的方法，以便抑制对位置控制单元的干扰影响。 解决方案：位置控制单元具有位置控制器（6），表示为对象过滤器（Ho）的对象，位置反馈电路（22）和加速控制设备（34）。 加速控制装置（34）具有减法器（8），第一电路支路中的第一滤波器（Hf）和第二电路支路中的第二滤波器（Hs）。 当从位置控制器输出的信号（Fp）被输入到减法器（8）时，干扰力（Fd）被直接输入到物体（Ho）。 与第一位置控制器力（Fp）相关的第一传递函数（G1）与与干扰力（Fd）有关的第二传递函数（G2）不同。 在没有加速控制装置的情况下，第一传递函数（G1）与与位置控制器力（Fp）相关的传递函数相同。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2005005707A

公开(公告)日：2005-01-06

申请号：JP2004169275

申请日：2004-06-08

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： JOERI LOF ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBER ,  KOLESNYCHENKO ALEKSEY ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARI ,  MULKENS JOHANNES CATHARINUS HU ,  RITSEMA ROELOF AEILKO SIEBRAND ,  VAN SCHAIK FRANK ,  SENGERS TIMOTHEUS FRANCISCUS ,  SIMON KLAUS ,  DE SMIT JOANNES THEODOOR ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  BIJLAART ERIK THEODORUS MARIA ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  VAN SANTEN HELMAR ,  VAN DE KERKHOF MARCUS ADRIANUS ,  KROON MARK ,  DEN BOEF ARIE JEFFREY ,  OTTENS JOOST JEROEN ,  MERTENS JEROEN JOHANNES SOPHIA

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

Abstract: PROBLEM TO BE SOLVED: To provide an immersion type lithography projection apparatus with improved functionality. SOLUTION: The highlights of this invention are that the lithography apparatus is equipped with a radiation system Ex to provide the projection beams PB of radiation including a radioactive source LA, a primary object table (mask table) MT connected to a primary positioning means to correctly position a mask against IL and a member PL, a secondary object table (substrate table) WT connected to a secondary positioning means to correctly position a substrate against the member PL, and a projection system PL to form an image of the irradiated part of the mask MA on the target part of the substrate W. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供具有改进的功能的浸没式光刻投影装置。 解决方案：本发明的亮点在于，光刻设备配备有辐射系统Ex以提供包括放射源LA的辐射投影束PB，连接到主要定位的主要物体台（掩模台）MT 用于将掩模正确地定位在IL和构件PL上的装置，连接到二次定位装置以将衬底正确地定位在构件PL上的第二对象台（衬底台）WT，以及用于形成照射的图像的投影系统PL 在基板W的目标部分上的掩模MA的一部分。版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2004289127A

公开(公告)日：2004-10-14

申请号：JP2003417260

申请日：2003-11-11

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： LOF JOERI ,  BIJLAART ERIK THEODORUS MARIA ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBER ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  KOLESNYCHENKO ALEKSEY ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARI ,  MERTENS JEROEN JOHANNES SOPHIA ,  MULKENS JOHANNES CATHARINUS HU ,  RITSEMA ROELOF AEILKO SIEBRAND ,  SCHAIK FRANK VAN ,  SENGERS TIMOTHEUS FRANCISCUS ,  SIMON KLAUS ,  DE SMIT JOHANNES THEODOOR ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  VAN SANTEN HELMAR

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F7/70866

Abstract: PROBLEM TO BE SOLVED: To disclose a lithography projector in which a space between the final element of a projection system and a substrate is filled with liquid. SOLUTION: Hermetic edge sealing members 17 and 117 surround a substrate W on a substrate table WT or another object at least partially thus preventing the catastrophic loss of the liquid when the edge part of the substrate is imaged or illuminated. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：公开一种其中投影系统的最终元件和基板之间的空间被液体填充的光刻投影仪。 解决方案：密封边缘密封构件17和117围绕基板台WT或另一物体上的基板W，至少部分地防止当基板的边缘部分成像或照明时液体的灾难性损失。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2003115450A

公开(公告)日：2003-04-18

申请号：JP2002201958

申请日：2002-06-06

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS

IPC: G03F7/20 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus, a device-manufacturing method, and a device that is manufactured by the method. SOLUTION: A control system for a mask table (patterning means) and substrate tables predicts the instantaneous position error in the substrate table, and feeds the position error to a control loop of the mask table for adding to the mask table set point as force to be operated on the mask table.

