公开(公告)号：JP2008306217A

公开(公告)日：2008-12-18

申请号：JP2008237316

申请日：2008-09-17

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： ZAAL KOEN JACOBUS JOHANNES MAR ,  JEROEN JOHANNES SOPHIA MARIA M ,  OTTENS JOOST JEROEN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70691

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus capable of supplying liquid with a high refractive index to a space between a final lens element and a substrate and reducing distortion of the substrate. SOLUTION: A burl plate for use in immersion lithography has a higher burl density in a peripheral portion than in a medial portion, so that even when a higher differential pressure is applied in the peripheral portion, the compression of the burls in the peripheral portion is substantially the same as in the medial portion. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 解决的问题：提供能够向最终透镜元件和基板之间的空间提供具有高折射率的液体并减少基板的变形的光刻设备。 解决方案：浸没式光刻中使用的凸缘板在周边部分具有比中间部分更高的凸起密度，使得即使当在周边部分中施加较高的压差时， 周边部分与中间部分基本相同。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008258657A

公开(公告)日：2008-10-23

申请号：JP2008188683

申请日：2008-07-22

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： OTTENS JOOST JEROEN ,  VEN DER SCHOOT HARMEN KLAAS ,  STARREVELD JEROEN P ,  PETRUS MARIA MAAS WOUTERUS J ,  VENEMA WILLEM JURRIANUS ,  MENCHTCHIKOV BORIS

IPC: G03F9/00 ,  H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70616 ,  G03F7/70783 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To correct thermal inductive deformation of a wafer substrate in a lithography device. SOLUTION: A correction method includes a stage P204 where a pattern is exposed on a plurality of fields of a substrate according to prespecified exposure information P204 and stages P206 and P208 where properties of fields are measured and deformations of fields induced by thermal effect of exposure processing are evaluated. The present method further includes a stage to determine correction information based on measured properties and stage P210 where the prespecified exposure information is adjusted based on the correction information to compensate thermal inductive field deformation. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：为了校正光刻设备中的晶片衬底的热感应变形。 解决方案：校正方法包括阶段P204，其中根据预先指定的曝光信息P204在基板的多个场上暴露图案，阶段P206和P208，其中测量场的性质和由热效应引起的场的变形 的曝光处理。 本方法还包括基于测量属性确定校正信息的阶段和阶段P210，其中基于校正信息调整预定曝光信息以补偿热感应场变形。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2007266603A

公开(公告)日：2007-10-11

申请号：JP2007072118

申请日：2007-03-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KEMPER NICOLAAS R ,  LAMBERTUS DONDERS SJOERD NICOL ,  OTTENS JOOST JEROEN ,  VAN DER HOEVEN JAN CORNELIS ,  KADIJK EDWIN CORNELIS ,  SERGEI SHULEPOV

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03B27/42 ,  G03F7/70341 ,  G03F7/70716

Abstract: PROBLEM TO BE SOLVED: To provide an exposure device capable of removing an immersion liquid in the edge of a substrate in immersion exposure. SOLUTION: A drain 10 is provided around an outer edge of a substrate W arranged such that a gap 15 exists between the substrate W and a substrate table WT. In this drain 10, the pressure of gas within a chamber 70 is maintained to be equal to the pressure of gas outside of the substrate table WT (i.e., the pressure of ambient gas.) This means the fact that, in a usual operation, substantially no gas flow which passes the gap 15 is present during a period when the gap 15 is not covered with a liquid supply system and one or more gas flow devices of the liquid supply system blow the gas away through the gap 15. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种能够在浸没曝光中去除衬底边缘中的浸没液体的曝光装置。 解决方案：在衬底W的外边缘周围设置漏极10，衬底W的外缘布置成使得在衬底W和衬底台WT之间存在间隙15。 在这个排水管10中，室70内的气体的压力保持等于衬底台WT外面的气体压力（即环境气体的压力）。这意味着在通常的操作中， 在间隙15没有被液体供应系统覆盖的时间段内，基本上没有通过间隙15的气流存在，并且液体供应系统的一个或多个气体流动装置通过间隙15吹走气体。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2007142428A

公开(公告)日：2007-06-07

申请号：JP2006310702

申请日：2006-11-16

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： ANTONIUS LEENDERS MARTINUS H ,  OTTENS JOOST JEROEN ,  KEMPER NICOLAAS R

