公开(公告)号：JP2013015596A

公开(公告)日：2013-01-24

申请号：JP2011146859

申请日：2011-06-30

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： KATAOKA SHOHEI ,  IIZUKA YUSUKE ,  SHIBUYA AKINORI ,  MATSUDA TOMOKI ,  TANGO NAOHIRO

IPC: G03F7/039 ,  C08F220/26 ,  G03F7/004 ,  G03F7/38 ,  H01L21/027

CPC classification number: G03F7/2041 ,  G03F7/0045 ,  G03F7/0397 ,  G03F7/11 ,  Y10S430/106 ,  Y10S430/114 ,  Y10S430/128 ,  Y10T428/24802

Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition capable of improving line edge roughness (LER) and suppressing pattern collapse, and to provide a resist film and a pattern forming method using the composition, and a method for manufacturing an electronic device and an electronic device.SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition comprises: (A) a resin having a repeating unit having a structure expressed by any of general formulae (I-1) to (I-3), and a repeating unit having at least one kind selected from the group consisting of a lactone structure, a sultone structure and a cyano group; and (B) a compound that generates an acid by irradiation with actinic rays or radiation.

Abstract translation: 要解决的问题：提供能够改善线边缘粗糙度（LER）并抑制图案塌陷的光化射线敏感或辐射敏感性树脂组合物，并提供使用该组合物的抗蚀剂膜和图案形成方法， 以及电子设备和电子设备的制造方法。 光敏性或辐射敏感性树脂组合物包含：（A）具有由通式（I-1）至（I-3）中任何一个表示的结构的重复单元的树脂和 具有选自内酯结构，磺内酯结构和氰基中的至少一种的重复单元; 和（B）通过用光化射线或辐射照射产生酸的化合物。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2012173367A

公开(公告)日：2012-09-10

申请号：JP2011032679

申请日：2011-02-17

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： IIZUKA YUSUKE ,  SHIBUYA AKINORI ,  IWATO KAORU ,  TANGO NAOHIRO

IPC: G03F7/039 ,  C07C381/12 ,  C08F20/10 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition excellent in all of line edge roughness, pattern features, followability for an immersion liquid and dry etching durability, and to provide a resist film and a pattern forming method using the composition.SOLUTION: The radiation-sensitive resin composition contains: (A) a resin having a repeating unit expressed by general formula (I-1) or (I-2); and (C) a compound, which has a molar absorption coefficient ε, at a wavelength of 193 nm measured in an acetonitrile solvent, of a relative ratio of 0.8 or less with respect to triphenylsulfonium nonafluorobutane sulfonate and which generates an acid by irradiation with radiation. In general formulae (I-1) and (I-2), ARand ARrepresent an aromatic group; Rrepresents an alkyl group, a cycloalkyl group or an aryl group; Aand Aeach independently represent a hydrogen atom, an alkyl group, a halogen atom, a cyano group or an alkyloxycarbonyl group; and Z represents a linking group to form a ring together with C-AR.

Abstract translation: 要解决的问题：提供一种在线边缘粗糙度，图案特征，浸渍液的追随性和干蚀刻耐久性方面优异的辐射敏感性树脂组合物，并提供抗蚀剂膜和使用该方法的图案形成方法 组成。 解决方案：辐射敏感性树脂组合物含有：（A）具有由通式（I-1）或（I-2）表示的重复单元的树脂; 和（C）在乙腈溶剂中测量的在193nm波长处具有摩尔吸收系数ε的化合物相对于九氟丁磺酸三苯基锍相对比例为0.8以下，通过辐射照射产生酸 。 在通式（I-1）和（I-2）中，AR 1 和AR 2 表示芳族基团; R 1 表示烷基，环烷基或芳基; A 1 和A 2 各自独立地表示氢原子，烷基，卤素原子，氰基或烷氧基羰基 组; Z表示与C-AR 2 一起形成环的连接基团。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2011257613A

