公开(公告)号：JP2009060127A

公开(公告)日：2009-03-19

申请号：JP2008274725

申请日：2008-10-24

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KOLESNYCHENKO ALEKSEY YURIEVIC ,  BASELMANS JOHANNES JACOBUS MAT ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  JEROEN JOHANNES SOPHIA MARIA M ,  MULKENS JOHANNES CATHARINUS HU ,  PEETERS FELIX GODFRIED PETER ,  STREEFKERK BOB ,  TEUNISSEN FRANCISCUS JOHANNES ,  VAN SANTEN HELMAR

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

CPC classification number: G03F7/70341 ,  G03F7/70733 ,  G03F7/70866 ,  G03F7/70908

Abstract: PROBLEM TO BE SOLVED: To provide a substrate table of an immersion lithographic apparatus, which is so configured as to prevent contamination with immersion liquid. SOLUTION: A substrate table WT is provided with a drainage ditch, namely, a barrier 40 surrounding an outer peripheral edge of a substrate W, and a barrier 100 surrounding another object 20 like a sensor existing on practically the same plane as an upper face of the substrate W. Since the barriers 40 and 100 can collect any liquid spilt from a liquid supply system during exposure of the substrate W, the risk of contamination of delicate components of a lithographic projection apparatus is reduced. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供浸没式光刻设备的基板台，其被设置为防止浸没液体的污染。 解决方案：衬底台WT设置有排水沟，即围绕衬底W的外围边缘的阻挡层40，以及围绕另一物体20的阻挡物100，像传感器存在于与实际上相同的平面上的传感器 由于障碍物40和100可以收集在衬底W暴露期间从液体供应系统溢出的任何液体，所以降低了光刻投影设备的微妙部件污染的风险。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009044186A

公开(公告)日：2009-02-26

申请号：JP2008274721

申请日：2008-10-24

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KOLESNYCHENKO ALEKSEY YURIEVIC ,  BASELMANS JOHANNES JACOBUS MAT ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  JEROEN JOHANNES SOPHIA MARIA M ,  MULKENS JOHANNES CATHARINUS HU ,  PEETERS FELIX GODFRIED PETER ,  STREEFKERK BOB ,  TEUNISSEN FRANCISCUS JOHANNES ,  VAN SANTEN HELMAR

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

CPC classification number: G03F7/70341 ,  G03F7/70733 ,  G03F7/70866 ,  G03F7/70908

Abstract: PROBLEM TO BE SOLVED: To provide a substrate table of an immersion lithographic apparatus which is configured to prevent contamination with immersion liquid. SOLUTION: The substrate table WT is provided with a drainage ditch or barrier 40 surrounding an outer circumferential edge of the substrate W and a barrier 100 surrounding other objects 20 like sensors positioned in the same plane substantially the upper surface of the substrate W. The barriers 40 and 100 are configured to collect all of liquid spilled from a liquid supply system while the substrate W is exposed, so thereby reducing the risk of contamination of fine components in the lithographic projection apparatus. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种浸没式光刻设备的基板台，其被配置为防止浸没液体的污染。 解决方案：衬底台WT设置有围绕衬底W的外周边缘的排水沟或屏障40，以及围绕基本上位于衬底W的上表面的同一平面中的诸如传感器的其它物体20的阻挡层100 挡板40和100被配置为在基板W暴露的同时收集从液体供应系统溢出的所有液体，从而降低光刻投影装置中的细小部件污染的风险。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009033200A

公开(公告)日：2009-02-12

申请号：JP2008274726

申请日：2008-10-24

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KOLESNYCHENKO ALEKSEY YURIEVIC ,  BASELMANS JOHANNES JACOBUS MAT ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  JEROEN JOHANNES SOPHIA MARIA M ,  MULKENS JOHANNES CATHARINUS HU ,  PEETERS FELIX GODFRIED PETER ,  STREEFKERK BOB ,  TEUNISSEN FRANCISCUS JOHANNES ,  VAN SANTEN HELMAR

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

CPC classification number: G03F7/70341 ,  G03F7/70733 ,  G03F7/70866 ,  G03F7/70908

Abstract: PROBLEM TO BE SOLVED: To provide a substrate table of an immersion lithographic apparatus configured to prevent contamination with immersion liquid. SOLUTION: The substrate table WT includes a drainage groove, i.e. a barrier 40 which surrounds an outer peripheral edge of the substrate W and a barrier 100 which surrounds another object 20 like a sensor present on substantially the same plane with a top surface of the substrate. The barriers 40 and 100 can collect any liquid which is spilt from the liquid supply system while the substrate W is exposed to reduce the risk of contamination of delicate components of the lithographic projection apparatus. COPYRIGHT: (C)2009,JPO&INPIT

