公开(公告)号：JP2009265609A

公开(公告)日：2009-11-12

申请号：JP2008331732

申请日：2008-12-26

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： TOMIGA TAKAMITSU ,  FUJII KANA ,  DOBASHI TORU ,  MIZUTANI KAZUYOSHI ,  YOKOYAMA SHIGEO ,  SUGIYAMA SHINICHI ,  HIRANO SHUJI ,  FUJIMORI TORU

IPC: G03F7/039 ,  C08F212/14 ,  C08F220/10 ,  G03F7/004 ,  H01L21/027

CPC classification number: G03F7/0392 ,  C08F8/12 ,  C08F12/22 ,  C08F214/18 ,  C08F220/18 ,  C08F220/22 ,  C08F220/32 ,  C08F2220/282 ,  C08K5/375 ,  C08K5/42 ,  C08L33/068 ,  C08L51/04 ,  C08L67/02 ,  C09D125/14 ,  C09D125/18 ,  G03F7/0045 ,  G03F7/0046 ,  C08F212/14 ,  C08F2220/1825 ,  C08F2220/185 ,  C08F220/14

Abstract: PROBLEM TO BE SOLVED: To provide a positive resist composition satisfying the requirements of wide exposure latitude, reduction in line edge roughness, a desirable pattern configuration and dry etching resistance and giving a pattern with few defects after development, and to provide a method for forming a pattern by use of the above composition. SOLUTION: An actinic ray-sensitive or radiation-sensitive resin composition is disclosed, comprising: (A) a resin containing repeating units of formulae (I), (II) and (III) that when acted on by an acid, becomes soluble in an alkali developer, and (B) a compound that when irradiated with actinic rays or radiation, generates a fluorine-containing acid. In the formulae, each of R 1 independently represents a hydrogen atom or an optionally substituted methyl group; R 2 represents a halogen atom, an optionally substituted alkyl group, an optionally substituted cycloalkyl group, an optionally substituted aryl group or an optionally substituted aralkyl group; and n is an integer of 0 to 5; provided that when n is ≥2, multiple R 2 s may be identical to or different from each other. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供满足宽曝光宽容度要求的正型抗蚀剂组合物，线边缘粗糙度的减小，期望的图案构造和耐干蚀刻性，并且在显影后给出少量缺陷的图案，并提供 通过使用上述组合物形成图案的方法。 解决方案：公开了光化射线敏感或辐射敏感性树脂组合物，其包含：（A）含有式（I），（II）和（III）的重复单元的树脂，当被酸作用时， 变得可溶于碱性显影剂，（B）当用光化射线或辐射照射时产生含氟酸的化合物。 在该式中，R SB 1 各自独立地表示氢原子或任选取代的甲基; R SB 2表示卤素原子，任选取代的烷基，任选取代的环烷基，任选取代的芳基或任选取代的芳烷基; n为0〜5的整数。 条件是当n≥2时，多个R SB 2可以彼此相同或不同。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009244741A

公开(公告)日：2009-10-22

申请号：JP2008093297

申请日：2008-03-31

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： MARUYAMA YOICHI ,  FUJIMORI TORU ,  ENAGA HIROYUKI ,  SHIMADA KAZUTO ,  TSUCHIMURA TOMOTAKA ,  KANEKO YUJI

IPC: G03F7/004 ,  G02B5/20 ,  G02B5/22 ,  G03F7/028

Abstract: PROBLEM TO BE SOLVED: To provide a photosensitive resin composition having less production of residue upon forming a pattern and exhibiting excellent linearity of thin lines in a formed pattern, to provide a light-shielding color filter formed from the above photosensitive resin composition and a method of producing the same, and to provide a solid-state image sensor. SOLUTION: The resin composition contains at least (A) titanium black, (B) a photopolymerization initiator, (C) a polymerizable compound, (D) a resin and (E) an organic solvent, wherein a weight ratio (W C /W A ) of the total weight W C of the polymerizable compound to the total weight W A of the titanium black ranges from 0.02 to 0.4. The light-shielding color filter formed from the above photosensitive resin composition and the method of producing the same, and the solid-state image sensor having the light-shielding color filter are also provided. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：为了提供一种在形成图案时具有较少残留量的感光性树脂组合物，并且在成形图案中显示出细线的线性优良，从而提供由上述感光性树脂组合物形成的遮光性滤色片 及其制造方法，提供固态图像传感器。 解决方案：树脂组合物至少含有（A）钛黑，（B）光聚合引发剂，（C）可聚合化合物，（D）树脂和（E）有机溶剂，其中重量比 可聚合化合物的总重量W C 与总重量W A 之比 钛黑的范围为0.02至0.4。 还提供了由上述感光树脂组合物形成的遮光滤色器及其制造方法，以及具有遮光滤色器的固态图像传感器。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009244692A