公开(公告)日：2011-12-22

申请号：JP2010132410

申请日：2010-06-09

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： YAMAMOTO KEI ,  IWATO KAORU ,  HIRANO SHUJI ,  IIZUKA YUSUKE

IPC: G03F7/039 ,  C08F20/04 ,  C08F20/10 ,  C08F20/28 ,  C08F20/54 ,  G03F7/004 ,  G03F7/38 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray sensitive or radiation sensitive resin composition which can provide a pattern having improved uniformity of coating film thickness and excellent size uniformity in the wafer surface on which the pattern has been formed by liquid immersion exposure, and a pattern forming method using the composition.SOLUTION: An actinic ray-sensitive or radiation-sensitive resin composition contains: (A) a resin which has a repeating unit represented by the following general formula (A1) and increases its dissolution rate in an alkali developer by an action of an acid; (B) a compound which generates an acid by irradiation with actinic rays or radiation; and (C) a resin which comprises a repeating unit having a lactone structure substituted by a group having a fluorine atom. (In the formula, Rrepresents a hydrogen atom, an alkyl group, a fluoroalkyl group, a halogen atom or CHOH; Rrepresents an alkylene group, a cycloalkylene group or a bivalent connecting group that is formed by combining them; n represents an integer of 0-5; if n is 2 or more, a plurality of Rmay be the same or different.)

Abstract translation: 要解决的问题：提供一种光化射线敏感或辐射敏感性树脂组合物，其可以提供在通过液浸曝光形成图案的晶片表面中具有改善的涂膜厚度均匀性和优异的尺寸均匀性的图案 ，以及使用该组合物的图案形成方法。 光敏射线敏感性或辐射敏感性树脂组合物含有：（A）具有下列通式（A1）所示的重复单元的树脂，并通过作用于 酸; （B）通过用光化射线或辐射照射产生酸的化合物; 和（C）含有被具有氟原子的基团取代的内酯结构的重复单元的树脂。 （式中，R 1 表示氢原子，烷基，氟代烷基，卤素原子或CH 2。 OH; R 2 表示通过组合形成的亚烷基，亚环烷基或二价连接基团; n表示0-5的整数;如果n为2或 更多，多个R 2 可以相同或不同。）版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2011215414A

公开(公告)日：2011-10-27

申请号：JP2010084199

申请日：2010-03-31

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： YOSHITOME MASAHIRO ,  HIRANO SHUJI ,  SHIRAKAWA MICHIHIRO ,  IIZUKA YUSUKE ,  TAKAHASHI HIDETOMO

IPC: G03F7/004 ,  C08F220/10 ,  G03F7/039 ,  G03F7/38 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition excellent in coating defect performance, coating film thickness uniformity, and PEBS performance, and provide a pattern forming method using the composition.SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition includes a structure part (S1) that is decomposed by action of acid to generate alkaline soluble group, resin (P) containing a repeating unit (A) having a structure part (S2) that is decomposed by action of alkali developing solution to increase the dissolution rate into the alkali developing solution, compound for generating acid by irradiation of active light or radiation, and a solvent. At least one kind of solvents listed in the following X group and Y group is contained. The X group includes alkylene glycol monoalkyl ethers, alkyl lactate esters, alkoxy acetic acid alkyls, alkoxy propionic acid alkyls, pyruvic acid alkyls, and acetic acid alkyl ester. The Y group includes cyclic lactones, and alkylene carbonates.

Abstract translation: 要解决的问题：提供涂膜缺陷性能，涂膜厚度均匀性和PEBS性能优异的光化射线敏感或辐射敏感性树脂组合物，并提供使用该组合物的图案形成方法。溶液：光化学敏感 或辐射敏感性树脂组合物包括通过酸作用而分解以产生碱溶性基团的结构部分（S1），含有具有结构部分（S2）的重复单元（A）的树脂（P） 碱显影液，以增加碱显影液的溶解速度，通过活性光或辐射照射产生酸的化合物和溶剂。 含有下列X基和Y基中的至少一种溶剂。 X基团包括亚烷基二醇单烷基醚，乳酸烷基酯，烷氧基乙酸烷基，烷氧基丙酸烷基，丙酮酸烷基和乙酸烷基酯。 Y基团包括环状内酯和碳酸亚烷基酯。