公开(公告)号：JP2013004979A

公开(公告)日：2013-01-07

申请号：JP2012134491

申请日：2012-06-14

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： FANG CHUN-HSIANG ,  BUTLER HANS ,  VAN EIJK JAN ,  HOL SVEN ANTOIN JOHAN ,  VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS ,  VAN DE VEN BASTIAAN LAAMBERTUS WILHELMUS MARINUS ,  JOHANNES PETRUS MARTINUS BERNARDUS VERMEULEN ,  THEODORUS PETRUS MARIA CADEE ,  ROBERT EDGAR VAN LIWEN

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

CPC classification number: G03F7/7085 ,  G03F7/70783

Abstract: PROBLEM TO BE SOLVED: To further improve control of a substrate table of a lithographic apparatus, for example.SOLUTION: A lithographic apparatus includes a projection system, a substrate table, a plurality of sensors, at least one actuator, and a controller. The projection system is configured to project a patterned beam of radiation onto a substrate. The substrate table is configured to support the substrate and to move relative to the projection system. The plurality of sensors are configured to measure a deformation of the substrate table. The at least one actuator is configured to deform the substrate table. The controller is configured to control the actuator to deform the substrate table on the basis of measurements made by the sensors. The plurality of sensors are located on a first side of the substrate table opposite to a second side of the substrate table facing the projection system. The plurality of sensors are substantially stationary relative to the projection system.

Abstract translation: 要解决的问题：例如，为了进一步改进光刻设备的基板台的控制。 解决方案：光刻设备包括投影系统，衬底台，多个传感器，至少一个致动器和控制器。 投影系统被配置为将图案化的辐射束投射到衬底上。 衬底台被配置为支撑衬底并相对于投影系统移动。 多个传感器被配置成测量衬底台的变形。 所述至少一个致动器构造成使所述衬底台变形。 控制器被配置为基于由传感器进行的测量来控制致动器使基板台变形。 所述多个传感器位于所述基板台的与所述基板台面对所述投影系统的第二侧相反的第一侧。 多个传感器相对于投影系统基本上是静止的。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2011176310A

公开(公告)日：2011-09-08

申请号：JP2011031905

申请日：2011-02-17

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BUTLER HANS ,  EUSSEN EMIEL JOZEF MELANIE ,  KOENEN WILLEM HERMAN GERTRUDA ANNA ,  VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS ,  HARMEN KLAAS VAN DER SCHOOT ,  VAN DER WIJST MARC WILHELMUS MARIA ,  VERMAELEN MARKUS MARTINUS PETRUS ADRIANUS ,  DE HOON CORNELIUS ADRIANUS LAMBERTUS

IPC: H01L21/027 ,  H01L21/68

CPC classification number: G03F7/70775 ,  G03F7/70516 ,  G03F7/70758 ,  G03F7/70783

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus having an improved positioning accuracy of a stage thereof.
SOLUTION: A lithographic apparatus includes: a stage that holds an object and is movable relative to a reference structure within a motion range; a magnet structure that provides a spatially varying magnetic field in at least a part of the motion range and is movable relative to the reference structure and the stage; a first position measuring system to provide a first measurement signal corresponding to a position of the stage and/or the object in a measuring direction relative to the reference structure; a second position measuring system to provide a second measurement signal corresponding to a position of the stage relative to the magnet structure; and a data processor that corrects the first measurement signal with a value dependent on the second measurement signal to provide a first corrected measurement signal representing the position of the stage and/or the object in the measuring direction relative to the reference structure.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种具有提高其阶段的定位精度的光刻设备。 解决方案：光刻设备包括：保持物体并且在运动范围内相对于参考结构可移动的平台; 磁体结构，其在所述运动范围的至少一部分中提供空间变化的磁场并且可相对于所述参考结构和所述平台移动; 第一位置测量系统，用于相对于参考结构在测量方向上提供对应于舞台和/或物体的位置的第一测量信号; 第二位置测量系统，用于提供对应于舞台相对于磁体结构的位置的第二测量信号; 以及数据处理器，其以取决于第二测量信号的值来校正第一测量信号，以提供表示相对于参考结构的测量方向上的台和/或物体的位置的第一校正测量信号。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011097056A

公开(公告)日：2011-05-12

申请号：JP2010240355

申请日：2010-10-27

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BUTLER HANS ,  GROENENDIJK REMCO JOCHEM SEBASTIAAN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F9/7026 ,  G03F7/70525