IPC: H01L21/027 ,  G03F7/20

Abstract: PROBLEM TO BE SOLVED: To improve the throughput of an exposure apparatus by increasing scanning speed in an immersion exposure apparatus. SOLUTION: A liquid supply system for supplying liquid between a projection system PL and a substrate is provided with a barrier member 12 for sealing the liquid, however, the relative speed between the barrier member 12 and the substrate can be reduced, thereby to increase the speed of the substrate relative to the projection system PL by forming the barrier member 12 so that the barrier member can move relatively to the projection system PL and independently of the substrate. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：通过增加浸没曝光装置中的扫描速度来提高曝光装置的生产量。 解决方案：用于在投影系统PL和基板之间供应液体的液体供应系统设置有用于密封液体的阻挡构件12，然而，可以减小阻挡构件12和基板之间的相对速度，由此 通过形成阻挡构件12使得阻挡构件能够相对于投影系统PL移动而独立于衬底来增加衬底相对于投影系统PL的速度。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006128682A

公开(公告)日：2006-05-18

申请号：JP2005310028

申请日：2005-10-25

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： OTTENS JOOST JEROEN ,  MERTENS JEROEN JOHANNES SOPHIA ,  DE JONG FREDERIK EDUARD ,  GOORMAN KOEN ,  MENCHTCHIKOV BORIS ,  VAN GOMPEL EDWIN AUGUSTINUS MA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: H01L21/67109 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70783 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide lithography equipment and a device manufacturing method.
SOLUTION: Lithography equipment has a substrate support formed such that it supports a substrate, and a projection system formed such that it projects a patterned radiation beam to a target part of the substrate. The substrate support is operated such that the substrate is moved along a specified path of the target part as the next target of the substrate. The substrate support has a duct fabric for thermally stabilizing the substrate. This duct fabric supplies a thermal stabilization medium to the substrate through the duct, and removes the thermal stabilization medium virtually using the duct from a portion of the substrate support that supports the target part via the substrate support part that supports the target part preceding the substrate, thereby maintaining the target part as a next target thermally stably.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供光刻设备和设备制造方法。 解决方案：平版印刷设备具有形成为支撑基板的基板支撑件和形成为使得其将图案化的辐射束投影到基板的目标部分的投影系统。 操作基板支撑件，使得基板沿着目标部件的指定路径移动，作为基板的下一个目标。 衬底支撑件具有用于热稳定衬底的管道织物。 这种管道织物通过管道向基底提供热稳定介质，并且通过经由基板支撑部分支撑目标部分的衬底支撑部分，基本上使用来自支撑目标部分的基板支撑件的管道的热稳定介质， 从而热稳定地将目标部分保持为下一个目标。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2006054468A

公开(公告)日：2006-02-23

申请号：JP2005233909

申请日：2005-08-12

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： CADEE THEODORUS PETRUS MARIA ,  JACOBS JOHANNES HENRICUS WILHE ,  KATE NICOLAAS TEN ,  LOOPSTRA ERIK ROELOF ,  VAN MEER ASCHWIN LODEWIJK HEND ,  MERTENS JEROEN JOHANNES SOPHIA ,  DE MOL CHRISTIANUS GERARDUS MA ,  MUITJENS MARCEL JOHANNUS ELISA ,  VAN DER NET ANTONIUS J ,  OTTENS JOOST JEROEN ,  QUAEDACKERS JOHANNES ANNA ,  REUHMAN-HUISKEN MARIA ELISABET ,  STAVENGA MARCO KOERT ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VERHAGEN MARTINUS CORNELIS MAR ,  VERSPAIJ JACOBUS JOHANNUS LEON ,  DE JONG FREDERIK EDUARD ,  GOORMAN KOEN ,  MENCHTCHIKOV BORIS ,  BOOM HERMAN ,  NIHTIANOV STOYAN ,  MOERMAN RICHARD ,  SMEETS MARTIN FRANS PIERRE ,  SCHOONDERMARK BART LEONARD PET ,  JANSSEN FRANCISCUS JOHANNES JO ,  RIEPEN MICHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70808 ,  G03F7/70341 ,  G03F7/70841 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide a system for reducing lithographic errors caused by immersion liquid. SOLUTION: A lithography apparatus comprises an illumination system so constituted as to control a radiation beam, a support so constituted as to support a pattern forming device which imparts patterns on a crosssection of the radiation beam to form a patternized radiation beam, a substrate table so constituted as to hold a substrate, a projection system so constituted as to project the patternized radiation beam on the target of the substrate, a liquid supply system so constituted as to fill at least part of a space between a final element of the projection system and the substrate with the liquid, a sealing member so disposed as to substantially enclose the liquid inside the space between the final element of the projection system and the substrate, and an element for controlling and/or compensate evaporation of the immersion liquid from the substrate. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种减少浸没液引起的平版印刷误差的系统。 解决方案：光刻设备包括照明系统，其被构造成控制辐射束，支撑件被构造成支撑图案形成装置，其在辐射束的横截面上施加图案以形成图案化的辐射束， 衬底台，其被构造成保持衬底;投影系统，其被构造成将图案化的辐射束投射到衬底的靶上;液体供应系统，其被构造成填充所述衬底的最终元件之间的至少一部分空间; 投影系统和具有液体的基板，密封构件，其被设置为基本上将液体包围在投影系统的最终元件和基板之间的空间内，以及用于控制和/或补偿浸没液体的蒸发的元件 底物。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2005294838A