公开(公告)号：JP2009033162A

公开(公告)日：2009-02-12

申请号：JP2008187824

申请日：2008-07-18

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： ANTONIUS LEENDERS MARTINUS HEN ,  VAN DOMMELEN YOURI JOHANNES LA ,  JANSEN HANS ,  WATSO ROBERT DOUGLAS ,  DE JONG ANTHONIUS MARTINUS COR ,  CROMWIJK JAN WILLEM ,  THOMAS LAURSEN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70925 ,  G03F7/2041 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To prevent or reduce contamination of an immersion lithographic apparatus. SOLUTION: The lithographic apparatus that includes a reflector for reflecting a cleaning beam of radiation projected through a projection system onto an underside of a liquid retrieval system is disclosed. The construction of the reflector is also disclosed as is a method for irradiating the underside of a liquid supply system used for cleaning. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：防止或减少浸没式光刻设备的污染。 公开了一种光刻设备，其包括用于将通过投影系统投射的清洁光束反射到液体回收系统的下侧的反射器。 还公开了用于照射用于清洁的液体供应系统的下侧的方法。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2007318129A

公开(公告)日：2007-12-06

申请号：JP2007129288

申请日：2007-05-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STAVENGA MARCO KOERT ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HEN ,  WANTEN PETER FRANCISCUS ,  CUIJPERS JOHANNES WILHELMUS JA ,  BEEREN RAYMOND GERARDUS MARIUS ,  DE JONG ANTHONIUS MARTINUS COR

IPC: H01L21/027 ,  G03F7/20

CPC classification number: H01L21/68735 ,  G03F7/70916 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To provide a method of effectively cleaning an immersion lithographic equipment. SOLUTION: The immersion lithographic equipment comprises a substrate so configured as to hold a substrate, a projection system configured to project a patterned radiation beam onto the substrate, a megasonic transducer configured to clean a surface, and a liquid supply system configured to supply a liquid between the megasonic transducer and the surface to be cleaned. The surface of the immersion lithography projector is cleaned using megasonic waves generated from the megasonic transducer configured to clean the surface. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种有效地清洗浸没式光刻设备的方法。 浸没式光刻设备包括被配置为保持基板的基板，被配置为将图案化的辐射束投影到基板上的投影系统，配置成清洁表面的兆声传感器，以及配置为 在超声波换能器和要清洁的表面之间提供液体。 浸没式光刻投影仪的表面使用由构造成清洁表面的兆声传感器产生的兆声波来清洁。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2006313904A

公开(公告)日：2006-11-16

申请号：JP2006123549

申请日：2006-04-27

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  LAMBERTUS DONDERS SJOERD NICOL ,  GRAAF ROELOF FREDERICK DE ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  MARTINUS HENDRIKUS ANTONIUS LE ,  LIEBREGTS PAULUS MARTINUS MARI ,  MERTENS JEROEN JOHANNES SOPHIA ,  VAN DER TOORN JAN-GERARD CORNE ,  RIEPEN MICHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/2041 ,  G03F7/3085 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/70825 ,  G03F7/70875 ,  G03F7/70916 ,  G03F2007/2067 ,  H01L21/0274 ,  H01L21/67098

Abstract: PROBLEM TO BE SOLVED: To reduce generation of bubbles in immersion liquid and to reduce evaporation of immersion liquid. SOLUTION: Liquid immersion lithography equipment is provided with a liquid confinement structure for defining a space arranged to contain liquid between a projection system and a substrate at least partially. In order to decrease crossing of the edge of a substrate for forming an image (which may cause inclusion of bubbles in immersion liquid), cross-sectional area of the space is minimized in a plane parallel with the substrate. Minimum theoretical size is the size of a target portion where an image is formed by the projection system. In one embodiment, profile of a final element in the projection system is altered to have the size and/or profile similar to that of the target portion in the cross-section parallel with the substrate. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：减少浸没液中气泡的产生并减少浸没液体的蒸发。 解决方案：液浸光刻设备设置有液体限制结构，用于限定至少部分地在投影系统和基板之间容纳液体的空间。 为了减少用于形成图像（可能引起浸入液体中的气泡的）的基板的边缘的交叉，在平行于基板的平面中，该空间的横截面面积被最小化。 最小理论尺寸是由投影系统形成图像的目标部分的尺寸。 在一个实施例中，投影系统中的最终元件的轮廓被改变成具有与平行于基底的横截面中的目标部分的尺寸和/或轮廓相似的尺寸和/或轮廓。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006173620A

公开(公告)日：2006-06-29

申请号：JP2005360344

申请日：2005-12-14

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： JANSEN HANS ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VAN DER TOORN JAN-GERARD CORNE

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide equipment and method of reducing the pollution of immersion fluid in the lithographic equipment when confining the liquid in a liquid supply system using a lock out surface. SOLUTION: According to the invention, a lock out surface is maintained at a place far by a predetermined distance from a liquid supply system, collision between the lock out surface and the liquid supply system is eliminated, and liquid is still confined in order to avoid or reduce the pollution by a particle generated by the collision of the lock out surface and the liquid supply system. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供在使用锁定表面将液体限制在液体供应系统中时减少平版印刷设备中的浸液的污染的设备和方法。 解决方案：根据本发明，锁定表面保持在远离液体供应系统的预定距离的位置，消除了锁定表面和液体供应系统之间的碰撞，并且液体仍然被限制在 以避免或减少由锁定表面和液体供应系统碰撞产生的颗粒的污染。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2006140494A