公开(公告)日：2009-10-22

申请号：JP2008092582

申请日：2008-03-31

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： MARUYAMA YOICHI ,  ENAGA HIROYUKI ,  FUJIMORI TORU ,  SHIMADA KAZUTO ,  TSUCHIMURA TOMOTAKA ,  KANEKO YUJI

IPC: G03F7/032 ,  G02B5/20 ,  G03F7/004 ,  G03F7/031

Abstract: PROBLEM TO BE SOLVED: To provide a photosensitive resin composition excellent in stability with lapse of time, from which a fine pattern with a reduced amount of development residue can be formed. SOLUTION: The resin composition contains at least titanium black, a photopolymerizable compound, a resin (A) having an acid value of ≥70 mgKOH/g and ≤250 mgKOH/g, a resin (B) having an acid value of ≥26 mgKOH/g and ≤65 mgKOH/g, a photopolymerization initiator, and a solvent. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 解决的问题：为了提供稳定性优异的时间流逝的感光性树脂组合物，可以形成具有减少的显影残渣量的精细图案。 解决方案：树脂组合物至少含有钛黑，光聚合性化合物，酸值≥70mgKOH/ g和≤250mgKOH/ g的树脂（A），酸值为 ≥26mgKOH/ g和≤65mgKOH/ g，光聚合引发剂和溶剂。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2008274022A

公开(公告)日：2008-11-13

申请号：JP2007115978

申请日：2007-04-25

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： AIZAWA TAEKO ,  SHIMADA KAZUTO ,  FUJIMORI TORU

IPC: C09B67/54 ,  C09B67/46 ,  C09D17/00 ,  G02B5/20

Abstract: PROBLEM TO BE SOLVED: To provide a pigment excellent in dispersion stability, excellent in transparency and capable of reducing generation of a pinhole even if a coating film is formed, a pigment dispersion composition excellent in dispersion stability, a curable composition excellent in storage stability, coatability, sensitivity, non-exposure part developability, substrate adhesion property and a pattern shape, a color filter, and its manufacturing method. SOLUTION: The pigment washed with an organic solvent having at least one hetero atom in a molecule, the pigment dispersion composition containing at least (A) the pigment, (B) a dispersing agent and (C) a solvent, the curable composition formulated with the pigment dispersion composition, the color filter using the curable composition, and its manufacturing method are provided. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：为了提供分散稳定性优异的透明性，即使形成涂膜也能够减少针孔产生的颜料，分散稳定性优异的颜料分散组合物，优异的固化性组合物 保存稳定性，可涂布性，灵敏度，非曝光部分显影性，基材粘合性和图案形状，滤色器及其制造方法。 溶液：颜料用分子中具有至少一个杂原子的有机溶剂洗涤，颜料分散体组合物至少含有（A）颜料，（B）分散剂和（C）溶剂，可固化 提供了配合颜料分散组合物的组合物，使用该固化性组合物的滤色器及其制造方法。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008083416A

公开(公告)日：2008-04-10

申请号：JP2006263581

申请日：2006-09-27

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： MIZUKAWA HIROKI ,  SETO NOBUO ,  TAKAKUWA HIDEKI ,  FUJIMORI TORU

IPC: G03F7/004 ,  C09B23/00 ,  C09B29/42 ,  C09B67/22 ,  G02B5/20 ,  G02B5/22

Abstract: PROBLEM TO BE SOLVED: To provide a photosensitive red colored curable composition excellent in color purity of red, having such a high absorbance index as to enable formation of a thinner layer and excellent in fastness, a color filter and a method for producing the same. SOLUTION: The photosensitive colored curable composition contains as a colorant a dipyromethene metal complex compound obtained from a dipyromethene compound represented by formula (I) and a metal or metal compound, and a compound represented by formula (A). In formula (I), R 1 -R 6 each represent H or a substituent; and R 7 represents H, halogen, an alkyl group, an aryl group or a heterocyclic group. In formula (A), R 50 represents H or a substituent; R 51 represents an alkyl group, an alkenyl group, an aryl group, a heterocyclic group, an acyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, a carbamoyl group, an alkylsulfonyl group, an arylsulfonyl group or a sulfamoyl group; X 1 represents -C(R 52 )= or -N=, R 52 represents H or a substituent; and A represents a coupler residue. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：为了提供具有如下特性的具有如此高的吸光度指数的红色的颜色纯度的感光性红色固化性组合物，能够形成更薄的层并具有优异的耐光性，滤色器和制造方法 一样。 光敏着色固化性组合物含有由式（I）表示的二亚甲基吡啶化合物和金属或金属化合物以及式（A）表示的化合物得到的二亚甲基金属络合物作为着色剂。 在式（I）中，R 1和R 2各自表示H或取代基; R 7表示H，卤素，烷基，芳基或杂环基。 在式（A）中，R 30代表H或取代基; R 51表示烷基，烯基，芳基，杂环基，酰基，烷氧基羰基，芳氧基羰基，氨基甲酰基，烷基磺酰基，芳基磺酰基或 氨磺酰基; X 1 表示-C（R SP 52）=或-N =，R SP 52表示H或取代基; A表示成色剂残基。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2008003164A