公开(公告)号：JP2011215334A

公开(公告)日：2011-10-27

申请号：JP2010082702

申请日：2010-03-31

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： IIZUKA YUSUKE ,  KOSHIJIMA KOSUKE ,  SHIRAKAWA MICHIHIRO

IPC: G03F7/039 ,  C08F34/00 ,  G03F7/38 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition which is improved in developability and enables to form a pattern having good conformability to an immersion liquid in liquid immersion exposure, and a pattern forming method using the composition.SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition includes: a resin (B) having a repeating unit represented by general formula (I); a resin (A) which exhibits increased solubility in an alkali developer under the action of an acid; and a compound which generates an acid upon irradiation with actinic rays or radiation, wherein X represents an alkylene group which may have a substituent, an oxygen atom or a sulfur atom; Y represents an electron withdrawing group; Rf represents a linear, branched or cyclic hydrocarbon group in which part or all of hydrogen atoms on the constitutive carbon atoms are substituted by fluorine atoms; and n represents an integer of ≥0.

Abstract translation: 要解决的问题：提供可显影性提高的光化射线敏感性或辐射敏感性树脂组合物，并且能够形成在液浸曝光中浸渍液具有良好贴合性的图案，以及使用该组合物的图案形成方法。 解决方案：光化射线敏感或辐射敏感性树脂组合物包括：具有由通式（I）表示的重复单元的树脂（B）; 在酸性作用下在碱性显影剂中表现出增加的溶解度的树脂（A） 以及在用光化射线或辐射照射时产生酸的化合物，其中X表示可以具有取代基的亚烷基，氧原子或硫原子; Y表示吸电子基团; Rf表示其中部分或全部氢原子被氟原子取代的直链，支链或环状烃基; n表示≥0的整数。

公开(公告)号：JP2011191731A

公开(公告)日：2011-09-29

申请号：JP2010206643

申请日：2010-09-15

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： IIZUKA YUSUKE ,  TAKAHASHI HIDETOMO ,  SHIRAKAWA MICHIHIRO ,  YOSHITOME MASAHIRO ,  HIRANO SHUJI

IPC: G03F7/039 ,  C08F220/26 ,  G03F7/004 ,  H01L21/027

CPC classification number: C08F220/26 ,  G03F7/0397 ,  G03F7/2041

Abstract: PROBLEM TO BE SOLVED: To provide an actinic-ray- or radiation-sensitive resin composition that excels in the roughness characteristics, exposure latitude, depth of focus, and development defect performance and that allows to form a pattern of favorable configuration, and to provide a method of forming a pattern using the composition. SOLUTION: The actinic-ray- or radiation-sensitive resin composition comprises a resin containing a repeating unit (A) containing both a structural moiety (S1) that is decomposed by an action of an acid to thereby generate an alkali-soluble group and a structural moiety (S2) that is decomposed by an action of an alkali developer to thereby increase its rate of dissolution into the alkali developer, and a compound that generates an acid by irradiation with actinic rays or radiation. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供在粗糙度特性，曝光宽容度，焦深和显影缺陷性能方面优异的光化射线或辐射敏感性树脂组合物，并且允许形成有利构造的图案， 并提供使用该组合物形成图案的方法。 光解射线或辐射敏感性树脂组合物包含含有重复单元（A）的树脂，该重复单元（A）含有通过酸的作用而分解的结构部分（S1），从而产生碱溶性 基团和通过碱性显影剂的作用分解的结构部分（S2），从而增加其对碱性显影剂的溶解速率，以及通过用光化射线或辐射照射产生酸的化合物。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011180393A

公开(公告)日：2011-09-15

申请号：JP2010044797

申请日：2010-03-01

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： IIZUKA YUSUKE ,  TAKAHASHI HIDETOMO ,  HIRANO SHUJI ,  YOSHITOME MASAHIRO ,  SHIRAKAWA MICHIHIRO

IPC: G03F7/039 ,  C08F220/22 ,  C08F220/26 ,  C08F230/08 ,  H01L21/027

CPC classification number: G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0757 ,  G03F7/2041

Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition enabling a pattern to be formed, the pattern having improved line width roughness, remedied development defects and pattern collapse and exhibiting good conformability to an immersion liquid in immersion exposure, and to provide a resist film and a pattern forming method using the composition.
SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition includes (A) a resin including a repeating unit having a structural moiety (S1) which decomposes by the action of an acid to thereby generate an alkali-soluble group and a structural moiety (S2) which exhibits an increased dissolution rate in an alkali developer by the action of the alkali developer, (B) a resin having at least one of a fluorine atom and a silicon atom, and (C) a compound which generates an acid upon irradiation with actinic rays or radiation. The resist film and the pattern forming method using the composition are also provided.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：为了提供能够形成图案的光化射线敏感或辐射敏感性树脂组合物，该图案具有改善的线宽粗糙度，矫正的显影缺陷和图案塌陷并且显示出对浸液的良好贴合性 并且提供使用该组合物的抗蚀剂膜和图案形成方法。 光敏性或辐射敏感性树脂组合物包含（A）包含具有结构部分（S1）的重复单元的树脂，其通过酸的作用分解，从而产生碱溶性基团， 通过碱显影剂的作用在碱性显影剂中显示出增加的溶解速率的结构部分（S2），（B）具有氟原子和硅原子中的至少一个的树脂，和（C）产生 用光化射线或辐射照射时的酸。 还提供了使用该组合物的抗蚀剂膜和图案形成方法。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011102975A

公开(公告)日：2011-05-26

申请号：JP2010230645

申请日：2010-10-13

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： SAEGUSA HIROSHI ,  IWATO KAORU ,  IIZUKA YUSUKE ,  KOSHIJIMA KOSUKE

IPC: G03F7/004 ,  C08F20/10 ,  C08F20/54 ,  C08F30/08 ,  G03F7/039 ,  H01L21/027

CPC classification number: G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0758 ,  G03F7/2041 ,  G03F7/38

Abstract: PROBLEM TO BE SOLVED: To provide an active light sensitive or radiation sensitive resin composition and a method of forming a pattern using the resin composition improved in line edge roughness, BLOB defects and generation of scum, and having good conformability to an immersion liquid in immersion exposure. SOLUTION: The active light sensitive or radiation sensitive resin composition includes (A) a resin that when acted on by an acid, increases its solubility in an alkali developer, (B) a compound that when exposed to active lights or radiation, generates an acid, and (C) a resin containing at least one group selected among the following groups (x) to (z) and further containing at least either a fluorine atom or a silicon atom, in which three or more polymer chains are contained through at least one branch point, (x) an alkali-soluble group, (y) a group that when acted on by an alkali developer, is decomposed to thereby increase its solubility in the alkali developer, and (z) a group that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种主动光敏或辐射敏感性树脂组合物和使用改善了线边缘粗糙度，BLOB缺陷和浮渣产生并且具有良好的浸渍适形性的树脂组合物形成图案的方法 液体浸入曝光。 主要的光敏性或辐射敏感性树脂组合物包括（A）当被酸作用时增加其在碱性显影剂中的溶解度的树脂，（B）当暴露于活性光或辐射时， 产生酸，和（C）含有选自下列基团（x）至（z）中的至少一个基团的树脂，并且还含有其中含有三个或更多个聚合物链的氟原子或硅原子中的至少一个 通过至少一个分支点，（x）碱溶性基团，（y）当被碱显影剂作用时分解的基团分解，从而增加其在碱性显影剂中的溶解度，和（z） 被酸分解，从而增加其在碱性显影剂中的溶解度。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010266857A

公开(公告)日：2010-11-25

申请号：JP2010089799

申请日：2010-04-08

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： OTANI TADAHIRO ,  HIRANO SHUJI ,  SAEGUSA HIROSHI ,  IWATO KAORU ,  IIZUKA YUSUKE