公开(公告)日：2005-10-20

申请号：JP2005100825

申请日：2005-03-31

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： ZAAL KOEN JACOBUS JOHANNES MAR ,  JEROEN JOHANNES SOPHIA MARIA M ,  OTTENS JOOST JEROEN

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/70691

Abstract: PROBLEM TO BE SOLVED: To provide lithography equipment capable of supplying a liquid having a high index of refraction to a space between a final lens element and a substrate and reducing distortion of the substrate.
SOLUTION: The lithography equipment comprises a lighting system for providing a projection beam of radiation; a support structure for supporting a pattern forming device that gives a pattern to the cross-section of the projection beams; a substrate table for supporting the substrate, having a bur plate and a vacuum system for establishing a pressure difference across the entire substrate held by the bur plate, in which the pressure difference is larger at the circumferential part of the substrate than the central part; a projection system for projecting the pattern-formed beam onto the target part of the substrate; and a liquid supply system for supplying a liquid having a high index of refraction to a space between the final element of the projection system and the substrate held by the substrate table, wherein the density of the bur on the bur plate is higher at the circumferential part than the central part.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供能够将具有高折射率的液体供应到最终透镜元件和基板之间的空间的光刻设备，并减少基板的变形。 解决方案：光刻设备包括用于提供投影射线束的照明系统; 用于支撑图案形成装置的支撑结构，该图案形成装置向投影光束的横截面赋予图案; 用于支撑基板的基板台，具有钻头板和真空系统，用于在基板的周向部分处的压力差比中心部分在压板上保持的整个基板上形成压力差; 投影系统，用于将图案形成的光束投影到基板的目标部分上; 以及液体供给系统，用于将具有高折射率的液体供应到投影系统的最终元件和由基板台保持的基板之间的空间，其中，钻孔板上的钻头的密度在圆周方向上较高 部分比中央部分。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2005005707A

公开(公告)日：2005-01-06

申请号：JP2004169275

申请日：2004-06-08

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： JOERI LOF ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBER ,  KOLESNYCHENKO ALEKSEY ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARI ,  MULKENS JOHANNES CATHARINUS HU ,  RITSEMA ROELOF AEILKO SIEBRAND ,  VAN SCHAIK FRANK ,  SENGERS TIMOTHEUS FRANCISCUS ,  SIMON KLAUS ,  DE SMIT JOANNES THEODOOR ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  BIJLAART ERIK THEODORUS MARIA ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  VAN SANTEN HELMAR ,  VAN DE KERKHOF MARCUS ADRIANUS ,  KROON MARK ,  DEN BOEF ARIE JEFFREY ,  OTTENS JOOST JEROEN ,  MERTENS JEROEN JOHANNES SOPHIA

