公开(公告)号：JP2005294839A

公开(公告)日：2005-10-20

申请号：JP2005100831

申请日：2005-03-31

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： BASELMANS JOHANNES JACOBUS MAT ,  SJOERD NICOLAAS LAMBERTUS DOND ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  JEROEN JOHANNES SOPHIA MARIA M ,  MULKENS JOHANNES CATHARINUS HU ,  STREEFKERK BOB

IPC: H01L21/027 ,  G03B27/52 ,  G03F7/20 ,  G03F9/00

CPC classification number: G03F9/7096 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide lithography equipment that has improved focusing, for example, in immersion lithography equipment. SOLUTION: A substrate is exposed to light in an immersion liquid supplied from a liquid supply system. Before exposure, a map of the substrate surface is generated at a measuring section. The liquid supply system fills the space between a measuring system and the substrate with a liquid so that measurement is performed in the liquid. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供例如在浸没式光刻设备中改进聚焦的光刻设备。 解决方案：将衬底暴露于从液体供应系统供应的浸没液中的光。 在曝光之前，在测量部分产生基板表面的图。 液体供应系统用液体填充测量系统和基板之间的空间，以便在液体中进行测量。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2005150734A

公开(公告)日：2005-06-09

申请号：JP2004328567

申请日：2004-11-12

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： STREEFKERK BOB ,  BASELMANS JOHANNES JACOBUS MAT ,  BRULS RICHARD JOSEPH ,  DIERICHS MARCLE MATHIJS T M ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  LOOPSTRA ERIK ROELOF ,  JEROEN JOHANNES SOPHIA MARIA M ,  MULKENS JOHANNES CATHARINUS HU ,  SENGERS TIMOTHEUS FRANCISCUS ,  RONALD WALTER JIIN SEVERYNS ,  SERGEI SHULEPOV ,  BOOM HERMAN

IPC: H01L21/027 ,  B05D3/12 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  G03F7/70908 ,  G03F7/70958

Abstract: PROBLEM TO BE SOLVED: To provide a immersion-type lithography projection apparatus.
SOLUTION: In the immersion-type lithography apparatus, an immersion liquid is confined between a final element of a projection system and a substrate. Both of hydrophobic and hydrophilic layers are used on various elements of the apparatus. The use of them helps to prevent air-bubble formation in the immersion liquid, and reduce residues remained on the elements after immersion in the immersion liquid.
COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种浸没型光刻投影装置。 解决方案：在浸没式光刻设备中，浸没液体被限制在投影系统的最终元件和基板之间。 疏水层和亲水层都用在装置的各种元件上。 它们的使用有助于防止浸入液体中的气泡形成，并且减少浸入浸液中之后残留在元件上的残留物。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2005057278A

公开(公告)日：2005-03-03

申请号：JP2004222718

申请日：2004-07-30

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： JEROEN JOHANNES SOPHIA MARIA M ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSSEN HENDRICUS WILHELMUS A ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VAN DEN SCHOOR LEON JOSEPH MAR ,  DONDERS SJOERD NICOLAAS LAMBER ,  STREEFKERK BOB

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a liquid feed system that can supply immersion liquid at a very stable flow rate with the minimum pressure fluctuation to a space between the last element and the substrate of a projection lens in an immersion liquid lithography equipment. SOLUTION: In the immersion liquid lithography equipment, immersion liquid is supplied through a flow rate limiter from a tank. Liquid held in the tank is maintained at a substantially fixed height above the flow rate limiter, by which stable liquid flow is assured. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种液体供给系统，其可以以最小的压力波动以非常稳定的流速向浸没液体光刻设备中的投影透镜的最后一个元件和基板之间的空间供应浸没液体 。 解决方案：在浸没液体光刻设备中，浸没液体通过流量限制器从罐中提供。 保持在罐中的液体保持在流量限制器上方基本上固定的高度，由此确保稳定的液体流动。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2005005707A

公开(公告)日：2005-01-06

申请号：JP2004169275

申请日：2004-06-08

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： JOERI LOF ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBER ,  KOLESNYCHENKO ALEKSEY ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARI ,  MULKENS JOHANNES CATHARINUS HU ,  RITSEMA ROELOF AEILKO SIEBRAND ,  VAN SCHAIK FRANK ,  SENGERS TIMOTHEUS FRANCISCUS ,  SIMON KLAUS ,  DE SMIT JOANNES THEODOOR ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  BIJLAART ERIK THEODORUS MARIA ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  VAN SANTEN HELMAR ,  VAN DE KERKHOF MARCUS ADRIANUS ,  KROON MARK ,  DEN BOEF ARIE JEFFREY ,  OTTENS JOOST JEROEN ,  MERTENS JEROEN JOHANNES SOPHIA