公开(公告)日：2008-01-10

申请号：JP2006170527

申请日：2006-06-20

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： FUJIMORI TORU ,  SASAKI TOMOYA

IPC: G03F7/031 ,  G02B5/20 ,  G03F7/004 ,  G03F7/027

Abstract: PROBLEM TO BE SOLVED: To provide a negative dye-containing curable composition which is capable of forming a rectangular fine pattern with high sensitivity and achieves high in-plane uniformity of a film in coating. SOLUTION: The negative dye-containing curable composition contains the dye, a photopolymerization initiator and a radical polymerizable monomer, wherein a compound represented by formula (1) is used as the photopolymerization initiator. In the formula (1), R 1 represents a phenyl group; R 2 represents a 1-20C alkyl group or a 5-8C cycloalkyl group; and R 3 represents a 1-4C alkyl group. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供能够以高灵敏度形成矩形精细图案并实现涂层中膜的高平面均匀性的含负染料的可固化组合物。 解决方案：含阴离子染料的可固化组合物含有染料，光聚合引发剂和可自由基聚合的单体，其中使用由式（1）表示的化合物作为光聚合引发剂。 在式（1）中，R“SP”表示苯基; R 2表示1-20C烷基或5-8C环烷基; 并且R“3”表示1-4C烷基。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2007219467A

公开(公告)日：2007-08-30

申请号：JP2006135522

申请日：2006-05-15

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： FUJIMORI TORU

IPC: G03F7/027 ,  G02B5/20 ,  G03F7/004

Abstract: PROBLEM TO BE SOLVED: To form a fine pattern having a rectangular cross section with high sensitivity. SOLUTION: A dye-containing negative working curable composition is used which contains, as a radical polymerizable monomer, an acidic group-containing polyfunctional (meth)acrylic compound having an acid value of ≥25 mgKOH/g, together with a dye and a photopolymerization initiator. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：形成具有高灵敏度的矩形截面的精细图案。 解决方案：使用含有酸值为≥25mgKOH/ g的酸性基团的多官能（甲基）丙烯酸化合物作为自由基聚合性单体的含染料的负极固化性组合物，与染料 和光聚合引发剂。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2013122602A

公开(公告)日：2013-06-20

申请号：JP2013003571

申请日：2013-01-11

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： KANEKO YUJI ,  MARUYAMA YOICHI ,  FUJIMORI TORU ,  ENAGA HIROYUKI ,  SHIMADA KAZUTO ,  TSUCHIMURA TOMOTAKA

IPC: G03F7/033 ,  G02B5/20 ,  G03F7/004 ,  G03F7/031 ,  H04N9/07

Abstract: PROBLEM TO BE SOLVED: To provide a black curable composition capable of being cured with high sensitivity even by small amount of exposure and forming a light-shielding color filter for a solid-state imaging element which reduces the residue in a developing part and improves a pattern shape, and further to provide a light-shielding color filter for a solid-state imaging element having excellent light-shielding properties in a wide wavelength region and a method for manufacturing the same and a solid-state imaging element.SOLUTION: There is provided a black curable composition which contains (A) titanium black, (B) an alkali-soluble resin having a weight average molecular weight of 7,000 or more and 18,000 or less, a distribution of molecular weight (weight-average molecular weight/average numerical molecular weight) of 1.8 or more and 2.2 or less and an acid value of 70 mgKOH/g to 130 mgKOH/g, (C) a solvent, (D) a photopolymerization initiator and (E) a compound having an ethylenically unsaturated double bond. The black curable composition is suitable for the manufacture of a light-shielding color filter for a solid-state imaging element and a solid-state imaging element.