公开(公告)日：2006-06-01

申请号：JP2005326781

申请日：2005-11-11

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： VERSPAIJ JACOBUS JOHANNUS LEON ,  JANSEN HANS ,  STAVENGA MARCO KOERT

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70608 ,  G03F7/70808 ,  G03F7/70858

Abstract: PROBLEM TO BE SOLVED: To provided a lithography equipment and a device manufacturing method. SOLUTION: In a liquid immersion lithography equipment in which liquid immersion liquid is supplied to local space, the profile of the plan view of the local space is substantially parallel to a substrate and is substantially a polygon. In one embodiment, the curvature radius of two angles of the space is not more than the width of a transition zone between the space to contain liquid and a periphery not to contain liquid. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供光刻设备和设备制造方法。 解决方案：在将液浸液体供应到局部空间的液浸光刻设备中，局部空间的平面图的轮廓基本上平行于基底并且基本上是多边形。 在一个实施例中，空间的两个角度的曲率半径不大于容纳液体的空间与不含液体的周边之间的过渡区域的宽度。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2006108660A

公开(公告)日：2006-04-20

申请号：JP2005268320

申请日：2005-09-15

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： RITZEN RAYMOND JOHANNES E ,  JANSEN HANS ,  PETIERS HUGO ,  HARBERS JOHN BERNARDUS HENRICU

IPC: H01L21/027 ,  C22C38/00 ,  C22C38/18 ,  G03F7/20

CPC classification number: G03F7/70916 ,  G03F7/7095

Abstract: PROBLEM TO BE SOLVED: To provide an apparatus that makes up a compartment capable of maintaining high vacuum at least temporarily, and constructed of metal or alloy that may be inexpensive and may have improved machinability, other than stainless steel. SOLUTION: The apparatus includes a compartment for maintaining a high vacuum environment, the compartment partially bounded by and/or including a surface containing an internal zone that includes a first zone Z1 and a second zone Z2, wherein the second zone Z2 is located between the first zone Z1 and the surface, the first zone Z1 is constructed of metal or alloy having a composition differing from stainless steel, and gas diffusion is less causable in the second zone Z2 than it is in the first zone Z1, so that gaseous molecules are blocked from intruding from the surface into the first zone Z1 through the second zone Z2, whereby production of porous erosion products is prevented at the surface position or near the surface and no apparent leakage is caused. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种能够至少暂时保持高真空的隔室的装置，并且由不锈钢以外的金属或合金制成，其可以是便宜的并且可以具有改进的机械加工性。 解决方案：该装置包括用于保持高真空环境的隔室，隔室部分界限和/或包括含有内部区域的表面，该内部区域包括第一区域Z1和第二区域Z2，其中第二区域Z2为 位于第一区域Z1和表面之间的第一区域Z1由具有不同于不锈钢的组成的金属或合金构成，并且第二区域Z2中的气体扩散比第一区域Z1中的气体扩散更少，因此 气态分子被阻止通过第二区域Z2从表面侵入第一区域Z1，从而在表面位置或表面附近防止多孔侵蚀产物的产生，并且不会引起明显的泄漏。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2014039069A

公开(公告)日：2014-02-27

申请号：JP2013243543

申请日：2013-11-26

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BRUIJSTENS JEROEN PETER JOHANNES ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  SIEBE LANDHEER ,  JORRITSMA LAURENTIUS CATRINUS ,  MEESTER ARNOUT JOHANNES ,  JANSEN BAUKE ,  THOMAS IVO ADAM JOHANNES ,  MIRANDA MARCIO ALEXANDRE CANO ,  VAN DER LEE MAURICE MARTINUS JOHANNES ,  TANASA GHEORGHE ,  NOORDAM LAMBERTUS DOMINICUS

IPC: H01L21/027

CPC classification number: G03F7/70341 ,  G03B27/52

Abstract: PROBLEM TO BE SOLVED: To provide a system to reduce effect of droplets and/or a boundary surface between gas/liquid and a final element on the final element, or to substantially avoid such droplet formation.SOLUTION: A lithographic apparatus comprises: a projection system; and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure, and a substrate and/or a substrate table. In the lithographic apparatus, means is taken for, e.g., reducing effect of droplets on a final element of the projection system or substantially avoiding such droplet formation.

Abstract translation: 要解决的问题：提供一种系统，以减少液体和/或气体/液体与最终元件上的最终元件之间的边界表面的影响，或基本上避免这种液滴形成。解决方案：光刻设备包括：投影 系统; 以及液体限制结构，其被配置为至少部分地将浸没液体限制在由所述投影系统，所述液体限制结构以及衬底和/或衬底台限定的浸没空间中。 在光刻设备中，采取手段来例如减少液滴对投影系统的最终元件的影响或基本上避免这种液滴形成。