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

Abstract: PROBLEM TO BE SOLVED: To provide an immersion type lithography projection apparatus with improved functionality. SOLUTION: The highlights of this invention are that the lithography apparatus is equipped with a radiation system Ex to provide the projection beams PB of radiation including a radioactive source LA, a primary object table (mask table) MT connected to a primary positioning means to correctly position a mask against IL and a member PL, a secondary object table (substrate table) WT connected to a secondary positioning means to correctly position a substrate against the member PL, and a projection system PL to form an image of the irradiated part of the mask MA on the target part of the substrate W. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供具有改进的功能的浸没式光刻投影装置。 解决方案：本发明的亮点在于，光刻设备配备有辐射系统Ex以提供包括放射源LA的辐射投影束PB，连接到主要定位的主要物体台（掩模台）MT 用于将掩模正确地定位在IL和构件PL上的装置，连接到二次定位装置以将衬底正确地定位在构件PL上的第二对象台（衬底台）WT，以及用于形成照射的图像的投影系统PL 在基板W的目标部分上的掩模MA的一部分。版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2004363588A

公开(公告)日：2004-12-24

申请号：JP2004158482

申请日：2004-05-28

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： STREEFKERK BOB ,  DIERICHS MARCLE MATHIJS T M ,  GEHOEL-VAN ANSEM WENDY FRANSIS

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/70866 ,  G03F7/70958

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic projector and a device manufacturing method capable of reducing or avoiding the deterioration of a photoresist that exists in a liquid immersion part of the surface of a substrate. SOLUTION: To provide a lithographic device in which exposure is performed by projection through aqueous solution less than pH 7 in contact with a substrate to be projected. It is advantageous that the aqueous solution is an antireflection topcoat solution. COPYRIGHT: (C)2005,JPO&NCIPI

公开(公告)号：JP2004289127A

公开(公告)日：2004-10-14

申请号：JP2003417260

申请日：2003-11-11

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： LOF JOERI ,  BIJLAART ERIK THEODORUS MARIA ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBER ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  KOLESNYCHENKO ALEKSEY ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARI ,  MERTENS JEROEN JOHANNES SOPHIA ,  MULKENS JOHANNES CATHARINUS HU ,  RITSEMA ROELOF AEILKO SIEBRAND ,  SCHAIK FRANK VAN ,  SENGERS TIMOTHEUS FRANCISCUS ,  SIMON KLAUS ,  DE SMIT JOHANNES THEODOOR ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  VAN SANTEN HELMAR

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F7/70866

Abstract: PROBLEM TO BE SOLVED: To disclose a lithography projector in which a space between the final element of a projection system and a substrate is filled with liquid. SOLUTION: Hermetic edge sealing members 17 and 117 surround a substrate W on a substrate table WT or another object at least partially thus preventing the catastrophic loss of the liquid when the edge part of the substrate is imaged or illuminated. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：公开一种其中投影系统的最终元件和基板之间的空间被液体填充的光刻投影仪。 解决方案：密封边缘密封构件17和117围绕基板台WT或另一物体上的基板W，至少部分地防止当基板的边缘部分成像或照明时液体的灾难性损失。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2012151488A

公开(公告)日：2012-08-09

申请号：JP2012061787

申请日：2012-03-19

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  ANTONIUS THEODORUS ANNA MARIA DERKSEN ,  JOERI LOF ,  SIMON KLAUS ,  STRAAIJER ALEXANDER

IPC: H01L21/027 ,  G02B13/00 ,  G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70258 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70891

Abstract: PROBLEM TO BE SOLVED: To reduce image distortion due to temperature gradients in a substrate and immersion liquid in an immersion projection exposure apparatus.SOLUTION: An immersion lithography apparatus comprises a temperature controller configured to adjust temperature of a member in the final stage of a projection exposure apparatus PL, a substrate, and immersion liquid to common target temperature T4. Imaging consistency and whole performance can be improved, by adjusting all of the temperatures of these structural members and by reducing temperature gradients. Means used to adjust the temperature may include controlling a flow rate and the temperature of the immersion liquid via a feedback circuit.