Abstract translation: 要解决的问题：提供一种即使通过少量曝光也能够以高灵敏度固化的黑色可固化组合物，并且形成用于固态成像元件的遮光滤色器，其减少显影部分中的残留物 并提高了图案形状，并且还提供了在宽波长区域中具有优异的遮光性的固态成像元件的遮光滤色器及其制造方法和固态成像元件。 解决方案：提供一种黑色可固化组合物，其含有（A）钛黑，（B）重均分子量为7,000以上且18,000以下的碱溶性树脂，分子量（重量） 平均分子量/平均数均分子量）为1.8以上且2.2以下，酸值为70mgKOH / g〜130mgKOH / g，（C）溶剂，（D）光聚合引发剂和（E） 具有烯属不饱和双键的化合物。 黑色固化性组合物适用于固体摄像元件和固体摄像元件的遮光性滤色片的制造。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2011013581A

公开(公告)日：2011-01-20

申请号：JP2009159327

申请日：2009-07-03

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： FUJII KANA ,  FUJIMORI TORU

IPC: G03F7/039 ,  C08F212/14 ,  G03F7/004 ,  H01L21/027

CPC classification number: G03F7/0048 ,  C08F8/02 ,  C08F12/22 ,  C08F12/24 ,  C08F12/32 ,  C08F212/14 ,  C09D125/14 ,  C09D125/18 ,  G03F7/0397 ,  C08F220/10 ,  C08F2220/1841

Abstract: PROBLEM TO BE SOLVED: To provide a resist composition capable of improving the performance in minute processing of a semiconductor element using an electron beam, an X ray, a KrF excimer laser beam, or an ArF excimer laser beam, excellent in terms of sensitivity, resolution, focal margin (DOF) performance, LWR, reduction of blur, and reduction of pattern surface roughness; and to provide a pattern-forming method using the same.SOLUTION: The active light or radiation-sensitive composition includes (A) a resin having a hydroxy styrene unit, an alkoxyalkyl group-substituted hydroxy styrene unit not including a cycloalkyl group, an alkoxyalkyl group-substituted hydroxy styrene unit including a cycloalkyl group or a (meth)alkyl acrylate ester unit, (B) a compound for generating an acid by radiation of an active light or radiation, and (C) a solvent including an ethyl lactate. Also provided is a pattern-forming method using the same.

Abstract translation: 要解决的问题：提供能够提高使用电子束的半导体元件的微小加工性能的抗蚀剂组合物，灵敏度优异的X射线，KrF准分子激光束或ArF准分子激光束， 分辨率，焦距（DOF）性能，LWR，模糊减少和图案表面粗糙度的降低; 并提供使用其的图案形成方法。解决方案：活性光或辐射敏感性组合物包括（A）具有羟基苯乙烯单元的树脂，不包括环烷基的烷氧基烷基取代的羟基苯乙烯单元，烷氧基烷基 包括环烷基或（甲基）丙烯酸烷基酯单元的基团取代的羟基苯乙烯单元，（B）通过活性光或辐射的辐射产生酸的化合物，和（C）包括乳酸乙酯的溶剂。 还提供了使用该图案形成方法的图案形成方法。

公开(公告)号：JP2010250271A

公开(公告)日：2010-11-04

申请号：JP2009288255

申请日：2009-12-18

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： FUJII KANA ,  HIRANO SHUJI ,  YAMADA MAKI ,  FUJIMORI TORU

IPC: G03F7/039 ,  C08F8/12 ,  C08F212/14 ,  C08F220/16 ,  G03F7/004 ,  H01L21/027

CPC classification number: C08F212/14 ,  C08F8/12 ,  C08F220/20 ,  C08F2220/1825 ,  C08K5/375 ,  C08K5/41 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  C08F2220/281 ,  C08F220/30

Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition that prevents an increase of a swing width, suppresses generation of a standing wave, and has a high resolution and small amount of film wear, even if using a high reflection substrate directly without using an anti-reflection film.
SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition contains: the resin containing a specific structure, and in which the solubility to an alkali developer increases by acid action; and a compound generating an acid containing a fluorine atom by irradiation of an active ray or radioactive rays. The resist film using the composition and the pattern forming method are also provided.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：为了提供防止摆动宽度增加的光化射线敏感性或辐射敏感性树脂组合物，抑制驻波的产生，并且具有高分辨率和少量的膜磨损，甚至 如果直接使用高反射衬底而不使用抗反射膜。 光敏射线敏感性或辐射敏感性树脂组合物含有：含有特定结构的树脂，其中碱性显影剂对酸性作用的溶解度增加; 以及通过活性射线或放射线的照射产生含有氟原子的酸的化合物。 还提供了使用组合物和图案形成方法的抗蚀剂膜。 版权所有（C）2011，JPO＆INPIT