Abstract: PROBLEM TO BE SOLVED: To reduce lithographIC errors. SOLUTION: The variations in the position of a substrate, in a direction substantially parallel to the propagation direction of the radiation beam being projected, or to be projected on the substrate, is determined as conditions where lithographic error can occur, when a pattern is projected on the substrate by using the radiation beam. In order to reduce the lithographic error, the nature of radiation beam is controlled, when the radiation beam is projected on the substrate, or while in the course of being projected by utilizing the variations in the position of the substrate. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：减少光刻误差。 解决方案：基板平行于被投影的辐射束的传播方向的方向上的位置的变化或要投影到基板上的位置的变化被确定为可以发生光刻误差的条件，当a 通过使用辐射束将图案投影在基板上。 为了减少光刻误差，当辐射束投射到基板上时，或者在通过利用基板的位置的变化在投影的过程中，控制辐射束的性质。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010161421A

公开(公告)日：2010-07-22

申请号：JP2010097301

申请日：2010-04-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JOERI LOF ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  KOLESNYCHENKO ALEKSEY ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARIA ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  RITSEMA ROELOF AEILKO SIEBRAND ,  VAN SCHAIK FRANK ,  SENGERS TIMOTHEUS FRANCISCUS ,  SIMON KLAUS ,  DE SMIT JOANNES THEODOOR ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  BIJLAART ERIK THEODORUS MARIA ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  VAN SANTEN HELMAR ,  VAN DE KERKHOF MARCUS ADRIANUS ,  KROON MARK ,  DEN BOEF ARIE JEFFREY ,  OTTENS JOOST JEROEN ,  MERTENS JEROEN JOHANNES SOPHIA MARIA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

Abstract: PROBLEM TO BE SOLVED: To provide an immersion type lithography projection apparatus with improved functionality. SOLUTION: The lithography projection apparatus includes: a radiation system Ex, IL also equipped with a radiation source LA, for providing the projection beams PB of radiation; a first object table (mask table) MT connected to a first positioning means, for correctly positioning a mask with respect to a member PL; a second object table (substrate table) WT connected to a second positioning means, for correctly positioning a substrate with respect to the member PL; and a projection system PL for forming an image of the radiated part of the mask MA on the target part C of the substrate W. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供具有改进的功能的浸没式光刻投影装置。 光刻投影设备包括：辐射系统Ex，IL，其还配备有辐射源LA，用于提供辐射的投影光束PB; 连接到第一定位装置的第一目标表（掩模台）MT，用于相对于构件PL正确定位掩模; 连接到第二定位装置的第二对象台（衬底台）WT，用于相对于构件PL正确定位衬底; 以及用于在基板W的目标部分C上形成掩模MA的辐射部分的图像的投影系统PL。版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2010147470A

公开(公告)日：2010-07-01

申请号：JP2009281091

申请日：2009-12-11

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VERMEULEN JOHANNES PETRUS MARTINUS ,  MARCEL KOENRAAD MARIE BAGGEN ,  BUTLER HANS ,  COX HENRIKUS HERMAN MARIE ,  VAN EIJK JAN ,  JEUNINK ANDRE BERNARDUS ,  KEMPER NICOLAAS R ,  MUNNIG SCHMIDT ROBERT-HAN ,  VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS ,  VAN DER WIJST MARC WILHELMUS MARIA ,  CADEE THEODORUS PETRUS MARIA ,  FRANSICUS MATHIJS JACOBS ,  VALENTIN CHRISTIAAN LOUIS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03B27/42 ,  G03F7/707 ,  G03F7/70775 ,  G03F7/70816 ,  G03F7/70866

Abstract: PROBLEM TO BE SOLVED: To provide a patterning device support that leads to improvement in overlays. SOLUTION: Lithographic apparatus includes a position controller for selectively pressurizing, at least one of sides of a patterning device M to control the position of the patterning device M in its planar direction. The position controller includes a gas supply section and one or a plurality of outflow openings directed to the side of the gas pressure supply section, to apply a pressurized gas to at least one side of the patterning device to control the position of the patterning device, in its planar direction in a non-contact manner. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供导致覆盖层改进的图案形成装置支撑件。 解决方案：平版印刷设备包括位置控制器，用于选择性地加压图案形成装置M的至少一个边以控制图案形成装置M在其平面方向上的位置。 位置控制器包括气体供给部和指向气体压力供应部侧的一个或多个流出开口，以将加压气体施加到图案形成装置的至少一侧，以控制图案形成装置的位置， 在其平面方向上以非接触方式。 版权所有（C）2010，JPO＆INPIT