Abstract translation: 要解决的问题：为了减少由于浸没投影曝光装置中的基板和浸没液体中的温度梯度引起的图像失真。 解决方案：浸没式光刻设备包括温度控制器，其被配置为将投影曝光设备PL，基板和浸没液体的最终级中的部件的温度调节到共同的目标温度T4。 通过调整这些结构件的所有温度和降低温度梯度，可以提高成像的一致性和整体性能。 用于调节温度的手段可以包括通过反馈电路来控制浸入液体的流量和温度。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2011029657A

公开(公告)日：2011-02-10

申请号：JP2010220937

申请日：2010-09-30

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JACOBS HERNES ,  GILISSEN NOUD JAN ,  JANSEN HANS ,  KATE NICOLAAS TEN ,  KEMPER NICOLAAS R ,  ANTONIUS LEENDERS MARTINUS HENDRIKUS ,  LOOPSTRA ERIK R ,  HUBERTUS MULKENS JOHANNES C ,  HARMEN KLAAS VAN DER SCHOOT ,  STAVENGA MARCO KOERT ,  STREEFKERK BOB ,  VERHAGEN MARTINUS CORNELIS MARIA ,  STEIJAART PETER PAUL ,  VERMAELEN MARKUS MARTINUS PETRUS ADRIANUS ,  VAN DER HOEVEN JAN CORNELIS

IPC: H01L21/027

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To moderate a defect induced by an immersion liquid in an immersion lithography projection apparatus where a liquid removal system surrounds a liquid supply system for providing liquid to a space between a projection system and a substrate.
SOLUTION: The liquid removal system 100 is moveable relative to the liquid supply system (partially shown as a barrier member 12) and is controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system (partially shown as the barrier member 12) and the liquid removal system 100 may be covered and the atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained so that the vapor pressure of liquid is relatively high.
COPYRIGHT: (C)2011,JPO&INPIT

公开(公告)号：JP2011029656A

公开(公告)日：2011-02-10

申请号：JP2010220936

申请日：2010-09-30

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JACOBS HERNES ,  GILISSEN NOUD JAN ,  JANSEN HANS ,  KATE NICOLAAS TEN ,  KEMPER NICOLAAS R ,  ANTONIUS LEENDERS MARTINUS HENDRIKUS ,  LOOPSTRA ERIK R ,  HUBERTUS MULKENS JOHANNES C ,  HARMEN KLAAS VAN DER SCHOOT ,  STAVENGA MARCO KOERT ,  STREEFKERK BOB ,  VERHAGEN MARTINUS CORNELIS MARIA ,  STEIJAART PETER PAUL ,  VERMAELEN MARKUS MARTINUS PETRUS ADRIANUS ,  VAN DER HOEVEN JAN CORNELIS

IPC: H01L21/027

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To moderate a defect induced by an immersion liquid in an immersion lithography projection apparatus where a liquid removal system surrounds a liquid supply system for providing liquid to a space between a projection system and a substrate. SOLUTION: The liquid removal system 100 is moveable relative to the liquid supply system (partially shown as a barrier member 12) and controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system (partially shown as the barrier member 12) and the liquid removal system 100 may be covered and an atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained so that the vapor pressure of liquid is relatively high. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：为了缓和浸没光刻投影装置中的浸没液体引起的缺陷，其中液体移除系统围绕用于向投影系统和基板之间的空间提供液体的液体供应系统。 解决方案：液体移除系统100可相对于液体供应系统（部分地示为阻挡构件12）移动并被控制为相对于移动的衬底台具有基本上零的速度。 可以覆盖液体供应系统（部分示为阻挡构件12）和液体移除系统100之间的间隙，并且可以保持液体供应系统和衬底台上方的液体移除系统之间的气氛，使得蒸气压 的液体比较高。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011018925A

公开(公告)日：2011-01-27

申请号：JP2010198845

申请日：2010-09-06

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BASELMANS JOHANNES JACOBUS MATHEUS ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  MERTENS JEROEN JOHANNES SOPHIA MARIA ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  STREEFKERK BOB

IPC: H01L21/027 ,  G03F9/02

CPC classification number: G03F9/7023 ,  G03F7/70341 ,  G03F7/70883

Abstract: PROBLEM TO BE SOLVED: To provide a method for correcting an exposure parameter of an immersion lithographic apparatus, and to provide a device and/or a computer program product.SOLUTION: In this method, an exposure parameter is measured using measuring beams 22, 24 projected through a liquid between the projection system PL and a substrate table of the immersion lithographic apparatus, and offset is determined based on a change of a physical property influencing measurement made using the measuring beams to at least partly correct the measured exposure parameter. Also, the height of an optical element connected to liquid between the projection system and the substrate table in the immersion lithographic apparatus is measured.

Abstract translation: 要解决的问题：提供一种用于校正浸没式光刻设备的曝光参数的方法，并提供设备和/或计算机程序产品。解决方案：在该方法中，使用测量光束22,24测量曝光参数 通过投影系统PL和浸没式光刻设备的衬底台之间的液体投影，并且基于影响使用测量光束进行的测量的物理属性的变化来确定偏移，以至少部分地校正测量的曝光参数。 此外，测量在浸没式光刻设备中连接到投影系统和基板台之间的液体的光学元件的高度。