IPC: G03F7/039 ,  C08F20/28 ,  G03F7/004 ,  G03F7/38 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition allowing formation of a pattern in which pattern collapse is suppressed, which hardly induces development failure and exhibits excellent stability with lapse of time, and also to provide a method for forming a pattern, using the composition. SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition contains: (A) a resin showing an increase in a dissolution rate with an alkali developing solution by the action of an acid; (B) a compound generating an acid by irradiation with actinic rays or radiation; (C) a resin containing a repeating unit having a polarity converting group that is decomposed by the action of an alkali developing solution to increase the solubility with the alkali developing solution, and containing at least either a fluorine atom or a silicon atom; and (D) a basic compound having a pKa of not more than 9. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供光化学射线敏感性或辐射敏感性树脂组合物，其能够形成抑制图案塌陷的图案，其几乎不引起显影破坏，并且随着时间的推移表现出优异的稳定性，并且还 提供使用该组合物形成图案的方法。 光敏射线敏感性或辐射敏感性树脂组合物含有：（A）通过酸的作用显示与碱性显影液的溶解速度增加的树脂; （B）通过用光化射线或辐射照射产生酸的化合物; （C）含有具有极性转换基团的重复单元的树脂，其通过碱显影液的作用而分解，以增加与碱性显影液的溶解度，并且至少含有氟原子或硅原子; （D）pKa不大于9的碱性化合物。版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010250072A

公开(公告)日：2010-11-04

申请号：JP2009099400

申请日：2009-04-15

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： SHIRAKAWA MICHIHIRO ,  YAMAMOTO KEI ,  IWATO KAORU ,  SAEGUSA HIROSHI ,  HIRANO SHUJI ,  IIZUKA YUSUKE

IPC: G03F7/039 ,  C08F20/00 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an active ray-sensitive or radiation-sensitive resin composition having an effect of improving a spread bottom profile of a resist pattern, with which a pattern having few pattern collapse defects is formed, and to provide a method for forming a pattern by using the composition. SOLUTION: The composition includes (A) a resin the solubility of which with an alkali developing solution is increased by an action of an acid, (B) a compound generating an acid by irradiation with active rays or radiation, and (C) a resin containing at least either a fluorine atom or a silicon atom and containing a polarity conversion group that is decomposed by an action of an alkali developing solution to increases the solubility with the alkali developing solution, wherein the resin component (A) contains a repeating unit obtained from an ester compound expressed by general formula (1). In general formula (1), A 1 represents a polymerizable functional group having a carbon-carbon double bond; A 2 represents a divalent group selected from furan-diyl, tetrahydrofuran-diyl and oxanorbornan-diyl; R 1 and R 2 each independently represent a 1C-10C straight-chain, branched or cyclic monovalent hydrocarbon group; or R 1 and R 2 may be bonded to form an aliphatic hydrocarbon ring together with carbon atoms bonding thereto; and R 3 represents a 1C-10C straight-chain, branched or cyclic monovalent hydrocarbon group which may include a hydrogen atom or a hetero atom. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种具有改善抗蚀剂图案的扩散底部轮廓的效果的活性射线敏感或辐射敏感性树脂组合物，由此形成具有很少图案塌陷缺陷的图案，并提供 通过使用该组合物形成图案的方法。 该组合物包含（A）通过酸的作用使其与碱性显影液的溶解度增加的树脂，（B）通过用活性射线或辐射照射产生酸的化合物和（C ）含有至少一个氟原子或硅原子的树脂，并含有通过碱性显影液的作用分解的极性转换基团以增加与碱性显影液的溶解度，其中树脂组分（A）含有 由通式（1）表示的酯化合物得到的重复单元。 在通式（1）中，A 1 表示具有碳 - 碳双键的聚合性官能团; A 2 表示选自呋喃二基，四氢呋喃 - 二基和氧杂二甘醇二基的二价基团; R 1 和R 2 各自独立地表示1C-10C直链，支链或环状的一价烃基; 或R 1 和R 2 可与键合的碳原子一起形成脂族烃环; R 3表示可以包含氢原子或杂原子的1C-10C直链，支链或环状的一价烃基。 版权所有（C）2011，JPO＆INPIT