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

Abstract: PROBLEM TO BE SOLVED: To provide an immersion type lithography projection apparatus with improved functionality. SOLUTION: The highlights of this invention are that the lithography apparatus is equipped with a radiation system Ex to provide the projection beams PB of radiation including a radioactive source LA, a primary object table (mask table) MT connected to a primary positioning means to correctly position a mask against IL and a member PL, a secondary object table (substrate table) WT connected to a secondary positioning means to correctly position a substrate against the member PL, and a projection system PL to form an image of the irradiated part of the mask MA on the target part of the substrate W. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供具有改进的功能的浸没式光刻投影装置。 解决方案：本发明的亮点在于，光刻设备配备有辐射系统Ex以提供包括放射源LA的辐射投影束PB，连接到主要定位的主要物体台（掩模台）MT 用于将掩模正确地定位在IL和构件PL上的装置，连接到二次定位装置以将衬底正确地定位在构件PL上的第二对象台（衬底台）WT，以及用于形成照射的图像的投影系统PL 在基板W的目标部分上的掩模MA的一部分。版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2004200700A

公开(公告)日：2004-07-15

申请号：JP2003420697

申请日：2003-12-18

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： OTTENS JOOST JEROEN ,  VAN KERVINCK MARCEL NICOLAAS J

IPC: G03F7/22 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70066 ,  G03F7/70216 ,  G03F7/70358 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide a method for exposing a structure on a substrate in non-rectangular region, such as a circumference of a region to be protected, in a shorter period.
SOLUTION: While exposing a target portion of the substrate edge by scanning, a radiation is prevented from being exposed on the substrate table or its radiation is decreased, or a position of an edge of an illuminating field is changed so as to expose an L-shaped region. A thermal load on the substrate table can be decreased by this method, and a mouse bite can be filled into a dummy structure without overlapping with an alignment mark.
COPYRIGHT: (C)2004,JPO&NCIPI

公开(公告)号：JP2014027308A

公开(公告)日：2014-02-06

申请号：JP2013228111

申请日：2013-11-01

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： CADEE THEODORUS PETRUS MARIA ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  NICOLAAS TEN KATE ,  LOOPSTRA ERIK ROELOF ,  ASHWIN RODEVICK HENDRICKS JOHANNES VAN MEHL ,  JEROEN JOHANNES SOPHIA MARIA MERTENS ,  CHRISTIANUS GERARDUS MARIA DE MOL ,  MUITJENS MARCEL JOHANNUS ELISABETH HUBERTUS ,  VAN DER NET ANTONIUS J ,  OTTENS JOOST JEROEN ,  QUAEDACKERS JOHANNES ANNA ,  REUHMAN-HUISKEN MARIA ELISABETH ,  MARCO COELHO STAUFEN ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VERHAGEN MARTINUS CORNELIS MARIA ,  VERSPAIJ JACOBUS JOHANNUS LEONARDUS HENDRICUS ,  DE JONG FREDERIK EDUARD ,  GOORMAN KOEN ,  MENCHTCHIKOV BORIS ,  BOOM HERMAN ,  STOYAN NIHTIANOV ,  MOERMAN RICHARD ,  SMEETS MARTIN FRANS PIERRE ,  SCHOONDERMARK BART LEONARD PETER ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  RIEPEN MICHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70808 ,  G03F7/70341 ,  G03F7/70841 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide a system that reduces lithography errors caused by immersion liquid.SOLUTION: A lithographic apparatus comprises: an illumination system configured to adjust a radiation beam; a support body configured to support a pattern forming device capable of imparting a pattern to the radiation beam in a cross section of the radiation beam to form a pattern formed radiation beam; a substrate table configured to hold a substrate; a projection system configured to project the pattern formed radiation beam onto a target portion of the substrate; a liquid supply system configured to fill at least a part of space between a final element of the projection system and the substrate with liquid; a seal member arranged to substantially contain the liquid within the space between the final element of the projection system and the substrate; and elements to control and/or compensate for evaporation of the immersion liquid from the substrate.

Abstract translation: 要解决的问题：提供减少由浸没液体引起的光刻误差的系统。解决方案：光刻设备包括：照明系统，被配置为调节辐射束; 支撑体，被配置为支撑图案形成装置，其能够在所述辐射束的横截面中赋予所述辐射束的图案以形成图案形成的辐射束; 被配置为保持基板的基板台; 投影系统，被配置为将所述图案形成的辐射束投影到所述基板的目标部分上; 液体供应系统，其配置成用液体填充所述投影系统的最终元件和所述基板之间的至少一部分空间; 密封构件，其布置成基本上将所述液体容纳在所述投影系统的最终元件与所述基板之间的空间内; 以及用于控制和/或补偿来自衬底的浸没液体的蒸发的元件。